JP2025501839A5 - - Google Patents

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Publication number
JP2025501839A5
JP2025501839A5 JP2024516844A JP2024516844A JP2025501839A5 JP 2025501839 A5 JP2025501839 A5 JP 2025501839A5 JP 2024516844 A JP2024516844 A JP 2024516844A JP 2024516844 A JP2024516844 A JP 2024516844A JP 2025501839 A5 JP2025501839 A5 JP 2025501839A5
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Japan
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measurement
measurement data
value
target
parameters
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JP2024516844A
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Japanese (ja)
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JP2025501839A (ja
JP7784530B2 (ja
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Priority claimed from US17/578,310 external-priority patent/US12019030B2/en
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JP2024516844A 2022-01-18 2022-12-22 半導体測定品質の標的モニタリングのための方法及びシステム Active JP7784530B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17/578,310 US12019030B2 (en) 2022-01-18 2022-01-18 Methods and systems for targeted monitoring of semiconductor measurement quality
US17/578,310 2022-01-18
PCT/US2022/053898 WO2023140957A1 (en) 2022-01-18 2022-12-22 Methods and systems for targeted monitoring of semiconductor measurement quality

Publications (3)

Publication Number Publication Date
JP2025501839A JP2025501839A (ja) 2025-01-24
JP2025501839A5 true JP2025501839A5 (https=) 2025-05-01
JP7784530B2 JP7784530B2 (ja) 2025-12-11

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JP2024516844A Active JP7784530B2 (ja) 2022-01-18 2022-12-22 半導体測定品質の標的モニタリングのための方法及びシステム

Country Status (6)

Country Link
US (1) US12019030B2 (https=)
JP (1) JP7784530B2 (https=)
KR (1) KR102901223B1 (https=)
CN (1) CN118140136A (https=)
IL (1) IL311357A (https=)
WO (1) WO2023140957A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250124599A1 (en) * 2023-10-11 2025-04-17 Applied Materials Israel Ltd. Automatic calibration of an examination tool

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