JP2024532665A5 - - Google Patents
Info
- Publication number
- JP2024532665A5 JP2024532665A5 JP2024503523A JP2024503523A JP2024532665A5 JP 2024532665 A5 JP2024532665 A5 JP 2024532665A5 JP 2024503523 A JP2024503523 A JP 2024503523A JP 2024503523 A JP2024503523 A JP 2024503523A JP 2024532665 A5 JP2024532665 A5 JP 2024532665A5
- Authority
- JP
- Japan
- Prior art keywords
- oxygen
- high temperature
- metal
- euv
- environment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163203507P | 2021-07-26 | 2021-07-26 | |
| US63/203,507 | 2021-07-26 | ||
| PCT/US2022/037393 WO2023009336A1 (en) | 2021-07-26 | 2022-07-15 | Multi-step post-exposure treatment to improve dry development performance of metal-containing resist |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024532665A JP2024532665A (ja) | 2024-09-10 |
| JP2024532665A5 true JP2024532665A5 (https=) | 2025-07-15 |
Family
ID=85087190
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024503523A Pending JP2024532665A (ja) | 2021-07-26 | 2022-07-15 | 金属含有レジストの乾式現像性能を改善する多段階露光後処理 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240329539A1 (https=) |
| JP (1) | JP2024532665A (https=) |
| KR (1) | KR102709877B1 (https=) |
| CN (1) | CN117730281A (https=) |
| TW (1) | TW202314365A (https=) |
| WO (1) | WO2023009336A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3990983A4 (en) | 2019-06-28 | 2023-07-26 | Lam Research Corporation | BAKING STRATEGIES TO INCREASE THE LITHOGRAPHIC PERFORMANCE OF A METAL CONTAINING RESIST |
| CN115362414A (zh) | 2020-04-03 | 2022-11-18 | 朗姆研究公司 | 用于增强euv光刻性能的暴露前光致抗蚀剂固化 |
| CN115702475A (zh) | 2020-06-22 | 2023-02-14 | 朗姆研究公司 | 用于含金属光致抗蚀剂沉积的表面改性 |
| US20250062123A1 (en) * | 2023-08-17 | 2025-02-20 | Applied Materials, Inc. | Treatments for thin films used in photolithography |
| WO2025177886A1 (ja) * | 2024-02-22 | 2025-08-28 | 東京エレクトロン株式会社 | 現像方法及び現像装置 |
| US20250271755A1 (en) * | 2024-02-28 | 2025-08-28 | Inpria Corporation | Controlled environment processing, rest steps, and baking processes for metal oxide-based resist patterning |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100398312B1 (ko) | 2000-06-30 | 2003-09-19 | 한국과학기술원 | 유기금속을 함유하고 있는 노르보넨 단량체, 이들의고분자 중합체를 함유하는 포토레지스트, 및 그제조방법과, 포토레지스트 패턴 형성방법 |
| JP2002134402A (ja) * | 2000-08-15 | 2002-05-10 | Tokyo Electron Ltd | 基板処理方法及び基板処理装置 |
| US7682659B1 (en) * | 2006-04-10 | 2010-03-23 | The Regents Of The University Of California | Fabrication of suspended carbon micro and nanoscale structures |
| CN106232345A (zh) | 2014-04-22 | 2016-12-14 | 沙特基础工业全球技术有限公司 | 集成的柔性透明导电膜 |
| US10520821B2 (en) * | 2016-11-29 | 2019-12-31 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography process with enhanced etch selectivity |
| KR20200144580A (ko) * | 2018-05-11 | 2020-12-29 | 램 리써치 코포레이션 | Euv 패터닝 가능한 하드 마스크들을 제조하기 위한 방법들 |
| US10838304B2 (en) | 2018-08-13 | 2020-11-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Priming material for organometallic resist |
| US11782345B2 (en) * | 2019-08-05 | 2023-10-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Bottom antireflective coating materials |
-
2022
- 2022-07-15 US US18/579,777 patent/US20240329539A1/en active Pending
- 2022-07-15 WO PCT/US2022/037393 patent/WO2023009336A1/en not_active Ceased
- 2022-07-15 KR KR1020247006338A patent/KR102709877B1/ko active Active
- 2022-07-15 JP JP2024503523A patent/JP2024532665A/ja active Pending
- 2022-07-15 CN CN202280052467.3A patent/CN117730281A/zh active Pending
- 2022-07-25 TW TW111127705A patent/TW202314365A/zh unknown
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