JP2022517336A - 新規な化合物およびこれを利用した有機発光素子 - Google Patents
新規な化合物およびこれを利用した有機発光素子 Download PDFInfo
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- JP2022517336A JP2022517336A JP2021539669A JP2021539669A JP2022517336A JP 2022517336 A JP2022517336 A JP 2022517336A JP 2021539669 A JP2021539669 A JP 2021539669A JP 2021539669 A JP2021539669 A JP 2021539669A JP 2022517336 A JP2022517336 A JP 2022517336A
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 149
- 125000004432 carbon atom Chemical group C* 0.000 claims description 126
- 239000000126 substance Substances 0.000 claims description 98
- -1 biphenylyl Chemical group 0.000 claims description 67
- 125000003118 aryl group Chemical group 0.000 claims description 41
- 125000000217 alkyl group Chemical group 0.000 claims description 39
- 229910052760 oxygen Inorganic materials 0.000 claims description 30
- 229910052717 sulfur Inorganic materials 0.000 claims description 28
- 125000001424 substituent group Chemical group 0.000 claims description 26
- 125000005842 heteroatom Chemical group 0.000 claims description 23
- 125000000623 heterocyclic group Chemical group 0.000 claims description 20
- 229910052799 carbon Inorganic materials 0.000 claims description 17
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims description 15
- 239000001257 hydrogen Substances 0.000 claims description 15
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 15
- 125000001072 heteroaryl group Chemical group 0.000 claims description 13
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 11
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 10
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 150000002431 hydrogen Chemical class 0.000 claims description 7
- 125000006574 non-aromatic ring group Chemical group 0.000 claims description 7
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 125000000732 arylene group Chemical group 0.000 claims description 5
- 125000001624 naphthyl group Chemical group 0.000 claims description 5
- 229910052805 deuterium Inorganic materials 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 125000001188 haloalkyl group Chemical group 0.000 claims description 3
- 125000005549 heteroarylene group Chemical group 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 86
- 0 *CCc1ccc(cccc2)c2c1* Chemical compound *CCc1ccc(cccc2)c2c1* 0.000 description 68
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 47
- 238000004519 manufacturing process Methods 0.000 description 37
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 30
- 239000002904 solvent Substances 0.000 description 28
- 239000012044 organic layer Substances 0.000 description 25
- 239000000463 material Substances 0.000 description 24
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- 238000002347 injection Methods 0.000 description 23
- 239000007924 injection Substances 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 21
- 239000000243 solution Substances 0.000 description 21
- 238000003786 synthesis reaction Methods 0.000 description 21
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- 238000000034 method Methods 0.000 description 14
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- 230000032258 transport Effects 0.000 description 12
- 238000004440 column chromatography Methods 0.000 description 11
- 230000005525 hole transport Effects 0.000 description 11
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 10
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- 239000012153 distilled water Substances 0.000 description 10
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 125000002723 alicyclic group Chemical group 0.000 description 7
- 125000003342 alkenyl group Chemical group 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
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- 238000006243 chemical reaction Methods 0.000 description 7
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 7
- UZKBSZSTDQSMDR-UHFFFAOYSA-N 1-[(4-chlorophenyl)-phenylmethyl]piperazine Chemical compound C1=CC(Cl)=CC=C1C(C=1C=CC=CC=1)N1CCNCC1 UZKBSZSTDQSMDR-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 239000002019 doping agent Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229940098779 methanesulfonic acid Drugs 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229940125904 compound 1 Drugs 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000007774 positive electrode material Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 3
- 125000002877 alkyl aryl group Chemical group 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 125000006267 biphenyl group Chemical group 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 125000004185 ester group Chemical group 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- UBOXGVDOUJQMTN-UHFFFAOYSA-N 1,1,2-trichloroethane Chemical compound ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 2
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical group C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- HTFNVAVTYILUCF-UHFFFAOYSA-N 2-[2-ethoxy-4-[4-(4-methylpiperazin-1-yl)piperidine-1-carbonyl]anilino]-5-methyl-11-methylsulfonylpyrimido[4,5-b][1,4]benzodiazepin-6-one Chemical compound CCOc1cc(ccc1Nc1ncc2N(C)C(=O)c3ccccc3N(c2n1)S(C)(=O)=O)C(=O)N1CCC(CC1)N1CCN(C)CC1 HTFNVAVTYILUCF-UHFFFAOYSA-N 0.000 description 2
- 125000005916 2-methylpentyl group Chemical group 0.000 description 2
- QENGPZGAWFQWCZ-UHFFFAOYSA-N 3-Methylthiophene Chemical compound CC=1C=CSC=1 QENGPZGAWFQWCZ-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- APDNWBLCZXQOMW-UHFFFAOYSA-N CC(C)(C)c(cc1)ccc1-c1cc(N(c2c3[o]c4cccc(C5(C)C)c4c3ccc2)c2cccc3c2cccc3)c2[o]c3ccccc3c2c1-c(c([o]c1ccccc11)c1c(N(c1cccc2c1[o]c1ccccc21)c1cccc2c1cccc2)c1)c1-c(cc1)ccc1N(c1ccc(C(C)(C)C)cc1)c1ccc5cc1 Chemical compound CC(C)(C)c(cc1)ccc1-c1cc(N(c2c3[o]c4cccc(C5(C)C)c4c3ccc2)c2cccc3c2cccc3)c2[o]c3ccccc3c2c1-c(c([o]c1ccccc11)c1c(N(c1cccc2c1[o]c1ccccc21)c1cccc2c1cccc2)c1)c1-c(cc1)ccc1N(c1ccc(C(C)(C)C)cc1)c1ccc5cc1 APDNWBLCZXQOMW-UHFFFAOYSA-N 0.000 description 2
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- UWMFEXOILTXUGD-UHFFFAOYSA-N Cc1cccc(N(c2ccccc2)c2ccc(C3(c4cc(N(c5ccccc5)c5c6[o]c(cccc7)c7c6ccc5)c(cccc5)c5c4-c(c4c5[o]c6ccccc46)c3cc5N(c3ccccc3)c3cccc4c3[o]c3c4cccc3)c3cc(C)ccc3C)cc2)c1 Chemical compound Cc1cccc(N(c2ccccc2)c2ccc(C3(c4cc(N(c5ccccc5)c5c6[o]c(cccc7)c7c6ccc5)c(cccc5)c5c4-c(c4c5[o]c6ccccc46)c3cc5N(c3ccccc3)c3cccc4c3[o]c3c4cccc3)c3cc(C)ccc3C)cc2)c1 UWMFEXOILTXUGD-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 125000003282 alkyl amino group Chemical group 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
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- 125000005264 aryl amine group Chemical group 0.000 description 2
- XSIFPSYPOVKYCO-UHFFFAOYSA-N butyl benzoate Chemical compound CCCCOC(=O)C1=CC=CC=C1 XSIFPSYPOVKYCO-UHFFFAOYSA-N 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 2
- 239000010406 cathode material Substances 0.000 description 2
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- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
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- IYYZUPMFVPLQIF-ALWQSETLSA-N dibenzothiophene Chemical group C1=CC=CC=2[34S]C3=C(C=21)C=CC=C3 IYYZUPMFVPLQIF-ALWQSETLSA-N 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000005241 heteroarylamino group Chemical group 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
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- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
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- 239000007773 negative electrode material Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
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- 125000003367 polycyclic group Chemical group 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
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- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 150000003852 triazoles Chemical group 0.000 description 2
- WJKHJLXJJJATHN-UHFFFAOYSA-N triflic anhydride Chemical compound FC(F)(F)S(=O)(=O)OS(=O)(=O)C(F)(F)F WJKHJLXJJJATHN-UHFFFAOYSA-N 0.000 description 2
- 238000005019 vapor deposition process Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
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- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- 229940015975 1,2-hexanediol Drugs 0.000 description 1
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- XPPWLXNXHSNMKC-UHFFFAOYSA-N phenylboron Chemical group [B]C1=CC=CC=C1 XPPWLXNXHSNMKC-UHFFFAOYSA-N 0.000 description 1
- 125000004592 phthalazinyl group Chemical group C1(=NN=CC2=CC=CC=C12)* 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000005581 pyrene group Chemical group 0.000 description 1
- 150000003220 pyrenes Chemical class 0.000 description 1
- 125000001725 pyrenyl group Chemical group 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 229940083082 pyrimidine derivative acting on arteriolar smooth muscle Drugs 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- DWRSCILTXDLQBG-UHFFFAOYSA-N silolane Chemical group C1CC[SiH2]C1 DWRSCILTXDLQBG-UHFFFAOYSA-N 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- JLBRGNFGBDNNSF-UHFFFAOYSA-N tert-butyl(dimethyl)borane Chemical group CB(C)C(C)(C)C JLBRGNFGBDNNSF-UHFFFAOYSA-N 0.000 description 1
- 125000001113 thiadiazolyl group Chemical group 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- KWQNQSDKCINQQP-UHFFFAOYSA-K tri(quinolin-8-yloxy)gallane Chemical compound C1=CN=C2C(O[Ga](OC=3C4=NC=CC=C4C=CC=3)OC=3C4=NC=CC=C4C=CC=3)=CC=CC2=C1 KWQNQSDKCINQQP-UHFFFAOYSA-K 0.000 description 1
- 125000004306 triazinyl group Chemical group 0.000 description 1
- LALRXNPLTWZJIJ-UHFFFAOYSA-N triethylborane Chemical group CCB(CC)CC LALRXNPLTWZJIJ-UHFFFAOYSA-N 0.000 description 1
- WXRGABKACDFXMG-UHFFFAOYSA-N trimethylborane Chemical group CB(C)C WXRGABKACDFXMG-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- MXSVLWZRHLXFKH-UHFFFAOYSA-N triphenylborane Chemical group C1=CC=CC=C1B(C=1C=CC=CC=1)C1=CC=CC=C1 MXSVLWZRHLXFKH-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- HTPBWAPZAJWXKY-UHFFFAOYSA-L zinc;quinolin-8-olate Chemical compound [Zn+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 HTPBWAPZAJWXKY-UHFFFAOYSA-L 0.000 description 1
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Abstract
Description
本出願は、2019年2月28日付の韓国特許出願第10-2019-0024296号および2020年2月21日付の韓国特許出願第10-2020-0021512号に基づく優先権の利益を主張し、当該韓国特許出願の文献に開示された全ての内容は本明細書の一部として含まれる。
R1およびR2はそれぞれ独立して、水素、またはR1またはR2同士が互いに結合して置換または非置換の炭素数6~60の芳香族環;置換または非置換の炭素数6~60の非芳香族環;または置換または非置換のN、O、SおよびSiで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロ環を形成し、
R1およびR2のうちの少なくとも一つはR1またはR2同士が互いに結合して、前記炭素数6~60の非芳香族環;または前記炭素数2~60のヘテロ環を形成し、
Lは置換または非置換の炭素数6~60のアリーレン;または置換または非置換のN、OおよびSで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロアリーレンであり、
XはO、S、NZ3、またはSiZ4Z5であり、
Z1~Z5はそれぞれ独立して、置換または非置換の炭素数1~60のアルキル;置換または非置換の炭素数1~60のハロアルキル;置換または非置換の炭素数3~60のシクロアルキル;置換または非置換の炭素数7~60のアラルキル;置換または非置換の炭素数6~60のアリール;または置換または非置換のN、OおよびSで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロアリールであり、
前記LおよびZ2;Z2およびZ3;またはZ4およびZ5は互いに連結されて5員-ヘテロ環を形成することができ、
L1およびL2はそれぞれ独立して、単結合;置換または非置換の炭素数6~60のアリーレン;または置換または非置換のN、OおよびSで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロアリーレンであり、
Ar1~Ar4はそれぞれ独立して、置換または非置換の炭素数6~60のアリール;または置換または非置換のN、OおよびSで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロアリールである。
一方、本発明は、前記化学式1で表されるジアミン化合物を提供する。
R1およびR2のうちの少なくとも一つはR1またはR2同士が互いに結合して炭素数6~60の脂環式環;またはN、O、SおよびSiで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロ環を形成し、残りは水素、またはR1またはR2同士が互いに結合して炭素数6~60の芳香族環;炭素数6~60の脂環式環;またはN、O、SおよびSiで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロ環を形成する。
この時、前記炭素数6~60の芳香族環、前記炭素数6~60の脂環式環および前記炭素数2~60のヘテロ環は、それぞれ独立して、水素、炭素数1~10のアルキルおよび炭素数6~20のアリールで構成される群から選択される置換基で置換され得る。
言い換えれば、
R1は互いに結合して前記炭素数6~60の脂環式環または前記炭素数2~60のヘテロ環を形成し、R2は全て水素、または互いに結合して前記炭素数6~60の芳香族環、前記炭素数6~60の脂環式環、または前記炭素数2~60のヘテロ環を形成するか;
R2が互いに結合して前記炭素数6~60の脂環式環または前記炭素数2~60のヘテロ環を形成し、R1は全て水素、または互いに結合して前記炭素数6~60の芳香族環、前記炭素数6~60の脂環式環、または前記炭素数2~60のヘテロ環を形成するか;または
R1およびR2がいずれもR1またはR2同士が互いに結合して前記炭素数6~60の芳香族環、前記炭素数6~60の脂環式環、または前記炭素数2~60のヘテロ環を形成することができる。
好ましくは、R1およびR2のうちの少なくとも一つはR1またはR2同士が互いに結合して下記化学式2d~化学式2gで表される構造のうちのいずれか一つを形成し、残りは水素、または互いに結合して下記化学式2a~化学式2gで表される構造のうちのいずれか一つを形成する:
YはO、S、CZ6Z7、またはSiZ8Z9であり、
Z6~Z9はそれぞれ独立して、置換または非置換の炭素数1~60のアルキル;置換または非置換の炭素数1~60のハロアルキル;置換または非置換の炭素数3~60のシクロアルキル;置換または非置換の炭素数6~60のアリール;または置換または非置換のN、OおよびSで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロアリールであり、
*はR1またはR2と結合した炭素との結合位置を意味する。
言い換えれば、
R1は互いに結合して前記化学式2d~化学式2gで表される構造のうちのいずれか一つを形成し、R2は全て水素、または互いに結合して前記化学式2a~化学式2gで表される構造のうちのいずれか一つを形成するか;
R2は互いに結合して前記化学式2d~化学式2gで表される構造のうちのいずれか一つを形成し、R1は全て水素、または互いに結合して前記化学式2a~化学式2gで表される構造のうちのいずれか一つを形成するか;または
R1およびR2がいずれもR1同士またはR2同士が互いに結合して前記化学式2d~化学式2gで表される構造のうちのいずれか一つを形成することができる。
最も好ましくは、R1およびR2のうちの少なくとも一つは互いに結合して前記化学式2dで表される構造を形成し、残りは水素、または互いに結合して前記化学式2aまたは化学式2dで表される構造を形成する。
R1は全て水素であり、R2同士が互いに結合して前記化学式2dで表される構造を形成する場合、下記化学式1-1で表され、
R2は全て水素であり、R1同士が互いに結合して前記化学式2dで表される構造を形成する場合、下記化学式1-2で表され、
R1同士が互いに結合して前記化学式2aで表される構造を形成し、R2同士が互いに結合して前記化学式2dで表される構造を形成する場合、下記化学式1-3で表され、
R1同士が互いに結合して前記化学式2dで表される構造を形成し、R2同士が互いに結合して前記化学式2aで表される構造を形成する場合、下記化学式1-4で表され、
R1およびR2同士がそれぞれ互いに結合して前記化学式2dで表される構造を形成する場合、下記化学式1-5で表される:
L、X、Z1、Z2、L1、L2およびAr1~Ar4は前記化学式1で定義した通りであり、
Y1およびY2のうちの一つは単結合であり、残りの一つはO、S、C(炭素数1~4のアルキル)2、またはSi(炭素数1~4のアルキル)2であり、
Y3およびY4のうちの一つは単結合であり、残りの一つはO、S、C(炭素数1~4のアルキル)2、またはSi(炭素数1~4のアルキル)2である。
好ましくは、Y1およびY2のうちの一つは単結合であり、残りの一つはO、S、C(メチル)2、またはSi(メチル)2であり、
Y3およびY4のうちの一つは単結合であり、残りの一つはO、S、C(メチル)2、またはSi(メチル)2である。
好ましくは、Z1はフェニルまたはビフェニリルであり、ここで、Z1は非置換、または重水素、ハロゲン、シアノ、炭素数1~10のアルキル、炭素数3~10のシクロアルキル、Si(炭素数1~10のアルキル)3およびSi(炭素数6~20のアリール)3で構成される群からそれぞれ独立して選択される1個~5個の置換基で置換される。
より好ましくは、Z1はフェニルまたはビフェニリルであり、ここで、Z1は重水素、ハロゲン、シアノ、メチル、エチル、プロピル、tert-ブチル、シクロペンチル、Si(メチル)3およびSi(フェニル)3で構成される群からそれぞれ独立して選択される1個~5個の置換基で置換される。
最も好ましくは、Z1は下記で構成される群から選択されるいずれか一つである:
好ましくは、Z2~Z5はそれぞれ独立して、炭素数1~4のアルキル;炭素数6~20のアリール;または炭素数7~20のアラルキルであり、ここで、Z2~Z5は非置換、または炭素数1~10のアルキルまたはSi(炭素数1~10のアルキル)3で置換される。
より好ましくは、Z2およびZ3はそれぞれ独立して、炭素数1~4のアルキル;非置換、または炭素数1~10のアルキルで置換された炭素数6~20のアリール;または非置換、または炭素数1~10のアルキルで置換された炭素数7~20のアラルキルである。また、Z4およびZ5はそれぞれ独立して、炭素数1~4のアルキル;または非置換、または炭素数1~10のアルキルで置換された炭素数6~60のアリールである。
この時、「前記LおよびZ2;Z2およびZ3;またはZ4およびZ5は互いに連結されて5員-ヘテロ環を形成することができる」とは、前記LおよびZ2同士、Z2およびZ3同士、またはZ4およびZ5同士が互いに連結され、Xのヘテロ原子であるO、S、N、またはSiを含有する5員-ヘテロ環を形成できることを意味する。
R、R’およびR’’はそれぞれ独立して、水素、メチル、tert-ブチル、またはSi(メチル)3である。
好ましくは、L1およびL2は単結合である。
好ましくは、Ar1~Ar4はそれぞれ独立して、フェニル、ナフチル、ビフェニリル、またはジベンゾフラニルであり、
ここで、Ar1~Ar4は非置換、または重水素、ハロゲン、炭素数1~10のアルキルおよび-Si(炭素数1~10のアルキル)3で構成される群からそれぞれ独立して選択される1個~5個の置換基で置換される。
より好ましくは、Ar1~Ar4はそれぞれ独立して、フェニル、ナフチル、ビフェニリル、またはジベンゾフラニルであり、
ここで、Ar1~Ar4は非置換、または重水素、ハロゲン、メチル、tert-ブチル、Si(メチル)3で構成される群からそれぞれ独立して選択される1個~5個の置換基で置換される。
最も好ましくは、Ar1~Ar4はそれぞれ独立して、下記で構成される群から選択されるいずれか一つである:
L、X、Z1、Z2およびAr1~Ar4は上述した通りであり、
Y5およびY6はそれぞれ独立して、O、S、C(メチル)2、またはSi(メチル)2である。
一方、本発明に係る化合物は、溶液工程で有機発光素子の有機物層、特に発光層を形成することができる。具体的には、前記化合物は、発光層のドーパント材料に用いることができる。このため、本発明は、上述した本発明に係る化合物および溶媒を含むコーティング組成物を提供する。
また、本発明は、前記化学式1で表される化合物を含む有機発光素子を提供する。一例として、本発明は、第1電極と、前記第1電極に対向して備えられた第2電極と、前記第1電極と前記第2電極との間に備えられた発光層と、を含む有機発光素子であって、前記発光層は前記化学式1で表される化合物を含む、有機発光素子を提供する。
図2は、基板1、正極2、正孔注入層5、正孔輸送層6、発光層7、電子輸送層8、電子注入層9および負極4からなる有機発光素子の例を示した図である。この構造において、前記化学式1で表される化合物は、前記発光層に含まれる。
化合物A1(17g、50mmol)、A2(15.9g、75mmol)、Pd(PPh3)4(5.8g、5mmol)およびK2CO3(20.7g、150mmol)をトルエン(500ml)および蒸留水(150ml)に溶かした後、90℃で15時間攪拌した。有機層を分離した後、これをMgSO4を利用して水分を除去した後、減圧して溶媒を除去した。得られた物質をカラムクロマトグラフィーを用いて、化合物A3(12g、収率:63%)を分離および精製した。
MS:[M+H]+=381
前記段階1-1で製造した化合物A3(1.52g、4mmol)、水酸化ナトリウム(0.2g、5mmol)、エタノール30mlを入れて48時間還流攪拌した後、室温に冷却した。2N塩酸を滴下し30分間攪拌した後、ろ過した。ジクロロメタンとn-ヘキサンで再結晶して、A4(1.2g、収率:79%)を得た。
MS:[M+H]+=367
前記段階1-2で製造した化合物A4(1.47g、4mmol)、メタンスルホン酸20mlを入れて、80℃に昇温して3時間攪拌した後、室温に冷却した。反応溶液を氷水20mlに徐々に滴下した後、30分間攪拌した。生成された固体はろ過した後、水とメタノールで洗浄して、化合物A5(1.24g、収率:89%)を得た。
MS:[M+H]+=349
前記段階1-3で製造した化合物A5(1.05g、3mmol)をジクロロメタン30mlに入れて常温で攪拌した。臭素(0.96g、6mmol)はジクロロメタン5mlに希釈して滴下し、8時間常温で攪拌した。反応完了後、反応容器にアセトン30mlを入れて攪拌した。生成された固体はろ過した後、アセトンで洗浄した。固体はモノクロロベンゼンで再結晶して、化合物A6(0.85g、収率:66%)を得た。
MS:[M+H]+=427
化合物A7(2.13g、10mmol)をテトラヒドロフラン400mLに入れて攪拌しながら零下78℃に冷却し、上記で製造された溶液にN-ブチルリチウム1.6M(5.35ml、8.5mmol)を添加した後、1時間攪拌した。次に、前記段階1-4で製造した化合物A6(3.21g、7.5mmol)を添加し、1時間攪拌した後、室温に昇温した後、2時間攪拌した。その後、アンモニウムクロリド水溶液を添加し30分間攪拌した後、分別漏斗で有機層を分離した後、これをMgSO4を利用して水分を除去した後、減圧して溶媒を除去した。それから得られた物質をカラムクロマトグラフィーを用いて、化合物A8(2.81g、収率:50%)を分離および精製した。
MS:[M+H]+=561
前記段階1-5で製造した化合物A8(2.81g、5mmol)をジクロロメタン200mLに入れて攪拌しながら0℃に冷却した後、メタンスルホン酸(1.2g、20mmol)を10分間添加し室温に昇温した。その後、そこに化合物A9(2.68g、7.5mmol)を添加し30分間攪拌した後、重炭酸ナトリウム水溶液を添加し30分間攪拌した。その後、分別漏斗で有機層を分離した後、これをMgSO4を利用して水分を除去した後、減圧して溶媒を除去した。それから得られた物質をカラムクロマトグラフィーを用いて、化合物A10(4.7g、収率:94%)を分離および精製した。
MS:[M+H]+=901
前記段階1-6で製造した化合物A10(2.03g、2.25mmol)、化合物A11(1.13g、5mmol)、Pd2(dba)3(110mg、0.12mmol)、P(t-Bu)3(73mg、0.36mmol)およびNat-BuO(0.71g、7.43mmol)をトルエン(50ml)に溶かした後、100℃で15時間攪拌した。室温に冷却し蒸留水を入れた後、分別漏斗で有機層を分離した後、これをMgSO4を利用して水分を除去した後、減圧して溶媒を除去した。得られた物質をカラムクロマトグラフィーを用いて、化合物1(1.1g、収率:41%)を分離および精製した。
MS:[M+H]+=1191
MS:[M+H]+=1371
MS:[M+H]+=1217
MS:[M+H]+=1397
化合物C1(15.5g、50mmol)、C2(15.9g、75mmol)、Pd(PPh3)4(5.8g、5mmol)およびK2CO3(20.7g、150mmol)をトルエン(500ml)および蒸留水(150ml)に溶かした後、90℃で15時間攪拌した。有機層を分離した後、これをMgSO4を利用して水分を除去した後、減圧して溶媒を除去した。得られた物質をカラムクロマトグラフィーを用いて、化合物C3(13.1g、収率:75%)を分離および精製した。
MS:[M+H]+=351
前記段階5-1で製造した化合物C3(7.0g、20mmol)を入れてジクロロメタン(100mL)に溶かした後、0℃に冷却した。ピリジン(1.9g、24mmol)に続いてトリフルオロメタンスルホン酸無水物(5.92g、21mmol)を入れて、室温で3時間攪拌した。その後、分別漏斗で有機層を分離した後、これをMgSO4を利用して水分を除去した後、減圧して溶媒を除去した。それから得られた物質をカラムクロマトグラフィーを用いて、化合物C4(7.8g、収率:81%)を分離および精製した。
MS:[M+H]+=483
前記段階5-2で製造した化合物C4(4.82g、10mmol)とシアン化カリウム(1.3g、20mmol)とPd(PPh3)4(1.16g、1mmol)を入れて、N,N-ジメチルホルムアミド(50mL)に溶かした後、130℃に昇温して18時間攪拌した。その後、分別漏斗で有機層を分離した後、これをMgSO4を利用して水分を除去した後、減圧して溶媒を除去した。それから得られた物質をカラムクロマトグラフィーを用いて、化合物C4(2.3g、収率:65%)を分離および精製した。
MS:[M+H]+=360
前記段階5-3で製造したC5(1.8g、5mmol)と水酸化カリウム(0.56g、10mmol)をエタノール(30ml)および水(10mL)に入れて、24時間還流攪拌した。室温に冷却した後、0.2N塩酸を用いて酸性化し、生成された固体をろ過し、ヘキサンで洗浄した後、乾燥して、C6(1.36g、収率:72%)を得た。
MS:[M+H]+=379
前記段階5-4で製造したC6(1.9g、5mmol)とメタンスルホン酸(20mL)を入れて、120℃で4時間攪拌した。冷却した後、水200mlに反応液を入れて生成された沈殿物をろ過し、トルエンで洗浄した後、乾燥して、C7(0.92g、収率:51%)を得た。
MS:[M+H]+=361
前記段階5-5で製造したC7(3.0g、8.32mmol)をジクロロメタン100mLに入れて、ジクロロメタン30mLに溶かした臭素(4.0g、25mmol)を徐々に添加した後、60時間常温で攪拌した。沈殿物をろ過し、ジクロロメタンおよびヘキサンで洗浄した後、トルエンおよびN-メチルピロリドンで再結晶して、C8(1.4g、収率:32%)を得た。
MS:[M+H]+=517
化合物A7(1.07g、5mmol)をテトラヒドロフラン200mLに入れて攪拌しながら零下78℃に冷却し、上記で製造した溶液にN-ブチルリチウム1.6M(2.8ml、4.5mmol)を添加した後、1時間攪拌した。次に、前記段階5-6で製造した化合物C8(2.07g、4mmol)を添加し1時間攪拌した後、室温に昇温した後、2時間攪拌した。その後、アンモニウムクロリド水溶液を添加し30分間攪拌した後、分別漏斗で有機層を分離した後、これをMgSO4を利用して水分を除去した後、減圧して溶媒を除去した。それから得られた物質をカラムクロマトグラフィーを用いて、化合物C9(1.1g、収率:42%)を分離および精製した。
MS:[M+H]+=651
前記段階5-7で製造した化合物C9(3.26g、5mmol)をジクロロメタン200mLに入れて攪拌しながら0℃に冷却した後、メタンスルホン酸(1.2g、20mmol)を10分間添加し室温に昇温した。その後、そこに化合物A9(2.68g、7.5mmol)を添加し30分間攪拌した後、重炭酸ナトリウム水溶液を添加し30分間攪拌した。その後、分別漏斗で有機層を分離した後、これをMgSO4を利用して水分を除去した後、減圧して溶媒を除去した。それから得られた物質をカラムクロマトグラフィーを用いて、化合物C10(4.36g、収率:88%)を分離および精製した。
MS:[M+H]+=990
前記段階5-8で製造した化合物C10(2.23g、2.25mmol)、化合物A11(1.13g、5mmol)、Pd2(dba)3(110mg、0.12mmol)、P(t-Bu)3(73mg、0.36mmol)およびNat-BuO(0.71g、7.43mmol)をトルエン(50ml)に溶かした後、100℃で15時間攪拌した。室温に冷却し蒸留水を入れた後、分別漏斗で有機層を分離した後、これをMgSO4を利用して水分を除去した後、減圧して溶媒を除去した。得られた物質をカラムクロマトグラフィーを用いて、化合物5(1.4g、収率:49%)を分離および精製した。
MS:[M+H]+=1281
MS:[M+H]+=1461
前記段階5-8で化合物A9の代わりにA13を使用したことを除いては、前記段階5-8と同様の方法で、化合物C11(2.24g、収率:52%)を製造した。
MS:[M+H]+=859
前記段階5-9で化合物C10の代わりにC11を使用したことを除いては、前記段階5-9と同様の方法で、化合物7(1.68g、収率:56%)を製造した。
MS:[M+H]+=1150
前記段階5-8で化合物A9の代わりにA14を使用したことを除いては、前記段階5-8と同様の方法で、化合物C12(2.67g、収率:61%)を製造した。
MS:[M+H]+=875
前記段階5-9で化合物C10の代わりにC12を使用したことを除いては、前記段階5-9と同様の方法で、化合物8(1.95g、収率:55%)を製造した。
MS:[M+H]+=1166
前記段階5-7で化合物A7の代わりにA15を使用したことを除いては、前記段階5-7と同様の方法で、化合物C13(1.27g、収率:38%)を製造した。
MS:[M+H]+=667
前記段階9-1で製造した化合物C13(3.34g、5mmol)をA16(200mL)に入れて攪拌しながら0℃に冷却した後、メタンスルホン酸(1.2g、20mmol)を10分間添加し80度に昇温した。12時間攪拌し室温に冷却した後、重炭酸ナトリウム水溶液を添加し30分間攪拌した。その後、分別漏斗で有機層を分離した後、これをMgSO4を利用して水分を除去した後、減圧して溶媒を除去した。それから得られた物質をカラムクロマトグラフィーを用いて、化合物C14(1.32g、収率:59%)を分離および精製した。
MS:[M+H]+=745
前記段階5-9で化合物C10の代わりにC14を使用したことを除いては、前記段階5-9と同様の方法で、化合物9(1.13g、収率:62%)を製造した。
MS:[M+H]+=1046
ITO(indium tin oxide)が500Åの厚さに薄膜蒸着されたガラス基板を洗剤を溶かした蒸留水に入れて超音波洗浄した。この時、洗剤としてはフィッシャー社(Fischer Co.)製品を使用し、蒸留水としてはミリポア社(Millipore Co.)製品のフィルタ(Filter)で2次ろ過した蒸留水を使用した。前記ITOを30分間洗浄した後、蒸留水で2回繰り返し超音波洗浄を10分間進行した。蒸留水洗浄が終わった後、アセトン、蒸留水、イソプロピルアルコールの溶剤で超音波洗浄し、乾燥して、洗浄した500Å厚さのITOガラス基板を準備した。
化合物1の代わりに下記表2に記載された化合物を使用したことを除いては、実施例1と同様の方法で有機発光素子を製造した。
前記実施例1~実施例9および比較例1で製造した有機発光素子に電流を印加した時、10mA/cm2の電流密度での駆動電圧、電流効率、発光効率、量子効率および寿命を測定した結果を下記表2に示す。この時、寿命(T90)は、輝度が初期輝度(1000nit)に対して90%となるのにかかる時間を意味する。
2:正極
3:発光層
4:負極
5:正孔注入層
6:正孔輸送層
7:発光層
8:電子輸送層
9:電子注入層
Claims (13)
- 下記化学式1で表される化合物:
R1およびR2はそれぞれ独立して、水素、またはR1またはR2同士が互いに結合して置換または非置換の炭素数6~60の芳香族環;置換または非置換の炭素数6~60の非芳香族環;または置換または非置換のN、O、SおよびSiで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロ環を形成し、
R1およびR2のうちの少なくとも一つはR1またはR2同士が互いに結合して、前記炭素数6~60の非芳香族環;または前記炭素数2~60のヘテロ環を形成し、
Lは置換または非置換の炭素数6~60のアリーレン;または置換または非置換のN、OおよびSで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロアリーレンであり、
XはO、S、NZ3、またはSiZ4Z5であり、
Z1~Z5はそれぞれ独立して、置換または非置換の炭素数1~60のアルキル;置換または非置換の炭素数1~60のハロアルキル;置換または非置換の炭素数3~60のシクロアルキル;置換または非置換の炭素数7~60のアラルキル;置換または非置換の炭素数6~60のアリール;または置換または非置換のN、OおよびSで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロアリールであり、
前記LおよびZ2;Z2およびZ3;またはZ4およびZ5は互いに連結されて5員-ヘテロ環を形成することができ、
L1およびL2はそれぞれ独立して、単結合;置換または非置換の炭素数6~60のアリーレン;または置換または非置換のN、OおよびSで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロアリーレンであり、
Ar1~Ar4はそれぞれ独立して、置換または非置換の炭素数6~60のアリール;または置換または非置換のN、OおよびSで構成される群から選択されるいずれか一つ以上のヘテロ原子を含む炭素数2~60のヘテロアリールである。 - Z1はフェニルまたはビフェニリルであり、
ここで、Z1は非置換、または重水素、ハロゲン、シアノ、炭素数1~10のアルキル、炭素数3~10のシクロアルキル、Si(炭素数1~10のアルキル)3およびSi(炭素数6~20のアリール)3で構成される群からそれぞれ独立して選択される1個~5個の置換基で置換される、請求項1~3のいずれか一項に記載の化合物。 - L1およびL2は単結合である、請求項1~6のいずれか一項に記載の化合物。
- Ar1~Ar4はそれぞれ独立して、フェニル、ナフチル、ビフェニリル、またはジベンゾフラニルであり、
ここで、Ar1~Ar4は非置換、または重水素、ハロゲン、炭素数1~10のアルキルおよびSi(炭素数1~10のアルキル)3で構成される群からそれぞれ独立して選択される1個~5個の置換基で置換される、請求項1~7のいずれか一項に記載の化合物。 - Ar1およびAr4は互いに同一であり、
Ar2およびAr3は互いに同一である、請求項1~9のいずれか一項に記載の化合物。 - 第1電極と、前記第1電極に対向して備えられた第2電極と、前記第1電極と前記第2電極との間に備えられた発光層と、を含む有機発光素子であって、前記発光層は、請求項1~12のいずれか一項に記載の化合物を含む、有機発光素子。
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