JP2022539216A - 荷電粒子のパルス発生器および荷電粒子のパルス発生器を使用するための方法 - Google Patents

荷電粒子のパルス発生器および荷電粒子のパルス発生器を使用するための方法 Download PDF

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Publication number
JP2022539216A
JP2022539216A JP2021578031A JP2021578031A JP2022539216A JP 2022539216 A JP2022539216 A JP 2022539216A JP 2021578031 A JP2021578031 A JP 2021578031A JP 2021578031 A JP2021578031 A JP 2021578031A JP 2022539216 A JP2022539216 A JP 2022539216A
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JP
Japan
Prior art keywords
charged particle
pulse generator
anode
sample
photocathode
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Pending
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JP2021578031A
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English (en)
Japanese (ja)
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JP2022539216A5 (enExample
Inventor
ゲリオック，マリー
ルノー，ジャン－フィリップ
オクセンアンドレール，トマ
Original Assignee
コミサリヤ・ア・レネルジ・アトミク・エ・オ・エネルジ・アルテルナテイブ
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Publication of JP2022539216A publication Critical patent/JP2022539216A/ja
Publication of JP2022539216A5 publication Critical patent/JP2022539216A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2203/00—Electron or ion optical arrangements common to discharge tubes or lamps
    • H01J2203/02—Electron guns
    • H01J2203/0204—Electron guns using cold cathodes, e.g. field emission cathodes
    • H01J2203/0292—Potentials applied to the electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2203/00—Electron or ion optical arrangements common to discharge tubes or lamps
    • H01J2203/04—Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction
    • H01J2237/062—Reducing size of gun
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06333—Photo emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Secondary Cells (AREA)
JP2021578031A 2019-07-02 2020-06-30 荷電粒子のパルス発生器および荷電粒子のパルス発生器を使用するための方法 Pending JP2022539216A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1907324A FR3098341B1 (fr) 2019-07-02 2019-07-02 Generateur pulse de particules chargees electriquement et procede d’utilisation d’un generateur pulse de particules chargees electriquement
FR1907324 2019-07-02
PCT/EP2020/068427 WO2021001383A1 (fr) 2019-07-02 2020-06-30 Generateur pulse de particules chargees electriquement et procede d'utilisation d'un generateur pulse de particules chargees electriquement

Publications (2)

Publication Number Publication Date
JP2022539216A true JP2022539216A (ja) 2022-09-07
JP2022539216A5 JP2022539216A5 (enExample) 2024-11-22

Family

ID=69375384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021578031A Pending JP2022539216A (ja) 2019-07-02 2020-06-30 荷電粒子のパルス発生器および荷電粒子のパルス発生器を使用するための方法

Country Status (6)

Country Link
US (1) US12278082B2 (enExample)
EP (1) EP3994714A1 (enExample)
JP (1) JP2022539216A (enExample)
CA (1) CA3145386A1 (enExample)
FR (1) FR3098341B1 (enExample)
WO (1) WO2021001383A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024114189A (ja) * 2023-02-13 2024-08-23 株式会社荏原製作所 絶縁構造体、静電レンズおよび荷電粒子線装置

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4703228A (en) * 1985-08-28 1987-10-27 Ga Technologies Inc. Apparatus and method for providing a modulated electron beam
JPH03238742A (ja) * 1990-02-16 1991-10-24 Hamamatsu Photonics Kk 光電面利用電子源装置
JPH05128990A (ja) * 1991-11-05 1993-05-25 Hitachi Ltd 荷電粒子銃
JPH06231724A (ja) * 1993-02-02 1994-08-19 Nissin Electric Co Ltd イオン注入装置
JPH09161660A (ja) * 1995-12-06 1997-06-20 Hitachi Ltd 電子線源および電子線装置
JP2014235816A (ja) * 2013-05-31 2014-12-15 独立行政法人物質・材料研究機構 フォトカソード型電子線源、その作成方法及びフォトカソード型電子線源システム
JP2017130334A (ja) * 2016-01-20 2017-07-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置及び荷電粒子ビーム装置の画像形成方法
CN107449792A (zh) * 2017-08-30 2017-12-08 中国科学院西安光学精密机械研究所 一种超紧凑型飞秒电子衍射装置
JP2018137231A (ja) * 2018-03-23 2018-08-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料観察方法、試料台、観察システム、および発光部材

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2075379A (en) 1935-03-13 1937-03-30 Farnsworth Television Inc Time delay oscillator
JPS5842136A (ja) 1981-09-08 1983-03-11 Nec Corp 電子ビ−ム発生装置
DE19627621C2 (de) 1996-07-09 1998-05-20 Bruker Saxonia Analytik Gmbh Ionenmobilitätsspektrometer
DE10245052A1 (de) 2002-09-26 2004-04-08 Leo Elektronenmikroskopie Gmbh Elektronenstrahlquelle und elektronenoptischer Apparat mit einer solchen
WO2010042629A2 (en) 2008-10-09 2010-04-15 California Institute Of Technology 4d imaging in an ultrafast electron microscope
JP6401600B2 (ja) 2014-12-18 2018-10-10 浜松ホトニクス株式会社 ストリーク管及びそれを含むストリーク装置

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4703228A (en) * 1985-08-28 1987-10-27 Ga Technologies Inc. Apparatus and method for providing a modulated electron beam
JPH03238742A (ja) * 1990-02-16 1991-10-24 Hamamatsu Photonics Kk 光電面利用電子源装置
JPH05128990A (ja) * 1991-11-05 1993-05-25 Hitachi Ltd 荷電粒子銃
JPH06231724A (ja) * 1993-02-02 1994-08-19 Nissin Electric Co Ltd イオン注入装置
JPH09161660A (ja) * 1995-12-06 1997-06-20 Hitachi Ltd 電子線源および電子線装置
JP2014235816A (ja) * 2013-05-31 2014-12-15 独立行政法人物質・材料研究機構 フォトカソード型電子線源、その作成方法及びフォトカソード型電子線源システム
JP2017130334A (ja) * 2016-01-20 2017-07-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置及び荷電粒子ビーム装置の画像形成方法
CN107449792A (zh) * 2017-08-30 2017-12-08 中国科学院西安光学精密机械研究所 一种超紧凑型飞秒电子衍射装置
JP2018137231A (ja) * 2018-03-23 2018-08-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料観察方法、試料台、観察システム、および発光部材

Also Published As

Publication number Publication date
US20220367139A1 (en) 2022-11-17
FR3098341B1 (fr) 2025-04-11
FR3098341A1 (fr) 2021-01-08
EP3994714A1 (fr) 2022-05-11
CA3145386A1 (fr) 2021-01-07
US12278082B2 (en) 2025-04-15
WO2021001383A1 (fr) 2021-01-07

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