JP2024036861A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2024036861A5 JP2024036861A5 JP2022141384A JP2022141384A JP2024036861A5 JP 2024036861 A5 JP2024036861 A5 JP 2024036861A5 JP 2022141384 A JP2022141384 A JP 2022141384A JP 2022141384 A JP2022141384 A JP 2022141384A JP 2024036861 A5 JP2024036861 A5 JP 2024036861A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- semiconductor device
- layer
- semiconductor
- carbon nanotubes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022141384A JP2024036861A (ja) | 2022-09-06 | 2022-09-06 | 半導体素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022141384A JP2024036861A (ja) | 2022-09-06 | 2022-09-06 | 半導体素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024036861A JP2024036861A (ja) | 2024-03-18 |
| JP2024036861A5 true JP2024036861A5 (https=) | 2025-06-19 |
Family
ID=90273041
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022141384A Pending JP2024036861A (ja) | 2022-09-06 | 2022-09-06 | 半導体素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2024036861A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20250054755A1 (en) * | 2023-08-07 | 2025-02-13 | Wisconsin Alumni Research Foundation | Surface-water-assisted deposition of patterned films of aligned nanoparticles |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009093698A1 (ja) * | 2008-01-24 | 2009-07-30 | Nec Corporation | カーボンナノチューブ分散膜の形成方法及び半導体素子の製造方法 |
| CN106816473B (zh) * | 2017-01-16 | 2020-01-21 | 京东方科技集团股份有限公司 | 薄膜晶体管及其制备方法、阵列基板和显示装置 |
| US12114515B2 (en) * | 2018-12-21 | 2024-10-08 | National Research Council Of Canada | Thin film transistors comprising carbon nanotube networks encapsulated by a polymeric layer and methods for the manufacture thereof |
| JP7593107B2 (ja) * | 2019-09-20 | 2024-12-03 | 東レ株式会社 | 半導体装置用基板、半導体装置用基板の製造方法および無線通信装置の製造方法 |
| WO2021149582A1 (ja) * | 2020-01-24 | 2021-07-29 | 国立大学法人東海国立大学機構 | 積層体、積層体の製造方法、および、積層体を備えるデバイス |
| JP2022025051A (ja) * | 2020-07-28 | 2022-02-09 | 日本電気株式会社 | ボロメータ及びその製造方法 |
-
2022
- 2022-09-06 JP JP2022141384A patent/JP2024036861A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Wang et al. | Support-free transfer of ultrasmooth graphene films facilitated by self-assembled monolayers for electronic devices and patterns | |
| CN106185848A (zh) | 一种金属离子修饰的黑磷及其制备方法与应用 | |
| CN103996624B (zh) | 柔性碳纳米管晶体管的制备方法 | |
| JP2024036861A5 (https=) | ||
| CN105609636B (zh) | 定向单壁碳纳米管阵列为沟道的场效应晶体管及制作方法 | |
| WO2020006858A1 (zh) | 一种薄膜晶体管及其制作方法 | |
| CN104465400B (zh) | 无残留光学光刻胶石墨烯fet的制备及原位表征方法 | |
| CN102354668A (zh) | 一种碳基纳米材料晶体管的制备方法 | |
| CN103943512B (zh) | 一种降低石墨烯与电极接触电阻的方法 | |
| CN102915929B (zh) | 一种石墨烯场效应器件制备方法 | |
| CN107146770A (zh) | 一种阵列基板的制备方法、阵列基板和显示装置 | |
| CN114242785A (zh) | 一种基于氧化铟锡的全透明薄膜晶体管及其制备方法 | |
| CN110729297A (zh) | 石墨炔和二硫化钼结合的非易失性多级光电存储器及制备 | |
| CN114068564A (zh) | 浮栅存储器及其制备方法 | |
| KR100963204B1 (ko) | 플렉시블 투명전극 제조 방법 | |
| CN101101967A (zh) | 低成本高性能有机场效应晶体管及制备方法 | |
| JP2023080040A5 (https=) | ||
| TW201406466A (zh) | 奈米球溶液塗佈方法與其應用 | |
| KR20120086621A (ko) | 바닥 접촉식 그래핀옥사이드를 이용한 환원그래핀옥사이드 전계효과 트랜지스터 제조방법 | |
| CN103570001A (zh) | 一种绝缘体上二维薄膜材料的制备方法 | |
| CN105551968B (zh) | 定向/无序复合单层碳纳米管为沟道的场效应管及制作方法 | |
| CN105140261A (zh) | 有机薄膜晶体管及其制备方法、阵列基板及显示装置 | |
| JP2022537125A5 (https=) | ||
| CN111969108A (zh) | 一种基于柔性基底的偏铝酸铜忆阻器及制备方法 | |
| CN116581163A (zh) | 场效应晶体管及其制备方法 |