JP2023001192A - 透過型小角x線散乱計量システム - Google Patents
透過型小角x線散乱計量システム Download PDFInfo
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Abstract
Description
本特許出願は、2017年4月14日付米国仮特許出願第62/485497号に基づき米国特許法第119条の規定による優先権を主張する出願であるので、この参照を以てその主題の全容を本願に繰り入れることにする。
Claims (20)
- X線輻射を生成するよう構成されたX線照明源と、
ウェハ表面上に形成された計測ターゲットを前記X線輻射の入射集束ビームで以て照明するよう構成された1つ以上のX線照明光学要素と、
前記入射集束ビームに対して試料である前記計測ターゲットを複数の向きに位置決めする試料位置決めシステムと、
複数の画素を有し、その画素それぞれが最大長の方向に100μm未満のサイズを有し、前記複数の向きの各向きにて前記入射集束ビームに応じ前記計測ターゲットで散乱された輻射のうち複数の回折次数の回折ビームのそれぞれの強度を検出するよう構成されたX線検出器と、
情報処理システムと、
を備え、前記情報処理システムが、
前記複数の向きにおける前記複数の回折次数の回折ビームの強度検出結果に基づき、前記計測ターゲットに係る注目パラメタの値を求めるよう構成された、計量システム。 - 請求項1に記載の計量システムであって、
前記X線検出器は、光子計数型検出器である、計量システム。 - 請求項1に記載の計量システムであって、
前記X線検出器は、積分型検出器である、計量システム。 - 請求項1に記載の計量システムであって、
前記X線照明源と前記X線検出器との間の光路長が3m未満である、計量システム。 - 請求項1に記載の計量システムであって、
前記1つ以上のX線照明光学要素が、前記集束ビームを、前記ウェハ表面より前200mm未満のところ、前記計測ターゲットのところ、前記X線検出器のところ、或いは前記計測ターゲット・前記X線検出器間光路沿いのいずれかの個所に、集束させる計量システム。 - 請求項1に記載の計量システムであって、
前記X線検出器の複数の画素のそれぞれは、前記複数の画素の第1の画素よりも小さい点拡がり関数(PSF)を有し、前記X線検出器に入射する回折ビームのうち前記第1画素の隣にある前記第2画素上に入射する部分が、その回折ビームのうち第1画素上に入射する部分の0.1%未満となる、計量システム。 - 請求項1に記載の計量システムであって、
前記X線検出器の感光素材がテルル化カドミウム、ゲルマニウム、ヒ化ガリウム又はそれらの組合せを含有する、計量システム。 - 請求項7に記載の計量システムであって、
前記感光素材が少なくとも500μm厚である計量システム。 - 請求項1に記載の計量システムであって、
前記X線検出器は、前記X線検出器のそれぞれの画素において複数のエネルギレベル間で補間する、計量システム。 - 請求項1に記載の計量システムであって、
前記X線検出器は、光子の前記X線検出器との相互作用の重心の位置を画素のサイズより小さいサブ画素の分解能で求める、計量システム。 - 請求項1に記載の計量システムであって、
前記回折次数のうち二つ以上の回折ビームが前記X線検出器上で空間的に重なり合い、前記情報処理システムが、更に、
前記重なり合う回折次数それぞれの強度を0次回折次数のビーム形状に基づき求めるよう構成された計量システム。 - ウェハ表面上に形成された計測ターゲットを、X線輻射ビームで以て照明するステップと、
前記入射ビームに応じ前記計測ターゲットで散乱された輻射のうち複数の回折次数の回折ビームの強度をX線検出器で検出するステップであり、前記X線検出器は、複数の画素を有し、その画素それぞれが最大長の方向に100μm未満のサイズを有するステップと、
前記複数の回折次数の強度に基づき、前記計測ターゲットに係る注目パラメタの値を求めるステップと、
を有する方法。 - 請求項12に記載の方法であって、
前記X線検出器は、光子計数型検出器または積分型検出器である、方法。 - 請求項12に記載の方法であって、
前記X線検出器の前記複数の画素のそれぞれが最大長の方向に50μm未満のサイズを有する、方法。 - 請求項12に記載の方法であって、
前記X線照明源と前記X線検出器との間の光路長が3m未満である、方法。 - 請求項12に記載の方法であって、さらに、
前記X線検出器のそれぞれの画素において複数のエネルギレベル間で補間するステップと、
を有する方法。 - X線輻射を生成するよう構成されたX線照明源と、
ウェハ表面上に形成された計測ターゲットを前記X線輻射の入射集束ビームで以て照明するよう構成された1つ以上のX線照明光学要素と、
前記入射集束ビームに対して試料である前記計測ターゲットを複数の向きに位置決めする試料位置決めシステムと、
複数の画素を有し、その画素それぞれが最大長の方向に50μm未満のサイズを有し、各向きにて前記入射集束ビームに応じ前記計測ターゲットで散乱された輻射のうち複数の回折次数の回折ビームのそれぞれの強度を検出するよう構成されたX線検出器と、
非一時的コンピュータ可読媒体と、
を備え、その非一時的コンピュータ可読媒体が、
前記複数の回折次数の強度に基づき、前記計測ターゲットに係る注目パラメタの値を情報処理システムに求めさせるコード、
を有する計量システム。 - 請求項17に記載の計量システムであって、
前記X線検出器は、光子計数型検出器または積分型検出器である、計量システム。 - 請求項17に記載の計量システムであって、
前記X線照明源と前記X線検出器との間の光路長が3m未満である、計量システム。 - 請求項17に記載の計量システムであって、
前記X線検出器は、光子の前記X線検出器との相互作用の重心の位置を画素のサイズより小さいサブ画素の分解能で求める、計量システム。
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TWI783988B (zh) | 2022-11-21 |
EP3593124A4 (en) | 2021-07-07 |
US20180299259A1 (en) | 2018-10-18 |
TW201842353A (zh) | 2018-12-01 |
CN110546489A (zh) | 2019-12-06 |
WO2018191714A1 (en) | 2018-10-18 |
KR20190131129A (ko) | 2019-11-25 |
JP2020516900A (ja) | 2020-06-11 |
KR102580560B1 (ko) | 2023-09-19 |
KR102515242B1 (ko) | 2023-03-29 |
JP7376666B2 (ja) | 2023-11-08 |
US10767978B2 (en) | 2020-09-08 |
EP3593124B1 (en) | 2024-01-10 |
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