JP2023530125A5 - - Google Patents

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Publication number
JP2023530125A5
JP2023530125A5 JP2022577087A JP2022577087A JP2023530125A5 JP 2023530125 A5 JP2023530125 A5 JP 2023530125A5 JP 2022577087 A JP2022577087 A JP 2022577087A JP 2022577087 A JP2022577087 A JP 2022577087A JP 2023530125 A5 JP2023530125 A5 JP 2023530125A5
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JP
Japan
Prior art keywords
signal
parameter
parameter level
parameters
level
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022577087A
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English (en)
Japanese (ja)
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JP2023530125A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2021/036477 external-priority patent/WO2021257331A1/en
Publication of JP2023530125A publication Critical patent/JP2023530125A/ja
Publication of JP2023530125A5 publication Critical patent/JP2023530125A5/ja
Priority to JP2025169826A priority Critical patent/JP2026010023A/ja
Pending legal-status Critical Current

Links

JP2022577087A 2020-06-15 2021-06-08 Ｒｆ信号のパラメータのパルス化周波数およびデューティサイクルの制御 Pending JP2023530125A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025169826A JP2026010023A (ja) 2020-06-15 2025-10-08 Ｒｆ信号のパラメータのパルス化周波数およびデューティサイクルの制御

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202063039335P 2020-06-15 2020-06-15
US63/039,335 2020-06-15
PCT/US2021/036477 WO2021257331A1 (en) 2020-06-15 2021-06-08 Control of pulsing frequencies and duty cycles of parameters of rf signals

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025169826A Division JP2026010023A (ja) 2020-06-15 2025-10-08 Ｒｆ信号のパラメータのパルス化周波数およびデューティサイクルの制御

Publications (2)

Publication Number Publication Date
JP2023530125A JP2023530125A (ja) 2023-07-13
JP2023530125A5 true JP2023530125A5 (https=) 2024-06-14

Family

ID=79268255

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022577087A Pending JP2023530125A (ja) 2020-06-15 2021-06-08 Ｒｆ信号のパラメータのパルス化周波数およびデューティサイクルの制御
JP2025169826A Pending JP2026010023A (ja) 2020-06-15 2025-10-08 Ｒｆ信号のパラメータのパルス化周波数およびデューティサイクルの制御

Family Applications After (1)

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JP2025169826A Pending JP2026010023A (ja) 2020-06-15 2025-10-08 Ｒｆ信号のパラメータのパルス化周波数およびデューティサイクルの制御

Country Status (4)

Country Link
US (1) US12609283B2 (https=)
JP (2) JP2023530125A (https=)
KR (1) KR20230021751A (https=)
WO (1) WO2021257331A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023530125A (ja) * 2020-06-15 2023-07-13 ラム リサーチ コーポレーション Ｒｆ信号のパラメータのパルス化周波数およびデューティサイクルの制御
US12494345B2 (en) * 2020-07-15 2025-12-09 Lam Research Corporation Pulsing RF coils of a plasma chamber in reverse synchronization
KR20260042206A (ko) * 2023-08-02 2026-03-30 램 리써치 코포레이션 더 높은 주파수 신호를 사용하여 내부 코일에 전력을 공급하고 더 높은 주파수 신호 및 더 낮은 주파수 신호의 혼합 신호를 사용하여 외부 코일에 전력을 공급하여 개선된 플라즈마 균일성

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US20030072051A1 (en) * 2000-10-16 2003-04-17 Myers Michael H. Orthogonal-code, photonic multiplexing
KR101510775B1 (ko) * 2008-11-24 2015-04-10 삼성전자주식회사 동기식 펄스 플라즈마 에칭 장비
US8404598B2 (en) * 2009-08-07 2013-03-26 Applied Materials, Inc. Synchronized radio frequency pulsing for plasma etching
US10271416B2 (en) * 2011-10-28 2019-04-23 Applied Materials, Inc. High efficiency triple-coil inductively coupled plasma source with phase control
US20130119018A1 (en) * 2011-11-15 2013-05-16 Keren Jacobs Kanarik Hybrid pulsing plasma processing systems
US10325759B2 (en) * 2012-02-22 2019-06-18 Lam Research Corporation Multiple control modes
JP6002556B2 (ja) 2012-11-27 2016-10-05 株式会社日立ハイテクノロジーズ プラズマ処理装置およびプラズマ処理方法
CN103021783B (zh) * 2012-12-24 2015-12-02 中微半导体设备(上海)有限公司 半导体结构的刻蚀方法
US9365924B2 (en) 2013-05-23 2016-06-14 Asm Ip Holding B.V. Method for forming film by plasma-assisted deposition using two-frequency combined pulsed RF power
US9761459B2 (en) * 2015-08-05 2017-09-12 Lam Research Corporation Systems and methods for reverse pulsing
US9515633B1 (en) 2016-01-11 2016-12-06 Lam Research Corporation Transformer coupled capacitive tuning circuit with fast impedance switching for plasma etch chambers
US10546724B2 (en) 2017-05-10 2020-01-28 Mks Instruments, Inc. Pulsed, bidirectional radio frequency source/load
US10734195B2 (en) * 2017-06-08 2020-08-04 Lam Research Corporation Systems and methods for transformer coupled plasma pulsing with transformer coupled capacitive tuning switching
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KR20220113502A (ko) * 2019-12-13 2022-08-12 램 리써치 코포레이션 보우 제어와 마스크 선택도 사이의 균형 (balance) 을 달성하기 위한 멀티-상태 펄싱 (multi-state pulsing)
US20230178344A1 (en) * 2020-05-14 2023-06-08 Lam Research Corporation Evaporative cooling of electrostatic chucks
JP2023530125A (ja) * 2020-06-15 2023-07-13 ラム リサーチ コーポレーション Ｒｆ信号のパラメータのパルス化周波数およびデューティサイクルの制御
US12494345B2 (en) * 2020-07-15 2025-12-09 Lam Research Corporation Pulsing RF coils of a plasma chamber in reverse synchronization
US12046450B2 (en) * 2020-09-29 2024-07-23 Lam Research Corporation Synchronization of RF generators
US12387909B2 (en) * 2020-12-08 2025-08-12 Lam Research Corporation Low frequency RF generator and associated electrostatic chuck

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