JP2024534990A - ダイレクトドライブ無線周波電源に対するコイルの対称的結合 - Google Patents

ダイレクトドライブ無線周波電源に対するコイルの対称的結合 Download PDF

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Publication number
JP2024534990A
JP2024534990A JP2024515615A JP2024515615A JP2024534990A JP 2024534990 A JP2024534990 A JP 2024534990A JP 2024515615 A JP2024515615 A JP 2024515615A JP 2024515615 A JP2024515615 A JP 2024515615A JP 2024534990 A JP2024534990 A JP 2024534990A
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JP
Japan
Prior art keywords
shaped
coil
direct drive
radio frequency
plasma processing
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Pending
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JP2024515615A
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English (en)
Japanese (ja)
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JP2024534990A5 (https=
Inventor
ドルワリー・ジョン
パターソン・アレクサンダー・ミラー
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Lam Research Corp
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Lam Research Corp
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Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of JP2024534990A publication Critical patent/JP2024534990A/ja
Publication of JP2024534990A5 publication Critical patent/JP2024534990A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32128—Radio frequency generated discharge using particular waveforms, e.g. polarised waves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
JP2024515615A 2021-09-17 2022-09-14 ダイレクトドライブ無線周波電源に対するコイルの対称的結合 Pending JP2024534990A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163245773P 2021-09-17 2021-09-17
US63/245,773 2021-09-17
PCT/US2022/043464 WO2023043795A1 (en) 2021-09-17 2022-09-14 Symmetric coupling of coil to direct-drive radiofrequency power supplies

Publications (2)

Publication Number Publication Date
JP2024534990A true JP2024534990A (ja) 2024-09-26
JP2024534990A5 JP2024534990A5 (https=) 2025-09-19

Family

ID=85603449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024515615A Pending JP2024534990A (ja) 2021-09-17 2022-09-14 ダイレクトドライブ無線周波電源に対するコイルの対称的結合

Country Status (6)

Country Link
US (2) US12482634B2 (https=)
JP (1) JP2024534990A (https=)
KR (1) KR20240058940A (https=)
CN (1) CN117957632A (https=)
TW (1) TW202320593A (https=)
WO (1) WO2023043795A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240043799A (ko) * 2021-08-12 2024-04-03 램 리써치 코포레이션 대칭적인 rf 리턴 경로를 제공하는 프로세스 모듈 챔버
JP2024534990A (ja) * 2021-09-17 2024-09-26 ラム リサーチ コーポレーション ダイレクトドライブ無線周波電源に対するコイルの対称的結合
JP7577093B2 (ja) * 2022-06-29 2024-11-01 東京エレクトロン株式会社 プラズマ処理システムおよびプラズマ処理方法
NL2036982B1 (en) * 2024-02-07 2025-08-20 Prodrive Tech Innovation Services B V Radio frequency drive generator for plasma sources

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6129807A (en) 1997-10-06 2000-10-10 Applied Materials, Inc. Apparatus for monitoring processing of a substrate
US6527912B2 (en) 2001-03-30 2003-03-04 Lam Research Corporation Stacked RF excitation coil for inductive plasma processor
JP2006186222A (ja) 2004-12-28 2006-07-13 Matsushita Electric Ind Co Ltd プラズマ処理装置
US20080179948A1 (en) 2005-10-31 2008-07-31 Mks Instruments, Inc. Radio frequency power delivery system
US7570028B2 (en) 2007-04-26 2009-08-04 Advanced Energy Industries, Inc. Method and apparatus for modifying interactions between an electrical generator and a nonlinear load
KR101841236B1 (ko) 2009-04-03 2018-03-22 어플라이드 머티어리얼스, 인코포레이티드 고압 ｒｆ-ｄｃ 스퍼터링과 이 프로세스의 단차 도포성 및 막 균일성을 개선하기 위한 방법
JP5461261B2 (ja) 2010-03-23 2014-04-02 株式会社ダイヘン 電力測定装置の信頼性の評価方法
US10125422B2 (en) 2013-03-27 2018-11-13 Applied Materials, Inc. High impedance RF filter for heater with impedance tuning device
GB201316815D0 (en) 2013-09-23 2013-11-06 Renishaw Plc Additive manufacturing apparatus and method
JP6746865B2 (ja) 2016-09-23 2020-08-26 株式会社ダイヘン プラズマ生成装置
US10264663B1 (en) * 2017-10-18 2019-04-16 Lam Research Corporation Matchless plasma source for semiconductor wafer fabrication
KR102823628B1 (ko) 2018-05-08 2025-06-20 램 리써치 코포레이션 텔레센트릭 (tele-centric) 렌즈, 광학 빔 폴딩 어셈블리, 또는 다각형 스캐너를 갖는 렌즈 회로를 포함하는 원자 층 에칭 및 증착 프로세싱 시스템들
US10515781B1 (en) 2018-06-13 2019-12-24 Lam Research Corporation Direct drive RF circuit for substrate processing systems
CA3111824A1 (en) 2018-09-10 2020-03-19 Fluidigm Canada Inc. High speed modulation sample imaging apparatus and method
JP7542555B2 (ja) 2019-04-30 2024-08-30 ラム リサーチ コーポレーション 二重周波数、直接駆動誘導結合プラズマ源
JP2024534990A (ja) * 2021-09-17 2024-09-26 ラム リサーチ コーポレーション ダイレクトドライブ無線周波電源に対するコイルの対称的結合
US20250174431A1 (en) * 2021-12-17 2025-05-29 Lam Research Corporation Apparatus and Method for Splitting Current from Direct-Drive Radiofrequency Signal Generator between Multiple Coils
WO2024004766A1 (ja) * 2022-06-29 2024-01-04 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法

Also Published As

Publication number Publication date
WO2023043795A1 (en) 2023-03-23
US20240395503A1 (en) 2024-11-28
TW202320593A (zh) 2023-05-16
US20260058095A1 (en) 2026-02-26
CN117957632A (zh) 2024-04-30
KR20240058940A (ko) 2024-05-07
US12482634B2 (en) 2025-11-25

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