JP2024534990A5 - - Google Patents
Info
- Publication number
- JP2024534990A5 JP2024534990A5 JP2024515615A JP2024515615A JP2024534990A5 JP 2024534990 A5 JP2024534990 A5 JP 2024534990A5 JP 2024515615 A JP2024515615 A JP 2024515615A JP 2024515615 A JP2024515615 A JP 2024515615A JP 2024534990 A5 JP2024534990 A5 JP 2024534990A5
- Authority
- JP
- Japan
- Prior art keywords
- radio frequency
- coil
- shaped
- direct
- plasma processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163245773P | 2021-09-17 | 2021-09-17 | |
| US63/245,773 | 2021-09-17 | ||
| PCT/US2022/043464 WO2023043795A1 (en) | 2021-09-17 | 2022-09-14 | Symmetric coupling of coil to direct-drive radiofrequency power supplies |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024534990A JP2024534990A (ja) | 2024-09-26 |
| JP2024534990A5 true JP2024534990A5 (https=) | 2025-09-19 |
Family
ID=85603449
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024515615A Pending JP2024534990A (ja) | 2021-09-17 | 2022-09-14 | ダイレクトドライブ無線周波電源に対するコイルの対称的結合 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US12482634B2 (https=) |
| JP (1) | JP2024534990A (https=) |
| KR (1) | KR20240058940A (https=) |
| CN (1) | CN117957632A (https=) |
| TW (1) | TW202320593A (https=) |
| WO (1) | WO2023043795A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20240043799A (ko) * | 2021-08-12 | 2024-04-03 | 램 리써치 코포레이션 | 대칭적인 rf 리턴 경로를 제공하는 프로세스 모듈 챔버 |
| JP2024534990A (ja) * | 2021-09-17 | 2024-09-26 | ラム リサーチ コーポレーション | ダイレクトドライブ無線周波電源に対するコイルの対称的結合 |
| JP7577093B2 (ja) * | 2022-06-29 | 2024-11-01 | 東京エレクトロン株式会社 | プラズマ処理システムおよびプラズマ処理方法 |
| NL2036982B1 (en) * | 2024-02-07 | 2025-08-20 | Prodrive Tech Innovation Services B V | Radio frequency drive generator for plasma sources |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6129807A (en) | 1997-10-06 | 2000-10-10 | Applied Materials, Inc. | Apparatus for monitoring processing of a substrate |
| US6527912B2 (en) | 2001-03-30 | 2003-03-04 | Lam Research Corporation | Stacked RF excitation coil for inductive plasma processor |
| JP2006186222A (ja) | 2004-12-28 | 2006-07-13 | Matsushita Electric Ind Co Ltd | プラズマ処理装置 |
| US20080179948A1 (en) | 2005-10-31 | 2008-07-31 | Mks Instruments, Inc. | Radio frequency power delivery system |
| US7570028B2 (en) | 2007-04-26 | 2009-08-04 | Advanced Energy Industries, Inc. | Method and apparatus for modifying interactions between an electrical generator and a nonlinear load |
| KR101841236B1 (ko) | 2009-04-03 | 2018-03-22 | 어플라이드 머티어리얼스, 인코포레이티드 | 고압 ｒｆ-ｄｃ 스퍼터링과 이 프로세스의 단차 도포성 및 막 균일성을 개선하기 위한 방법 |
| JP5461261B2 (ja) | 2010-03-23 | 2014-04-02 | 株式会社ダイヘン | 電力測定装置の信頼性の評価方法 |
| US10125422B2 (en) | 2013-03-27 | 2018-11-13 | Applied Materials, Inc. | High impedance RF filter for heater with impedance tuning device |
| GB201316815D0 (en) | 2013-09-23 | 2013-11-06 | Renishaw Plc | Additive manufacturing apparatus and method |
| JP6746865B2 (ja) | 2016-09-23 | 2020-08-26 | 株式会社ダイヘン | プラズマ生成装置 |
| US10264663B1 (en) * | 2017-10-18 | 2019-04-16 | Lam Research Corporation | Matchless plasma source for semiconductor wafer fabrication |
| KR102823628B1 (ko) | 2018-05-08 | 2025-06-20 | 램 리써치 코포레이션 | 텔레센트릭 (tele-centric) 렌즈, 광학 빔 폴딩 어셈블리, 또는 다각형 스캐너를 갖는 렌즈 회로를 포함하는 원자 층 에칭 및 증착 프로세싱 시스템들 |
| US10515781B1 (en) | 2018-06-13 | 2019-12-24 | Lam Research Corporation | Direct drive RF circuit for substrate processing systems |
| CA3111824A1 (en) | 2018-09-10 | 2020-03-19 | Fluidigm Canada Inc. | High speed modulation sample imaging apparatus and method |
| JP7542555B2 (ja) | 2019-04-30 | 2024-08-30 | ラム リサーチ コーポレーション | 二重周波数、直接駆動誘導結合プラズマ源 |
| JP2024534990A (ja) * | 2021-09-17 | 2024-09-26 | ラム リサーチ コーポレーション | ダイレクトドライブ無線周波電源に対するコイルの対称的結合 |
| US20250174431A1 (en) * | 2021-12-17 | 2025-05-29 | Lam Research Corporation | Apparatus and Method for Splitting Current from Direct-Drive Radiofrequency Signal Generator between Multiple Coils |
| WO2024004766A1 (ja) * | 2022-06-29 | 2024-01-04 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
-
2022
- 2022-09-14 JP JP2024515615A patent/JP2024534990A/ja active Pending
- 2022-09-14 US US18/689,030 patent/US12482634B2/en active Active
- 2022-09-14 KR KR1020247012637A patent/KR20240058940A/ko active Pending
- 2022-09-14 CN CN202280062934.0A patent/CN117957632A/zh active Pending
- 2022-09-14 WO PCT/US2022/043464 patent/WO2023043795A1/en not_active Ceased
- 2022-09-15 TW TW111134897A patent/TW202320593A/zh unknown
-
2025
- 2025-10-31 US US19/376,783 patent/US20260058095A1/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2024534990A5 (https=) | ||
| US5654679A (en) | Apparatus for matching a variable load impedance with an RF power generator impedance | |
| EP1236275B1 (en) | Variable load switchable impedance matching system | |
| WO2017017407A1 (en) | Radio frequency heating system | |
| CN104349567A (zh) | 射频电源系统和利用射频电源系统进行阻抗匹配的方法 | |
| KR20230127362A (ko) | 부하의 임피던스를 전력 발생기의 출력 임피던스에조정시키는 방법 및 임피던스 조정 어셈블리 | |
| WO2002080221B1 (en) | Inductive plasma processor having coil with plural windings and method of controlling plasma density | |
| KR102194601B1 (ko) | 전자식 가변 임피던스 매칭박스를 구비한 플라즈마 전원 공급 시스템 | |
| US20230253185A1 (en) | Systems and Methods for Radiofrequency Signal Generator-Based Control of Impedance Matching System | |
| EP4421844A3 (en) | Plasma treatment device, plasma treatment method, program, and memory medium | |
| TW202425045A (zh) | 射頻電漿處理腔室中基於學習的調諧 | |
| TW202205345A (zh) | 線性加速器、離子束控制裝置及方法 | |
| KR20230145182A (ko) | 임피던스 매칭을 위한 방법, 임피던스 매칭 장치 및 플라즈마 시스템 | |
| TW202320593A (zh) | 線圈對直接驅動式射頻電源供應器的對稱耦合 | |
| JP6780007B2 (ja) | 高周波電源装置 | |
| KR20150064722A (ko) | 플라즈마 임피던스 매칭 장치 및 그 방법 | |
| KR102944798B1 (ko) | 플라즈마 발생 시스템을 위한 임피던스 정합 회로를 제어하기 위한 제어 장치와 방법 및 이러한 플라즈마 발생 시스템 | |
| WO2024182071A1 (en) | Radio frequency diverter assembly enabling on demand different spatial outputs | |
| TW202420374A (zh) | 具有彈性調諧演算法的無線射頻阻抗匹配網路 | |
| US20250183006A1 (en) | Match network with variable capacitance and switchable array of solid-state capacitance | |
| KR20230120165A (ko) | 플라즈마 발생 장치 및 그 제어 방법 | |
| US20220093363A1 (en) | Alternating Current (AC) Dual Magnetron Sputtering | |
| KR102088041B1 (ko) | 외부운용환경에 대한 적응형 진행파관증폭기의 출력제어장치 및 방법 | |
| US12603630B2 (en) | Match network with switchable variable capacitance | |
| US20260106115A1 (en) | Plasma process supply system, in particular for pulsed plasma processes, and method for operating such a plasma process supply system |