JP2023507602A5 - - Google Patents

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Publication number
JP2023507602A5
JP2023507602A5 JP2022537644A JP2022537644A JP2023507602A5 JP 2023507602 A5 JP2023507602 A5 JP 2023507602A5 JP 2022537644 A JP2022537644 A JP 2022537644A JP 2022537644 A JP2022537644 A JP 2022537644A JP 2023507602 A5 JP2023507602 A5 JP 2023507602A5
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JP
Japan
Prior art keywords
hollow cathode
plasma source
cathode plasma
polymer substrate
linear
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JP2022537644A
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English (en)
Japanese (ja)
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JP7730328B2 (ja
JP2023507602A (ja
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Priority claimed from PCT/EP2020/087042 external-priority patent/WO2021123183A1/en
Publication of JP2023507602A publication Critical patent/JP2023507602A/ja
Publication of JP2023507602A5 publication Critical patent/JP2023507602A5/ja
Application granted granted Critical
Publication of JP7730328B2 publication Critical patent/JP7730328B2/ja
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JP2022537644A 2019-12-19 2020-12-18 酸化ケイ素被覆ポリマーフィルム及びそれを製造するための低圧ｐｅｃｖｄ方法 Active JP7730328B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP19217863 2019-12-19
EP19217863.0 2019-12-19
PCT/EP2020/087042 WO2021123183A1 (en) 2019-12-19 2020-12-18 Silicon oxide coated polymer films and low pressure pecvd methods for producing the same

Publications (3)

Publication Number Publication Date
JP2023507602A JP2023507602A (ja) 2023-02-24
JP2023507602A5 true JP2023507602A5 (enExample) 2025-02-12
JP7730328B2 JP7730328B2 (ja) 2025-08-27

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JP2022537644A Active JP7730328B2 (ja) 2019-12-19 2020-12-18 酸化ケイ素被覆ポリマーフィルム及びそれを製造するための低圧ｐｅｃｖｄ方法

Country Status (5)

Country Link
US (1) US12662735B2 (enExample)
EP (1) EP4077762A1 (enExample)
JP (1) JP7730328B2 (enExample)
CN (1) CN114829670B (enExample)
WO (1) WO2021123183A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119630832A (zh) * 2022-08-04 2025-03-14 旭硝子欧洲玻璃公司 装饰性涂覆的聚合物基材及其获得方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5147826A (en) * 1990-08-06 1992-09-15 The Pennsylvania Research Corporation Low temperature crystallization and pattering of amorphous silicon films
FR2701492B1 (fr) * 1993-02-10 1996-05-10 Univ Lille Sciences Tech Procédé pour déposer une couche mince sur un substrat par plasma froid différé d'azote.
US5888593A (en) * 1994-03-03 1999-03-30 Monsanto Company Ion beam process for deposition of highly wear-resistant optical coatings
US6444945B1 (en) * 2001-03-28 2002-09-03 Cp Films, Inc. Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
WO2002086932A1 (en) * 2001-04-20 2002-10-31 Applied Process Technologies Magnetic mirror plasma source
DE10153760A1 (de) * 2001-10-31 2003-05-22 Fraunhofer Ges Forschung Verfahren zur Herstellung einer UV-absorbierenden transparenten Abriebschutzschicht
US7411352B2 (en) * 2002-09-19 2008-08-12 Applied Process Technologies, Inc. Dual plasma beam sources and method
WO2008045226A1 (en) * 2006-10-06 2008-04-17 Dow Global Technologies Inc. Plasma-enhanced chemical vapor deposition coating process
WO2009036308A1 (en) * 2007-09-12 2009-03-19 Sub-One Technology Hybrid photovoltaically active layer and method for forming such a layer
KR101602517B1 (ko) * 2008-08-04 2016-03-10 에이지씨 플랫 글래스 노스 아메리카, 인코퍼레이티드 Ｐｅｃｖｄ를 이용한 박막 코팅을 증착하기 위한 플라즈마 소스 및 방법
US20100024729A1 (en) * 2008-08-04 2010-02-04 Xinmin Cao Methods and apparatuses for uniform plasma generation and uniform thin film deposition
BE1019991A3 (fr) * 2011-05-25 2013-03-05 Agc Glass Europe Procede de depot de couches sur un substrat verrier par pecvd a faible pression.
US9431218B2 (en) * 2013-03-15 2016-08-30 Tokyo Electron Limited Scalable and uniformity controllable diffusion plasma source
JP2017105643A (ja) * 2014-04-24 2017-06-15 旭硝子株式会社 被膜付きガラス基板および被膜付きガラス基板の製造方法
MX2017007356A (es) * 2014-12-05 2018-04-11 Agc Flat Glass Europe S A Fuente de plasma del catodo hueco.
ES2900321T3 (es) * 2014-12-05 2022-03-16 Agc Flat Glass Na Inc Fuente de plasma que utiliza un recubrimiento de reducción de macropartículas y procedimiento para usar una fuente de plasma que utiliza un recubrimiento de reducción de macropartículas para la deposición de recubrimientos de película delgada y modificación de superficies
US10246772B2 (en) * 2015-04-01 2019-04-02 Applied Materials, Inc. Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices
US9721765B2 (en) * 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
CN113366141A (zh) * 2018-12-21 2021-09-07 旭硝子欧洲玻璃公司 用于金属涂层的方法
CN116806279B (zh) * 2021-02-12 2026-05-05 旭硝子欧洲玻璃公司 使用由空心阴极产生的等离子体在纺织品基材上产生防水涂层的方法

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