JP2024017814A - 接合装置、接合方法、および物品の製造方法 - Google Patents
接合装置、接合方法、および物品の製造方法 Download PDFInfo
- Publication number
- JP2024017814A JP2024017814A JP2022120714A JP2022120714A JP2024017814A JP 2024017814 A JP2024017814 A JP 2024017814A JP 2022120714 A JP2022120714 A JP 2022120714A JP 2022120714 A JP2022120714 A JP 2022120714A JP 2024017814 A JP2024017814 A JP 2024017814A
- Authority
- JP
- Japan
- Prior art keywords
- die
- bonding
- pattern
- wafer
- joining
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0446—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
- H10P72/0606—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
- H10P72/53—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B80/00—Assemblies of multiple devices comprising at least one memory device covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
- H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
- H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
Landscapes
- Wire Bonding (AREA)
- Die Bonding (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022120714A JP2024017814A (ja) | 2022-07-28 | 2022-07-28 | 接合装置、接合方法、および物品の製造方法 |
| KR1020230090185A KR102952198B1 (ko) | 2022-07-28 | 2023-07-12 | 접합장치, 접합방법, 추정방법, 및 물품의 제조방법 |
| US18/352,494 US20240038598A1 (en) | 2022-07-28 | 2023-07-14 | Bonding apparatus, bonding method, estimation method, and article manufacturing method |
| TW112126505A TW202407829A (zh) | 2022-07-28 | 2023-07-17 | 接合設備、接合方法、預估方法及物品製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022120714A JP2024017814A (ja) | 2022-07-28 | 2022-07-28 | 接合装置、接合方法、および物品の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024017814A true JP2024017814A (ja) | 2024-02-08 |
| JP2024017814A5 JP2024017814A5 (https=) | 2025-06-11 |
Family
ID=89664823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022120714A Pending JP2024017814A (ja) | 2022-07-28 | 2022-07-28 | 接合装置、接合方法、および物品の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20240038598A1 (https=) |
| JP (1) | JP2024017814A (https=) |
| KR (1) | KR102952198B1 (https=) |
| TW (1) | TW202407829A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025242350A1 (en) * | 2024-05-22 | 2025-11-27 | Asml Netherlands B.V. | Apparatus and method for continuous die bonding |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004071600A (ja) * | 2002-08-01 | 2004-03-04 | Asuriito Fa Kk | ボンディング不良チップ取り外し方法およびボンディング装置 |
| WO2006118018A1 (ja) * | 2005-04-28 | 2006-11-09 | Toray Engineering Co., Ltd. | フリップチップ実装ずれ検査方法および実装装置 |
| JP2007180232A (ja) * | 2005-12-27 | 2007-07-12 | Toshiba Corp | ボンディング装置及び半導体装置の製造方法 |
| JP2014017471A (ja) * | 2012-06-11 | 2014-01-30 | Shinkawa Ltd | ボンディング装置およびボンディング方法 |
| JP2015149314A (ja) * | 2014-02-04 | 2015-08-20 | 富士通株式会社 | 半導体装置及びその製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5019946A (en) * | 1988-09-27 | 1991-05-28 | General Electric Company | High density interconnect with high volumetric efficiency |
-
2022
- 2022-07-28 JP JP2022120714A patent/JP2024017814A/ja active Pending
-
2023
- 2023-07-12 KR KR1020230090185A patent/KR102952198B1/ko active Active
- 2023-07-14 US US18/352,494 patent/US20240038598A1/en active Pending
- 2023-07-17 TW TW112126505A patent/TW202407829A/zh unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004071600A (ja) * | 2002-08-01 | 2004-03-04 | Asuriito Fa Kk | ボンディング不良チップ取り外し方法およびボンディング装置 |
| WO2006118018A1 (ja) * | 2005-04-28 | 2006-11-09 | Toray Engineering Co., Ltd. | フリップチップ実装ずれ検査方法および実装装置 |
| JP2007180232A (ja) * | 2005-12-27 | 2007-07-12 | Toshiba Corp | ボンディング装置及び半導体装置の製造方法 |
| JP2014017471A (ja) * | 2012-06-11 | 2014-01-30 | Shinkawa Ltd | ボンディング装置およびボンディング方法 |
| JP2015149314A (ja) * | 2014-02-04 | 2015-08-20 | 富士通株式会社 | 半導体装置及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20240016197A (ko) | 2024-02-06 |
| TW202407829A (zh) | 2024-02-16 |
| KR102952198B1 (ko) | 2026-04-14 |
| US20240038598A1 (en) | 2024-02-01 |
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