JP2025188116A5 - - Google Patents

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Publication number
JP2025188116A5
JP2025188116A5 JP2025167902A JP2025167902A JP2025188116A5 JP 2025188116 A5 JP2025188116 A5 JP 2025188116A5 JP 2025167902 A JP2025167902 A JP 2025167902A JP 2025167902 A JP2025167902 A JP 2025167902A JP 2025188116 A5 JP2025188116 A5 JP 2025188116A5
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JP
Japan
Prior art keywords
chamber
grid
applying
positive voltage
central region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2025167902A
Other languages
English (en)
Japanese (ja)
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JP2025188116A (ja
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Publication date
Priority claimed from PCT/US2019/050060 external-priority patent/WO2020214197A1/en
Application filed filed Critical
Publication of JP2025188116A publication Critical patent/JP2025188116A/ja
Publication of JP2025188116A5 publication Critical patent/JP2025188116A5/ja
Pending legal-status Critical Current

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JP2025167902A 2019-04-19 2025-10-06 イオン源および中性子発生装置 Pending JP2025188116A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201962836481P 2019-04-19 2019-04-19
US62/836,481 2019-04-19
PCT/US2019/050060 WO2020214197A1 (en) 2019-04-19 2019-09-06 Ion source and neutron generator
JP2021562130A JP7579270B2 (ja) 2019-04-19 2019-09-06 イオン源および中性子発生装置
JP2024188189A JP7756223B2 (ja) 2019-04-19 2024-10-25 イオン源および中性子発生装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2024188189A Division JP7756223B2 (ja) 2019-04-19 2024-10-25 イオン源および中性子発生装置

Publications (2)

Publication Number Publication Date
JP2025188116A JP2025188116A (ja) 2025-12-25
JP2025188116A5 true JP2025188116A5 (https=) 2026-01-08

Family

ID=72836988

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2021562130A Active JP7579270B2 (ja) 2019-04-19 2019-09-06 イオン源および中性子発生装置
JP2024188189A Active JP7756223B2 (ja) 2019-04-19 2024-10-25 イオン源および中性子発生装置
JP2025167902A Pending JP2025188116A (ja) 2019-04-19 2025-10-06 イオン源および中性子発生装置

Family Applications Before (2)

Application Number Title Priority Date Filing Date
JP2021562130A Active JP7579270B2 (ja) 2019-04-19 2019-09-06 イオン源および中性子発生装置
JP2024188189A Active JP7756223B2 (ja) 2019-04-19 2024-10-25 イオン源および中性子発生装置

Country Status (8)

Country Link
US (2) US12342447B2 (https=)
EP (1) EP3956918A4 (https=)
JP (3) JP7579270B2 (https=)
KR (2) KR102784434B1 (https=)
CN (2) CN120126983A (https=)
AU (2) AU2019441368B2 (https=)
CA (1) CA3137275A1 (https=)
WO (1) WO2020214197A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4260360A4 (en) * 2020-12-08 2024-05-22 SHINE Technologies, LLC ISOTHERMAL ION SOURCE WITH AUXILIARY HEATING ELEMENTS
CN117836899A (zh) * 2021-08-13 2024-04-05 阳光技术有限责任公司 用于如离子和同位素生产等高真空应用的磁旋转装置
KR20240090158A (ko) 2021-10-01 2024-06-21 샤인 테크놀로지스 엘엘씨 이온 수집을 위한 섬유질 격자를 갖는 이온 생성 시스템
CN117042276A (zh) * 2023-07-26 2023-11-10 中国工程物理研究院流体物理研究所 一种高引出效率的离子源结构及密封中子管结构

Family Cites Families (19)

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US2689918A (en) 1952-04-26 1954-09-21 Well Surveys Inc Static atmosphere ion accelerator for well logging
GB778656A (en) 1954-03-08 1957-07-10 Schlumberger Well Surv Corp Neutron well logging apparatus
US3084256A (en) 1957-09-03 1963-04-02 Lab For Electronics Inc Neutron generator
US3588593A (en) * 1969-03-27 1971-06-28 Atomic Energy Commission Method of operating an ion-getter vacuum pump with gun and grid structure arranged for optimum ionization and sublimation
US3761708A (en) 1971-10-08 1973-09-25 Us Interior Electron suppressor grid for a mass spectrometer
US4155825A (en) 1977-05-02 1979-05-22 Fournier Paul R Integrated sputtering apparatus and method
US4267007A (en) 1979-03-19 1981-05-12 Kellogg Charles W Winding apparatus for the manufacture of filament-wound, reinforced resinous products
JPS6252843A (ja) * 1985-08-30 1987-03-07 Hitachi Ltd イオン流調整装置
JPH02204941A (ja) * 1989-02-03 1990-08-14 Japan Steel Works Ltd:The イオン発生装置
US5262652A (en) 1991-05-14 1993-11-16 Applied Materials, Inc. Ion implantation apparatus having increased source lifetime
JP3239427B2 (ja) * 1992-03-27 2001-12-17 株式会社島津製作所 イオン散乱分光装置
US5856674A (en) 1997-09-16 1999-01-05 Eaton Corporation Filament for ion implanter plasma shower
US6551471B1 (en) 1999-11-30 2003-04-22 Canon Kabushiki Kaisha Ionization film-forming method and apparatus
US6907097B2 (en) 2001-03-16 2005-06-14 The Regents Of The University Of California Cylindrical neutron generator
GB2386747A (en) 2001-11-08 2003-09-24 Ionoptika Ltd Fullerene ion gun
JP4078084B2 (ja) * 2002-01-28 2008-04-23 キヤノン株式会社 イオン化成膜方法及び装置
JP2004362901A (ja) * 2003-06-04 2004-12-24 Sharp Corp イオンドーピング装置、イオンドーピング方法および半導体装置
JP2006266854A (ja) 2005-03-23 2006-10-05 Shinku Jikkenshitsu:Kk 全圧測定電極付き四重極質量分析計及びこれを用いる真空装置
JP2008152941A (ja) 2006-12-14 2008-07-03 Jeol Ltd イオン発生装置

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