JP2024542436A5 - - Google Patents

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Publication number
JP2024542436A5
JP2024542436A5 JP2024527775A JP2024527775A JP2024542436A5 JP 2024542436 A5 JP2024542436 A5 JP 2024542436A5 JP 2024527775 A JP2024527775 A JP 2024527775A JP 2024527775 A JP2024527775 A JP 2024527775A JP 2024542436 A5 JP2024542436 A5 JP 2024542436A5
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JP
Japan
Prior art keywords
carbon atoms
alkylene
alkyl
group
unsubstituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024527775A
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English (en)
Japanese (ja)
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JP2024542436A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2022/081910 external-priority patent/WO2023088869A2/en
Publication of JP2024542436A publication Critical patent/JP2024542436A/ja
Publication of JP2024542436A5 publication Critical patent/JP2024542436A5/ja
Pending legal-status Critical Current

Links

JP2024527775A 2021-11-17 2022-11-15 湿式化学エッチングによる金属構造体製造を改善するための組成物及び方法 Pending JP2024542436A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163280302P 2021-11-17 2021-11-17
US63/280,302 2021-11-17
PCT/EP2022/081910 WO2023088869A2 (en) 2021-11-17 2022-11-15 Compositions and methods for improving metal structure fabrication by wet chemical etch

Publications (2)

Publication Number Publication Date
JP2024542436A JP2024542436A (ja) 2024-11-15
JP2024542436A5 true JP2024542436A5 (https=) 2025-11-11

Family

ID=84389247

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024527775A Pending JP2024542436A (ja) 2021-11-17 2022-11-15 湿式化学エッチングによる金属構造体製造を改善するための組成物及び方法

Country Status (7)

Country Link
US (1) US20250244669A1 (https=)
EP (1) EP4433873A2 (https=)
JP (1) JP2024542436A (https=)
KR (1) KR20240095519A (https=)
CN (1) CN118284852A (https=)
TW (1) TW202336531A (https=)
WO (1) WO2023088869A2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120784160B (zh) * 2025-09-11 2025-12-05 广州市艾佛光通科技有限公司 一种厚金属湿法刻蚀工艺改善方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69331471T2 (de) * 1992-07-22 2002-06-20 Asahi Kasei K.K., Osaka Photoempfindliche Polyimidvorlaüferzusammensetzung
JPH06130551A (ja) * 1992-10-21 1994-05-13 Konica Corp ハロゲン化銀カラー写真感光材料
DE69900812D1 (de) * 1999-04-16 2002-03-14 Agfa Gevaert Nv Strahlungsempfindliche Emulsion, lichtempfindlicher photographischer Silberhalogenidfilm und Kombination eines radiographischen Verstärkungsschirms mit einem Film
US6576394B1 (en) 2000-06-16 2003-06-10 Clariant Finance (Bvi) Limited Negative-acting chemically amplified photoresist composition
US6852465B2 (en) 2003-03-21 2005-02-08 Clariant International Ltd. Photoresist composition for imaging thick films
JP4830313B2 (ja) * 2004-06-08 2011-12-07 ダイキン工業株式会社 含フッ素エラストマーの製造方法
JP2007079449A (ja) * 2005-09-16 2007-03-29 Fujifilm Holdings Corp 熱現像感光材料
US7601482B2 (en) 2006-03-28 2009-10-13 Az Electronic Materials Usa Corp. Negative photoresist compositions
US8017296B2 (en) 2007-05-22 2011-09-13 Az Electronic Materials Usa Corp. Antireflective coating composition comprising fused aromatic rings
US9012126B2 (en) 2012-06-15 2015-04-21 Az Electronic Materials (Luxembourg) S.A.R.L. Positive photosensitive material
US8906594B2 (en) 2012-06-15 2014-12-09 Az Electronic Materials (Luxembourg) S.A.R.L. Negative-working thick film photoresist
US8841062B2 (en) 2012-12-04 2014-09-23 Az Electronic Materials (Luxembourg) S.A.R.L. Positive working photosensitive material
CN109844641B (zh) 2016-08-09 2022-10-11 默克专利有限公司 环境稳定的厚膜的化学放大抗蚀剂
US12124166B2 (en) 2017-04-25 2024-10-22 Merck Patent Gmbh Negative resist formulation for producing undercut pattern profiles
JP7274496B2 (ja) 2018-03-23 2023-05-16 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング ネガ作動型超厚膜フォトレジスト
CN118377192A (zh) 2018-05-24 2024-07-23 默克专利股份有限公司 基于酚醛清漆/dnq的化学增幅型光致抗蚀剂
EP3847506A1 (en) 2018-09-05 2021-07-14 Merck Patent GmbH Positive working photosensitive material
WO2021094350A1 (en) 2019-11-13 2021-05-20 Merck Patent Gmbh Positive working photosensitive material
KR102863895B1 (ko) 2019-11-14 2025-09-23 메르크 파텐트 게엠베하 알칼리-가용성 아크릴 수지를 포함하는 dnq-타입 포토레지스트 조성물
EP4066059B1 (en) * 2019-11-25 2024-02-28 Merck Patent GmbH Chemically amplified photoresist
EP4275093A1 (en) * 2021-01-07 2023-11-15 Merck Patent GmbH Positive-working photoresist composition with improved pattern profile and depth of focus (dof)

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