JP2022091223A - Manufacturing method of print circuit board and print circuit board - Google Patents

Manufacturing method of print circuit board and print circuit board Download PDF

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JP2022091223A
JP2022091223A JP2020203913A JP2020203913A JP2022091223A JP 2022091223 A JP2022091223 A JP 2022091223A JP 2020203913 A JP2020203913 A JP 2020203913A JP 2020203913 A JP2020203913 A JP 2020203913A JP 2022091223 A JP2022091223 A JP 2022091223A
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conductor
plating film
insulating substrate
hole
filling resin
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貴秀 長谷川
Takahide Hasegawa
悟 川合
Satoru Kawai
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Ibiden Co Ltd
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Ibiden Co Ltd
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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

To obtain an excellent conductive circuit on a penetration hole.SOLUTION: A manufacturing method contains the steps of: preparing a double-sided copper adhesion laminate sheet 3 made of an insulation substrate 1 and, a first copper foil 2-1 and a second copper foil 2-2, formed on both surfaces; forming a penetration hole 4 to the double-sided copper adhesion laminate sheet; forming a cylindrical through-hole conductor 5-3 to a side wall of the penetration hole; forming both of a first plating film 5-1 onto the first copper foil 2-1, and a second plating film 5-2 onto the second copper foil 2-2 to fill a filling resin 6 to the penetration hole, removing the first copper foil and the first plating film, the second copper foil and the second plating film, and the filling resin projected from the penetration hole to obtain one surface of a front surface of the insulation substrate and the front surface of the filling resin to have a shape of both end parts of the through-hole conductor, which is inserted into the penetration hole from the front surface having the one surface of the insulation substrate and the filling resin in a convex shape; forming a third plating film 7-1 and a fourth plating film 7-2, onto the front surface of the insulation substrate and the front surface of the filling resin as one surface; and forming a first conductive circuit 8-1 and a second surface circuit 8-2 on both front surfaces of the insulation substrate from the third plating film 7-1 and the fourth plating film 7-2.SELECTED DRAWING: Figure 1

Description

本発明は、スルーホールを形成したプリント配線板の製造方法およびプリント配線板に関する。 The present invention relates to a method for manufacturing a printed wiring board having through holes and a printed wiring board.

従来、スルーホールを形成したプリント配線板が使用されている(例えば、特許文献1参照)。図4(a)~(d)は、それぞれ、従来のスルーホールを形成したプリント配線板の製造方法の一実施形態を示す図である。 Conventionally, a printed wiring board having a through hole formed has been used (see, for example, Patent Document 1). 4 (a) to 4 (d) are diagrams showing an embodiment of a conventional method for manufacturing a printed wiring board having a through hole formed therein.

プリント配線板の製造は以下の工程により行われる。まず、絶縁基板51とその両表面に形成された銅箔52とからなる両面銅貼積層板53にドリルで貫通孔54を形成し、露出する絶縁基板51上に筒状のスルーホール導体55と、銅箔52上にめっき膜59とを形成する(図4(a))。次に、スルーホール導体55内に充填樹脂56を充填し、充填樹脂56をスルーホール導体55とめっき膜59と面一になるように研磨する(図4(b))。次に、充填樹脂56とスルーホール導体55とめっき膜59とが面一となる両表面に、めっき膜57を形成する(図4(c))。さらに、めっき膜57に対し、例えばサブトラクティブ工法を適用して、導体回路58を形成している(図4(d))。 The printed wiring board is manufactured by the following process. First, a through hole 54 is formed by a drill in a double-sided copper-plated laminated plate 53 composed of an insulating substrate 51 and copper foils 52 formed on both surfaces thereof, and a tubular through-hole conductor 55 is formed on the exposed insulating substrate 51. , A plating film 59 is formed on the copper foil 52 (FIG. 4A). Next, the through-hole conductor 55 is filled with the filling resin 56, and the filling resin 56 is polished so as to be flush with the through-hole conductor 55 and the plating film 59 (FIG. 4B). Next, the plating film 57 is formed on both surfaces where the filling resin 56, the through-hole conductor 55, and the plating film 59 are flush with each other (FIG. 4 (c)). Further, for example, a subtractive method is applied to the plating film 57 to form a conductor circuit 58 (FIG. 4 (d)).

特開2003-163452号公報Japanese Patent Application Laid-Open No. 2003-163452

上述した製造方法で製造したプリント配線板においては、絶縁基板51の表面から、銅箔52の厚さ+スルーホール導体55の厚さ分だけ、充填樹脂56が突出する。そのため、図4(c)の状態において、充填樹脂56上の導体厚みが、絶縁基板51上の導体厚みより、銅箔52の厚さ+スルーホール導体55の厚さ分だけ薄くなる。この時、充填樹脂56の突出部付近で応力が大きくなり、めっき膜57の剥離等が生じ易くなる。充填樹脂56上の導体厚みが薄いため、その上に形成されたビルドアップ層をレーザ加工する際、導体を貫通する恐れがある。両面銅貼積層板53の絶縁基板51と銅箔52との界面の算術平均粗さRaが大きいため、絶縁基板51の伝送損失が大きくなり、高周波用基板として不利となる。 In the printed wiring board manufactured by the above-mentioned manufacturing method, the filling resin 56 protrudes from the surface of the insulating substrate 51 by the thickness of the copper foil 52 + the thickness of the through-hole conductor 55. Therefore, in the state of FIG. 4C, the conductor thickness on the filled resin 56 is thinner than the conductor thickness on the insulating substrate 51 by the thickness of the copper foil 52 + the thickness of the through-hole conductor 55. At this time, the stress increases in the vicinity of the protruding portion of the filling resin 56, and the plating film 57 is likely to be peeled off. Since the conductor thickness on the filling resin 56 is thin, there is a risk of penetrating the conductor when laser processing the build-up layer formed on the conductor. Since the arithmetic mean roughness Ra of the interface between the insulating substrate 51 of the double-sided copper-clad laminate 53 and the copper foil 52 is large, the transmission loss of the insulating substrate 51 becomes large, which is disadvantageous as a high-frequency substrate.

本発明に係るプリント配線板の製造方法は、第1面と、前記第1面と反対側の第2面を有する絶縁基板と、前記絶縁基板の前記第1面上に積層されている第1銅箔と、前記2面上に積層されている第2銅箔で形成されている両面銅貼積層板を準備することと、前記両面銅貼積層板を貫通する貫通孔を前記両面銅貼積層板に形成することと、前記貫通孔から露出する前記絶縁基板上に筒状のスルーホール導体を形成することと、前記第1銅箔上に第1めっき膜を形成することと、前記第2銅箔上に第2めっき膜を形成することと、前記スルーホール導体内に充填樹脂を充填することと、前記第1めっき膜と前記第1銅箔と前記スルーホール導体の一部と前記充填樹脂の一部を除去することで、前記第1面側に前記絶縁基板と前記スルーホール導体と前記充填樹脂で形成される第1平面を形成することと、前記第2めっき膜と前記第2銅箔と前記スルーホール導体の一部と前記充填樹脂の一部を除去することで、前記第2面側に前記絶縁基板と前記スルーホール導体と前記充填樹脂で形成される第2平面を形成することと、前記第1面から露出する前記絶縁基板と前記スルーホール導体と前記充填樹脂上に第3めっき膜を形成することと、前記第2面から露出する前記絶縁基板と前記スルーホール導体と前記充填樹脂上に第4めっき膜を形成すること、前記第3めっき膜から第1導体回路を形成することと、前記第4めっき膜から第2導体回路を形成することと、を含むプリント配線板の製造方法であって、前記第1面から露出するスルーホール導体が凸形状で、前記第1面より貫通孔に入り込む形状であり、前記第2面から露出するスルーホール導体が凸形状で、前記第2面より貫通孔に入り込む形状である。 In the method for manufacturing a printed wiring board according to the present invention, a first surface, an insulating substrate having a second surface opposite to the first surface, and a first surface laminated on the first surface of the insulating substrate. A double-sided copper-clad laminate formed of a copper foil and a second copper foil laminated on the two surfaces is prepared, and a through hole penetrating the double-sided copper-clad laminate is provided with the double-sided copper-clad laminate. Forming a plate, forming a tubular through-hole conductor on the insulating substrate exposed from the through hole, forming a first plating film on the first copper foil, and forming the second plating film. Forming a second plating film on the copper foil, filling the through-hole conductor with a filling resin, and filling the first plating film, the first copper foil, a part of the through-hole conductor, and the filling. By removing a part of the resin, a first plane formed of the insulating substrate, the through-hole conductor, and the filled resin is formed on the first surface side, and the second plating film and the second plating film are formed. By removing the copper foil, a part of the through-hole conductor, and a part of the filling resin, a second plane formed of the insulating substrate, the through-hole conductor, and the filling resin is formed on the second surface side. To form a third plating film on the insulating substrate exposed from the first surface, the through-hole conductor, and the filling resin, and the insulating substrate exposed from the second surface and the through-hole conductor. A print including forming a fourth conductor circuit on the filling resin, forming a first conductor circuit from the third plating film, and forming a second conductor circuit from the fourth plating film. In the method of manufacturing a wiring plate, the through-hole conductor exposed from the first surface has a convex shape and has a shape of entering the through hole from the first surface, and the through-hole conductor exposed from the second surface has a convex shape. The shape is such that it enters the through hole from the second surface.

本発明に係るプリント配線板は、第1面と、前記第1面と反対側の第2面を有する絶縁基板と、前記絶縁基板を貫通するよう形成された貫通孔と、前記貫通孔から露出する前記絶縁基板上に形成された筒状のスルーホール導体と、前記スルーホール導体内に充填された充填樹脂と、前記絶縁基板の前記第1面上に形成された第1導体回路と、前記絶縁基板の前記第2面上に形成された第2導体回路と、を含むプリント配線板であって、前記絶縁基板上の導体厚みと前記充填樹脂上の導体厚みとが同一であり、前記絶縁基板の表面と前記充填樹脂の表面とが面一であり、前記絶縁基板の前記第1面上には、前記第1導体回路のみが形成されており、前記絶縁基板の前記第2面上には、前記第2導体回路のみが形成されており、前記第1導体回路および前記第2導体回路は、前記絶縁基板の表面より深い位置で前記スルーホール導体と接触しており、前記スルーホール導体の両端部が凸形状である。 The printed wiring board according to the present invention has an insulating substrate having a first surface, a second surface opposite to the first surface, a through hole formed so as to penetrate the insulating substrate, and exposed from the through hole. A tubular through-hole conductor formed on the insulating substrate, a filling resin filled in the through-hole conductor, a first conductor circuit formed on the first surface of the insulating substrate, and the above. A printed wiring board including a second conductor circuit formed on the second surface of an insulating substrate, wherein the conductor thickness on the insulating substrate and the conductor thickness on the filling resin are the same, and the insulation is provided. The surface of the substrate and the surface of the filling resin are flush with each other, and only the first conductor circuit is formed on the first surface of the insulating substrate, and the surface of the insulating substrate is on the second surface. In, only the second conductor circuit is formed, and the first conductor circuit and the second conductor circuit are in contact with the through-hole conductor at a position deeper than the surface of the insulating substrate, and the through-hole conductor is formed. Both ends of the are convex.

(a)~(e)は、それぞれ、本発明に係るプリント配線板の製造方法の一実施形態における各工程を説明するための図である。(A) to (e) are diagrams for explaining each step in one embodiment of the method for manufacturing a printed wiring board according to the present invention, respectively. (a)~(d)は、それぞれ、第1導体回路および第2導体回路を形成するサブトラクティブ工法を説明するための図である。(A) to (d) are diagrams for explaining the subtractive construction method for forming the first conductor circuit and the second conductor circuit, respectively. (a)~(c)は、それぞれ、第1導体回路および第2導体回路を形成するセミアディティブ工法を説明するための図である。(A) to (c) are diagrams for explaining the semi-additive construction method for forming the first conductor circuit and the second conductor circuit, respectively. (a)~(d)は、それぞれ、従来のプリント配線板の製造方法の一実施形態における各工程を説明するための図である。(A) to (d) are diagrams for explaining each step in one embodiment of the conventional method for manufacturing a printed wiring board, respectively.

本発明に係るプリント配線板の製造方法の一実施形態が、図面を参照して説明される。なお、図1(a)~(e)に示す例において、各部材の寸法、特に高さ方向の寸法については、本発明の特徴をより良く理解できるようにするために、実際の寸法とは異なる寸法で記載している。以下、本発明に係るプリント配線板の製造方法の一実施形態を、図1(a)~(e)を参照して説明する。 An embodiment of a method for manufacturing a printed wiring board according to the present invention will be described with reference to the drawings. In the examples shown in FIGS. 1 (a) to 1 (e), the dimensions of each member, particularly the dimensions in the height direction, are the actual dimensions so that the features of the present invention can be better understood. They are listed with different dimensions. Hereinafter, an embodiment of the method for manufacturing a printed wiring board according to the present invention will be described with reference to FIGS. 1 (a) to 1 (e).

まず、図1(a)に示すように、従来と同様の方法を用いて、絶縁基板1とその両表面に形成された第1銅箔2-1および第2銅箔2-2とからなる両面銅貼積層板3を準備し、両面銅貼積層板3に貫通孔4を形成し、第1銅箔2-1上に第1めっき膜5-1と、第2銅箔2-2上に第2めっき膜5-2と、貫通孔4から露出する絶縁基板1上に筒状のスルーホール導体5-3とを形成する。 First, as shown in FIG. 1A, the insulating substrate 1 is composed of a first copper foil 2-1 and a second copper foil 2-2 formed on both surfaces thereof by using the same method as before. A double-sided copper-clad laminate 3 is prepared, a through hole 4 is formed in the double-sided copper-clad laminate 3, and a first plating film 5-1 and a second copper foil 2-2 are formed on the first copper foil 2-1. A second plating film 5-2 and a tubular through-hole conductor 5-3 are formed on the insulating substrate 1 exposed from the through hole 4.

ここで、両面銅貼積層板3としては、市販の両面銅貼積層板(CCL)を用いることができる。貫通孔4の形成は、両面銅貼積層板3に、従来から知られている方法、例えば、ドリル加工やレーザ(CO、UV-YAG、エキシマなど)加工を施すことで行うことができる。また、貫通孔4の形成後、スルーホール導体5-3の形成前に、絶縁基板1の表面および貫通孔4の側面の貫通孔形成で発生した残渣を、例えば、過マンガン酸+水酸化ナトリウムを用いるデスミア処理やCFを用いたプラズマを用いるデスミア処理で除去することが好ましい。さらに、第1めっき膜5-1および第2めっき膜5-2、スルーホール導体5-3は、無電解銅めっきとその後の電解銅めっきにより形成される。 Here, as the double-sided copper-clad laminate 3, a commercially available double-sided copper-clad laminate (CCL) can be used. The through hole 4 can be formed by subjecting the double-sided copper-clad laminate 3 to a conventionally known method, for example, drilling or laser (CO 2 , UV-YAG, excimer, etc.) processing. Further, after the formation of the through hole 4 and before the formation of the through hole conductor 5-3, the residue generated by the formation of the through hole on the surface of the insulating substrate 1 and the side surface of the through hole 4 is, for example, permanganate + sodium hydroxide. It is preferable to remove it by a desmear treatment using the above or a desmear treatment using plasma using CF 4 . Further, the first plating film 5-1 and the second plating film 5-2 and the through-hole conductor 5-3 are formed by electroless copper plating and subsequent electrolytic copper plating.

次に、図1(b)に示すように、スルーホール導体5-3内に充填樹脂6を充填する。ここで、充填樹脂6は、従来から知られているように、例えば熱硬化型のエポキシ樹脂組成物を用いることができる。また、充填樹脂6の充填は、従来から知られているように、印刷法や真空印刷法などを用いることができる。 Next, as shown in FIG. 1 (b), the filling resin 6 is filled in the through-hole conductor 5-3. Here, as the filling resin 6, for example, a thermosetting epoxy resin composition can be used, as is conventionally known. Further, as conventionally known, a printing method, a vacuum printing method, or the like can be used for filling the filling resin 6.

次に、図1(c)に示すように、両面銅貼積層板3の両表面に対し、研磨およびエッチングを行うことで、第1めっき膜5-1と第1銅箔2-1、第2めっき膜5-2と第2銅箔2-2、スルーホール導体5-3の一部、および、充填樹脂6の一部を除去する。研磨およびその後のエッチングにより、絶縁基板1の表面と充填樹脂6の表面とが面一となる。同時に、貫通孔4の側壁のスルーホール導体5-3の両端部が、凸形状で絶縁基板1と充填樹脂6とを面一とした表面より貫通孔4に入り込む形状となる。 Next, as shown in FIG. 1 (c), the first plating film 5-1 and the first copper foil 2-1 and the first copper foil 2-1 are obtained by polishing and etching both surfaces of the double-sided copper-clad laminate 3. 2 The plating film 5-2, the second copper foil 2-2, a part of the through-hole conductor 5-3, and a part of the filling resin 6 are removed. By polishing and subsequent etching, the surface of the insulating substrate 1 and the surface of the filling resin 6 become flush with each other. At the same time, both ends of the through-hole conductor 5-3 on the side wall of the through hole 4 are convex and have a shape of entering the through hole 4 from the surface where the insulating substrate 1 and the filling resin 6 are flush with each other.

ここで、両面銅貼積層板3の両表面の研磨方法としては、従来から知られているように、バフ研磨、ベルト研磨、平面研磨などの方法を用いることができ、製品の仕様により研磨方法を使い分ける。また、研磨後の絶縁基板1の両表面およびスルーホール導体5-3の両端部のエッチングは、従来から知られているように、エッチング液を用いるいずれのエッチング処理をも用いることができる。このとき、エッチング後、絶縁基板1の表面のRaが0.1μm以上0.5μm以下であることが好ましい。 Here, as a method for polishing both surfaces of the double-sided copper-clad laminate 3, as conventionally known methods, methods such as buffing, belt polishing, and surface polishing can be used, and the polishing method depends on the product specifications. Use properly. Further, as conventionally known, any etching process using an etching solution can be used for etching both surfaces of the insulating substrate 1 and both ends of the through-hole conductor 5-3 after polishing. At this time, after etching, the Ra on the surface of the insulating substrate 1 is preferably 0.1 μm or more and 0.5 μm or less.

次に、図1(d)に示すように、絶縁基板1の表面と充填樹脂6の表面とを面一とした両表面、および、両端部が凸形状のスルーホール導体5-3に、第3のめっき膜7-1および第4めっき膜7-2を形成する。第3めっき膜7-1および第4めっき膜7-2は、スルーホール導体5-3の形成と同様に、無電解銅めっきとその後の電解銅めっきにより形成することができる。このとき、同一である絶縁基板1上の導体(第3めっき膜7-1および第4めっき膜7-2)の厚みと充填樹脂6上の導体(第3めっき膜7-1および第4めっき膜7-2)の厚みとが20μm以上40μm以下であることが好ましい。 Next, as shown in FIG. 1 (d), both surfaces of the insulating substrate 1 and the surface of the filling resin 6 are flush with each other, and through-hole conductors 5-3 having convex ends at both ends are formed. The plating film 7-1 and the fourth plating film 7-2 of No. 3 are formed. The third plating film 7-1 and the fourth plating film 7-1 can be formed by electroless copper plating and subsequent electrolytic copper plating in the same manner as in the formation of the through-hole conductor 5-3. At this time, the thickness of the conductor (third plating film 7-1 and the fourth plating film 7-2) on the insulating substrate 1 and the conductor (third plating film 7-1 and the fourth plating) on the filling resin 6 are the same. The thickness of the film 7-2) is preferably 20 μm or more and 40 μm or less.

最後に、図1(e)に示すように、第3めっき膜7-1および第4めっき膜7-2を加工して、絶縁基板1の表面に第1導体回路8-1および第2導体回路8-2を形成する。第3めっき膜7-1および第4めっき膜7-2から第1導体回路8-1および第2導体回路8-2を形成するには、従来から知られているサブトラクティブ工法またはセミアディティブ工法を用いることができる。このとき、スルーホール導体5-3の両端部と第1導体回路8-1および第2導体回路8-2との接触位置は、絶縁基板1の表面より5μm以上深い位置であることが好ましい。 Finally, as shown in FIG. 1 (e), the third plating film 7-1 and the fourth plating film 7-2 are processed, and the first conductor circuit 8-1 and the second conductor are formed on the surface of the insulating substrate 1. The circuit 8-2 is formed. In order to form the first conductor circuit 8-1 and the second conductor circuit 8-2 from the third plating film 7-1 and the fourth plating film 7-2, a conventionally known subtractive method or semi-additive method is used. Can be used. At this time, the contact position between both ends of the through-hole conductor 5-3 and the first conductor circuit 8-1 and the second conductor circuit 8-2 is preferably a position deeper than the surface of the insulating substrate 1 by 5 μm or more.

以下、第3めっき膜7-1および第4めっき膜7-2から第1導体回路8-1および第2導体回路8-2を形成する際使用する加工方法として、サブトラクティブ工法およびセミアディティブ工法を、それぞれ、図2(a)~(d)および図3(a)~(d)を参照して説明する。図2(a)~(d)および図3(a)~(c)に示す例において、図1(a)~(e)に示した部材と同一の部材には同一の符号を付し、その説明を省略する。 Hereinafter, as a processing method used when forming the first conductor circuit 8-1 and the second conductor circuit 8-2 from the third plating film 7-1 and the fourth plating film 7-2, the subtractive method and the semi-additive method are used. Will be described with reference to FIGS. 2 (a) to 2 (d) and FIGS. 3 (a) to 3 (d), respectively. In the examples shown in FIGS. 2 (a) to 2 (d) and FIGS. 3 (a) to 3 (c), the same members as those shown in FIGS. 1 (a) to 1 (e) are designated by the same reference numerals. The explanation is omitted.

図2(a)~(d)は、それぞれ、サブトラクティブ工法に従って第1導体回路8-1および第2導体回路8-2を形成する一実施形態の工程を示す図である。まず、図2(a)に示す第3めっき膜7-1および第4めっき膜7-2を形成した状態の両面銅貼積層板3(図1(d)に対応)に対し、図2(b)に示すように、第1導体回路8-1および第2導体回路8-2を形成すべき位置にレジスト9を形成する。その後、レジスト9を形成した両面銅貼積層板3に対しエッチングを行い、図2(c)に示すように、レジスト9以外の第3めっき膜7-1および第4めっき膜7-2を除去して、絶縁基板1を露出させる。最後に、レジスト9を除去して、図2(d)に示すように、第1導体回路8-1および第2導体回路8-2を形成する。なお、レジスト9の形成、エッチング、レジスト9の除去は、いずれも公知の方法をとることができる。 2 (a) to 2 (d) are diagrams showing the steps of one embodiment for forming the first conductor circuit 8-1 and the second conductor circuit 8-2 according to the subtractive method, respectively. First, with respect to the double-sided copper-clad laminate 3 (corresponding to FIG. 1 (d)) in which the third plating film 7-1 and the fourth plating film 7-2 shown in FIG. 2 (a) are formed, FIG. 2 (corresponding to FIG. 1 (d)) As shown in b), the resist 9 is formed at a position where the first conductor circuit 8-1 and the second conductor circuit 8-2 should be formed. After that, etching was performed on the double-sided copper-clad laminate 3 on which the resist 9 was formed, and as shown in FIG. 2 (c), the third plating film 7-1 and the fourth plating film 7-2 other than the resist 9 were removed. Then, the insulating substrate 1 is exposed. Finally, the resist 9 is removed to form the first conductor circuit 8-1 and the second conductor circuit 8-2, as shown in FIG. 2D. A known method can be used for forming the resist 9, etching, and removing the resist 9.

図3(a)~(c)は、それぞれ、セミアディティブ工法に従って第1導体回路8-1および第2導体回路8-2を形成する一実施形態の工程を示す図である。まず、図3(a)に示すように、図1(c)に示す状態の絶縁基板1の表面上において、第1導体回路8-1および第2導体回路8-2を形成しない位置にレジスト9を形成する。次に、図3(b)に示すように、レジスト9の存在しない絶縁基板1上に第3めっき膜7-1および第4めっき膜7-2を形成する。最後に、レジスト9を除去して、図3(c)に示すように、第1導体回路8-1および第2導体回路8-2を形成する。本例においても、レジスト9の形成、エッチング、レジスト9の除去は、いずれも公知の方法をとることができる。セミアディディブ工法は、サブトラクティブ工法と比較して、狭ピッチの導体パターンの形成に向いている。 3 (a) to 3 (c) are diagrams showing the steps of one embodiment for forming the first conductor circuit 8-1 and the second conductor circuit 8-2 according to the semi-additive method, respectively. First, as shown in FIG. 3A, a resist is formed on the surface of the insulating substrate 1 in the state shown in FIG. 1C at a position where the first conductor circuit 8-1 and the second conductor circuit 8-2 are not formed. 9 is formed. Next, as shown in FIG. 3B, the third plating film 7-1 and the fourth plating film 7-2 are formed on the insulating substrate 1 in which the resist 9 does not exist. Finally, the resist 9 is removed to form the first conductor circuit 8-1 and the second conductor circuit 8-2, as shown in FIG. 3 (c). Also in this example, known methods can be used for forming the resist 9, etching, and removing the resist 9. The semi-additive method is more suitable for forming a narrow-pitch conductor pattern than the subtractive method.

次に、図1(e)を参照して、本発明に係る製造方法に従って製造したプリント配線板の一実施形態を説明する。 Next, an embodiment of the printed wiring board manufactured according to the manufacturing method according to the present invention will be described with reference to FIG. 1 (e).

図1(e)に示す実施形態において、絶縁基板1上の第1導体回路8-1および第2導体回路8-2の厚みと充填樹脂6上の第1導体回路8-1および第2導体回路8-2の厚みとが同一となり、好ましくは導体厚みが20μm以上40μm以下である。絶縁基板1の表面と充填樹脂6の表面とが面一となる。絶縁基板1の表面の算術平均粗さRaが0.1μm以上0.5μm以下である。絶縁基板1の表面のRaと充填樹脂6の表面のRaとが略同一である。絶縁基板1の第1面上には、第1銅箔2-1および第1銅箔2-1上の第1めっき膜5-1が存在せず、第1導体回路8-1のみが形成されている。絶縁基板1の第2面上には、第2銅箔2-2および第2銅箔2-2上の第2めっき膜5-2が存在せず、第2導体回路8-2のみが形成されている。第1導体回路8-1および第2導体回路8-2は、絶縁基板1の表面より深い位置でスルーホール導体5-3と接触しており、スルーホール導体5-3の両端部が凸形状である。好ましくは、絶縁基板1の第1面から露出するスルーホール導体5-3と第1導体回路8-1との接触位置、および、絶縁基板1の第2面から露出するスルーホール導体5-3と第2導体回路8-2との接触位置は、絶縁基板1の第1表面および第2表面よりそれぞれ5μm以上深い位置である。 In the embodiment shown in FIG. 1 (e), the thickness of the first conductor circuit 8-1 and the second conductor circuit 8-2 on the insulating substrate 1 and the first conductor circuit 8-1 and the second conductor on the filling resin 6 The thickness of the circuit 8-2 is the same, and the conductor thickness is preferably 20 μm or more and 40 μm or less. The surface of the insulating substrate 1 and the surface of the filling resin 6 are flush with each other. The arithmetic mean roughness Ra of the surface of the insulating substrate 1 is 0.1 μm or more and 0.5 μm or less. Ra on the surface of the insulating substrate 1 and Ra on the surface of the filling resin 6 are substantially the same. The first plating film 5-1 on the first copper foil 2-1 and the first copper foil 2-1 does not exist on the first surface of the insulating substrate 1, and only the first conductor circuit 8-1 is formed. Has been done. The second plating film 5-2 on the second copper foil 2-2 and the second copper foil 2-2 does not exist on the second surface of the insulating substrate 1, and only the second conductor circuit 8-2 is formed. Has been done. The first conductor circuit 8-1 and the second conductor circuit 8-2 are in contact with the through-hole conductor 5-3 at a position deeper than the surface of the insulating substrate 1, and both ends of the through-hole conductor 5-3 are convex. Is. Preferably, the contact position between the through-hole conductor 5-3 exposed from the first surface of the insulating substrate 1 and the first conductor circuit 8-1 and the through-hole conductor 5-3 exposed from the second surface of the insulating substrate 1 The contact position between the and the second conductor circuit 8-2 is 5 μm or more deeper than the first surface and the second surface of the insulating substrate 1, respectively.

図1(e)に示す本発明のプリント配線板によれば、絶縁基板1上の第1導体回路8-1および第2導体回路8-2の厚みと充填樹脂6上の第1導体回路8-1および第2導体回路8-2の厚みとが同一となるため、充填樹脂6が絶縁基板1より突出することはなく、第1導体回路8-1および第2導体回路8-2にかかる応力を均一にすることができる。また、第1導体回路8-1および第2導体回路8-2の厚みを、好ましくは20μm以上40μm以下と厚くできるため、上層をレーザ加工しても第1導体回路8-1および第2導体回路8-2を貫通する恐れを少なくすることができる。 According to the printed wiring board of the present invention shown in FIG. 1 (e), the thickness of the first conductor circuit 8-1 and the second conductor circuit 8-2 on the insulating substrate 1 and the thickness of the first conductor circuit 8 on the filling resin 6 Since the thickness of -1 and the second conductor circuit 8-2 are the same, the filling resin 6 does not protrude from the insulating substrate 1 and is applied to the first conductor circuit 8-1 and the second conductor circuit 8-2. The stress can be made uniform. Further, since the thickness of the first conductor circuit 8-1 and the second conductor circuit 8-2 can be preferably increased to 20 μm or more and 40 μm or less, even if the upper layer is laser-machined, the first conductor circuit 8-1 and the second conductor circuit 8-1 and the second conductor are formed. The risk of penetrating the circuit 8-2 can be reduced.

また、絶縁基板1および充填樹脂6の表面を研磨およびエッチングしているため、表面を好ましくはRaが0.1μm以上0.5μm以下と小さくすることができ、伝送損失を小さくでき、高周波用のプリント配線板として有利となる。さらに、スルーホール導体5-3の両端部が、凸形状であるとともにスルーホール内に、好ましくは表面より5μm以上深い位置まで入り込む構造であるため、第1導体回路8-1および第2導体回路8-2が絶縁基板1および充填樹脂6から剥がれにくくなり、第1導体回路8-1および第2導体回路8-2を強固に形成することができる。 Further, since the surfaces of the insulating substrate 1 and the filling resin 6 are polished and etched, the surface can be preferably as small as 0.1 μm or more and 0.5 μm or less, the transmission loss can be reduced, and the surface can be used for high frequencies. It is advantageous as a printed wiring board. Further, since both ends of the through-hole conductor 5-3 have a convex shape and have a structure that penetrates into the through-hole to a position preferably 5 μm or more deeper than the surface, the first conductor circuit 8-1 and the second conductor circuit 8-2 is less likely to peel off from the insulating substrate 1 and the filling resin 6, and the first conductor circuit 8-1 and the second conductor circuit 8-2 can be firmly formed.

1 絶縁基板
2-1 第1銅箔
2-2 第2銅箔
3 両面銅貼積層板
4 貫通孔
5-1 第1めっき膜
5-2 第2めっき膜
5-3 スルーホール導体
6 充填樹脂
7-1 第3めっき膜
7-2 第4めっき膜
8-1 第1導体回路
8-2 第2導体回路
9 レジスト
1 Insulated substrate 2-1 1st copper foil 2-2 2nd copper foil 3 Double-sided copper laminated board 4 Through hole 5-1 1st plating film 5-2 2nd plating film 5-3 Through-hole conductor 6 Filling resin 7 -1 3rd plating film 7-2 4th plating film 8-1 1st conductor circuit 8-2 2nd conductor circuit 9 Resist

Claims (9)

第1面と、前記第1面と反対側の第2面を有する絶縁基板と、前記絶縁基板の前記第1面上に積層されている第1銅箔と、前記2面上に積層されている第2銅箔で形成されている両面銅貼積層板を準備することと、
前記両面銅貼積層板を貫通する貫通孔を前記両面銅貼積層板に形成することと、
前記貫通孔から露出する前記絶縁基板上に筒状のスルーホール導体を形成することと、
前記第1銅箔上に第1めっき膜を形成することと、
前記第2銅箔上に第2めっき膜を形成することと、
前記スルーホール導体内に充填樹脂を充填することと、
前記第1めっき膜と前記第1銅箔と前記スルーホール導体の一部と前記充填樹脂の一部を除去することで、前記第1面側に前記絶縁基板と前記スルーホール導体と前記充填樹脂で形成される第1平面を形成することと、
前記第2めっき膜と前記第2銅箔と前記スルーホール導体の一部と前記充填樹脂の一部を除去することで、前記第2面側に前記絶縁基板と前記スルーホール導体と前記充填樹脂で形成される第2平面を形成することと、
前記第1面から露出する前記絶縁基板と前記スルーホール導体と前記充填樹脂上に第3めっき膜を形成することと、
前記第2面から露出する前記絶縁基板と前記スルーホール導体と前記充填樹脂上に第4めっき膜を形成すること、
前記第3めっき膜から第1導体回路を形成することと、
前記第4めっき膜から第2導体回路を形成することと、を含むプリント配線板の製造方法であって、
前記第1面から露出するスルーホール導体が凸形状で、前記第1面より貫通孔に入り込む形状であり、
前記第2面から露出するスルーホール導体が凸形状で、前記第2面より貫通孔に入り込む形状である。
An insulating substrate having a first surface, a second surface opposite to the first surface, and a first copper foil laminated on the first surface of the insulating substrate are laminated on the two surfaces. Preparing a double-sided copper-clad laminate made of the second copper foil,
By forming a through hole penetrating the double-sided copper-clad laminate in the double-sided copper-clad laminate,
Forming a cylindrical through-hole conductor on the insulating substrate exposed from the through hole, and
Forming the first plating film on the first copper foil and
Forming a second plating film on the second copper foil and
Filling the through-hole conductor with a filling resin and
By removing the first plating film, the first copper foil, a part of the through-hole conductor, and a part of the filling resin, the insulating substrate, the through-hole conductor, and the filling resin are on the first surface side. To form the first plane formed by
By removing the second plating film, the second copper foil, a part of the through-hole conductor, and a part of the filling resin, the insulating substrate, the through-hole conductor, and the filling resin are on the second surface side. To form the second plane formed by
Forming a third plating film on the insulating substrate exposed from the first surface, the through-hole conductor, and the filling resin, and
Forming a fourth plating film on the insulating substrate exposed from the second surface, the through-hole conductor, and the filling resin.
Forming the first conductor circuit from the third plating film and
It is a method of manufacturing a printed wiring board including forming a second conductor circuit from the fourth plating film.
The through-hole conductor exposed from the first surface has a convex shape and has a shape that enters the through hole from the first surface.
The through-hole conductor exposed from the second surface has a convex shape and has a shape that enters the through hole from the second surface.
請求項1のプリント配線板の製造方法であって、前記スルーホール導体を形成することと前記第1めっき膜を形成することと前記第2めっき膜を形成することは同時に行われ、前記第3めっき膜を形成することと前記第4めっき膜を形成することは同時に行われる。 In the method for manufacturing a printed wiring board according to claim 1, the formation of the through-hole conductor, the formation of the first plating film, and the formation of the second plating film are performed at the same time, and the third plating film is formed. The formation of the plating film and the formation of the fourth plating film are performed at the same time. 請求項1または2のプリント配線板の製造方法であって、前記第1めっき膜と前記第1銅箔と前記スルーホール導体の一部と前記充填樹脂の一部を除去することおよび前記第2めっき膜と前記第2銅箔と前記スルーホール導体の一部と前記充填樹脂の一部を除去することは、研磨およびエッチングで行われる。 The method for manufacturing a printed wiring board according to claim 1 or 2, wherein the first plating film, the first copper foil, a part of the through-hole conductor, and a part of the filling resin are removed, and the second. Removal of the plating film, the second copper foil, a part of the through-hole conductor, and a part of the filling resin is performed by polishing and etching. 請求項1または2のプリント配線板の製造方法であって、前記第3めっき膜から前記第1導体回路を形成することおよび前記第4めっき膜から前記第2導体回路を形成することは、サブトラクティブ工法またはセミアディティブ工法により行う。 In the method for manufacturing a printed wiring board according to claim 1 or 2, forming the first conductor circuit from the third plating film and forming the second conductor circuit from the fourth plating film is a subtra. It is carried out by the active method or the semi-additive method. 第1面と、前記第1面と反対側の第2面を有する絶縁基板と、
前記絶縁基板を貫通するよう形成された貫通孔と、
前記貫通孔から露出する前記絶縁基板上に形成された筒状のスルーホール導体と、
前記スルーホール導体内に充填された充填樹脂と、
前記絶縁基板の前記第1面上に形成された第1導体回路と、
前記絶縁基板の前記第2面上に形成された第2導体回路と、を含むプリント配線板であって、
前記絶縁基板上の導体厚みと前記充填樹脂上の導体厚みとが同一であり、
前記絶縁基板の表面と前記充填樹脂の表面とが面一であり、
前記絶縁基板の前記第1面上には、前記第1導体回路のみが形成されており、
前記絶縁基板の前記第2面上には、前記第2導体回路のみが形成されており、
前記第1導体回路および前記第2導体回路は、前記絶縁基板の表面より深い位置で前記スルーホール導体と接触しており、
前記スルーホール導体の両端部が凸形状である。
An insulating substrate having a first surface and a second surface opposite to the first surface,
A through hole formed so as to penetrate the insulating substrate,
A tubular through-hole conductor formed on the insulating substrate exposed from the through hole, and
The filling resin filled in the through-hole conductor and
A first conductor circuit formed on the first surface of the insulating substrate and
A printed wiring board comprising a second conductor circuit formed on the second surface of the insulating substrate.
The conductor thickness on the insulating substrate and the conductor thickness on the filling resin are the same,
The surface of the insulating substrate and the surface of the filling resin are flush with each other.
Only the first conductor circuit is formed on the first surface of the insulating substrate.
Only the second conductor circuit is formed on the second surface of the insulating substrate.
The first conductor circuit and the second conductor circuit are in contact with the through-hole conductor at a position deeper than the surface of the insulating substrate.
Both ends of the through-hole conductor are convex.
請求項5のプリント配線板であって、同一である前記絶縁基板上の導体厚みと前記充填樹脂上の導体厚みとが20μm以上40μm以下である。 In the printed wiring board of claim 5, the conductor thickness on the insulating substrate and the conductor thickness on the filling resin, which are the same, are 20 μm or more and 40 μm or less. 請求項5のプリント配線であって、前記絶縁基板の表面のRaが0.1μm以上0.5μm以下である。 In the printed wiring of claim 5, Ra on the surface of the insulating substrate is 0.1 μm or more and 0.5 μm or less. 請求項5のプリント配線板であって、前記第1面から露出する前記スルーホール導体と前記第1導体回路との接触位置および前記第2面から露出する前記スルーホール導体と前記第2導体回路との接触位置は、前記絶縁基板の表面より5μm以上深い位置である。 The printed wiring board according to claim 5, wherein the through-hole conductor exposed from the first surface and the first conductor circuit are in contact with each other, and the through-hole conductor exposed from the second surface and the second conductor circuit. The contact position with the insulation substrate is 5 μm or more deeper than the surface of the insulating substrate. 請求項5のプリント配線板であって、前記絶縁基板の表面のRaと前記充填樹脂の表面のRaとが略同一である。 In the printed wiring board of claim 5, Ra on the surface of the insulating substrate and Ra on the surface of the filling resin are substantially the same.
JP2020203913A 2020-12-09 2020-12-09 Manufacturing method of print circuit board and print circuit board Pending JP2022091223A (en)

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