JP2023505437A5 - - Google Patents
Info
- Publication number
- JP2023505437A5 JP2023505437A5 JP2022532673A JP2022532673A JP2023505437A5 JP 2023505437 A5 JP2023505437 A5 JP 2023505437A5 JP 2022532673 A JP2022532673 A JP 2022532673A JP 2022532673 A JP2022532673 A JP 2022532673A JP 2023505437 A5 JP2023505437 A5 JP 2023505437A5
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- light beam
- path
- imaging camera
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962943170P | 2019-12-03 | 2019-12-03 | |
| US62/943,170 | 2019-12-03 | ||
| US17/106,046 | 2020-11-27 | ||
| US17/106,046 US11397153B2 (en) | 2019-12-03 | 2020-11-27 | Apparatus and method for gray field imaging |
| PCT/US2020/062759 WO2021113273A1 (en) | 2019-12-03 | 2020-12-01 | Apparatus and method for gray field imaging |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023505437A JP2023505437A (ja) | 2023-02-09 |
| JP2023505437A5 true JP2023505437A5 (https=) | 2023-09-12 |
| JP7592088B2 JP7592088B2 (ja) | 2024-11-29 |
Family
ID=76092124
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022532673A Active JP7592088B2 (ja) | 2019-12-03 | 2020-12-01 | グレイ視野撮像装置及び方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US11397153B2 (https=) |
| JP (1) | JP7592088B2 (https=) |
| KR (1) | KR102914290B1 (https=) |
| CN (1) | CN114746739B (https=) |
| TW (1) | TW202127093A (https=) |
| WO (1) | WO2021113273A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20240020346A (ko) * | 2022-08-05 | 2024-02-15 | 삼성디스플레이 주식회사 | 포토마스크 장치 및 이를 이용한 포토마스크 검사 방법 |
| US20260023325A1 (en) * | 2024-07-17 | 2026-01-22 | Applied Materials, Inc. | Digital lithography apparatus with imaging device positioned to mitigate moire effect |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6882417B2 (en) | 2002-03-21 | 2005-04-19 | Applied Materials, Inc. | Method and system for detecting defects |
| US7525659B2 (en) * | 2003-01-15 | 2009-04-28 | Negevtech Ltd. | System for detection of water defects |
| JP2005070477A (ja) | 2003-08-26 | 2005-03-17 | Yokogawa Electric Corp | 焦点移動機構およびそれを用いた光学顕微鏡 |
| US7239389B2 (en) | 2004-07-29 | 2007-07-03 | Applied Materials, Israel, Ltd. | Determination of irradiation parameters for inspection of a surface |
| US7400390B2 (en) * | 2004-11-29 | 2008-07-15 | Applied Materials, Israel, Ltd. | Inspection system and a method for aerial reticle inspection |
| JP2007024758A (ja) | 2005-07-20 | 2007-02-01 | Tokyo Seimitsu Co Ltd | 光学式検査装置及びその照明方法 |
| JP5639169B2 (ja) * | 2009-07-22 | 2014-12-10 | ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ | 暗視野検査システムおよび暗視野検査システムを構成する方法 |
| KR20120043850A (ko) | 2010-10-27 | 2012-05-07 | 삼성전자주식회사 | 레이저 광학계 및 이를 가지는 리페어 장치 및 방법 |
| WO2013011508A2 (en) | 2011-07-19 | 2013-01-24 | Nova Measuring Instruments Ltd. | Optical system and method for measuring in patterned stuctures |
| RU2509718C1 (ru) * | 2012-08-07 | 2014-03-20 | Корпорация "САМСУНГ ЭЛЕКТРОНИКС Ко., Лтд." | Оптическая измерительная система и способ измерения критического размера |
| US9696264B2 (en) * | 2013-04-03 | 2017-07-04 | Kla-Tencor Corporation | Apparatus and methods for determining defect depths in vertical stack memory |
| US9891175B2 (en) * | 2015-05-08 | 2018-02-13 | Kla-Tencor Corporation | System and method for oblique incidence scanning with 2D array of spots |
| JP6640482B2 (ja) * | 2015-07-31 | 2020-02-05 | 株式会社ニューフレアテクノロジー | パターン検査装置及びパターン検査方法 |
| US9874526B2 (en) * | 2016-03-28 | 2018-01-23 | Kla-Tencor Corporation | Methods and apparatus for polarized wafer inspection |
| US10887580B2 (en) | 2016-10-07 | 2021-01-05 | Kla-Tencor Corporation | Three-dimensional imaging for semiconductor wafer inspection |
| KR102027986B1 (ko) * | 2017-04-13 | 2019-10-04 | 재단법인 경북아이티융합 산업기술원 | 비전 카메라를 이용한 비드 인식 장치 및 그 방법 |
| KR102368435B1 (ko) | 2017-07-28 | 2022-03-02 | 삼성전자주식회사 | 기판 검사 장치, 기판 검사 방법 및 이를 이용한 반도체 소자의 제조 방법 |
-
2020
- 2020-11-27 US US17/106,046 patent/US11397153B2/en active Active
- 2020-12-01 CN CN202080083596.XA patent/CN114746739B/zh active Active
- 2020-12-01 KR KR1020227022760A patent/KR102914290B1/ko active Active
- 2020-12-01 JP JP2022532673A patent/JP7592088B2/ja active Active
- 2020-12-01 WO PCT/US2020/062759 patent/WO2021113273A1/en not_active Ceased
- 2020-12-03 TW TW109142605A patent/TW202127093A/zh unknown
-
2022
- 2022-06-22 US US17/846,187 patent/US11965835B2/en active Active
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