JP2024058420A - 酸化珪素膜用研磨液組成物 - Google Patents

酸化珪素膜用研磨液組成物 Download PDF

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Publication number
JP2024058420A
JP2024058420A JP2022165767A JP2022165767A JP2024058420A JP 2024058420 A JP2024058420 A JP 2024058420A JP 2022165767 A JP2022165767 A JP 2022165767A JP 2022165767 A JP2022165767 A JP 2022165767A JP 2024058420 A JP2024058420 A JP 2024058420A
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Japan
Prior art keywords
polishing
component
present disclosure
silicon oxide
oxide film
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Pending
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JP2022165767A
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Japanese (ja)
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JP2024058420A5 (enExample
Inventor
将来 井上
Masaki Inoue
哲史 山口
Tetsushi Yamaguchi
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Kao Corp
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Kao Corp
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Priority to JP2022165767A priority Critical patent/JP2024058420A/ja
Publication of JP2024058420A publication Critical patent/JP2024058420A/ja
Publication of JP2024058420A5 publication Critical patent/JP2024058420A5/ja
Pending legal-status Critical Current

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  • Mechanical Treatment Of Semiconductor (AREA)
JP2022165767A 2022-10-14 2022-10-14 酸化珪素膜用研磨液組成物 Pending JP2024058420A (ja)

Priority Applications (1)

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JP2022165767A JP2024058420A (ja) 2022-10-14 2022-10-14 酸化珪素膜用研磨液組成物

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JP2022165767A JP2024058420A (ja) 2022-10-14 2022-10-14 酸化珪素膜用研磨液組成物

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JP2024058420A true JP2024058420A (ja) 2024-04-25
JP2024058420A5 JP2024058420A5 (enExample) 2025-09-30

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JP2022165767A Pending JP2024058420A (ja) 2022-10-14 2022-10-14 酸化珪素膜用研磨液組成物

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