JP2023507602A5 - - Google Patents
Info
- Publication number
- JP2023507602A5 JP2023507602A5 JP2022537644A JP2022537644A JP2023507602A5 JP 2023507602 A5 JP2023507602 A5 JP 2023507602A5 JP 2022537644 A JP2022537644 A JP 2022537644A JP 2022537644 A JP2022537644 A JP 2022537644A JP 2023507602 A5 JP2023507602 A5 JP 2023507602A5
- Authority
- JP
- Japan
- Prior art keywords
- hollow cathode
- plasma source
- cathode plasma
- polymer substrate
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP19217863 | 2019-12-19 | ||
| EP19217863.0 | 2019-12-19 | ||
| PCT/EP2020/087042 WO2021123183A1 (en) | 2019-12-19 | 2020-12-18 | Silicon oxide coated polymer films and low pressure pecvd methods for producing the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023507602A JP2023507602A (ja) | 2023-02-24 |
| JP2023507602A5 true JP2023507602A5 (https=) | 2025-02-12 |
| JP7730328B2 JP7730328B2 (ja) | 2025-08-27 |
Family
ID=68965802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022537644A Active JP7730328B2 (ja) | 2019-12-19 | 2020-12-18 | 酸化ケイ素被覆ポリマーフィルム及びそれを製造するための低圧ｐｅｃｖｄ方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20230054056A1 (https=) |
| EP (1) | EP4077762A1 (https=) |
| JP (1) | JP7730328B2 (https=) |
| CN (1) | CN114829670B (https=) |
| WO (1) | WO2021123183A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4565727A1 (en) * | 2022-08-04 | 2025-06-11 | AGC Glass Europe | Decoratively coated polymer substrates and process for obtaining the same |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5147826A (en) * | 1990-08-06 | 1992-09-15 | The Pennsylvania Research Corporation | Low temperature crystallization and pattering of amorphous silicon films |
| FR2701492B1 (fr) * | 1993-02-10 | 1996-05-10 | Univ Lille Sciences Tech | Procédé pour déposer une couche mince sur un substrat par plasma froid différé d'azote. |
| US5888593A (en) * | 1994-03-03 | 1999-03-30 | Monsanto Company | Ion beam process for deposition of highly wear-resistant optical coatings |
| US6444945B1 (en) * | 2001-03-28 | 2002-09-03 | Cp Films, Inc. | Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source |
| DE60238979D1 (de) * | 2001-04-20 | 2011-03-03 | Gen Plasma Inc | Penningentladungsplasmaquelle |
| US7411352B2 (en) * | 2002-09-19 | 2008-08-12 | Applied Process Technologies, Inc. | Dual plasma beam sources and method |
| WO2008045226A1 (en) * | 2006-10-06 | 2008-04-17 | Dow Global Technologies Inc. | Plasma-enhanced chemical vapor deposition coating process |
| WO2009036308A1 (en) * | 2007-09-12 | 2009-03-19 | Sub-One Technology | Hybrid photovoltaically active layer and method for forming such a layer |
| EP2316252B1 (en) * | 2008-08-04 | 2018-10-31 | AGC Flat Glass North America, Inc. | Plasma source and method for depositing thin film coatings using plasma enhanced chemical vapor deposition and method thereof |
| BE1019991A3 (fr) | 2011-05-25 | 2013-03-05 | Agc Glass Europe | Procede de depot de couches sur un substrat verrier par pecvd a faible pression. |
| US9431218B2 (en) * | 2013-03-15 | 2016-08-30 | Tokyo Electron Limited | Scalable and uniformity controllable diffusion plasma source |
| JP2017105643A (ja) * | 2014-04-24 | 2017-06-15 | 旭硝子株式会社 | 被膜付きガラス基板および被膜付きガラス基板の製造方法 |
| BR112017011770A2 (pt) | 2014-12-05 | 2017-12-26 | Agc Flat Glass Na Inc | fonte de plasma que utiliza um revestimento de redução de macro partícula e método de usar a fonte de plasma que utiliza um revestimento de redução de macro partícula para a deposição de revestimentos de filme fino e modificação de superfícies |
| EA201791234A1 (ru) * | 2014-12-05 | 2017-11-30 | Эй-Джи-Си Гласс Юроуп, С.А. | Плазменный источник с полым катодом |
| US10246772B2 (en) * | 2015-04-01 | 2019-04-02 | Applied Materials, Inc. | Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices |
| US9721765B2 (en) * | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
| EP3899086A1 (en) * | 2018-12-21 | 2021-10-27 | AGC Glass Europe | Method for coating metal |
| US20240279811A1 (en) * | 2021-02-12 | 2024-08-22 | Agc Glass Europe | Method of producing a water repellent coating onto textile substrates using a plasma generated by hollow cathodes |
-
2020
- 2020-12-18 EP EP20838006.3A patent/EP4077762A1/en active Pending
- 2020-12-18 JP JP2022537644A patent/JP7730328B2/ja active Active
- 2020-12-18 WO PCT/EP2020/087042 patent/WO2021123183A1/en not_active Ceased
- 2020-12-18 US US17/787,286 patent/US20230054056A1/en active Pending
- 2020-12-18 CN CN202080088728.8A patent/CN114829670B/zh active Active
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