JP2023159385A5 - - Google Patents

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Publication number
JP2023159385A5
JP2023159385A5 JP2023137339A JP2023137339A JP2023159385A5 JP 2023159385 A5 JP2023159385 A5 JP 2023159385A5 JP 2023137339 A JP2023137339 A JP 2023137339A JP 2023137339 A JP2023137339 A JP 2023137339A JP 2023159385 A5 JP2023159385 A5 JP 2023159385A5
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JP
Japan
Prior art keywords
isomers
hcfc
hfc
hcfo
chloro
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2023137339A
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English (en)
Japanese (ja)
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JP2023159385A (ja
Filing date
Publication date
Priority claimed from US15/864,730 external-priority patent/US10351494B1/en
Application filed filed Critical
Publication of JP2023159385A publication Critical patent/JP2023159385A/ja
Priority to JP2026000183A priority Critical patent/JP2026053693A/ja
Publication of JP2023159385A5 publication Critical patent/JP2023159385A5/ja
Withdrawn legal-status Critical Current

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JP2023137339A 2018-01-08 2023-08-25 １２３４ｙｆに対する２４４ｂｂの脱塩化水素化中の不純物の形成を低減するためのシステム及び方法 Withdrawn JP2023159385A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2026000183A JP2026053693A (ja) 2018-01-08 2026-01-05 １２３４ｙｆに対する２４４ｂｂの脱塩化水素化中の不純物の形成を低減するためのシステム及び方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US15/864,730 US10351494B1 (en) 2018-01-08 2018-01-08 Systems and methods for reducing the formation of impurities during 244bb dehydrochlorination to 1234yf
US15/864,730 2018-01-08
PCT/US2019/012619 WO2019136410A1 (en) 2018-01-08 2019-01-08 SYSTEMS AND METHODS FOR REDUCING THE FORMATION OF IMPURITIES DURING 244bb DEHYDROCHLORINATION TO 1234yf
JP2020537197A JP7340523B2 (ja) 2018-01-08 2019-01-08 １２３４ｙｆに対する２４４ｂｂの脱塩化水素化中の不純物の形成を低減するためのシステム及び方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2020537197A Division JP7340523B2 (ja) 2018-01-08 2019-01-08 １２３４ｙｆに対する２４４ｂｂの脱塩化水素化中の不純物の形成を低減するためのシステム及び方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2026000183A Division JP2026053693A (ja) 2018-01-08 2026-01-05 １２３４ｙｆに対する２４４ｂｂの脱塩化水素化中の不純物の形成を低減するためのシステム及び方法

Publications (2)

Publication Number Publication Date
JP2023159385A JP2023159385A (ja) 2023-10-31
JP2023159385A5 true JP2023159385A5 (OSRAM) 2026-02-18

Family

ID=67140488

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2020537197A Active JP7340523B2 (ja) 2018-01-08 2019-01-08 １２３４ｙｆに対する２４４ｂｂの脱塩化水素化中の不純物の形成を低減するためのシステム及び方法
JP2023137339A Withdrawn JP2023159385A (ja) 2018-01-08 2023-08-25 １２３４ｙｆに対する２４４ｂｂの脱塩化水素化中の不純物の形成を低減するためのシステム及び方法
JP2026000183A Pending JP2026053693A (ja) 2018-01-08 2026-01-05 １２３４ｙｆに対する２４４ｂｂの脱塩化水素化中の不純物の形成を低減するためのシステム及び方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2020537197A Active JP7340523B2 (ja) 2018-01-08 2019-01-08 １２３４ｙｆに対する２４４ｂｂの脱塩化水素化中の不純物の形成を低減するためのシステム及び方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2026000183A Pending JP2026053693A (ja) 2018-01-08 2026-01-05 １２３４ｙｆに対する２４４ｂｂの脱塩化水素化中の不純物の形成を低減するためのシステム及び方法

Country Status (12)

Country Link
US (1) US10351494B1 (OSRAM)
EP (2) EP4692032A2 (OSRAM)
JP (3) JP7340523B2 (OSRAM)
KR (3) KR102699994B1 (OSRAM)
CN (3) CN111699168A (OSRAM)
DK (1) DK3737660T3 (OSRAM)
ES (1) ES3054194T3 (OSRAM)
FI (1) FI3737660T3 (OSRAM)
MX (3) MX2020007042A (OSRAM)
PT (1) PT3737660T (OSRAM)
RS (1) RS67524B1 (OSRAM)
WO (1) WO2019136410A1 (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10351494B1 (en) * 2018-01-08 2019-07-16 Honeywell International Inc. Systems and methods for reducing the formation of impurities during 244bb dehydrochlorination to 1234yf
LT4400489T (lt) * 2020-02-07 2025-11-10 Kompozicijos, apimančios 2,3,3,3 tetrafluorpropeną, ir kompozicijų gamybos bei panaudojimo būdai
CN116375555B (zh) * 2022-09-22 2025-07-08 浙江埃克盛化工有限公司 一种使用CH4和C2CL2F4为原料联产R244bb和R1234yf的工艺

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8058486B2 (en) 2004-04-29 2011-11-15 Honeywell International Inc. Integrated process to produce 2,3,3,3-tetrafluoropropene
US8766020B2 (en) 2008-07-31 2014-07-01 Honeywell International Inc. Process for producing 2,3,3,3-tetrafluoropropene
US8034251B2 (en) 2007-01-03 2011-10-11 Honeywell International Inc. Azeotropic compositions of 2-chloro-3,3,3-trifluoropropene (HCFC-1233xf), 2-chloro-1,1,1,2-tetrafluoropropane (HCFC-244bb), and hydrogen fluoride (HF)
WO2009105517A2 (en) * 2008-02-21 2009-08-27 E. I. Du Pont De Nemours And Company Azeotrope compositions comprising 3,3,3-trifluoropropene and hydrogen fluoride and processes for separation thereof
KR101937117B1 (ko) * 2008-02-21 2019-01-09 이 아이 듀폰 디 네모아 앤드 캄파니 공비 증류에 의한 플루오르화수소로부터의 1,3,3,3-테트라플루오로프로펜의 분리 방법
CN101952230B (zh) * 2008-02-21 2015-07-22 纳幕尔杜邦公司 通过共沸蒸馏使2,3,3,3-四氟丙烯与氟化氢分离的方法
US7803283B2 (en) 2008-03-31 2010-09-28 Honeywell Internationl Inc. Azeotrope-like compositions of 2-chloro-3,3,3-trifluoropropene (HCFC-1233xf) and 2-chloro-1,1,1,2-tetrafluoropropane (HCFC-244bb)
US8845921B2 (en) 2008-04-09 2014-09-30 Honeywell International Inc. Separation of close boiling compounds by addition of a third compound
GB0806389D0 (en) * 2008-04-09 2008-05-14 Ineos Fluor Holdings Ltd Process
DK2634231T3 (da) * 2008-05-07 2022-09-19 Chemours Co Fc Llc Sammensætninger
US8168837B2 (en) * 2008-05-15 2012-05-01 Honeywell International Inc. Process for separating hydrogen fluoride from organic feedstocks
US8975454B2 (en) * 2008-07-31 2015-03-10 Honeywell International Inc. Process for producing 2,3,3,3-tetrafluoropropene
US9890096B2 (en) 2011-01-19 2018-02-13 Honeywell International Inc. Methods of making 2,3,3,3-tetrafluoro-2-propene
EP2812298A4 (en) 2012-02-10 2015-09-16 Haiyou Wang IMPROVED PROCESS FOR PRODUCING 2,3,3,3-TETRAFLUOROPROPENE
CN105026350A (zh) * 2013-03-13 2015-11-04 霍尼韦尔国际公司 分级氟化方法和反应器系统
EP2970058B1 (en) * 2013-03-15 2023-12-13 Honeywell International Inc. Method for the removal of halogenated ethylene impuritites form a fluoroolefin mixture
US9334206B2 (en) 2013-03-15 2016-05-10 Honeywell International Inc. Integrated process to produce 2,3,3,3-tetrafluoropropene
JP5825299B2 (ja) * 2013-07-12 2015-12-02 ダイキン工業株式会社 ２，３，３，３−テトラフルオロプロペンの製造方法
GB2528690B (en) * 2014-07-28 2017-03-01 Mexichem Amanco Holding Sa Process for preparing a (hydro)(chloro)fluoroalkene
GB201512510D0 (en) 2015-07-17 2015-08-19 Mexichem Fluor Sa De Cv Process
JP6971226B2 (ja) 2015-10-15 2021-11-24 ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. 脱ハロゲン化水素化反応器及び方法
GB2547277A (en) 2016-02-15 2017-08-16 Mexichem Fluor Sa De Cv Process
US10351494B1 (en) * 2018-01-08 2019-07-16 Honeywell International Inc. Systems and methods for reducing the formation of impurities during 244bb dehydrochlorination to 1234yf

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