JP7803946B2 - プラズマ加熱のための電子ビームのためのシステム、デバイス、および方法 - Google Patents

プラズマ加熱のための電子ビームのためのシステム、デバイス、および方法

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Publication number
JP7803946B2
JP7803946B2 JP2023526963A JP2023526963A JP7803946B2 JP 7803946 B2 JP7803946 B2 JP 7803946B2 JP 2023526963 A JP2023526963 A JP 2023526963A JP 2023526963 A JP2023526963 A JP 2023526963A JP 7803946 B2 JP7803946 B2 JP 7803946B2
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Japan
Prior art keywords
plasma
frc
chamber
confinement
neutral
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JP2023526963A
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English (en)
Japanese (ja)
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JP2023549117A5 (https=
JP2023549117A (ja
Inventor
アントン トカチョフ，
セルゲイ コレパノフ，
Original Assignee
ティーエーイー テクノロジーズ， インコーポレイテッド
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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/05—Thermonuclear fusion reactors with magnetic or electric plasma confinement
    • G21B1/052—Thermonuclear fusion reactors with magnetic or electric plasma confinement reversed field configuration
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/11—Details
    • G21B1/15—Particle injectors for producing thermonuclear fusion reactions, e.g. pellet injectors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/10—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied magnetic fields only, e.g. Q-machines, Yin-Yang, base-ball
    • H05H1/14—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied magnetic fields only, e.g. Q-machines, Yin-Yang, base-ball wherein the containment vessel is straight and has magnetic mirrors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
    • H05H2007/048—Magnet systems, e.g. undulators, wigglers; Energisation thereof for modifying beam trajectory, e.g. gantry systems
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma Technology (AREA)
  • Furnace Details (AREA)
JP2023526963A 2020-11-09 2021-11-09 プラズマ加熱のための電子ビームのためのシステム、デバイス、および方法 Active JP7803946B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202063111446P 2020-11-09 2020-11-09
US63/111,446 2020-11-09
PCT/US2021/058601 WO2022099189A1 (en) 2020-11-09 2021-11-09 System, devices and methods for electron beam for plasma heating

Publications (3)

Publication Number Publication Date
JP2023549117A JP2023549117A (ja) 2023-11-22
JP2023549117A5 JP2023549117A5 (https=) 2024-11-18
JP7803946B2 true JP7803946B2 (ja) 2026-01-21

Family

ID=81456810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023526963A Active JP7803946B2 (ja) 2020-11-09 2021-11-09 プラズマ加熱のための電子ビームのためのシステム、デバイス、および方法

Country Status (10)

Country Link
US (1) US20230403779A1 (https=)
EP (1) EP4218367A4 (https=)
JP (1) JP7803946B2 (https=)
KR (1) KR20230101896A (https=)
CN (1) CN116671256A (https=)
AU (1) AU2021373891A1 (https=)
CA (1) CA3199783A1 (https=)
IL (1) IL302734A (https=)
MX (1) MX2023005412A (https=)
WO (1) WO2022099189A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115380627A (zh) * 2020-01-13 2022-11-22 阿尔法能源技术公司 用于经由球马克合并和中性束注入来形成和保持高能高温frc等离子体的系统和方法
WO2022256721A1 (en) * 2021-06-03 2022-12-08 Helion Energy, Inc. Apparatus and methods for generating a pulsating, high-strength magnetic field

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000243334A (ja) 1999-02-22 2000-09-08 Nikon Corp 電子銃及び電子銃の制御方法
US20190318831A1 (en) 2016-10-28 2019-10-17 Tae Technologies, Inc. Systems and methods for improved sustainment of a high performance frc elevated energies utilizing neutral beam injectors with tunable beam energies

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6127053A (ja) * 1984-07-13 1986-02-06 Nissin Electric Co Ltd 電子ビ−ム源
CA2268456A1 (en) * 1996-11-01 1998-05-14 George H. Miley Plasma jet source using an inertial electrostatic confinement discharge plasma
US6664739B1 (en) * 1999-08-02 2003-12-16 Advanced Energy Industries, Inc. Enhanced electron emissive surfaces for a thin film deposition system using ion sources
US6664740B2 (en) * 2001-02-01 2003-12-16 The Regents Of The University Of California Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma
US8031824B2 (en) * 2005-03-07 2011-10-04 Regents Of The University Of California Inductive plasma source for plasma electric generation system
US20100008461A1 (en) * 2006-10-19 2010-01-14 John Andrew Hodgson Cold fusion apparatus
DE102010025123A1 (de) * 2010-06-25 2011-12-29 Forschungszentrum Jülich GmbH Verfahren und Vorrichtung zur Ermittlung eines Elektronenstrahldurchmessers
US9793098B2 (en) * 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
MY191665A (en) * 2015-11-13 2022-07-06 Tae Tech Inc Systems and methods for frc plasma position stability
US10204709B2 (en) * 2016-10-26 2019-02-12 Joel Guild Rogers Apparatus and method for controlling a plasma fusion reactor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000243334A (ja) 1999-02-22 2000-09-08 Nikon Corp 電子銃及び電子銃の制御方法
US20190318831A1 (en) 2016-10-28 2019-10-17 Tae Technologies, Inc. Systems and methods for improved sustainment of a high performance frc elevated energies utilizing neutral beam injectors with tunable beam energies
JP2019537002A (ja) 2016-10-28 2019-12-19 ティーエーイー テクノロジーズ， インコーポレイテッド 調整可能ビームエネルギーを伴う中性ビーム注入器を利用する高性能ｆｒｃ上昇エネルギーの改良された持続性のためのシステムおよび方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
D. Twarog，Field-Reversed Configuration Induced by a Paramagnetic Field，IEEE TRANSACTIONS ON PLASMA SCIENCE，IEEE，2013年，Vol.41, No.2，280-289，IEL Online (IEEE Xplore)

Also Published As

Publication number Publication date
US20230403779A1 (en) 2023-12-14
IL302734A (en) 2023-07-01
AU2021373891A9 (en) 2024-07-04
CN116671256A (zh) 2023-08-29
AU2021373891A1 (en) 2023-06-22
WO2022099189A1 (en) 2022-05-12
KR20230101896A (ko) 2023-07-06
EP4218367A4 (en) 2024-11-13
CA3199783A1 (en) 2022-05-12
EP4218367A1 (en) 2023-08-02
MX2023005412A (es) 2023-07-25
JP2023549117A (ja) 2023-11-22

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