JP2022131422A - Liquid discharge head - Google Patents

Liquid discharge head Download PDF

Info

Publication number
JP2022131422A
JP2022131422A JP2021030364A JP2021030364A JP2022131422A JP 2022131422 A JP2022131422 A JP 2022131422A JP 2021030364 A JP2021030364 A JP 2021030364A JP 2021030364 A JP2021030364 A JP 2021030364A JP 2022131422 A JP2022131422 A JP 2022131422A
Authority
JP
Japan
Prior art keywords
substrate
liquid
recess
ejection head
liquid ejection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021030364A
Other languages
Japanese (ja)
Inventor
広志 樋口
Hiroshi Higuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2021030364A priority Critical patent/JP2022131422A/en
Priority to US17/673,115 priority patent/US11752770B2/en
Publication of JP2022131422A publication Critical patent/JP2022131422A/en
Priority to US18/364,234 priority patent/US20230373215A1/en
Pending legal-status Critical Current

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1623Manufacturing processes bonding and adhesion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14201Structure of print heads with piezoelectric elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14201Structure of print heads with piezoelectric elements
    • B41J2/14233Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1607Production of print heads with piezoelectric elements
    • B41J2/161Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1607Production of print heads with piezoelectric elements
    • B41J2/1618Fixing the piezoelectric elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14201Structure of print heads with piezoelectric elements
    • B41J2/14233Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • B41J2002/14241Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm having a cover around the piezoelectric thin film element

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

To provide a liquid discharge head which can inhibit flow of a contact material protruding from a joint surface.SOLUTION: A liquid discharge head 4 has: a first substrate including a structure; and a second substrate joined to the first substrate through an adhesive 40. The first substrate is formed with: a joint surface 24 joined to the second substrate through the adhesive 40; and a non-joint surface 29 which is not joined to the second substrate. A recessed part 32 is formed at an area, which is located between a joint end part 25, i.e. a structure side end part of the joint surface 24, and the structure, of an area of the non-joint surface 29.SELECTED DRAWING: Figure 2

Description

本発明は、液体吐出ヘッドに関する。 The present invention relates to liquid ejection heads.

液体を吐出して記録を行う記録装置には、吐出口から液体を吐出する液体吐出ヘッドが備えられている。接着剤により複数の基板を接合して液体吐出ヘッドを形成する場合、余剰な接着剤が接合面からはみ出すことで、歩留まり低下やデバイス特性の低下が生じるおそれがある。 2. Description of the Related Art A printing apparatus that performs printing by ejecting liquid is equipped with a liquid ejection head that ejects liquid from an ejection port. When a liquid ejection head is formed by bonding a plurality of substrates with an adhesive, excess adhesive protrudes from the bonding surface, which may result in a decrease in yield and deterioration in device characteristics.

そこで、特許文献1においては、接着剤を塗布する接合面に溝(凹部)を形成し、接合時に基板同士の押し付けで発生する余剰な接着剤を凹部で収容することができる方法を提示している。余剰な接着剤を凹部で収容することで、接着剤が接合面からはみ出すことを抑制することができる。 Therefore, in Patent Document 1, a method is presented in which a groove (recess) is formed in the bonding surface to which the adhesive is applied, and the surplus adhesive that is generated when the substrates are pressed against each other during bonding can be accommodated in the recess. there is By accommodating the excess adhesive in the recess, it is possible to suppress the adhesive from protruding from the joint surface.

特開2011-207072号公報JP 2011-207072 A

しかしながら、特許文献1においては、凹部で収容しきれずに接合面から接着剤がはみ出てしまった場合には、凹部は接合面にしか形成されていないため、その後の接着剤の流動を抑制することができない。そのため、例えば圧力発生素子等の構造物にはみ出た接着剤が付着し、記録品位に影響が生じる恐れがあった。 However, in Patent Document 1, when the adhesive overflows from the joint surface because it cannot be accommodated in the recess, the recess is formed only on the joint surface, so that subsequent flow of the adhesive can be suppressed. can't As a result, there is a risk that the protruding adhesive will adhere to structures such as the pressure generating element, thereby affecting the recording quality.

本発明は、上記課題を鑑み、接合面からはみ出た接触材の流動を抑制することができる液体吐出ヘッドを提供することを目的とする。 SUMMARY OF THE INVENTION An object of the present invention is to provide a liquid ejection head capable of suppressing the flow of a contact material protruding from a joint surface.

上記課題を解決するために本発明は、構造物を備える第1の基板と、接着剤を介して前記第1の基板と接合している第2の基板と、を有する液体吐出ヘッドにおいて、前記第1の基板には、前記接着剤を介して第2の基板と接合している接合面と、該第2の基板とは接合していない非接合面と、が形成されており、前記非接合面の領域のうち、前記接合面の前記構造物側の端部である接合端部と該構造物との間の領域には、凹部が形成されていることを特徴とする。 In order to solve the above problems, the present invention provides a liquid ejection head having a first substrate having a structure and a second substrate bonded to the first substrate via an adhesive, The first substrate is formed with a bonding surface that is bonded to the second substrate via the adhesive and a non-bonding surface that is not bonded to the second substrate. A concave portion is formed in a region of the joint surface between the joint end portion, which is the end portion of the joint surface on the side of the structure, and the structure.

本発明によれば、接合面からはみ出た接触材の流動を抑制することができる液体吐出ヘッドを提供することができる。 According to the present invention, it is possible to provide a liquid ejection head capable of suppressing the flow of the contact material protruding from the joint surface.

液体吐出ヘッドの概略図。Schematic diagram of a liquid ejection head. 各基板を接合する際の工程を示す図。The figure which shows the process at the time of joining each board|substrate. 各基板を接合する際の工程を示す図。The figure which shows the process at the time of joining each board|substrate. 第2の実施形態の凹部を示す概略図。Schematic which shows the recessed part of 2nd Embodiment. 第3の実施形態の凹部を示す概略図。Schematic which shows the recessed part of 3rd Embodiment. 第3の実施形態の凹部を示す概略図。Schematic which shows the recessed part of 3rd Embodiment. 第3の実施形態の凹部を示す概略図。Schematic which shows the recessed part of 3rd Embodiment. 第4の実施形態の凹部を示す概略図。Schematic which shows the recessed part of 4th Embodiment.

以下、本発明の実施形態について詳細に説明する。なお、本願において、構造物とは、後述する圧力発生素子21(図1)、吐出口31(図1)および連通口5(図7)のことをいう。また、本願において、前述の構造物が形成されている基板を第1の基板と称し、第1の基板と接着剤により接合している基板を第2の基板と称す。即ち、詳しくは後述する圧力発生基板2が第1の基板とみなされ、流路基板1が第2の基板とみなされる場合がある一方、吐出口基板3が第1の基板とみなされ、圧力発生基板2が第2の基板とみなされる場合もある。 BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described in detail. In the present application, the structures refer to pressure generating elements 21 (FIG. 1), discharge ports 31 (FIG. 1), and communication ports 5 (FIG. 7), which will be described later. Further, in the present application, the substrate on which the above structure is formed is referred to as a first substrate, and the substrate bonded to the first substrate with an adhesive is referred to as a second substrate. That is, the pressure generating substrate 2, which will be described later in detail, may be regarded as the first substrate, and the flow path substrate 1 may be regarded as the second substrate. The generator substrate 2 may also be considered the second substrate.

(第1の実施形態)
(液体吐出ヘッド)
図1(a)は、本実施形態に係る液体吐出ヘッド4の概要斜視図である。図1(b)は、図1(a)に示すA-A´断面における断面図である。図1に示すように、液体吐出ヘッド4は、主に、流路基板1、圧力発生基板2、吐出口基板3から構成されており、各基板はそれぞれ接着剤40(図2)で接合される。
(First embodiment)
(liquid ejection head)
FIG. 1A is a schematic perspective view of the liquid ejection head 4 according to this embodiment. FIG. 1(b) is a cross-sectional view taken along line AA' shown in FIG. 1(a). As shown in FIG. 1, the liquid ejection head 4 is mainly composed of a flow path substrate 1, a pressure generating substrate 2, and an ejection port substrate 3, and each substrate is bonded with an adhesive 40 (FIG. 2). be.

流路基板1は、シリコンやセラミック、樹脂などの基板等で形成されている。流路基板1には、ドライエッチングやウェットエッチング、物理加工などにより形成された貫通孔が形成されており、この貫通孔が液体を圧力発生素子上に供給するための供給流路11となる。さらに、流路基板1には、吐出口31から液体を吐出するための圧力を発生する圧力発生素子21が備えられる空間(圧力発生室12)が形成されている。圧力発生素子21がピエゾ素子である場合には、この空間によりピエゾ素子の変位が可能となり、ピエゾ素子の変位による圧力で液体が吐出口31から吐出される。 The channel substrate 1 is formed of a substrate such as silicon, ceramic, or resin. A through hole is formed in the channel substrate 1 by dry etching, wet etching, physical processing, or the like, and this through hole serves as a supply channel 11 for supplying liquid onto the pressure generating element. Furthermore, the channel substrate 1 is formed with a space (pressure generating chamber 12 ) in which a pressure generating element 21 for generating pressure for discharging liquid from the discharge port 31 is provided. When the pressure generating element 21 is a piezo element, the space allows the piezo element to be displaced, and the liquid is ejected from the ejection port 31 by the pressure generated by the displacement of the piezo element.

圧力発生基板2は、シリコンやセラミック、樹脂などの基板等で形成されている。圧力発生基板2には、圧力発生素子21や、圧力発生素子21と接続する電極、選択的に特定の電極に給電するための回路(不図示)等が形成されている。圧力発生素子21は、圧電性を付与したジルコン酸チタン酸鉛(PZT)などの多結晶セラミックや、無機薄膜による抵抗発熱体などが用いられる。また流路基板1の供給流路11と連通し、圧力発生素子21と隣接する液室22が形成される。 The pressure generating substrate 2 is formed of a substrate such as silicon, ceramic, or resin. The pressure generating substrate 2 is formed with pressure generating elements 21, electrodes connected to the pressure generating elements 21, circuits (not shown) for selectively supplying power to specific electrodes, and the like. For the pressure generating element 21, a polycrystalline ceramic such as lead zirconate titanate (PZT) imparted with piezoelectricity, a resistance heating element made of an inorganic thin film, or the like is used. Further, a liquid chamber 22 communicating with the supply channel 11 of the channel substrate 1 and adjacent to the pressure generating element 21 is formed.

吐出口基板3は、シリコンやセラミック、樹脂などの基板等で形成されている。また、吐出口基板3には、液体を吐出する吐出口31が形成されている。吐出口31は液室22と連通しており、圧力発生素子21により発生した圧力が液室22に伝わり、吐出口31から液体が吐出される。 The ejection port substrate 3 is formed of a substrate such as silicon, ceramic, or resin. Further, the ejection port substrate 3 is formed with ejection ports 31 for ejecting liquid. The ejection port 31 communicates with the liquid chamber 22 , and the pressure generated by the pressure generating element 21 is transmitted to the liquid chamber 22 to eject the liquid from the ejection port 31 .

基板どうしを接合する接着剤には、エポキシ樹脂や有機シリコン系材料、金属ペースト等が単独もしくは混合して用いられ、接着強度や接液耐久性などを考慮して材料選択される。これらの接着剤を、基板の接合面に塗布し、熱やプレス等のエネルギーを加えることにより化学的もしくは物理的に基板同士を接合する。 Epoxy resins, organic silicon materials, metal pastes, and the like are used singly or in combination as adhesives for bonding substrates, and materials are selected in consideration of adhesive strength, liquid contact durability, and the like. These adhesives are applied to the joint surfaces of the substrates, and the substrates are chemically or physically joined together by applying energy such as heat or press.

複数の基板を接合して液体吐出ヘッドを作成する際、各基板の接合順番や接着剤を塗布する面は自由であり、3つの基板の積層関係が適切であればよい。即ち、圧力発生基板2は流路基板1と吐出口基板3に挟まれた形で接合される。 When a plurality of substrates are bonded to form a liquid ejection head, the order of bonding the substrates and the surfaces to which the adhesive is applied are arbitrary, and the lamination relationship of the three substrates may be appropriate. In other words, the pressure generating substrate 2 is sandwiched between the flow path substrate 1 and the discharge port substrate 3 and joined together.

(基板の接合)
各基板を接合する工程について、図2および図3を参照しながら説明する。図2(a)は、流路基板1の圧力発生基板2側の面に接着剤を塗布した状態の概略図である。図2(b)は、図2(a)に示す状態から流路基板1と圧力発生基板2とを接合した際の概略図である。図2(c)は、図2(b)に示す領域Bにおける拡大図である。図3(a)は、流路基板1と圧力発生基板2とが接合された状態で、圧力発生基板2の吐出口基板3側の面に接着剤を塗布した状態の概略図である。図3(b)は、図3(a)に示す状態から吐出口基板3を圧力発生基板2に接合した際の概略図である。図3(c)は、図3(b)に示す領域Cにおける拡大図である。
(bonding of substrates)
The process of bonding each substrate will be described with reference to FIGS. 2 and 3. FIG. FIG. 2(a) is a schematic diagram showing a state in which an adhesive is applied to the surface of the flow path substrate 1 on the side of the pressure generating substrate 2. FIG. FIG. 2(b) is a schematic view of the state shown in FIG. 2(a) when the channel substrate 1 and the pressure generating substrate 2 are joined together. FIG.2(c) is an enlarged view in the area|region B shown in FIG.2(b). FIG. 3(a) is a schematic diagram showing a state in which the flow path substrate 1 and the pressure generation substrate 2 are bonded together, and an adhesive is applied to the surface of the pressure generation substrate 2 on the ejection port substrate 3 side. FIG. 3(b) is a schematic view of the state shown in FIG. 3(a) when the ejection port substrate 3 is joined to the pressure generating substrate 2. As shown in FIG. FIG.3(c) is an enlarged view in the area|region C shown in FIG.3(b).

図2(a)に示すように、流路基板1の圧力発生基板2側の面であって圧力発生基板2と接合する面(接合面)24に接着剤40を塗布する。また、圧力発生基板2には、流路基板1とは接合しない面である非接合面29に予め凹部23を形成しておく。次に、流路基板1と圧力発生基板2とを加熱プレスして接合する(図2(b))。接合後の基板界面、すなわち接合面24の接着剤厚みは、接合条件にもよるが典型的には数μm以下であり、余分な接着剤41は接合面24が終端した接合端部25からはみ出し、圧力発生基板上に濡れ拡がる。ここで、接合端部25とは、接合面24の端部のうち構造物側の端部のことである。接合端部25の先の圧力発生基板上には圧力発生素子21(構造物とも称する)が存在する。そして、接合端部25と圧力発生素子21との間の圧力発生基板2上には凹部23が形成されている。この凹部23の接合端部側の際26では接着剤の表面張力が働き、はみ出した余分な接着剤41をその先に移動させないための作用が働く。これにより余分な接着剤41が圧力発生素子21に接触することを抑制することができる。その結果、接合端部25からはみ出た接着剤が圧力発生素子21に付着することによる記録品位への影響を抑制することができる。なお、図2においては、圧力発生基板2が第1の基板に相当し、流路基板1が第2の基板に相当している。 As shown in FIG. 2A, an adhesive 40 is applied to a surface (bonding surface) 24 of the flow path substrate 1 on the side of the pressure generating substrate 2 that is to be bonded to the pressure generating substrate 2 . Further, in the pressure-generating substrate 2 , recesses 23 are formed in advance on a non-bonding surface 29 that is a surface that is not bonded to the flow path substrate 1 . Next, the channel substrate 1 and the pressure generating substrate 2 are hot-pressed and joined together (FIG. 2(b)). The substrate interface after bonding, that is, the thickness of the adhesive on the bonding surface 24 is typically several μm or less, although it depends on the bonding conditions. , wets and spreads on the pressure-generating substrate. Here, the joint end portion 25 is the end portion of the joint surface 24 on the side of the structure. A pressure-generating element 21 (also referred to as a structure) is present on the pressure-generating substrate beyond the joint end 25 . A recess 23 is formed on the pressure generating substrate 2 between the joint end 25 and the pressure generating element 21 . The surface tension of the adhesive acts on the edge 26 on the joint end side of the concave portion 23, and an action is performed to prevent the excess adhesive 41 that protrudes from moving ahead. As a result, excess adhesive 41 can be prevented from coming into contact with pressure generating element 21 . As a result, it is possible to suppress the influence on the recording quality due to the adhesive protruding from the joint end portion 25 adhering to the pressure generating element 21 . In FIG. 2, the pressure generating substrate 2 corresponds to the first substrate, and the channel substrate 1 corresponds to the second substrate.

次に、図3(a)に示すように、予め凹部23を接合した吐出口基板3を準備する。圧力発生基板2の吐出口基板3側の面に接着剤40を塗布する。この際、吐出口基板3には、吐出口31の横に凹部23を予め形成しておく。その後、吐出口基板3を接合して液体吐出ヘッド4を形成する。図2と同様に、余分な接着剤41が接合端部25からはみ出し、吐出口基板上に濡れ拡がると、接着剤41が吐出口31(構造物とも称する)に付着する可能性がある。そこで、上述したように、吐出口基板3に凹部23を形成することで、凹部23の段差部で接着剤の表面張力が働き、はみ出した接着剤がその先に流動することを抑制することができる。これにより余分な接着剤41による吐出口31の閉塞を防ぐことが可能となるため、記録品位への影響を抑制することができる。その他、吐出口近傍へのはみ出しの移動を制限する効果として、吐出口31近傍の液室の体積変化が抑えられ、吐出量特性への影響を少なくする効果もある。なお、図3においては、吐出口基板3が第1の基板に相当し、圧力発生基板2が第2の基板に相当している。 Next, as shown in FIG. 3(a), the ejection port substrate 3 with the concave portions 23 bonded in advance is prepared. An adhesive 40 is applied to the surface of the pressure generating substrate 2 on the ejection port substrate 3 side. At this time, recesses 23 are previously formed in the ejection port substrate 3 beside the ejection ports 31 . After that, the liquid ejection head 4 is formed by bonding the ejection port substrate 3 . As in FIG. 2, if excess adhesive 41 protrudes from the joint end 25 and wets and spreads on the ejection port substrate, the adhesive 41 may adhere to the ejection port 31 (also referred to as a structure). Therefore, as described above, by forming the concave portion 23 in the discharge port substrate 3, the surface tension of the adhesive acts on the stepped portion of the concave portion 23, and it is possible to suppress the overflowing adhesive from flowing beyond it. can. As a result, it is possible to prevent the discharge port 31 from being clogged with excess adhesive 41, so that the influence on the print quality can be suppressed. In addition, as an effect of restricting the movement of the protrusion to the vicinity of the ejection port, the volume change of the liquid chamber in the vicinity of the ejection port 31 is suppressed, and there is also an effect of reducing the influence on the ejection amount characteristics. In FIG. 3, the discharge port substrate 3 corresponds to the first substrate, and the pressure generating substrate 2 corresponds to the second substrate.

また、はみ出た接着剤が凹部の段差部を超えたとして、その接着剤は凹部内に収容されることになる。これにより、接着剤が構造物に付着することを抑制することができる効果も得られる。 In addition, if the protruding adhesive exceeds the stepped portion of the recess, the adhesive is accommodated in the recess. This also has the effect of suppressing adhesion of the adhesive to the structure.

(第2の実施形態)
第2の実施形態について、図4を参照しながら説明する。なお、第1の実施形態と同様の箇所については同一の符号を付し、説明は省略する。本実施形態は、接着剤の流動を抑制するための凹部の形状に特徴がある。なお、圧力発生基板2に形成した凹部23を用いて以下説明を行うが、吐出口基板3に形成する凹部についても同様に適用することができる。図4(a)は、本実施形態における流路基板1と圧力発生基板2とを示す概略図である。図4(b)は、図4(a)に示す領域Dにおける拡大図である。以下の説明において、凹部23の形成角度θとは、凹部23の側壁6と基板の主面7とのなす角のことであり、即ち、図4(b)に示す角度θのことである。
(Second embodiment)
A second embodiment will be described with reference to FIG. In addition, the same code|symbol is attached|subjected about the same location as 1st Embodiment, and description is abbreviate|omitted. This embodiment is characterized by the shape of the recess for suppressing the flow of the adhesive. Although the following description will be made using the concave portion 23 formed in the pressure generating substrate 2, the same can be applied to the concave portion formed in the discharge port substrate 3 as well. FIG. 4(a) is a schematic diagram showing the channel substrate 1 and the pressure generating substrate 2 in this embodiment. FIG.4(b) is an enlarged view in the area|region D shown to Fig.4 (a). In the following description, the forming angle .theta. of the recess 23 is the angle formed between the side wall 6 of the recess 23 and the main surface 7 of the substrate, that is, the angle .theta. shown in FIG. 4(b).

図4(b)に示すように、凹部23の形成角度θを90度未満とするのが良い。接着剤のはみ出しが多い場合は凹部23の際26に表面張力による接着剤のせり出しが起こり、これが凹部23の内壁に接触すると堰き止め効果が崩れて凹部23の内部に接着剤が流れ込んでしまう。凹部23の形成角度θが小さいほどせり出しと内壁の接触が起こりにくくなり、堰き止め効果も維持しやすい。なお、より好ましくは、凹部23の形成角度θを70度以下とすることが好ましくは、さらには、50度以下にすることがより好ましい。しかしながら、凹部23の形成角度θが小さすぎると凹部の形成が複雑になることから、凹部23の形成角度θは、30度以上であることが好ましい。 As shown in FIG. 4(b), it is preferable that the formation angle θ of the concave portion 23 is less than 90 degrees. When a large amount of adhesive protrudes, the adhesive protrudes due to surface tension at the edge 26 of the recess 23, and when this contacts the inner wall of the recess 23, the damming effect is lost and the adhesive flows into the recess 23. The smaller the formation angle θ of the concave portion 23, the less likely it is that the protrusion will come into contact with the inner wall, and the more likely the damming effect will be maintained. More preferably, the formation angle θ of the concave portion 23 is 70 degrees or less, and more preferably 50 degrees or less. However, if the formation angle θ of the recess 23 is too small, the formation of the recess becomes complicated, so the formation angle θ of the recess 23 is preferably 30 degrees or more.

(第3の実施形態)
第3の実施形態について、図5、図6および図7を参照しながら説明する。なお、第1の実施形態と同様の箇所については同一の符号を付し、説明は省略する。本実施形態は、凹部23を形成する位置や凹部23の寸法に特徴がある。図5(a)は、本実施形態における流路基板1と圧力発生基板2とを示す概略図である。図5(b)は、図5(a)に示す領域Eにおける拡大図である。
(Third Embodiment)
A third embodiment will be described with reference to FIGS. 5, 6 and 7. FIG. In addition, the same code|symbol is attached|subjected about the same location as 1st Embodiment, and description is abbreviate|omitted. This embodiment is characterized by the position where the recess 23 is formed and the dimensions of the recess 23 . FIG. 5(a) is a schematic diagram showing the channel substrate 1 and the pressure generating substrate 2 in this embodiment. FIG. 5(b) is an enlarged view of the region E shown in FIG. 5(a).

凹部23は、なるべく圧力発生素子21から離れた位置に形成するのが好ましい。圧力発生素子21がPZT(ピエゾ素子)である場合、溝を掘り込んだ凹部23にはPZTによる振動の応力が加わりやすくなるため共振周波数が変化するなど、凹部23がPZTに近いほど振動状態が影響を受けやすくなる可能性があるためである。図5に示すように、なるべく影響がない範囲、例えば、凹部23を、接合端部25と圧力発生素子21の接合端部25側の端部33との中間位置27よりも接合端部25側に収まるように配置することで影響を小さくすることができる。さらに、より好ましくは、接合端部25と圧力発生素子21の端部33との間の領域を3等分した場合に、該3等分した領域のうち、接合端部25に最も近い領域内に凹部23を形成することが好ましい。 It is preferable to form the recess 23 at a position as far away from the pressure generating element 21 as possible. When the pressure generating element 21 is a PZT (piezo element), the vibration stress caused by the PZT is likely to be applied to the concave portion 23 dug into the groove, so that the resonance frequency changes. This is because they may be more susceptible. As shown in FIG. 5, the recessed portion 23 is positioned closer to the joint end 25 than an intermediate position 27 between the joint end 25 and the end 33 of the pressure generating element 21 on the joint end 25 side. The effect can be reduced by arranging it so that it fits within the More preferably, when the region between the joint end portion 25 and the end portion 33 of the pressure generating element 21 is divided into three equal parts, the It is preferable to form a recess 23 in the .

同様な理由から、凹部23の幅28は,接合端部25と圧力発生素子21の距離の半分以下の幅30以下にとどめ、デバイス特性への影響を小さくするのが好ましい。凹部23の幅28を小さくすることで、凹部23周辺の強度の低下を最小限に抑えることができる。なお、凹部23の幅28とは、凹部23の長辺と短辺のうち、短辺の長さのことをいう(図8参照)。 For the same reason, it is preferable that the width 28 of the recess 23 is set to a width 30 or less, which is less than half the distance between the joint end 25 and the pressure generating element 21, to reduce the effect on device characteristics. By reducing the width 28 of the recess 23, the reduction in strength around the recess 23 can be minimized. The width 28 of the recess 23 means the length of the short side of the long side and short side of the recess 23 (see FIG. 8).

図6(a)に、吐出口基板3に形成した凹部23の一例を示す。図6(b)に、図6(a)に示す領域Fの拡大図を示す。凹部23の深さは、接着剤の表面張力による盛り上がりが崩れて凹部内部への接着剤の濡れ広がりが発生した場合を考慮するとなるべく深いほど良い。一方、凹部周辺の機械強度や前述のデバイス特性への影響を考えた場合は浅いほど良い。これらを考慮して、凹部を形成する基板の厚み35に対して、凹部23の深さ(接合面24からの深さ)36は、0.01倍以上、0.80倍以下とするのが好ましい。さらには、凹部23の深さ36は、0.01倍以上、0.50倍以下であることが、凹部周辺の機械強度等の観点からより好ましい。 FIG. 6A shows an example of the concave portion 23 formed in the ejection port substrate 3. As shown in FIG. FIG. 6(b) shows an enlarged view of the region F shown in FIG. 6(a). The depth of the concave portion 23 is preferably as deep as possible, considering the case where the swelling caused by the surface tension of the adhesive collapses and the adhesive spreads inside the concave portion. On the other hand, considering the mechanical strength around the recess and the influence on the device characteristics described above, the shallower the depth, the better. In consideration of these, the depth 36 of the recess 23 (the depth from the bonding surface 24) should be 0.01 times or more and 0.80 times or less with respect to the thickness 35 of the substrate forming the recess. preferable. Furthermore, the depth 36 of the recess 23 is more preferably 0.01 times or more and 0.50 times or less from the viewpoint of mechanical strength around the recess.

図7(a)に、供給流路11と接合面24の間に凹部23を形成した例を示す。図7(b)に、図7(a)に示す領域Gの拡大図を示す。図7に示すように、供給流路11と液室22とが供給流路11の流路径よりも小さい径を有する連通口5(構造物とも称する)により連通する場合には、余分な接着剤41が少量であっても連通口5の一部を塞ぐと、液体の流抵抗が大きくなり、好ましくない。そこで、本実施形態においては、図7に示すように、接合端部25と連通口5との間に凹部23を形成している。このような凹部23を形成することで、余分な接着剤41が連通口5を塞いでしまうことを抑制することができる。 FIG. 7A shows an example in which a recess 23 is formed between the supply channel 11 and the joint surface 24. As shown in FIG. FIG. 7(b) shows an enlarged view of the region G shown in FIG. 7(a). As shown in FIG. 7, when the supply channel 11 and the liquid chamber 22 are communicated with each other through a communication port 5 (also referred to as a structure) having a diameter smaller than that of the supply channel 11, excess adhesive Even if the amount of the liquid 41 is small, if the communication port 5 is partially blocked, the flow resistance of the liquid will increase, which is not preferable. Therefore, in this embodiment, as shown in FIG. By forming such a concave portion 23 , it is possible to prevent excess adhesive 41 from blocking the communication port 5 .

(第4の実施形態)
第4の実施形態について、図8を参照しながら説明する。なお、第1の実施形態と同様の箇所については同一の符号を付し、説明は省略する。本実施形態は、凹部23を形成する領域に特徴がある。図8(a)は、流路基板1および圧力発生基板2を接合した状態のものを圧力発生基板側から見たときの平面図である。図8(b)~(d)は、図8(a)に示す領域Hにおける拡大図である。なお、一例として、図8においては圧力発生素子21と接合端部25との間に凹部23が形成されている形態を図示しているが、本実施形態はこれに限られない。即ち、図3(c)に示したように、吐出口31と接合端部25との間に凹部23を形成する場合においても同様である。
(Fourth embodiment)
A fourth embodiment will be described with reference to FIG. In addition, the same code|symbol is attached|subjected about the same location as 1st Embodiment, and description is abbreviate|omitted. This embodiment is characterized by the region where the concave portion 23 is formed. FIG. 8(a) is a plan view of the flow path substrate 1 and the pressure generating substrate 2 joined together as viewed from the pressure generating substrate side. 8(b) to (d) are enlarged views of region H shown in FIG. 8(a). As an example, FIG. 8 shows a form in which the recess 23 is formed between the pressure generating element 21 and the joint end 25, but the present embodiment is not limited to this. That is, as shown in FIG. 3(c), the same applies to the case where the recess 23 is formed between the ejection port 31 and the joint end 25. As shown in FIG.

図8(b)~(d)に示すように、凹部23の平面配置は、接合端部25と圧力発生素子21との間の領域であればどのように配置しても良い。したがって、図8(b)に示すように、圧力発生素子21の周囲を囲うように連続的に凹部23を形成してもよく、或いは、図8(c)に示すように、断続的に形成してもよい。または、図8(d)に示すように、複数の凹部23が圧力発生素子21の周囲を取り囲むように形成されていてもよい。 As shown in FIGS. 8(b) to 8(d), the concave portion 23 may be arranged in any plane as long as it is located between the joint end portion 25 and the pressure generating element 21. FIG. Therefore, as shown in FIG. 8(b), the concave portion 23 may be formed continuously so as to surround the pressure generating element 21, or may be formed intermittently as shown in FIG. 8(c). You may Alternatively, as shown in FIG. 8D, a plurality of recesses 23 may be formed so as to surround the pressure generating element 21 .

液体吐出ヘッド4を、流路基板1、圧力発生基板2、吐出口基板3を接合して作製した。流路基板1は、厚さ500μmのシリコン基板に100μm×100μmの開口サイズの供給流路11、および150μm×2000μmのサイズで深さ100μmの圧力発生室12を備える。圧力発生基板2には、シリコン基板上にチタン酸ジルコン酸鉛によるPZT素子を100μm×1900μmのサイズで電極および駆動回路とともに形成した。また、圧力発生基板2には、液室22を150μm×2500μmのサイズ、100μmの深さで形成し、PZT素子の周囲を囲うように幅10μmの凹部を形成した。吐出口基板3には、厚み10μmのシリコンに、直径20μmの吐出口31を形成した。これら3つの基板を、ケイ素を含むベンゾシクロブテン樹脂を主成分とする熱硬化型の接着剤で接合した。液体吐出ヘッドの吐出口31を観察したところ、余分な接着剤のはみ出しによる閉塞は確認されなかった。 A liquid ejection head 4 was manufactured by bonding the flow path substrate 1, the pressure generation substrate 2, and the ejection port substrate 3. FIG. The flow path substrate 1 includes a supply flow path 11 having an opening size of 100 μm×100 μm and a pressure generation chamber 12 having a size of 150 μm×2000 μm and a depth of 100 μm in a silicon substrate having a thickness of 500 μm. As the pressure generating substrate 2, a PZT element made of lead zirconate titanate was formed on a silicon substrate with a size of 100 μm×1900 μm together with electrodes and a driving circuit. In the pressure generating substrate 2, a liquid chamber 22 having a size of 150 μm×2500 μm and a depth of 100 μm was formed, and a concave portion having a width of 10 μm was formed so as to surround the PZT element. In the ejection port substrate 3, ejection ports 31 having a diameter of 20 μm were formed in silicon having a thickness of 10 μm. These three substrates were bonded with a thermosetting adhesive mainly composed of silicon-containing benzocyclobutene resin. Observation of the ejection port 31 of the liquid ejection head did not confirm clogging due to excess adhesive overflowing.

比較として、圧力発生基板2および吐出口基板3に凹部23を形成せず、その他の構造は同じ寸法で作製した液体吐出ヘッドを作製したところ、接着剤のはみ出しによる吐出口31の閉塞が0.5%の割合で発生していた。 For comparison, when a liquid ejection head was manufactured in which the recesses 23 were not formed in the pressure generating substrate 2 and the ejection port substrate 3 and the other structures were manufactured with the same dimensions, the clogging of the ejection ports 31 due to the protrusion of the adhesive was 0.00. It occurred at a rate of 5%.

2,3 第1の基板
2,3 第2の基板
4 液体吐出ヘッド
23 凹部
24 接合面
29 非接合面
25 接合端部
40 接着剤
2, 3 first substrate 2, 3 second substrate 4 liquid ejection head 23 concave portion 24 bonding surface 29 non-bonding surface 25 bonding end portion 40 adhesive

Claims (16)

構造物を備える第1の基板と、
接着剤を介して前記第1の基板と接合している第2の基板と、
を有する液体吐出ヘッドにおいて、
前記第1の基板には、前記接着剤を介して第2の基板と接合している接合面と、該第2の基板とは接合していない非接合面と、が形成されており、
前記非接合面の領域のうち、前記接合面の前記構造物側の端部である接合端部と該構造物との間の領域には、凹部が形成されていることを特徴とする液体吐出ヘッド。
a first substrate comprising a structure;
a second substrate bonded to the first substrate via an adhesive;
In a liquid ejection head having
The first substrate is formed with a bonding surface that is bonded to the second substrate via the adhesive and a non-bonding surface that is not bonded to the second substrate,
The liquid ejecting method according to claim 1, wherein a concave portion is formed in a region of the non-bonding surface between the structure and a bonding end, which is an end of the bonding surface on the side of the structure. head.
前記液体吐出ヘッドは、液体を吐出する吐出口を備える吐出口基板と、前記吐出口から液体を吐出するための圧力を発生する圧力発生素子を備える圧力発生基板と、前記圧力発生素子上に液体を供給する流路を備える流路基板と、を有し、
前記第1の基板は、前記圧力発生基板であり、
前記第2の基板は、前記流路基板であり、
前記構造物は、前記圧力発生素子である請求項1に記載の液体吐出ヘッド。
The liquid ejection head includes an ejection port substrate having ejection ports for ejecting liquid, a pressure generation substrate having pressure generation elements for generating pressure for ejecting the liquid from the ejection ports, and liquid on the pressure generation elements. and a channel substrate comprising a channel for supplying
The first substrate is the pressure generating substrate,
The second substrate is the channel substrate,
2. A liquid ejection head according to claim 1, wherein said structure is said pressure generating element.
前記液体吐出ヘッドは、液体を吐出する吐出口を備える吐出口基板と、前記吐出口から液体を吐出するための圧力を発生する圧力発生素子を備える圧力発生基板と、前記圧力発生素子上に液体を供給する流路を備える流路基板と、を有し、
前記第1の基板は、前記吐出口基板であり、
前記第2の基板は、前記圧力発生基板であり、
前記構造物は、前記吐出口である請求項1に記載の液体吐出ヘッド。
The liquid ejection head includes an ejection port substrate having ejection ports for ejecting liquid, a pressure generation substrate having pressure generation elements for generating pressure for ejecting the liquid from the ejection ports, and liquid on the pressure generation elements. and a channel substrate comprising a channel for supplying
the first substrate is the ejection port substrate;
The second substrate is the pressure generating substrate,
2. A liquid ejection head according to claim 1, wherein said structure is said ejection port.
前記液体吐出ヘッドは、液体を吐出する吐出口を備える吐出口基板と、前記吐出口から液体を吐出するための圧力を発生する圧力発生素子を備える圧力発生基板と、前記圧力発生素子上に液体を供給する流路を備える流路基板と、を有し、
前記圧力発生基板には、前記流路の流路径よりも小さい径を有する連通口が形成されており、
前記流路基板の前記流路は、前記圧力発生基板の前記連通口と接続されており、
前記第1の基板は、前記圧力発生基板であり、
前記第2の基板は、前記流路基板であり、
前記構造物は、前記連通口である請求項1に記載の液体吐出ヘッド。
The liquid ejection head includes an ejection port substrate having ejection ports for ejecting liquid, a pressure generation substrate having pressure generation elements for generating pressure for ejecting the liquid from the ejection ports, and liquid on the pressure generation elements. and a channel substrate comprising a channel for supplying
The pressure generating substrate is formed with a communication port having a diameter smaller than the flow path diameter of the flow path,
the channel of the channel substrate is connected to the communication port of the pressure generating substrate,
The first substrate is the pressure generating substrate,
The second substrate is the channel substrate,
2. The liquid ejection head according to claim 1, wherein the structure is the communication port.
前記凹部の形成角度は90度未満である請求項1ないし4のいずれか1項に記載の液体吐出ヘッド。 5. The liquid ejection head according to any one of claims 1 to 4, wherein the formation angle of said recess is less than 90 degrees. 前記凹部の形成角度は70度以下である請求項1ないし5のいずれか1項に記載の液体吐出ヘッド。 6. The liquid ejection head according to any one of claims 1 to 5, wherein the recess is formed at an angle of 70 degrees or less. 前記凹部の形成角度は50度以下である請求項1ないし6のいずれか1項に記載の液体吐出ヘッド。 7. The liquid ejection head according to any one of claims 1 to 6, wherein the recess is formed at an angle of 50 degrees or less. 前記凹部の形成角度は30度以上である請求項1ないし7のいずれか1項に記載の液体吐出ヘッド。 8. The liquid ejection head according to any one of claims 1 to 7, wherein the recess is formed at an angle of 30 degrees or more. 前記凹部は、前記接合端部と前記構造物の該接合端部側の端部との中間位置よりも該接合端部側に収まって形成されている請求項1ないし8のいずれか1項に記載の液体吐出ヘッド。 9. The recess according to any one of claims 1 to 8, wherein the recess is formed so as to be located closer to the joint end than an intermediate position between the joint end and an end of the structure on the joint end side. A liquid ejection head as described. 前記凹部は、前記接合端部と前記構造物の該接合端部側の端部との間の領域を3等分したときに、該3等分した領域のうち該接合端部に最も近い領域内に収まって形成されている請求項1ないし9のいずれか1項に記載の液体吐出ヘッド。 When the region between the joint end and the end of the structure on the joint end side is divided into three equal parts, the recess is the region closest to the joint end among the three equal parts. 10. The liquid ejection head according to any one of claims 1 to 9, wherein the liquid ejection head is formed so as to be contained within. 前記凹部の幅は、前記接合端部と前記構造物との距離の半分以下である請求項1ないし10のいずれか1項に記載の液体吐出ヘッド。 11. The liquid ejection head according to any one of claims 1 to 10, wherein the width of the recess is half or less of the distance between the joint end and the structure. 前記凹部の前記接合面からの深さは、該凹部が形成されている前記第1の基板の厚みに対して、0.01倍以上、0.80倍以下である請求項1ないし11のいずれか1項に記載の液体吐出ヘッド。 12. The depth of the recess from the bonding surface is 0.01 times or more and 0.80 times or less the thickness of the first substrate in which the recess is formed. 2. The liquid ejection head according to item 1 or 2. 前記凹部の前記接合面からの深さは、該凹部が形成されている前記第1の基板の厚みに対して、0.01倍以上、0.50倍以下である請求項1ないし12のいずれか1項に記載の液体吐出ヘッド。 13. The depth of the recess from the bonding surface is 0.01 times or more and 0.50 times or less the thickness of the first substrate in which the recess is formed. 2. The liquid ejection head according to item 1 or 2. 前記第1の基板および前記第2の基板の平面図を見たときに、前記凹部は、前記構造物の周囲を連続的に取り囲んで形成されている請求項1ないし13のいずれか1項に記載の液体吐出ヘッド。 14. The method according to any one of claims 1 to 13, wherein when the plan view of the first substrate and the second substrate is viewed, the recess is formed so as to continuously surround the periphery of the structure. A liquid ejection head as described. 前記第1の基板および前記第2の基板の平面図を見たときに、前記凹部は、前記構造物の周囲を断続的に取り囲んで形成されている請求項1ないし13のいずれか1項に記載の液体吐出ヘッド。 14. The method according to any one of claims 1 to 13, wherein when the plan views of the first substrate and the second substrate are viewed, the recess is formed so as to intermittently surround the structure. A liquid ejection head as described. 前記第1の基板および前記第2の基板の平面図を見たときに、複数の前記凹部が、前記構造物の周囲を取り囲んで形成されている請求項1ないし15のいずれか1項に記載の液体吐出ヘッド。
16. The structure according to any one of claims 1 to 15, wherein a plurality of said recesses are formed surrounding said structures when viewed from plan views of said first substrate and said second substrate. liquid ejection head.
JP2021030364A 2021-02-26 2021-02-26 Liquid discharge head Pending JP2022131422A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2021030364A JP2022131422A (en) 2021-02-26 2021-02-26 Liquid discharge head
US17/673,115 US11752770B2 (en) 2021-02-26 2022-02-16 Liquid ejection head
US18/364,234 US20230373215A1 (en) 2021-02-26 2023-08-02 Liquid ejection head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021030364A JP2022131422A (en) 2021-02-26 2021-02-26 Liquid discharge head

Publications (1)

Publication Number Publication Date
JP2022131422A true JP2022131422A (en) 2022-09-07

Family

ID=83006853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021030364A Pending JP2022131422A (en) 2021-02-26 2021-02-26 Liquid discharge head

Country Status (2)

Country Link
US (2) US11752770B2 (en)
JP (1) JP2022131422A (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011207072A (en) 2010-03-30 2011-10-20 Seiko Epson Corp Method for manufacturing liquid jet head
JP7098282B2 (en) * 2017-06-09 2022-07-11 キヤノン株式会社 Manufacturing method of wafer bonding body, manufacturing method of liquid discharge head, substrate bonding body and liquid discharge head

Also Published As

Publication number Publication date
US20220274406A1 (en) 2022-09-01
US11752770B2 (en) 2023-09-12
US20230373215A1 (en) 2023-11-23

Similar Documents

Publication Publication Date Title
JP4357600B2 (en) Fluid ejection device
US9937716B2 (en) Electronic device, liquid ejecting head, and electronic device manufacturing method
KR20170048187A (en) Mems device manufacturing method, mems device, liquid-jet head and liquid-jet apparatus
JPH11320875A (en) Ink-jet head and its manufacture
JP2009196354A (en) Liquid jet head manufacturing method and liquid jet apparatus
JP2022131422A (en) Liquid discharge head
JP3997485B2 (en) Liquid transfer device
US10870275B2 (en) Liquid discharge head and method of producing liquid discharge head
US8998380B2 (en) Liquid ejecting head, liquid ejecting apparatus
JP5425850B2 (en) Inkjet head
JP6359367B2 (en) Inkjet head
JP5914976B2 (en) Nozzle substrate, droplet discharge head, and droplet discharge apparatus
US9517624B2 (en) Wiring mounting structure and method of manufacturing the same, and liquid ejecting head and liquid ejecting apparatus
JP5492824B2 (en) Ink jet head and method of manufacturing ink jet head
JP7020103B2 (en) Liquid spray head, liquid spray device and wiring board
JP2009220507A (en) Method for manufacturing liquid ejection head
JP5879288B2 (en) Ink jet head and method of manufacturing ink jet head
JP5900516B2 (en) Inkjet head manufacturing method and inkjet head
JP5829658B2 (en) Ink jet head and manufacturing method thereof
JP2011189597A (en) Manufacturing method of liquid jet head, liquid jet head and liquid jet apparatus
JP2006175654A (en) Manufacturing method of liquid jet head, and liquid jet head
JP2003205612A (en) Ink-jet head
JP2003062998A (en) Ink-jet recording head and ink-jet recording apparatus
JP2008194985A (en) Manufacturing method of liquid ejection head
JP2004009479A (en) Ink jet printer and its manufacturing process

Legal Events

Date Code Title Description
RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20231213

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240208