JP2025509041A5 - - Google Patents
Info
- Publication number
- JP2025509041A5 JP2025509041A5 JP2024543882A JP2024543882A JP2025509041A5 JP 2025509041 A5 JP2025509041 A5 JP 2025509041A5 JP 2024543882 A JP2024543882 A JP 2024543882A JP 2024543882 A JP2024543882 A JP 2024543882A JP 2025509041 A5 JP2025509041 A5 JP 2025509041A5
- Authority
- JP
- Japan
- Prior art keywords
- electronic equipment
- equipment manufacturing
- manufacturing
- resist pattern
- branched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022036381 | 2022-03-09 | ||
| JP2022036381 | 2022-03-09 | ||
| PCT/EP2023/055662 WO2023170021A1 (en) | 2022-03-09 | 2023-03-07 | Electronic device manufacturing solution, method for manufacturing resist pattern, and method for manufacturing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025509041A JP2025509041A (ja) | 2025-04-11 |
| JP2025509041A5 true JP2025509041A5 (https=) | 2026-03-16 |
Family
ID=85570004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024543882A Pending JP2025509041A (ja) | 2022-03-09 | 2023-03-07 | 電子機器製造液、レジストパターンの製造方法およびデバイスの製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20240425777A1 (https=) |
| EP (1) | EP4490578A1 (https=) |
| JP (1) | JP2025509041A (https=) |
| KR (1) | KR20240162095A (https=) |
| CN (1) | CN118891587A (https=) |
| IL (1) | IL314237A (https=) |
| TW (1) | TW202342709A (https=) |
| WO (1) | WO2023170021A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2026046920A1 (en) | 2024-08-28 | 2026-03-05 | Merck Patent Gmbh | Electronic device manufacturing aqueous solution, method for producing resist pattern, and method for manufacturing device |
| WO2026046961A1 (en) | 2024-08-28 | 2026-03-05 | Merck Patent Gmbh | Electronic device manufacturing aqueous solution, method for producing resist pattern, and method for manufacturing device |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6372415B1 (en) * | 1997-10-30 | 2002-04-16 | Kao Corporation | Resist developer |
| JP5336306B2 (ja) | 2008-10-20 | 2013-11-06 | 信越化学工業株式会社 | レジスト下層膜形成方法、これを用いたパターン形成方法、及びレジスト下層膜材料 |
| US8361237B2 (en) * | 2008-12-17 | 2013-01-29 | Air Products And Chemicals, Inc. | Wet clean compositions for CoWP and porous dielectrics |
| JP5646882B2 (ja) * | 2009-09-30 | 2014-12-24 | 富士フイルム株式会社 | 洗浄組成物、洗浄方法、及び半導体装置の製造方法 |
| JP5513196B2 (ja) * | 2010-03-25 | 2014-06-04 | 富士フイルム株式会社 | 洗浄組成物及び半導体装置の製造方法 |
| JP6240404B2 (ja) | 2013-05-09 | 2017-11-29 | アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ | リソグラフィー用リンス液およびそれを用いたパターン形成方法 |
| TWI717526B (zh) | 2016-06-20 | 2021-02-01 | 盧森堡商Ａｚ電子材料盧森堡有限公司 | 清洗組成物、形成光阻圖案之方法及製造半導體裝置之方法 |
| CN110023841B (zh) | 2016-11-25 | 2023-05-30 | 默克专利有限公司 | 光刻组合物、形成抗蚀图案的方法和制造半导体器件的方法 |
| JP2021165771A (ja) * | 2020-04-06 | 2021-10-14 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | 電子機器製造水溶液、レジストパターンの製造方法およびデバイスの製造方法 |
-
2023
- 2023-03-07 WO PCT/EP2023/055662 patent/WO2023170021A1/en not_active Ceased
- 2023-03-07 EP EP23710271.0A patent/EP4490578A1/en active Pending
- 2023-03-07 CN CN202380025970.4A patent/CN118891587A/zh active Pending
- 2023-03-07 IL IL314237A patent/IL314237A/en unknown
- 2023-03-07 JP JP2024543882A patent/JP2025509041A/ja active Pending
- 2023-03-07 KR KR1020247033664A patent/KR20240162095A/ko active Pending
- 2023-03-08 TW TW112108484A patent/TW202342709A/zh unknown
-
2024
- 2024-09-09 US US18/829,131 patent/US20240425777A1/en active Pending
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