JP2022536293A5 - - Google Patents

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Publication number
JP2022536293A5
JP2022536293A5 JP2021572275A JP2021572275A JP2022536293A5 JP 2022536293 A5 JP2022536293 A5 JP 2022536293A5 JP 2021572275 A JP2021572275 A JP 2021572275A JP 2021572275 A JP2021572275 A JP 2021572275A JP 2022536293 A5 JP2022536293 A5 JP 2022536293A5
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JP
Japan
Prior art keywords
flow
temperature
substrate
maintaining
flow element
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JP2021572275A
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English (en)
Japanese (ja)
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JP7625540B2 (ja
JP2022536293A (ja
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Priority claimed from PCT/US2020/070072 external-priority patent/WO2020247966A1/en
Publication of JP2022536293A publication Critical patent/JP2022536293A/ja
Publication of JP2022536293A5 publication Critical patent/JP2022536293A5/ja
Priority to JP2025008812A priority Critical patent/JP2025061569A/ja
Application granted granted Critical
Publication of JP7625540B2 publication Critical patent/JP7625540B2/ja
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JP2021572275A 2019-06-07 2020-05-22 マルチステーション半導体処理における独立して調整可能な流路コンダクタンス Active JP7625540B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025008812A JP2025061569A (ja) 2019-06-07 2025-01-22 マルチステーション半導体処理における独立して調整可能な流路コンダクタンス

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962858570P 2019-06-07 2019-06-07
US62/858,570 2019-06-07
PCT/US2020/070072 WO2020247966A1 (en) 2019-06-07 2020-05-22 Independently adjustable flowpath conductance in multi-station semiconductor processing

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025008812A Division JP2025061569A (ja) 2019-06-07 2025-01-22 マルチステーション半導体処理における独立して調整可能な流路コンダクタンス

Publications (3)

Publication Number Publication Date
JP2022536293A JP2022536293A (ja) 2022-08-15
JP2022536293A5 true JP2022536293A5 (https=) 2023-05-24
JP7625540B2 JP7625540B2 (ja) 2025-02-03

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ID=73651952

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021572275A Active JP7625540B2 (ja) 2019-06-07 2020-05-22 マルチステーション半導体処理における独立して調整可能な流路コンダクタンス
JP2025008812A Pending JP2025061569A (ja) 2019-06-07 2025-01-22 マルチステーション半導体処理における独立して調整可能な流路コンダクタンス

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025008812A Pending JP2025061569A (ja) 2019-06-07 2025-01-22 マルチステーション半導体処理における独立して調整可能な流路コンダクタンス

Country Status (6)

Country Link
US (2) US20220228263A1 (https=)
JP (2) JP7625540B2 (https=)
KR (2) KR20260036050A (https=)
CN (2) CN118098919A (https=)
TW (2) TWI880718B (https=)
WO (1) WO2020247966A1 (https=)

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CN113862647A (zh) * 2021-09-28 2021-12-31 长江存储科技有限责任公司 一种薄膜沉积设备及方法
WO2023102325A1 (en) * 2021-12-01 2023-06-08 Lam Research Corporation Dry process tool with adjustable flow valve
KR20240122822A (ko) * 2021-12-13 2024-08-13 램 리써치 코포레이션 기판 프로세싱 시스템의 복수의 스테이션들로의 가스 플로우를 밸런싱하기 위한 밸브 시스템들
CN117467944A (zh) * 2022-07-22 2024-01-30 成都高真科技有限公司 一种晶圆的气体喷洒结构及喷洒方法
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