JP2507468Y2 - 横軸遠心式基板乾燥装置 - Google Patents
横軸遠心式基板乾燥装置Info
- Publication number
- JP2507468Y2 JP2507468Y2 JP1990105384U JP10538490U JP2507468Y2 JP 2507468 Y2 JP2507468 Y2 JP 2507468Y2 JP 1990105384 U JP1990105384 U JP 1990105384U JP 10538490 U JP10538490 U JP 10538490U JP 2507468 Y2 JP2507468 Y2 JP 2507468Y2
- Authority
- JP
- Japan
- Prior art keywords
- rotor
- chamber
- substrate
- peripheral wall
- horizontal axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 title claims description 45
- 230000002093 peripheral effect Effects 0.000 claims description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 24
- 230000002209 hydrophobic effect Effects 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 9
- 230000004323 axial length Effects 0.000 claims description 5
- 238000003825 pressing Methods 0.000 description 7
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 3
- 208000005156 Dehydration Diseases 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Drying Of Solid Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990105384U JP2507468Y2 (ja) | 1990-06-26 | 1990-10-05 | 横軸遠心式基板乾燥装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2-68249 | 1990-06-26 | ||
| JP6824990 | 1990-06-26 | ||
| JP1990105384U JP2507468Y2 (ja) | 1990-06-26 | 1990-10-05 | 横軸遠心式基板乾燥装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0448622U JPH0448622U (enrdf_load_stackoverflow) | 1992-04-24 |
| JP2507468Y2 true JP2507468Y2 (ja) | 1996-08-14 |
Family
ID=31948658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990105384U Expired - Lifetime JP2507468Y2 (ja) | 1990-06-26 | 1990-10-05 | 横軸遠心式基板乾燥装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2507468Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2955910B2 (ja) * | 1992-09-25 | 1999-10-04 | 大日本スクリーン製造株式会社 | 横軸回転式基板乾燥装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59101190U (ja) * | 1982-12-23 | 1984-07-07 | 黒谷 信子 | 水切乾燥装置の上蓋 |
| JPS59185590U (ja) * | 1983-05-14 | 1984-12-10 | 黒谷 巌 | 水切乾燥装置の上蓋 |
| JP2663492B2 (ja) * | 1988-04-04 | 1997-10-15 | 大日本スクリーン製造 株式会社 | 基板の回転式表面処理装置 |
| JP2606726B2 (ja) * | 1988-07-29 | 1997-05-07 | 東京エレクトロン株式会社 | 回転処理装置及び回転処理方法 |
-
1990
- 1990-10-05 JP JP1990105384U patent/JP2507468Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0448622U (enrdf_load_stackoverflow) | 1992-04-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |