JP2025514239A - インゴット引き上げ装置の引き上げケーブル用の清掃ツールおよび方法 - Google Patents

インゴット引き上げ装置の引き上げケーブル用の清掃ツールおよび方法 Download PDF

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Publication number
JP2025514239A
JP2025514239A JP2024563437A JP2024563437A JP2025514239A JP 2025514239 A JP2025514239 A JP 2025514239A JP 2024563437 A JP2024563437 A JP 2024563437A JP 2024563437 A JP2024563437 A JP 2024563437A JP 2025514239 A JP2025514239 A JP 2025514239A
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JP
Japan
Prior art keywords
cleaning tool
ingot
pulling
cable
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024563437A
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English (en)
Japanese (ja)
Other versions
JP2025514239A5 (OSRAM
Inventor
ホー，チン－フン
チェン，チー－カイ
リン，チェン－イー
ツァイ，フォン－チエン
リ，トゥン－シャオ
チョン，ヨンギル
オム，ジンヨン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GlobalWafers Co Ltd
Original Assignee
GlobalWafers Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GlobalWafers Co Ltd filed Critical GlobalWafers Co Ltd
Publication of JP2025514239A publication Critical patent/JP2025514239A/ja
Publication of JP2025514239A5 publication Critical patent/JP2025514239A5/ja
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/30—Mechanisms for rotating or moving either the melt or the crystal
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
    • B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
    • B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
    • B08B9/34—Arrangements of conduits or nozzles
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
JP2024563437A 2022-04-27 2023-04-24 インゴット引き上げ装置の引き上げケーブル用の清掃ツールおよび方法 Pending JP2025514239A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202263335447P 2022-04-27 2022-04-27
US63/335,447 2022-04-27
PCT/US2023/019616 WO2023211834A1 (en) 2022-04-27 2023-04-24 Cleaning tools and methods for cleaning the pull cable of an ingot puller apparatus

Publications (2)

Publication Number Publication Date
JP2025514239A true JP2025514239A (ja) 2025-05-02
JP2025514239A5 JP2025514239A5 (OSRAM) 2026-05-07

Family

ID=86424780

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024563437A Pending JP2025514239A (ja) 2022-04-27 2023-04-24 インゴット引き上げ装置の引き上げケーブル用の清掃ツールおよび方法

Country Status (7)

Country Link
US (5) US12202017B2 (OSRAM)
EP (2) EP4729670A2 (OSRAM)
JP (1) JP2025514239A (OSRAM)
KR (1) KR20250006212A (OSRAM)
CN (1) CN119256124A (OSRAM)
TW (1) TW202344721A (OSRAM)
WO (1) WO2023211834A1 (OSRAM)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12202017B2 (en) * 2022-04-27 2025-01-21 Globalwafers Co., Ltd. Cleaning tools and methods for cleaning the pull cable of an ingot puller apparatus
WO2026024809A1 (en) * 2024-07-25 2026-01-29 Globalwafers Co., Ltd. Ingot puller apparatus including in-situ cable cleaner

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2975036A (en) * 1956-10-05 1961-03-14 Motorola Inc Crystal pulling apparatus
JP2001089295A (ja) * 1999-09-16 2001-04-03 Toshiba Ceramics Co Ltd 単結晶引上げ装置
JP4092859B2 (ja) * 2000-06-06 2008-05-28 株式会社Ｓｕｍｃｏ 単結晶引上装置のクリーニング装置
JP3975649B2 (ja) * 2000-06-06 2007-09-12 株式会社Ｓｕｍｃｏ 単結晶引上装置
JP5035144B2 (ja) 2008-07-02 2012-09-26 株式会社Ｓｕｍｃｏ 単結晶引き上げ用ワイヤの洗浄装置およびその洗浄方法
JP5067403B2 (ja) * 2009-08-05 2012-11-07 信越半導体株式会社 単結晶引き上げ装置
US9738992B2 (en) * 2011-03-29 2017-08-22 Sumco Corporation Apparatus for cleaning exhaust passage for semiconductor crystal manufacturing device
JP2013147406A (ja) 2012-01-23 2013-08-01 Shin Etsu Handotai Co Ltd シリコン単結晶の製造方法
CN107208306B (zh) 2015-02-03 2020-07-14 胜高股份有限公司 单晶提拉装置的清洗方法及其清洗用具和单晶的制造方法
JP6489004B2 (ja) * 2015-12-14 2019-03-27 株式会社Sumco クリーニング装置、クリーニング方法およびシリコン単結晶の製造方法
US11198161B2 (en) 2017-02-02 2021-12-14 Sumco Corporation Cleaning device for monocrystal pulling apparatus
WO2018142540A1 (ja) 2017-02-02 2018-08-09 株式会社Sumco 単結晶引上装置のクリーニング装置、クリーニング方法
CN209779039U (zh) 2019-01-31 2019-12-13 常州市乐萌压力容器有限公司 一种单晶炉副室清洁器
US12202017B2 (en) 2022-04-27 2025-01-21 Globalwafers Co., Ltd. Cleaning tools and methods for cleaning the pull cable of an ingot puller apparatus

Also Published As

Publication number Publication date
US20230347388A1 (en) 2023-11-02
CN119256124A (zh) 2025-01-03
EP4515025A1 (en) 2025-03-05
US12491542B2 (en) 2025-12-09
KR20250006212A (ko) 2025-01-10
US20260070095A1 (en) 2026-03-12
TW202344721A (zh) 2023-11-16
US20250121415A1 (en) 2025-04-17
EP4729670A2 (en) 2026-04-22
US12202017B2 (en) 2025-01-21
US12491541B2 (en) 2025-12-09
US12502696B2 (en) 2025-12-23
US20240335863A1 (en) 2024-10-10
WO2023211834A1 (en) 2023-11-02
US20250091100A1 (en) 2025-03-20

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