JP2023536819A5 - - Google Patents
Info
- Publication number
- JP2023536819A5 JP2023536819A5 JP2023505859A JP2023505859A JP2023536819A5 JP 2023536819 A5 JP2023536819 A5 JP 2023536819A5 JP 2023505859 A JP2023505859 A JP 2023505859A JP 2023505859 A JP2023505859 A JP 2023505859A JP 2023536819 A5 JP2023536819 A5 JP 2023536819A5
- Authority
- JP
- Japan
- Prior art keywords
- optionally substituted
- film
- homopolymer
- substrate
- independently
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202062706035P | 2020-07-28 | 2020-07-28 | |
| US62/706,035 | 2020-07-28 | ||
| PCT/US2021/042978 WO2022026323A1 (en) | 2020-07-28 | 2021-07-23 | Low ceiling temperature homopolymers as sacrificial protection layers for environmentally sensitive substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023536819A JP2023536819A (ja) | 2023-08-30 |
| JP2023536819A5 true JP2023536819A5 (https=) | 2024-07-08 |
Family
ID=80038094
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023505859A Pending JP2023536819A (ja) | 2020-07-28 | 2021-07-23 | 環境に敏感な基板用の犠牲保護層としての低天井温度ホモポリマー |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20230295412A1 (https=) |
| JP (1) | JP2023536819A (https=) |
| KR (1) | KR102939373B1 (https=) |
| CN (1) | CN116194843A (https=) |
| TW (1) | TWI900618B (https=) |
| WO (1) | WO2022026323A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102890564B1 (ko) | 2019-01-29 | 2025-11-24 | 램 리써치 코포레이션 | 기판들의 환경에 민감한 표면들을 위한 희생적 보호 층 |
| CN114375489A (zh) | 2019-09-04 | 2022-04-19 | 朗姆研究公司 | 刺激响应聚合物膜和制剂 |
| EP4363552A1 (en) * | 2021-07-02 | 2024-05-08 | Boise State University | Layered constructions with removable layers |
| KR20250088540A (ko) * | 2022-10-10 | 2025-06-17 | 램 리써치 코포레이션 | 화학적 기상 증착 (chemical vapor deposition) 동안 일시적인 표면 보호를 위한 옥시메틸렌 공중합체들 (oxymethylene copolymers) |
| CN118852506A (zh) * | 2024-06-25 | 2024-10-29 | 华东理工大学 | 三线态能量转移诱导聚合光催化剂及其制备方法和应用 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2189493B (en) * | 1986-04-11 | 1990-12-19 | James C W Chien | Self-developing resist |
| AU2009256118A1 (en) * | 2008-06-05 | 2009-12-10 | The Administrators Of The Tulane Educational Fund | Methods and instrumentation for during-synthesis monitoring of polymer functional evolution |
| AU2014246657A1 (en) * | 2013-04-02 | 2015-11-19 | University Of South Australia | Stimulus responsive substrates |
| US9466511B2 (en) * | 2014-09-18 | 2016-10-11 | Lam Research Corporation | Systems and methods for drying high aspect ratio structures without collapse using stimuli-responsive sacrificial bracing material |
| JP2021519844A (ja) * | 2018-03-26 | 2021-08-12 | ジョージア テック リサーチ コーポレイション | 過渡的なポリマーの配合物、その物品、並びにそれを作製及び使用する方法 |
| US11111378B2 (en) * | 2018-04-16 | 2021-09-07 | The Board Of Trustees Of The University Of Illinois | Bulk transient materials made of cyclic poly(phthalaldehyde) |
| CN114423796A (zh) * | 2019-08-09 | 2022-04-29 | 佐治亚技术研究公司 | 聚醛的快速合成 |
-
2021
- 2021-07-23 US US18/006,552 patent/US20230295412A1/en active Pending
- 2021-07-23 WO PCT/US2021/042978 patent/WO2022026323A1/en not_active Ceased
- 2021-07-23 JP JP2023505859A patent/JP2023536819A/ja active Pending
- 2021-07-23 CN CN202180059233.7A patent/CN116194843A/zh active Pending
- 2021-07-23 KR KR1020237007057A patent/KR102939373B1/ko active Active
- 2021-07-23 TW TW110127126A patent/TWI900618B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2023536819A5 (https=) | ||
| JP2021008618A5 (https=) | ||
| US9096726B2 (en) | Composition for forming silica based insulating layer, method for manufacturing composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layer | |
| KR101583232B1 (ko) | 중합체 제조 방법 및 실리카계 절연막 형성용 조성물 | |
| JP2003531925A (ja) | 脱水素縮合によるシリコーンの重合及び／又は架橋用の熱活性化触媒としての硼素誘導体の使用 | |
| JP2024040229A5 (https=) | ||
| US8367190B2 (en) | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | |
| KR20140093903A (ko) | 하드마스크 표면 처리 | |
| WO2015041207A1 (ja) | 被膜形成用組成物およびそれを用いた被膜形成方法 | |
| TWI803865B (zh) | 化合物、聚合物、圖案形成材料、圖案形成方法及半導體裝置之製造方法 | |
| CN113874421A (zh) | 甲硅烷基氢化物与硅氧烷之间的热引发的酸催化反应 | |
| KR101599952B1 (ko) | 중합체 제조 방법 및 실리카계 절연막 형성용 조성물 | |
| US10647056B2 (en) | Method of additive manufacturing using photoregulated radical polymerization | |
| KR20100126295A (ko) | 실세스퀴옥산 수지 | |
| JP7076237B2 (ja) | 下地剤、及び相分離構造を含む構造体の製造方法 | |
| JP2015232115A (ja) | 硬化性組成物、並びにそれを用いた硬化物の製造方法及びその再溶解方法 | |
| CN1044995A (zh) | 聚硅烷的蒸汽积附法 | |
| JP2023184588A5 (https=) | ||
| KR101583225B1 (ko) | 실리카계 절연층 형성용 조성물, 실리카계 절연층 및 실리카계 절연층의 제조방법 | |
| JP6078150B2 (ja) | 物品の表面のエピラム化のための作用剤 | |
| JP2002317049A (ja) | ホウ素含有ポリマー組成物 | |
| JP6811957B2 (ja) | 相分離構造形成用樹脂組成物、及び相分離構造を含む構造体の製造方法 | |
| JP2019034993A (ja) | ポリカルボシランを含んでなるシリコンカーバイド質膜形成組成物、およびそれを用いたシリコンカーバイド質膜の製造方法 | |
| US9828519B2 (en) | Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure | |
| CN113950514B (zh) | 甲硅烷基氢化物与α-β不饱和酯之间的热引发酸催化反应 |