JP2508841Y2 - フオトマスクブランクス用保持具 - Google Patents
フオトマスクブランクス用保持具Info
- Publication number
- JP2508841Y2 JP2508841Y2 JP1884590U JP1884590U JP2508841Y2 JP 2508841 Y2 JP2508841 Y2 JP 2508841Y2 JP 1884590 U JP1884590 U JP 1884590U JP 1884590 U JP1884590 U JP 1884590U JP 2508841 Y2 JP2508841 Y2 JP 2508841Y2
- Authority
- JP
- Japan
- Prior art keywords
- holder
- substrate
- film
- view
- shielding film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 51
- 230000002093 peripheral effect Effects 0.000 claims description 13
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 23
- 229910052804 chromium Inorganic materials 0.000 description 20
- 239000011651 chromium Substances 0.000 description 20
- 238000000034 method Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000005192 partition Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1884590U JP2508841Y2 (ja) | 1990-02-28 | 1990-02-28 | フオトマスクブランクス用保持具 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1884590U JP2508841Y2 (ja) | 1990-02-28 | 1990-02-28 | フオトマスクブランクス用保持具 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03110439U JPH03110439U (enrdf_load_stackoverflow) | 1991-11-13 |
| JP2508841Y2 true JP2508841Y2 (ja) | 1996-08-28 |
Family
ID=31521988
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1884590U Expired - Lifetime JP2508841Y2 (ja) | 1990-02-28 | 1990-02-28 | フオトマスクブランクス用保持具 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2508841Y2 (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005063624B4 (de) * | 2004-09-29 | 2019-06-27 | Hoya Corp. | Substrat für Maskenrohling, Maskenrohling, Belichtungsmaske und Herstellungsverfahren für Maskenrohlingssubstrat |
| JP4803576B2 (ja) * | 2004-09-29 | 2011-10-26 | Ｈｏｙａ株式会社 | マスクブランク用基板、マスクブランク、露光用マスク、半導体デバイスの製造方法、及びマスクブランク用基板の製造方法 |
| JP4190523B2 (ja) | 2005-07-22 | 2008-12-03 | シャープ産業株式会社 | 応援用打ち鳴らし具 |
| JP5393972B2 (ja) * | 2007-11-05 | 2014-01-22 | Ｈｏｙａ株式会社 | マスクブランク及び転写用マスクの製造方法 |
-
1990
- 1990-02-28 JP JP1884590U patent/JP2508841Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03110439U (enrdf_load_stackoverflow) | 1991-11-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |