JP2023126710A - ウェルプレート及びそれを備える3次元細胞培養プレート - Google Patents
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Abstract
Description
ii)幹細胞を製造するためのハイドロゲルを含まない3次元細胞培養プレートを準備する工程と、
iii)前記培養された細胞を、前記ハイドロゲルを含まない3次元細胞培養プレートで幹細胞にリプログラミングさせる工程と、
iv)前記リプログラミングされた幹細胞のスフェロイド(spheroid)を形成する工程と、
v)継代培養のためにハイドロゲルを含まない3次元細胞培養プレートを準備する工程と、
vi)前記スフェロイドを分離し、ハイドロゲルを含まない3次元細胞培養プレートで1回以上継代培養する工程と、を含む幹細胞増殖方法であって、
前記3次元細胞培養プレートは、
複数個のメインウェル(main well)と、メインウェルのそれぞれの下部に形成され、細胞培養液が注入され、底面に凹部を含む複数個のサブウェル(sub well)とを含むウェルプレート(well plate)と、ウェルプレートを支持するハイコンテントスクリーニング(High contents screening:HCS)用コネクタと、を含み、
前記ハイコンテントスクリーニング(High contents screening:HCS)用コネクタは、ウェルプレートの下端に互いに着脱可能に固定手段が備えられたベースと、ウェルプレートの上部に配置され、ベースと結合されるカバーと、を含み、前記メインウェルは、所定の部位がテーパ状になるように段差が形成され、前記段差は、メインウェルの壁に対して10~60°範囲の傾斜角(θ)を有する。
ウェルプレートを支持するハイコンテントスクリーニング(High contents screening:HCS)用コネクタと、を含み、
前記ハイコンテントスクリーニング(High contents screening:HCS)用コネクタは、ウェルプレートの下端に互いに着脱可能に固定手段が備えられたベースと、ウェルプレートの上部に配置され、ベースと結合されるカバーと、を含み、
前記メインウェルは、所定の部位にテーパ状になるように段差が形成され、前記段差はメインウェルの壁に対して10~60°の範囲の傾斜角(θ)を有する。
101:段差
110:メインウェル
120:サブウェル
121:凹部
130:空間部
140:落とし込み部
200:ハイコンテントスクリーニング用コネクタ
210:ベース
220:カバー
240:凸部
Claims (11)
- 幹細胞の増殖方法であって、
i)細胞を培養する工程と、
ii)幹細胞を製造するためのハイドロゲルを含まない3次元細胞培養プレートを準備する工程と、
iii)前記培養された細胞を、前記ハイドロゲルを含まない3次元細胞培養プレートで幹細胞にリプログラミングさせる工程と、
iv)前記リプログラミングされた幹細胞のスフェロイド(spheroid)を形成する工程と、
v)継代培養のためにハイドロゲルを含まない3次元細胞培養プレートを準備する工程と、
vi)前記スフェロイドを分離し、ハイドロゲルを含まない3次元細胞培養プレートで1回以上継代培養する工程と、を含み、
前記3次元細胞培養プレートは、
複数個のメインウェル(main well)と、前記メインウェルのそれぞれの下部に形成され、細胞培養液が注入され、底面に凹部を含む複数個のサブウェル(sub well)と、を含むウェルプレート(well plate)と、
前記ウェルプレートを支持するハイコンテントスクリーニング(High contents screening:HCS)用コネクタと、を含み、
前記ハイコンテントスクリーニング(High contents screening:HCS)用コネクタは、
前記ウェルプレートの下端に互いに着脱可能に固定手段が備えられたベースと、
前記ウェルプレートの上部に配置され、前記ベースと結合されるカバーと、を含み、
前記メインウェルは、所定の部位がテーパ状になるように段差が形成され、
前記段差は、前記メインウェルの壁に対して10~60°範囲の傾斜角(θ)を有する、
幹細胞の増殖方法。 - 前記細胞は、体細胞又は幹細胞である、請求項1に記載の増殖方法。
- 前記幹細胞は、成体幹細胞、胚性幹細胞、間葉系幹細胞、脂肪幹細胞、造血幹細胞、臍帯血幹細胞及び人工多能性幹細胞からなる群から選択される1種以上である、請求項2に記載の増殖方法。
- 前記ハイドロゲルは、細胞外マトリックスに基づくハイドロゲルである、請求項1に記載の増殖方法。
- 前記細胞外マトリックスに基づくハイドロゲルはマトリゲルである、請求項4に記載の増殖方法。
- 前記継代培養は、1~20世代までの継代培養である、請求項1に記載の増殖方法。
- 前記vi)工程において、前記スフェロイドを単一細胞に分離し、1回以上継代培養するものである、請求項1に記載の増殖方法。
- 前記サブウェルは、前記凹部に向かってテーパ状になるように傾斜面が形成され、
前記サブウェル(120)の上端径は、3.0~4.5mmの範囲であり、
前記凹部(121)の上端径は、0.45~1.5mmの範囲であり、
前記サブウェルと前記凹部の前記傾斜面(θ2)は、40~50°の範囲であり、
前記サブウェルの直径と前記凹部の直径に対する長さの比は、1:0.1~0.5の範囲であることを特徴とする請求項1に記載の増殖方法。 - 前記メインウェルの個々の体積は、100~300μlの範囲であり、
前記凹部の個々の体積は、20~50μlの範囲であり、
前記メインウェルと前記凹部の個々の体積比は、平均1:0.1~0.5であることを特徴とする、請求項1に記載の増殖方法。 - 前記メインウェルは、前記段差と前記サブウェルとの間に空間部を含み、
前記空間部の高さ(ah)は、平均2.0~3.0mmの範囲であり、
前記サブウェルの高さ(bh)は、平均1.0~2.0mmの範囲であり、
前記空間部と前記サブウェルの高さの比(ah:bh)は、1:0.3~1の範囲であることを特徴とする、請求項1に記載の増殖方法。 - 前記細胞は、前記細胞培養プレートの前記サブウェルに100~1000cells/wellで播種されるものである、請求項1に記載の増殖方法。
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