JP2023549117A5 - - Google Patents

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Publication number
JP2023549117A5
JP2023549117A5 JP2023526963A JP2023526963A JP2023549117A5 JP 2023549117 A5 JP2023549117 A5 JP 2023549117A5 JP 2023526963 A JP2023526963 A JP 2023526963A JP 2023526963 A JP2023526963 A JP 2023526963A JP 2023549117 A5 JP2023549117 A5 JP 2023549117A5
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JP
Japan
Prior art keywords
plasma
frc
chamber
confinement chamber
beam energy
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JP2023526963A
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English (en)
Japanese (ja)
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JP7803946B2 (ja
JP2023549117A (ja
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Priority claimed from PCT/US2021/058601 external-priority patent/WO2022099189A1/en
Publication of JP2023549117A publication Critical patent/JP2023549117A/ja
Publication of JP2023549117A5 publication Critical patent/JP2023549117A5/ja
Application granted granted Critical
Publication of JP7803946B2 publication Critical patent/JP7803946B2/ja
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JP2023526963A 2020-11-09 2021-11-09 プラズマ加熱のための電子ビームのためのシステム、デバイス、および方法 Active JP7803946B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202063111446P 2020-11-09 2020-11-09
US63/111,446 2020-11-09
PCT/US2021/058601 WO2022099189A1 (en) 2020-11-09 2021-11-09 System, devices and methods for electron beam for plasma heating

Publications (3)

Publication Number Publication Date
JP2023549117A JP2023549117A (ja) 2023-11-22
JP2023549117A5 true JP2023549117A5 (https=) 2024-11-18
JP7803946B2 JP7803946B2 (ja) 2026-01-21

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ID=81456810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023526963A Active JP7803946B2 (ja) 2020-11-09 2021-11-09 プラズマ加熱のための電子ビームのためのシステム、デバイス、および方法

Country Status (10)

Country Link
US (1) US20230403779A1 (https=)
EP (1) EP4218367A4 (https=)
JP (1) JP7803946B2 (https=)
KR (1) KR20230101896A (https=)
CN (1) CN116671256A (https=)
AU (1) AU2021373891A1 (https=)
CA (1) CA3199783A1 (https=)
IL (1) IL302734A (https=)
MX (1) MX2023005412A (https=)
WO (1) WO2022099189A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115380627A (zh) * 2020-01-13 2022-11-22 阿尔法能源技术公司 用于经由球马克合并和中性束注入来形成和保持高能高温frc等离子体的系统和方法
WO2022256721A1 (en) * 2021-06-03 2022-12-08 Helion Energy, Inc. Apparatus and methods for generating a pulsating, high-strength magnetic field

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6127053A (ja) * 1984-07-13 1986-02-06 Nissin Electric Co Ltd 電子ビ−ム源
CA2268456A1 (en) * 1996-11-01 1998-05-14 George H. Miley Plasma jet source using an inertial electrostatic confinement discharge plasma
JP2000243334A (ja) 1999-02-22 2000-09-08 Nikon Corp 電子銃及び電子銃の制御方法
US6664739B1 (en) * 1999-08-02 2003-12-16 Advanced Energy Industries, Inc. Enhanced electron emissive surfaces for a thin film deposition system using ion sources
US6664740B2 (en) * 2001-02-01 2003-12-16 The Regents Of The University Of California Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma
US8031824B2 (en) * 2005-03-07 2011-10-04 Regents Of The University Of California Inductive plasma source for plasma electric generation system
US20100008461A1 (en) * 2006-10-19 2010-01-14 John Andrew Hodgson Cold fusion apparatus
DE102010025123A1 (de) * 2010-06-25 2011-12-29 Forschungszentrum Jülich GmbH Verfahren und Vorrichtung zur Ermittlung eines Elektronenstrahldurchmessers
US9793098B2 (en) * 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
MY191665A (en) * 2015-11-13 2022-07-06 Tae Tech Inc Systems and methods for frc plasma position stability
US10204709B2 (en) * 2016-10-26 2019-02-12 Joel Guild Rogers Apparatus and method for controlling a plasma fusion reactor
CA3041826A1 (en) * 2016-10-28 2018-05-03 Tae Technologies, Inc. Systems and methods for improved sustainment of a high performance frc elevated energies utilizing neutral beam injectors with tunable beam energies

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