JP2023522345A - 接着層を含む二次電池用分離膜、及び前記分離膜の製造方法 - Google Patents
接着層を含む二次電池用分離膜、及び前記分離膜の製造方法 Download PDFInfo
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- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
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Abstract
Description
水に高密度粒子としてアルミナ(Al2O3、D50:500m、密度:4g/cm3)及び低密度粒子としてAl(OH)3(D50:800nm、密度:2.4g/cm3)を投入し、バインダー樹脂としてスチレンアクリレート(ゲル含有量98%、pH3、粒径(D50:380nm))を投入し、ペイントシェーカー(タングステンビーズ)を用いて2時間撹拌して分散させることにより、固形分濃度30wt%の無機物コーティング層形成用スラリーを準備した。前記高密度粒子、低密度粒子及びバインダーの含有量比は35:35:30の比率(wt%)であった。前記スラリーをバーコーターを用いて分離膜基材(ポリエチレン、東レ社製、厚さ9μm、通気時間90秒/100cc)に塗布し、約80℃~90℃の温度条件で乾燥させて分離膜を得た。
水に高密度粒子としてアルミナ(Al2O3、D50:500m、密度:4g/cm3)及び低密度粒子としてAl(OH)3(D50:800nm、密度:2.4g/cm3)を投入し、バインダー樹脂としてスチレンアクリレート(ゲル含有量98%、pH3、D50380nm、密度:1.02g/cm3)を投入し、ペイントシェーカー(タングステンビーズ)を用いて2時間撹拌して分散させることにより、固形分濃度30wt%の無機物コーティング層形成用スラリーを準備した。前記高密度粒子、低密度粒子及びバインダーの含有量比は、25:45:30の比率(wt%)であった。前記スラリーをバーコーターを用いて分離膜基材(ポリエチレン、東レ社製、厚さ9μm、通気時間90秒/100cc)に塗布し、約80℃~90℃の温度条件で乾燥させて分離膜を得た。
水に高密度粒子としてアルミナ(Al2O3、D50:500m、密度:4g/cm3)及び低密度粒子としてAl(OH)3(D50:800nm、密度:2.4g/cm3)を投入し、バインダー樹脂としてスチレンアクリレート(ゲル含有量98%、pH3、粒径(D50)380nm、密度:1.02g/cm3)を投入し、ペイントシェーカー(タングステンビーズ)を用いて2時間撹拌して分散させることにより、固形分濃度30wt%の無機物コーティング層形成用スラリーを準備した。前記高密度粒子、低密度粒子及びバインダーの含有量比は、15:55:30の比率(wt%)であった。前記スラリーをバーコーターを用いて分離膜基材(ポリエチレン、東レ社製、厚さ9μm、通気時間90秒/100cc)に塗布し、約80℃~90℃の温度条件で乾燥させて分離膜を得た。
水に高密度粒子としてアルミナ(Al2O3、D50:500m、密度:4g/cm3)及び低密度粒子としてAlOOH(D50:200~300nm、密度:3g/cm3)を投入し、バインダー樹脂としてスチレンアクリレート(ゲル含有量98%、pH3、粒径(D50)380nm、密度:1.02g/cm3)を投入し、ペイントシェーカー(タングステンビーズ)を用いて2時間撹拌して分散させることにより、固形分濃度30wt%の無機物コーティング層形成用スラリーを準備した。前記高密度粒子、低密度粒子及びバインダーの含有量比は、15:55:30の比率(wt%)であった。前記スラリーをバーコーターを用いて分離膜基材(ポリエチレン、東レ社製、厚さ9μm、通気時間90秒/100cc)に塗布し、約80℃~90℃の温度条件で乾燥させて分離膜を得た。
水にアルミナ(Al2O3、D50:500m、密度:4g/cm3)及びスチレンアクリレート(ゲル含有量98%、pH3、粒径(D50)380nm、密度:1.02g/cm3)を投入し、ペイントシェーカー(タングステンビーズ)を用いて2時間撹拌して分散させることにより、固形分濃度30wt%の無機物コーティング層形成用スラリーを準備した。前記無機物粒子及びバインダーの含有量比は、70:30の比率(wt%)であった。前記スラリーをバーコーターを用いて分離膜基材(ポリエチレン、東レ社製、厚さ9μm、通気時間90秒/100cc)に塗布し、約80℃~90℃の温度条件で乾燥させて分離膜を得た。
水にAlOOH(D50:200nm~300m、密度:3g/cm3)及びスチレンアクリレート(ゲル含有量98%、pH3、粒径(D50)380nm、密度:1.02g/cm3)を投入し、ペイントシェーカー(タングステンビーズ)を用いて2時間攪拌して分散させることにより、固形分濃度30wt%の無機物コーティング層形成用スラリーを準備した。前記無機物粒子及びバインダーの含有量比は70:30の比率(wt%)であった。前記スラリーをバーコーターを用いて分離膜基材(ポリエチレン、東レ社製、厚さ9μm、通気時間90秒/100cc)に塗布し、約80℃~90℃の温度条件で乾燥させて分離膜を得た。
水にAl(OH)3(D50:800m、2.4g/cm3)及びスチレンアクリレート(ゲル含有量98%、pH3、粒径(D50)380nm、1.02g/cm3)を投入し、ペイントシェーカー(タングステンビーズ)を用いて2時間撹拌して分散させることにより、固形分濃度30wt%の無機物コーティング層形成用スラリーを準備した。前記無機物粒子及びバインダーの含有量比は70:30の比率(wt%)であった。前記スラリーをバーコーターを用いて分離膜基材(ポリエチレン、東レ社製、厚さ9μm、通気時間90秒/100cc)に塗布し、約80℃~90℃の温度条件で乾燥させて分離膜を得た。
(1)通気時間(ガーレー値)
通気度測定器(製造社:旭精工社、製品名:EG01-55-1MR)を用いて一定圧力(0.05MPa)で100mlの空気が分離膜を通過するのにかかる時間(sec)を測定した。サンプルの左/中/右各1ポイントずつ合計3ポイント測定して平均を記録した。
各実施例及び比較例で得られた分離膜をSUSの間に介在させ、コインセルを製造した。前記コインセルの電解液としては、エチレンカーボネート:エチルメチルカルボネートを1:2(体積比)で混合し、LiPF6を1M濃度で添加した。各コインセルに対して分析装置(VMP3、Bio-Logic Science Instrument)を用いて、25℃で振幅10mV及びスキャン範囲0.1hz~1Mhzの条件で電気化学インピーダンス分光分析結果を介して抵抗を測定した。
各実施例及び比較例で得られた分離膜を5cm×5cmのサイズに裁断して試験片を製作し、これをそれぞれ150℃の条件で0.5時間(hr)維持した後、収縮した長さを最初の長さと比較した。TD及びMD方向は、分離膜基材を基準とした。
Claims (11)
- 多孔性の分離膜基材、及び前記分離膜基材の少なくとも一つの側面に形成された無機物コーティング層を含み、
前記無機物コーティング層は、高密度無機物粒子、低密度無機物粒子及び粒子状バインダー樹脂を含み、
前記高密度無機物粒子に対する前記バインダー樹脂の密度(バインダー樹脂密度/高密度無機物粒子)の比は、0.2以上0.33未満であり、前記低密度無機物粒子に対する前記バインダー樹脂の密度(バインダー樹脂密度/低密度無機物粒子の密度)の比は、0.33以上0.5以下である、電気化学素子用分離膜。 - 前記無機物コーティング層は、分離膜基材に近い第1層、前記第1層の表面に形成された第2層、及び前記第2層の表面に形成された電極接着部を含み、前記第1層は、高密度無機物粒子の含有量が最も高く、前記第2層は、前記低密度無機物粒子の含有量が最も高く、電極接着部は、前記粒子状バインダー樹脂の含有量が最も高い、請求項1に記載の電気化学素子用分離膜。
- 前記無機物コーティング層は、前記高密度無機物粒子、低密度無機物粒子及び粒子状バインダー樹脂の間に形成された間隙容量によって形成された気孔による多孔性特性を有する、請求項1または2に記載の電気化学素子用分離膜。
- 前記粒子状バインダー樹脂は、粒径(D50)が300nm~500nmである、請求項1から3のいずれか一項に記載の電気化学素子用分離膜。
- 前記低密度無機物粒子は、粒径(D50)が500nm~1,000nmの範囲から選択され、前記高密度無機物粒子は、粒径(D50)が300nm~700nmの範囲から選択されるものであって、前記低密度粒子の粒径(D50)に比べて高密度粒子の粒径(D50)がさらに小さい、請求項1から4のいずれか一項に記載の電気化学素子用分離膜。
- 前記粒子状バインダー樹脂がアクリル系バインダー樹脂を含む、請求項1から5のいずれか一項に記載の電気化学素子用分離膜。
- 前記低密度無機物粒子は、水酸化アルミニウム(Al(OH)3)及びMg(OH)2の中から選択された1種以上を含む、請求項1から6のいずれか一項に記載の電気化学素子用分離膜。
- 前記高密度無機物粒子は、ベーマイト(AlOOH)、アルミナ(Al2O3)及びBaTiO3の中から選択された1種以上を含む、請求項1から7のいずれか一項に記載の電気化学素子用分離膜。
- 前記無機物コーティング層における無機物粒子100wt%に対する低密度粒子の含有量は40wt%~80wt%である、請求項1から8のいずれか一項に記載の電気化学素子用分離膜。
- 請求項1から9のいずれか一項に記載の分離膜を製造する方法であって、
前記分離膜の製造方法は、
分離膜基材のいずれか一つの側面に無機物コーティング層形成用水系スラリーを塗布し、乾燥させる方法を含み、
前記水系スラリーは、前記粒子状バインダー樹脂、低密度無機物粒子及び高密度無機物粒子を含み、
溶媒として水を用いるものであり、
前記水系スラリーの塗布後に乾燥する間に沈降速度の差によって第1層/第2層/電極接着部が形成されて最終的に得られる分離膜の無機物コーティング層は、3層構造を示すものである、電気化学素子用分離膜の製造方法。 - 前記水系スラリーの粘度が100cp以下である、請求項10に記載の電気化学素子用分離膜の製造方法。
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