JP2022537788A - 太陽電池パネル用グラフィックカバー基板の製造方法と太陽電池パネル及びその製造方法 - Google Patents
太陽電池パネル用グラフィックカバー基板の製造方法と太陽電池パネル及びその製造方法 Download PDFInfo
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
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- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
- H01L31/0488—Double glass encapsulation, e.g. photovoltaic cells arranged between front and rear glass sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
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- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
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Abstract
Description
球形の一部に対応する形状)、角形状、ピラミッド形状など、様々な形状を有することができる。前述した光拡散部(LD)は、
陽刻形状に突出した形状を有することができ、 陰刻形状で凹面形状を有することもできる。
相対的に低い光透過度を有する白色を有する場合には、他の色のカバー部114よりも小さい厚さを有することができる。
シリコン炭化窒化物で構成された第3カバー層を含むと、カバー部分124が青色を有することができる。または、カバー部分124が酸化ジルコニウムで構成された第1カバー層は、その上に位置し、シリコン酸化物で構成された第2カバー層、その上に位置し、ジルコニウム酸化物で構成された第3カバー層、それとその上に位置し、シリコン酸化物を含む第4カバー層を含むと、カバー部分124が緑色を有することができる。
Claims (20)
- 転写部材上にセラミック物質層で構成されるカバー層を形成する、カバー層塗布段階と前記カバー層をベース部材に転写する、転写段階と、
前記カバー層が形成された前記ベース部材を強化または半強化してカバー部を形成する、強化段階
を含む、太陽電池パネル用グラフィックカバー基板の製造方法。 - 前記カバー部がセラミックフリットを含むセラミック酸化物組成物で構成される、請求項1に記載の太陽電池パネル用グラフィックカバー基板の製造方法。
- 前記ベース部材がガラス基板を含み、
前記カバー部が前記ガラス基板の一部を構成する一体化された部分で構成される、請求項2に記載の太陽電池パネル用グラフィックカバー基板の製造方法。 - 前記カバー層塗布段階においては、印刷工程によって、前記カバー層を形成する、請求項1に記載の太陽電池パネル用グラフィックカバー基板の製造方法。
- 前記カバー層塗布段階においては、デジタルインクジェット印刷プロセスによって、前記カバー層を形成する、請求項4に記載の太陽電池パネル用グラフィックカバー基板の製造方法。
- 前記セラミック物質層が50μm以上の中心粒径を有する粒子を含む、請求項5に記載の太陽電池パネル用グラフィックカバー基板の製造方法。
- 前記カバー部の厚さが20μm以下である、請求項1に記載の太陽電池パネル用グラフィックカバー基板の製造方法。
- 前記転写段階と、前記強化段階の間に前記ベース部材を成形する成形段階をさらに含む、請求項1に記載の太陽電池パネル用グラフィックカバー基板の製造方法。
- 前記カバー部が形成される前記ベース部材の一面が5μm以上の高さの差を有する屈曲、凹凸、または突出部を有する、請求項1に記載の太陽電池パネル用グラフィックカバー基板の製造方法。
- 第1カバー部材、第1封止材、太陽電池部、第1封止材、第2カバー部材を積層して積層構造体を形成する積層段階と、
前記積層構造体に熱と圧力を加えて一体化するラミネート段階
を含み、
前記第1カバー部材が、転写部材上にセラミック物質層で構成されるカバー層を形成するカバー層塗布段階と前記カバー層をベース部材に転写する転写工程と、前記カバー層が形成された前記ベース部材を強化または半強化してカバー部を形成する強化段階によって形成される、太陽電池パネルの製造方法。 - 前記カバー部がセラミックフリットを含むセラミック酸化物組成物で構成される、 請求項10に記載の太陽電池パネルの製造方法。
- 前記ベース部材がガラス基板を含み、
前記カバー部が前記ガラス基板の一部を構成する一体化された部分で構成される、 請求項11に記載の太陽電池パネルの製造方法。 - 前記カバー層塗布段階においては、印刷工程によって、前記カバー層を形成する、請求項10に記載の太陽電池パネルの製造方法。
- 前記カバー層塗布段階においては、デジタルインクジェット印刷プロセスによって、前記カバー層を形成する、請求項13に記載の太陽電池パネルの製造方法。
- 前記カバー部の厚さが20μm以下である、請求項10に記載の太陽電池パネルの製造方法。
- 前記転写段階と、前記強化段階の間に前記ベース部材を成形する成形段階をさらに含む、請求項10に記載の太陽電池パネルの製造方法。
- 前記カバー部が形成される前記ベース部材の一面が5μm以上の高さの差を有する屈曲、凹凸、または突出部を有する、請求項10に記載の太陽電池パネルの製造方法。
- 太陽電池と
前記太陽電池を密封するシール材と
前記封止材の上、前記の太陽電池の一面上に位置する第1カバー部材と、
前記封止材の上、前記太陽電池の他面の上に位置する第2カバー部材
を含み、
前記第1カバー部材は、一面に屈曲、凹凸、または突出部を有するベース部材と、前記ベース部材の前記一面に形成され酸化物セラミック組成物で構成されるカバー部を含む太陽電池パネル。 - 前記屈曲、前記凹凸、または前記突出部による高さの差が5μm以上である、請求項18に記載の太陽電池パネル。
- 前記カバー部からの赤外線領域の光に対する前記カバー部の平均光透過度である第1透過度が可視光線領域の光に対する前記カバー部の平均光透過度である第2透過度と同じかそれより大きい、請求項18に記載 太陽電池パネル。
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KR1020190080381A KR20210004251A (ko) | 2019-07-03 | 2019-07-03 | 태양 전지 패널용 그래픽 커버 기판의 제조 방법, 그리고 태양 전지 패널 및 이의 제조 방법 |
KR10-2019-0080381 | 2019-07-03 | ||
PCT/KR2020/004836 WO2021002570A1 (ko) | 2019-07-03 | 2020-04-09 | 태양 전지 패널용 그래픽 커버 기판의 제조 방법, 그리고 태양 전지 패널 및 이의 제조 방법 |
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WO2021002570A1 (ko) | 2021-01-07 |
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