JP2024510161A5 - - Google Patents
Info
- Publication number
- JP2024510161A5 JP2024510161A5 JP2023554333A JP2023554333A JP2024510161A5 JP 2024510161 A5 JP2024510161 A5 JP 2024510161A5 JP 2023554333 A JP2023554333 A JP 2023554333A JP 2023554333 A JP2023554333 A JP 2023554333A JP 2024510161 A5 JP2024510161 A5 JP 2024510161A5
- Authority
- JP
- Japan
- Prior art keywords
- light source
- source device
- wavelength light
- radiation
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP21162934.0A EP4060403A1 (en) | 2021-03-16 | 2021-03-16 | Hollow-core photonic crystal fiber based multiple wavelength light source device |
| EP21162934.0 | 2021-03-16 | ||
| PCT/EP2022/053157 WO2022194456A1 (en) | 2021-03-16 | 2022-02-09 | Hollow-core photonic crystal fiber based multiple wavelength light source device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024510161A JP2024510161A (ja) | 2024-03-06 |
| JP2024510161A5 true JP2024510161A5 (https=) | 2025-02-13 |
Family
ID=74947008
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023554333A Pending JP2024510161A (ja) | 2021-03-16 | 2022-02-09 | 中空コアフォトニック結晶ファイバベースの多波長光源デバイス |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20240142853A1 (https=) |
| EP (2) | EP4060403A1 (https=) |
| JP (1) | JP2024510161A (https=) |
| KR (1) | KR20230154204A (https=) |
| CN (1) | CN117063117A (https=) |
| DK (1) | DK4060404T3 (https=) |
| IL (1) | IL305662A (https=) |
| TW (1) | TWI850632B (https=) |
| WO (1) | WO2022194456A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12493225B2 (en) * | 2023-08-27 | 2025-12-09 | Ledlas Corp. | Single-material-double-process parametric laser-wavelength converter |
| EP4664194A3 (en) * | 2025-09-29 | 2026-04-22 | ASML Netherlands B.V. | A radiation source and method for generating output radiation |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE60319462T2 (de) | 2002-06-11 | 2009-03-12 | Asml Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung eines Artikels |
| KR100434690B1 (ko) | 2002-07-19 | 2004-06-04 | 소광섭 | 생명체에 대한 자기장의 영향을 측정하는 장치 및 방법 |
| KR100585476B1 (ko) | 2002-11-12 | 2006-06-07 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 디바이스 제조방법 |
| SG125101A1 (en) | 2003-01-14 | 2006-09-29 | Asml Netherlands Bv | Level sensor for lithographic apparatus |
| US7265364B2 (en) | 2004-06-10 | 2007-09-04 | Asml Netherlands B.V. | Level sensor for lithographic apparatus |
| US7791727B2 (en) | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
| NL1036245A1 (nl) | 2007-12-17 | 2009-06-18 | Asml Netherlands Bv | Diffraction based overlay metrology tool and method of diffraction based overlay metrology. |
| NL1036734A1 (nl) | 2008-04-09 | 2009-10-12 | Asml Netherlands Bv | A method of assessing a model, an inspection apparatus and a lithographic apparatus. |
| NL1036857A1 (nl) | 2008-04-21 | 2009-10-22 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
| JP5584689B2 (ja) | 2008-10-06 | 2014-09-03 | エーエスエムエル ネザーランズ ビー．ブイ． | ２次元ターゲットを用いたリソグラフィの焦点及びドーズ測定 |
| EP2228685B1 (en) | 2009-03-13 | 2018-06-27 | ASML Netherlands B.V. | Level sensor arrangement for lithographic apparatus and device manufacturing method |
| JP5545782B2 (ja) | 2009-07-31 | 2014-07-09 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置の焦点測定方法、散乱計、リソグラフィシステム、およびリソグラフィセル |
| WO2012022584A1 (en) | 2010-08-18 | 2012-02-23 | Asml Netherlands B.V. | Substrate for use in metrology, metrology method and device manufacturing method |
| WO2014019846A2 (en) | 2012-07-30 | 2014-02-06 | Asml Netherlands B.V. | Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method |
| US9160137B1 (en) | 2014-05-09 | 2015-10-13 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e. V. | Method and device for creating supercontinuum light pulses |
| WO2016083076A1 (en) | 2014-11-26 | 2016-06-02 | Asml Netherlands B.V. | Metrology method, computer product and system |
| WO2016102127A1 (en) | 2014-12-22 | 2016-06-30 | Asml Netherlands B.V. | Level sensor, lithographic apparatus and device manufacturing method |
| IL256196B (en) | 2015-06-17 | 2022-07-01 | Asml Netherlands Bv | Recipe selection based on inter-recipe consistency |
| EP3136143B1 (en) | 2015-08-26 | 2020-04-01 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Hollow-core fibre and method of manufacturing thereof |
| KR102217258B1 (ko) * | 2016-04-28 | 2021-02-18 | 에이에스엠엘 네델란즈 비.브이. | Hhg 소스, 검사 장치, 및 측정 수행 방법 |
| IL299683B2 (en) | 2017-01-09 | 2025-08-01 | Max Planck Gesellschaft | Broadband light source device and method of creating broadband light pulses |
-
2021
- 2021-03-16 EP EP21162934.0A patent/EP4060403A1/en not_active Withdrawn
-
2022
- 2022-02-09 CN CN202280020595.XA patent/CN117063117A/zh active Pending
- 2022-02-09 US US18/280,529 patent/US20240142853A1/en active Pending
- 2022-02-09 IL IL305662A patent/IL305662A/en unknown
- 2022-02-09 JP JP2023554333A patent/JP2024510161A/ja active Pending
- 2022-02-09 EP EP22155985.9A patent/EP4060404B1/en active Active
- 2022-02-09 KR KR1020237031871A patent/KR20230154204A/ko active Pending
- 2022-02-09 WO PCT/EP2022/053157 patent/WO2022194456A1/en not_active Ceased
- 2022-02-09 DK DK22155985.9T patent/DK4060404T3/da active
- 2022-03-04 TW TW111107908A patent/TWI850632B/zh active
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