JP2023553066A5 - - Google Patents
Info
- Publication number
- JP2023553066A5 JP2023553066A5 JP2023534597A JP2023534597A JP2023553066A5 JP 2023553066 A5 JP2023553066 A5 JP 2023553066A5 JP 2023534597 A JP2023534597 A JP 2023534597A JP 2023534597 A JP2023534597 A JP 2023534597A JP 2023553066 A5 JP2023553066 A5 JP 2023553066A5
- Authority
- JP
- Japan
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Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063122659P | 2020-12-08 | 2020-12-08 | |
| US63/122,659 | 2020-12-08 | ||
| US202163164450P | 2021-03-22 | 2021-03-22 | |
| US63/164,450 | 2021-03-22 | ||
| PCT/US2021/058357 WO2022125231A1 (en) | 2020-12-08 | 2021-11-05 | Low frequency rf generator and associated electrostatic chuck |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2023553066A JP2023553066A (ja) | 2023-12-20 |
| JP2023553066A5 true JP2023553066A5 (https=) | 2024-11-01 |
| JPWO2022125231A5 JPWO2022125231A5 (https=) | 2024-11-01 |
| JP7842759B2 JP7842759B2 (ja) | 2026-04-08 |
Family
ID=81974772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023534597A Active JP7842759B2 (ja) | 2020-12-08 | 2021-11-05 | 低周波ｒｆ発生器および関連する静電チャック |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US12387909B2 (https=) |
| JP (1) | JP7842759B2 (https=) |
| KR (1) | KR20230114184A (https=) |
| WO (1) | WO2022125231A1 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12609283B2 (en) * | 2020-06-15 | 2026-04-21 | Lam Research Corporation | Control of pulsing frequencies and duty cycles of parameters of RF signals |
| WO2022103765A1 (en) * | 2020-11-13 | 2022-05-19 | Lam Research Corporation | Systems and methods for radiofrequency signal generator-based control of impedance matching system |
| KR20230107477A (ko) * | 2020-11-18 | 2023-07-17 | 램 리써치 코포레이션 | 임피던스 매칭을 위한 균일도 제어 회로 |
| JP7560214B2 (ja) * | 2021-03-11 | 2024-10-02 | 東京エレクトロン株式会社 | 着火方法及びプラズマ処理装置 |
| JP7374961B2 (ja) * | 2021-07-27 | 2023-11-07 | 株式会社Kokusai Electric | 半導体装置の製造方法、基板処理方法、基板処理装置、およびプログラム |
| JP2025508379A (ja) * | 2022-02-18 | 2025-03-26 | ラム リサーチ コーポレーション | 中心周波数同調のためのシステムおよび方法 |
| JP7577093B2 (ja) * | 2022-06-29 | 2024-11-01 | 東京エレクトロン株式会社 | プラズマ処理システムおよびプラズマ処理方法 |
| CN119998917A (zh) * | 2022-09-28 | 2025-05-13 | 应用材料公司 | 用于等离子体处理系统的宽带供应电路系统 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011525682A (ja) * | 2008-05-14 | 2011-09-22 | アプライド マテリアルズ インコーポレイテッド | Ｒｆ電力供給のための時間分解チューニングスキームを利用したパルス化プラズマ処理の方法及び装置 |
| US8040068B2 (en) * | 2009-02-05 | 2011-10-18 | Mks Instruments, Inc. | Radio frequency power control system |
| US10283330B2 (en) * | 2016-07-25 | 2019-05-07 | Lam Research Corporation | Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators |
| US11367597B2 (en) | 2018-07-05 | 2022-06-21 | Samsung Electronics Co., Ltd. | Electrostatic chuck and plasma processing apparatus including the same |
| KR102650167B1 (ko) * | 2018-07-05 | 2024-03-22 | 삼성전자주식회사 | 정전 척 및 그를 포함하는 플라즈마 처리 장치 |
| US10854427B2 (en) * | 2018-08-30 | 2020-12-01 | Applied Materials, Inc. | Radio frequency (RF) pulsing impedance tuning with multiplier mode |
| US12300473B2 (en) * | 2019-03-08 | 2025-05-13 | Applied Materials, Inc. | Electrostatic chuck for high bias radio frequency (RF) power application in a plasma processing chamber |
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2021
- 2021-11-05 KR KR1020227045355A patent/KR20230114184A/ko active Pending
- 2021-11-05 US US18/011,062 patent/US12387909B2/en active Active
- 2021-11-05 WO PCT/US2021/058357 patent/WO2022125231A1/en not_active Ceased
- 2021-11-05 JP JP2023534597A patent/JP7842759B2/ja active Active