CN117957632A - 线圈与直接驱动式射频功率供应源的对称耦合 - Google Patents

线圈与直接驱动式射频功率供应源的对称耦合 Download PDF

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Publication number
CN117957632A
CN117957632A CN202280062934.0A CN202280062934A CN117957632A CN 117957632 A CN117957632 A CN 117957632A CN 202280062934 A CN202280062934 A CN 202280062934A CN 117957632 A CN117957632 A CN 117957632A
Authority
CN
China
Prior art keywords
coil
direct drive
shaped
radio frequency
plasma processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280062934.0A
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English (en)
Chinese (zh)
Inventor
约翰·德鲁厄里
亚历山大·米勒·帕特森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of CN117957632A publication Critical patent/CN117957632A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32128—Radio frequency generated discharge using particular waveforms, e.g. polarised waves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
CN202280062934.0A 2021-09-17 2022-09-14 线圈与直接驱动式射频功率供应源的对称耦合 Pending CN117957632A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163245773P 2021-09-17 2021-09-17
US63/245,773 2021-09-17
PCT/US2022/043464 WO2023043795A1 (en) 2021-09-17 2022-09-14 Symmetric coupling of coil to direct-drive radiofrequency power supplies

Publications (1)

Publication Number Publication Date
CN117957632A true CN117957632A (zh) 2024-04-30

Family

ID=85603449

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280062934.0A Pending CN117957632A (zh) 2021-09-17 2022-09-14 线圈与直接驱动式射频功率供应源的对称耦合

Country Status (6)

Country Link
US (2) US12482634B2 (https=)
JP (1) JP2024534990A (https=)
KR (1) KR20240058940A (https=)
CN (1) CN117957632A (https=)
TW (1) TW202320593A (https=)
WO (1) WO2023043795A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240043799A (ko) * 2021-08-12 2024-04-03 램 리써치 코포레이션 대칭적인 rf 리턴 경로를 제공하는 프로세스 모듈 챔버
JP2024534990A (ja) * 2021-09-17 2024-09-26 ラム リサーチ コーポレーション ダイレクトドライブ無線周波電源に対するコイルの対称的結合
JP7577093B2 (ja) * 2022-06-29 2024-11-01 東京エレクトロン株式会社 プラズマ処理システムおよびプラズマ処理方法
NL2036982B1 (en) * 2024-02-07 2025-08-20 Prodrive Tech Innovation Services B V Radio frequency drive generator for plasma sources

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6129807A (en) 1997-10-06 2000-10-10 Applied Materials, Inc. Apparatus for monitoring processing of a substrate
US6527912B2 (en) 2001-03-30 2003-03-04 Lam Research Corporation Stacked RF excitation coil for inductive plasma processor
JP2006186222A (ja) 2004-12-28 2006-07-13 Matsushita Electric Ind Co Ltd プラズマ処理装置
US20080179948A1 (en) 2005-10-31 2008-07-31 Mks Instruments, Inc. Radio frequency power delivery system
US7570028B2 (en) 2007-04-26 2009-08-04 Advanced Energy Industries, Inc. Method and apparatus for modifying interactions between an electrical generator and a nonlinear load
KR101841236B1 (ko) 2009-04-03 2018-03-22 어플라이드 머티어리얼스, 인코포레이티드 고압 ｒｆ-ｄｃ 스퍼터링과 이 프로세스의 단차 도포성 및 막 균일성을 개선하기 위한 방법
JP5461261B2 (ja) 2010-03-23 2014-04-02 株式会社ダイヘン 電力測定装置の信頼性の評価方法
US10125422B2 (en) 2013-03-27 2018-11-13 Applied Materials, Inc. High impedance RF filter for heater with impedance tuning device
GB201316815D0 (en) 2013-09-23 2013-11-06 Renishaw Plc Additive manufacturing apparatus and method
JP6746865B2 (ja) 2016-09-23 2020-08-26 株式会社ダイヘン プラズマ生成装置
US10264663B1 (en) * 2017-10-18 2019-04-16 Lam Research Corporation Matchless plasma source for semiconductor wafer fabrication
KR102823628B1 (ko) 2018-05-08 2025-06-20 램 리써치 코포레이션 텔레센트릭 (tele-centric) 렌즈, 광학 빔 폴딩 어셈블리, 또는 다각형 스캐너를 갖는 렌즈 회로를 포함하는 원자 층 에칭 및 증착 프로세싱 시스템들
US10515781B1 (en) 2018-06-13 2019-12-24 Lam Research Corporation Direct drive RF circuit for substrate processing systems
CA3111824A1 (en) 2018-09-10 2020-03-19 Fluidigm Canada Inc. High speed modulation sample imaging apparatus and method
JP7542555B2 (ja) 2019-04-30 2024-08-30 ラム リサーチ コーポレーション 二重周波数、直接駆動誘導結合プラズマ源
JP2024534990A (ja) * 2021-09-17 2024-09-26 ラム リサーチ コーポレーション ダイレクトドライブ無線周波電源に対するコイルの対称的結合
US20250174431A1 (en) * 2021-12-17 2025-05-29 Lam Research Corporation Apparatus and Method for Splitting Current from Direct-Drive Radiofrequency Signal Generator between Multiple Coils
WO2024004766A1 (ja) * 2022-06-29 2024-01-04 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法

Also Published As

Publication number Publication date
WO2023043795A1 (en) 2023-03-23
US20240395503A1 (en) 2024-11-28
JP2024534990A (ja) 2024-09-26
TW202320593A (zh) 2023-05-16
US20260058095A1 (en) 2026-02-26
KR20240058940A (ko) 2024-05-07
US12482634B2 (en) 2025-11-25

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