JP2024121091A - 描画装置および描画方法 - Google Patents

描画装置および描画方法 Download PDF

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Publication number
JP2024121091A
JP2024121091A JP2023027990A JP2023027990A JP2024121091A JP 2024121091 A JP2024121091 A JP 2024121091A JP 2023027990 A JP2023027990 A JP 2023027990A JP 2023027990 A JP2023027990 A JP 2023027990A JP 2024121091 A JP2024121091 A JP 2024121091A
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JP
Japan
Prior art keywords
stage
scanning direction
sub
movement
reading
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023027990A
Other languages
English (en)
Japanese (ja)
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JP2024121091A5 (https=
Inventor
慎也 谷口
Shinya Taniguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2023027990A priority Critical patent/JP2024121091A/ja
Priority to PCT/JP2023/044760 priority patent/WO2024180866A1/ja
Priority to KR1020257024983A priority patent/KR20250129065A/ko
Priority to TW112151479A priority patent/TWI897171B/zh
Publication of JP2024121091A publication Critical patent/JP2024121091A/ja
Publication of JP2024121091A5 publication Critical patent/JP2024121091A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/03—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring coordinates of points
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2023027990A 2023-02-27 2023-02-27 描画装置および描画方法 Pending JP2024121091A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2023027990A JP2024121091A (ja) 2023-02-27 2023-02-27 描画装置および描画方法
PCT/JP2023/044760 WO2024180866A1 (ja) 2023-02-27 2023-12-14 描画装置および描画方法
KR1020257024983A KR20250129065A (ko) 2023-02-27 2023-12-14 묘화 장치 및 묘화 방법
TW112151479A TWI897171B (zh) 2023-02-27 2023-12-29 描繪裝置及描繪方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2023027990A JP2024121091A (ja) 2023-02-27 2023-02-27 描画装置および描画方法

Publications (2)

Publication Number Publication Date
JP2024121091A true JP2024121091A (ja) 2024-09-06
JP2024121091A5 JP2024121091A5 (https=) 2025-10-10

Family

ID=92589482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023027990A Pending JP2024121091A (ja) 2023-02-27 2023-02-27 描画装置および描画方法

Country Status (4)

Country Link
JP (1) JP2024121091A (https=)
KR (1) KR20250129065A (https=)
TW (1) TWI897171B (https=)
WO (1) WO2024180866A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI622084B (zh) 2006-09-01 2018-04-21 尼康股份有限公司 Mobile body driving method, moving body driving system, pattern forming method and device, exposure method and device, component manufacturing method, and correction method
JP2012169549A (ja) 2011-02-16 2012-09-06 Dainippon Screen Mfg Co Ltd 露光装置及び露光方法
HK1248832A1 (zh) * 2015-09-30 2018-10-19 株式会社尼康 曝光装置、平面显示器的制造方法、组件制造方法、及曝光方法
WO2017057587A1 (ja) * 2015-09-30 2017-04-06 株式会社ニコン 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
US10782619B2 (en) * 2016-09-30 2020-09-22 Nikon Corporation Movable body apparatus, moving method, exposure apparatus, exposure method, flat-panel display manufacturing method, and device manufacturing method
KR102296327B1 (ko) * 2016-09-30 2021-09-01 가부시키가이샤 니콘 이동체 장치, 이동 방법, 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 그리고 디바이스 제조 방법

Also Published As

Publication number Publication date
TW202435277A (zh) 2024-09-01
TWI897171B (zh) 2025-09-11
KR20250129065A (ko) 2025-08-28
WO2024180866A1 (ja) 2024-09-06

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