JP2023535291A5 - - Google Patents
Info
- Publication number
- JP2023535291A5 JP2023535291A5 JP2022581338A JP2022581338A JP2023535291A5 JP 2023535291 A5 JP2023535291 A5 JP 2023535291A5 JP 2022581338 A JP2022581338 A JP 2022581338A JP 2022581338 A JP2022581338 A JP 2022581338A JP 2023535291 A5 JP2023535291 A5 JP 2023535291A5
- Authority
- JP
- Japan
- Prior art keywords
- movable
- configuration
- valve seat
- processing chamber
- semiconductor processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202062706004P | 2020-07-24 | 2020-07-24 | |
| US62/706,004 | 2020-07-24 | ||
| PCT/US2021/042951 WO2022020707A1 (en) | 2020-07-24 | 2021-07-23 | High-conductance vacuum valves for wafer processing systems |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023535291A JP2023535291A (ja) | 2023-08-17 |
| JP2023535291A5 true JP2023535291A5 (cg-RX-API-DMAC10.html) | 2024-07-22 |
| JP7803890B2 JP7803890B2 (ja) | 2026-01-21 |
Family
ID=79728981
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022581338A Active JP7803890B2 (ja) | 2020-07-24 | 2021-07-23 | ウェハ処理システム用の高コンダクタンス真空バルブ |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20230360894A1 (cg-RX-API-DMAC10.html) |
| JP (1) | JP7803890B2 (cg-RX-API-DMAC10.html) |
| KR (2) | KR20260033638A (cg-RX-API-DMAC10.html) |
| WO (1) | WO2022020707A1 (cg-RX-API-DMAC10.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025080417A1 (en) * | 2023-10-11 | 2025-04-17 | Applied Materials, Inc. | Smart faceplate using shape memory alloy poppet actuators |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3646292B2 (ja) * | 2001-07-17 | 2005-05-11 | 学校法人金沢工業大学 | 物体の加工処理方法と、その装置 |
| CN102084468B (zh) * | 2008-02-08 | 2014-10-29 | 朗姆研究公司 | 包括横向波纹管和非接触颗粒密封的可调节间隙电容耦合rf等离子反应器 |
| JP2009212177A (ja) * | 2008-03-03 | 2009-09-17 | Hitachi High-Technologies Corp | 真空処理装置 |
| JP5337185B2 (ja) * | 2011-03-11 | 2013-11-06 | 株式会社東芝 | 圧力制御装置 |
| TWI661746B (zh) * | 2011-10-05 | 2019-06-01 | 應用材料股份有限公司 | 電漿處理設備及其蓋組件（一） |
| JP5778001B2 (ja) * | 2011-11-04 | 2015-09-16 | 小林製薬株式会社 | 板状部材 |
| US9879684B2 (en) * | 2012-09-13 | 2018-01-30 | Kla-Tencor Corporation | Apparatus and method for shielding a controlled pressure environment |
| US10049862B2 (en) * | 2015-04-17 | 2018-08-14 | Lam Research Corporation | Chamber with vertical support stem for symmetric conductance and RF delivery |
| KR101852833B1 (ko) * | 2015-12-02 | 2018-06-20 | 한국항공우주연구원 | 다단 포핏 밸브 |
| CN105445973B (zh) | 2015-12-31 | 2019-04-30 | 京东方科技集团股份有限公司 | 一种抽真空装置及采用该抽真空装置的操作方法 |
| JP6960737B2 (ja) * | 2017-01-23 | 2021-11-05 | 株式会社日立ハイテク | 真空処理装置 |
| KR102225955B1 (ko) * | 2018-04-19 | 2021-03-11 | 세메스 주식회사 | 기판 처리 장치 및 배기 어셈블리 |
| JP6833784B2 (ja) * | 2018-09-28 | 2021-02-24 | 芝浦メカトロニクス株式会社 | プラズマ処理装置 |
-
2021
- 2021-07-23 JP JP2022581338A patent/JP7803890B2/ja active Active
- 2021-07-23 KR KR1020267006636A patent/KR20260033638A/ko active Pending
- 2021-07-23 WO PCT/US2021/042951 patent/WO2022020707A1/en not_active Ceased
- 2021-07-23 KR KR1020227045044A patent/KR102935842B1/ko active Active
- 2021-07-23 US US18/006,531 patent/US20230360894A1/en active Pending
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