JP2024072256A - 画素定義層の製造方法 - Google Patents
画素定義層の製造方法 Download PDFInfo
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- 125000005562 phenanthrylene group Chemical group 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920001690 polydopamine Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- BWJUFXUULUEGMA-UHFFFAOYSA-N propan-2-yl propan-2-yloxycarbonyloxy carbonate Chemical compound CC(C)OC(=O)OOC(=O)OC(C)C BWJUFXUULUEGMA-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- BWESROVQGZSBRX-UHFFFAOYSA-N pyrido[3,2-d]pyrimidine Chemical compound C1=NC=NC2=CC=CN=C21 BWESROVQGZSBRX-UHFFFAOYSA-N 0.000 description 1
- PLZDHJUUEGCXJH-UHFFFAOYSA-N pyrido[4,3-d]pyrimidine Chemical compound C1=NC=C2C=NC=CC2=N1 PLZDHJUUEGCXJH-UHFFFAOYSA-N 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000005576 pyrimidinylene group Chemical group 0.000 description 1
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000008054 sulfonate salts Chemical class 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 150000001911 terphenyls Chemical class 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electroluminescent Light Sources (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Plural Heterocyclic Compounds (AREA)
Abstract
Description
Claims (20)
- 感光性組成物を塗布及びコーティング;プリベーク;露光;現像;及び後熱処理;する段階を含む画素定義層の製造方法であって、後熱処理段階以降に塗膜の光学密度が0.80/μm~1.5/μmであり、反射率が0.01%超過6.5%未満を満足することを特徴とする画素定義層の製造方法。
- 前記後熱処理後の塗膜の反射率が0.01%超過6.3%以下であることを特徴とする請求項1に記載の画素定義層の製造方法。
- 前記後熱処理後の塗膜の光学密度が0.83/μm~1.4/μmであることを特徴とする請求項1に記載の画素定義層の製造方法。
- 前記後熱処理後の塗膜の光学密度が0.9/μm~1.3/μmであることを特徴とする請求項1に記載の画素定義層の製造方法。
- 前記後熱処理段階のオーブン温度が250~270℃であることを特徴とする請求項1に記載の画素定義層の製造方法。
- 前記後熱処理段階が60分ないし120分であることを特徴とする請求項1に記載の画素定義層の製造方法。
- 前記感光性組成物が着色剤を含むことを特徴とする請求項1に記載の画素定義層の製造方法。
- 前記着色剤が感光性組成物総量に対して17ないし35重量%で含まれることを特徴とする請求項7に記載の画素定義層の製造方法。
- 前記着色剤が無機染料、有機染料、無機顔料及び有機顔料の1つ以上を含むことを特徴とする請求項7に記載の画素定義層の製造方法。
- 前記着色剤は分散剤;または水溶性無機塩及び湿潤剤;を利用して前処理されることを特徴とする請求項7に記載の画素定義層の製造方法。
- 前記感光性組成物がアクリル系バインダ樹脂、カルド系バインダ樹脂またはこれらの組み合わせを含むパターニング用樹脂を含むことを特徴とする請求項1に記載の画素定義層の製造方法。
- 前記アクリル系バインダ樹脂の重量平均分子量は3,000g/molないし150,000g/molであることを特徴とする請求項11に記載の画素定義層の製造方法。
- 前記カルド系バインダ樹脂が下記化学式1の繰り返し構造を含むことを特徴とする請求項11に記載の画素定義層の製造方法:
前記化学式1において、
1)R1及びR2は互いに独立的に、水素;重水素;ハロゲン;C6~C30のアリール基;O、N、S、Si及びPの少なくとも1つのヘテロ原子を含むC2~C30のヘテロ環基;C6~C30の脂肪族環と芳香族環との融合環基;C1~C20のアルキル基;C2~C20のアルケニル基;C2~C20のアルキニル基;C1~C20のアルコキシ基 : C6~C30のアリールオキシ基;フルオレニル基:カルボニル基;エーテル基;又はC1~C20のアルコキシカルボニル基であり、
2)R1及びR2は隣接した基同士で環を形成することができ、
3)m又はnは互いに独立的に0~4の整数であり、
4)A1及びA2は互いに独立的に下記の化学式2又は化学式3であり、
前記化学式2及び化学式3において、
4-1)*は連結部位を示し、
4-2)R3~R6は互いに独立的に水素;重水素;ハロゲン;C6~C30のアリール基;O、N、S、Si及びPの少なくとも1つのヘテロ原子を含むC2~C30のヘテロ環基;C6~C30脂肪族環と芳香族環の融合環基;C1~C20のアルキル基;C2~C20のアルケニル基;C2~C20のアルキニル基;C1~C20のアルコキシ基 : C6~C30のアリールオキシ基;フルオレニル基:カルボニル基;エーテル基;又はC1~C20のアルコキシカルボニル基であり、
4-3)R3~R6は隣接する基同士で環を形成することができ、
4-4)Y1及びY2は互いに独立的に下記の化学式6又は化学式7であり、
前記化学式6及び化学式7において、
4-4-1)*は結合位置を示し、
4-4-2)R9は水素またはメチルであり、
4-4-3)R10~R13は互いに独立的に水素;重水素;ハロゲン;C6~C30のアリール基;O、N、S、Si及びPの少なくとも1つヘテロ原子を含むC2~C30のヘテロ環基;C6~C30の脂肪族環と芳香族環との融合環基;C1~C20のアルキル基;C2~C20のアルケニル基;C2~C20のアルキニル基;C1~C20のアルコキシ基;C6~C30のアリールオキシ基;フルオレニル基:カルボニル基;エーテル基;又はC1~C20のアルコキシカルボニル基であり
4-4-4)L1~L3は互いに独立的に単一結合;フルオレニレン基;C2~C30のアルキレン;C6~C30のアリレン;C2~C30のヘテロ環;C1~C30のアルコキシレン;C2~C30のアルキレンオキシ;C6~C30アリールオキシ基;C2~C30のポリエチレンオキシ基であり、
4-4-5)q及びrは互いに独立的に0~3の整数であり;ただし、q+r=3であり、
5)化学式1で表示される繰り返し単位を含む樹脂の高分子鎖内にA1とA2の比率は9:1ないし1:9であり、
6)X1は単一結合;O;CO;SO2;CR’R”;SiR’R”;下記の化学式4;または化学式5であり、
6-1)R’及びR”は互いに独立的に水素;重水素;ハロゲン;C6~C30のアリール基、O、N、S、Si及びPの少なくとも1つのヘテロ原子を含むC2~C30のヘテロ環基;C6~C30の脂肪族環と芳香族環の融合環基;C1~C20のアルキル基;C2~C20のアルケニル基;C2~C20のアルキニル基;C1~C20のアルコキシ基;C6~C30のアリールオキシ基;フルオレニル基:カルボニル基;エーテル基;又はC1~C20のアルコキシカルボニル基であり、
(6-2)R’及びR”は隣接した基同士で環を形成することができ、
前記化学式4及び化学式5において、
6-3)*は結合位置を示し、
6-4)R7~R8は互いに独立的に水素;重水素;ハロゲン;C6~C30のアリール基;O、N、S、Si及びPの少なくとも1つのヘテロ原子を含むC2~C30のヘテロ環基;C6~C30の脂肪族環と芳香族環の融合環基;C1~C20のアルキル基;C2~C20のアルケニル基;C2~C20のアルキニル基;C1~C20のアルコキシ基;C6~C30のアリールオキシ基;フルオレニル基:カルボニル基;エーテル基;又はC1~C20のアルコキシカルボニル基であり、
6-5)o及びpは互いに独立的に0~4の整数であり、
7)X2は、C6~C30のアリール基、O、N、S、Si及びPの少なくとも1つのヘテロ原子を含むC2~C30のヘテロ環基、C6~C30の脂肪族環と芳香族環との融合環基、C1~C20のアルキル基、C2~C20のアルケニル基;C2~C20のアルキニル基;C1~C20のアルコキシ基;C6~C30のアリールオキシ基;フルオレニル基:カルボニル基;エーテル基;又はC1~C20のアルコキシカルボニル基であり、
8)前記R’、R”、X2、L1~L3、R1~R8及びR10~R13は、それぞれ重水素;ハロゲン;C1~C30のアルキル基又はC6~C30のアリール基で置換又は非置換されたシラン基;シロキサン基;ホウ素基;ゲルマニウム基;シアノ基;アミノ基;ニトロ基;C1~C30のアルキルチオ基;C1~C30のアルコキシ基;C6~C30のアリールアルコキシ基;C1~C30のアルキル基、C2~C30のアルケニル基;C2~C30のアルキニル基;C6~C30のアリール基;重水素で置換されたC6~C30のアリール基;フルオレニル基;O、N、S、Si及びPからなる群から選択された少なくとも1つのヘテロ原子を含むC2~C30のヘテロ環基;C3~C30の脂肪族環基;C7~C30のアリールアルキル基;C8~C30のアリールアルケニル基;及びこれらの組み合わせからなる群から選択された1つ以上の置換基でさらに置換されることができ、隣接した置換基同士で環を形成することができる。 - 前記カルド系樹脂の重量平均分子量は1,000ないし100,000g/molであることを特徴とする請求項11に記載の画素定義層の製造方法。
- 前記カルド系樹脂が前記感光性組成物の総量に対して1ないし30重量%で含まれることを特徴とする請求項11に記載の画素定義層の製造方法。
- 前記感光性組成物がその総量に対して1ないし40重量%の反応性不飽和化合物を含むことを特徴とする請求項1に記載の画素定義層の製造方法。
- 前記感光性組成物がその総量に対して0.01ないし10重量%の光開始剤を含むことを特徴とする請求項1に記載の画素定義層の製造方法。
- 請求項1により製造された画素定義層。
- 請求項18による画素定義層を含む有機発光表示装置。
- 請求項19の表示装置及び前記表示装置を駆動する制御部を含む電子装置。
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