JP2021099492A - エレクトロクロミックデバイス用の対電極 - Google Patents
エレクトロクロミックデバイス用の対電極 Download PDFInfo
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- JP2021099492A JP2021099492A JP2021013861A JP2021013861A JP2021099492A JP 2021099492 A JP2021099492 A JP 2021099492A JP 2021013861 A JP2021013861 A JP 2021013861A JP 2021013861 A JP2021013861 A JP 2021013861A JP 2021099492 A JP2021099492 A JP 2021099492A
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- Prior art keywords
- layer
- electrochromic
- counter electrode
- substrate
- lithium
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- 239000000463 material Substances 0.000 claims abstract description 202
- 238000000034 method Methods 0.000 claims abstract description 160
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- FKYIHOHREWQUFH-UHFFFAOYSA-N [W+4].[O-2].[Ta+5].[Ni+2] Chemical compound [W+4].[O-2].[Ta+5].[Ni+2] FKYIHOHREWQUFH-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000000203 mixture Substances 0.000 claims description 79
- 238000004519 manufacturing process Methods 0.000 claims description 26
- 229910044991 metal oxide Inorganic materials 0.000 claims description 21
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- 230000015572 biosynthetic process Effects 0.000 description 122
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- 229910052744 lithium Inorganic materials 0.000 description 85
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 84
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 80
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- 238000000151 deposition Methods 0.000 description 40
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- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 39
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- 238000004544 sputter deposition Methods 0.000 description 25
- 239000002159 nanocrystal Substances 0.000 description 22
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 21
- 229910001930 tungsten oxide Inorganic materials 0.000 description 21
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- 230000003287 optical effect Effects 0.000 description 14
- 239000005328 architectural glass Substances 0.000 description 13
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 12
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- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 11
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- 230000007547 defect Effects 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 8
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- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 6
- 229910001080 W alloy Inorganic materials 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
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- MOWMLACGTDMJRV-UHFFFAOYSA-N nickel tungsten Chemical compound [Ni].[W] MOWMLACGTDMJRV-UHFFFAOYSA-N 0.000 description 6
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- 238000010586 diagram Methods 0.000 description 5
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- USPVIMZDBBWXGM-UHFFFAOYSA-N nickel;oxotungsten Chemical compound [Ni].[W]=O USPVIMZDBBWXGM-UHFFFAOYSA-N 0.000 description 5
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- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 4
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- DZZDTRZOOBJSSG-UHFFFAOYSA-N [Ta].[W] Chemical compound [Ta].[W] DZZDTRZOOBJSSG-UHFFFAOYSA-N 0.000 description 3
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- 239000011261 inert gas Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- VMJRMGHWUWFWOB-UHFFFAOYSA-N nickel tantalum Chemical compound [Ni].[Ta] VMJRMGHWUWFWOB-UHFFFAOYSA-N 0.000 description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 3
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- 229910001415 sodium ion Inorganic materials 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910001887 tin oxide Inorganic materials 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 2
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 2
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 2
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- JFBZPFYRPYOZCQ-UHFFFAOYSA-N [Li].[Al] Chemical compound [Li].[Al] JFBZPFYRPYOZCQ-UHFFFAOYSA-N 0.000 description 2
- ZOTQTSYGAVSULL-UHFFFAOYSA-N [O].[Ta].[W].[Ni] Chemical compound [O].[Ta].[W].[Ni] ZOTQTSYGAVSULL-UHFFFAOYSA-N 0.000 description 2
- PGTAKMRAYVRICI-UHFFFAOYSA-N aluminum lithium borate Chemical compound B([O-])([O-])[O-].[Al+3].[Li+] PGTAKMRAYVRICI-UHFFFAOYSA-N 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
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- 230000003247 decreasing effect Effects 0.000 description 2
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- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
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- 239000007788 liquid Substances 0.000 description 2
- 229910000659 lithium lanthanum titanates (LLT) Inorganic materials 0.000 description 2
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 2
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 2
- IDBFBDSKYCUNPW-UHFFFAOYSA-N lithium nitride Chemical compound [Li]N([Li])[Li] IDBFBDSKYCUNPW-UHFFFAOYSA-N 0.000 description 2
- 229910001386 lithium phosphate Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
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- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
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- 229910001414 potassium ion Inorganic materials 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
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- 229910001925 ruthenium oxide Inorganic materials 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 238000005001 rutherford backscattering spectroscopy Methods 0.000 description 2
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- TWQULNDIKKJZPH-UHFFFAOYSA-K trilithium;phosphate Chemical compound [Li+].[Li+].[Li+].[O-]P([O-])([O-])=O TWQULNDIKKJZPH-UHFFFAOYSA-K 0.000 description 2
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 2
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- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
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- MKGYHFFYERNDHK-UHFFFAOYSA-K P(=O)([O-])([O-])[O-].[Ti+4].[Li+] Chemical compound P(=O)([O-])([O-])[O-].[Ti+4].[Li+] MKGYHFFYERNDHK-UHFFFAOYSA-K 0.000 description 1
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- 241001074085 Scophthalmus aquosus Species 0.000 description 1
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- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
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- G02F1/1514—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material
- G02F1/1523—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material comprising inorganic material
- G02F1/1524—Transition metal compounds
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- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/1514—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material
- G02F1/1523—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material comprising inorganic material
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/10—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating making use of vibrations, e.g. ultrasonic welding
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K9/00—Tenebrescent materials, i.e. materials for which the range of wavelengths for energy absorption is changed as a result of excitation by some form of energy
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- C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C23C14/083—Oxides of refractory metals or yttrium
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
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- G02F1/1514—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material
- G02F1/1523—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material comprising inorganic material
- G02F1/1525—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material comprising inorganic material characterised by a particular ion transporting layer, e.g. electrolyte
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- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
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- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
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- C—CHEMISTRY; METALLURGY
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- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F2001/1502—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect complementary cell
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/155—Electrodes
- G02F2001/1555—Counter electrode
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/44—Arrangements combining different electro-active layers, e.g. electrochromic, liquid crystal or electroluminescent layers
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Abstract
Description
本願は、それぞれがその全体として及びすべての目的のために参照により本明細書に援用される、2014年11月26日に出願され、「COUNTER ELECTRODE FOR ELECTROCHROMIC DEVICES」と題する米国仮出願第62/085,096号、及び2015年7月14日に出願され、「COUNTER ELECTRODE FOR ELECTROCHROMIC DEVICES」と題する米国仮出願第62/192,443号に対する優先権の利益を主張する。
図1Aに示されるように、陽極着色する対電極は、一部の場合では単一の均質層であってよい。しかしながら、本明細書のいくつかの実施形態では、陽極着色する対電極層は組成または形態等の物理的特徴において異質である。係る異質対電極層は改善された色、切替え動作、耐用期間、均一性、プロセスウィンドウ等を示すことがある。異種対電極は、その全体として参照により本明細書に援用される米国仮特許出願第62/192,443号にさらに説明される。
エレクトロクロミック積層体の成膜
上述したように、実施形態の一態様はエレクトロクロミック窓を製造する方法である。広義では、方法は、イオン伝導性層が、陰極着色するエレクトロクロミック層及び陽極着色する対電極層を分離する積層体を形成するために、基板に(i)陰極着色するエレクトロクロミック層、(ii)任意選択のイオン伝導性層、及び(iii)陽極着色する対電極層を順次成膜することを含む。順次成膜は、圧力、温度、及び/またはガス組成が統合成膜システムの外部の外部環境とは関係なく制御される制御された周囲環境を有し、基板がエレクトロクロミック層、イオン伝導性層、及び対電極層の順次成膜中いずれのときでも統合成膜システムを離れない単一統合成膜システムを利用する。(制御された周囲環境を維持する統合成膜システムの例は、図5A〜図5Eに関して以下により詳細に説明される。)ガス組成は、制御された周囲環境での多様な構成要素の分圧によって特徴付けられてよい。また、制御された周囲環境は、粒子の数または粒子密度に関して特徴付けられることもある。特定の実施形態では、制御された周囲環境はm3あたり350未満の(0.1マイクロメートル以上のサイズの)粒子を含有する。特定の実施形態では、制御された周囲環境はクラス1000のクリーンルーム(US FED STD 209E)またはクラス100のクリーンルーム(US FED STD 209E)の要件を満たす。特定の実施形態では、制御された周囲環境は、クラス10のクリーンルーム(US FED STD 209E)の要件を満たす。基板はクラス1000、クラス100、またはクラス10の要件を満たすクリーンルームの制御された周囲環境に進入してよい及び/または周囲環境を出てよい。
一部の実施形態では、上述したように、リチウムイオンのインターカレーションがエレクトロクロミックデバイス積層体の光学状態を切り替えることを担う。必要とされるリチウムが多様な手段によって積層体に導入されてよいことが理解されたい。例えば、リチウムは層の材料の成膜と同時に、これらの層の1つまたは複数に提供されてよい(例えば、EC層の形成中のリチウム及びタングステンの同時成膜)。しかしながら、一部の場合では、図4BのプロセスはEC層、IC層、及び/またはCE層にリチウムを供給するための1つまたは複数の処理によって中断されてよい。例えば、リチウムは、リチウム元素が他の材料の実質的な成膜なしに供給される1つまたは複数の個別のリチオ化ステップを介して導入されてもよい。係るリチオ化ステップ(複数可)は、EC層、IC層、及び/またはCE層の成膜後に行われてよい。代わりに(またはさらに)、1つまたは複数のリチオ化ステップが、単一の層を成膜するために実行されるステップの間に実行されてもよい。例えば、対電極層は、最初に限られた量の酸化ニッケルタングステンタンタルを成膜し、続いてリチウムを直接的に成膜することによって成膜し、次いで追加の量の酸化ニッケルタングステンタンタルを成膜することによって終えられてよい。係る手法は、成膜を改善し、望ましくない副反応を防ぐ、ITO(または導電層の他の材料)からリチウムをうまく分離する等の特定の優位点を有してよい。別個のリチオ化処理を実行する積層体形成プロセスの一例が図4Cに示される。特定の場合では、リチオ化処理(複数可)は、層の成膜が完成される前にリチウムを導入できるようにするために、所与の層の成膜が、一時的に中断される間に実行される。
再び図4Aを参照すると、いったん積層体が成膜されると、デバイスには多段階熱化学調整(MTC)プロセスが実行される(ブロック730を参照)。通常、MTCプロセスは、エレクトロクロミック積層体のすべての層が形成された後にだけ実行される。MTCプロセス730の一部の実施形態は図4Eにより詳細に示される。MTCプロセスは、例えば真空を破壊するもしくは積層体を製造するために使用される制御された周囲環境の外部に基板を移動することなく、完全にエクスサイチュで、つまり積層体を成膜するために使用される統合成膜システムの外部で、または少なくとも部分的にもしくは完全にインサイチュで、つまり成膜システムの内部で成膜できることに留意されたい。特定の実施形態では、MTCプロセスの初期の部分はインサイチュで実行され、プロセスの後の部分はエクスサイチュで実行される。特定の実施形態では、MTCの部分は、例えば第2のTCO層の成膜前に等、特定の層の成膜前に実行される。
再び図4Aを参照すると、第2のレーザー切込(ブロック740)が実行される。レーザー切込740は、第1のレーザー切込に垂直な基板の2つの側面で積層体の外縁の近くの基板の長さに沿って実行される。図3は、レーザー切込740によって形成されるトレンチ626の場所を示す。また、この切込は、(第1のバスバーが接続される)第1のTCO層の分離された部分をさらに分離し、端縁で(例えば、マスク近くで)積層体コーティングを分離して積層体層の成膜ロールオフによる短絡を最小限に抑えるために、第1のTCO(及び存在する場合は拡散障壁)を貫通して基板まで実行される。一実施形態では、トレンチは幅が約100μmと300μmの間である。別の実施形態では、トレンチは幅が約150μmと250μmの間である。別の実施形態では、トレンチは幅が約150μmである。トレンチは、関連する構成要素を効果的に分離するほど十分に深い必要がある。
上記に説明されたように、統合成膜システムは、例えば建築用ガラス上でエケレクトロクロミックデバイスを製造するために利用されてよい。上述したように、エレクトロクロミックデバイスは、同様にエレクトロクロミック窓を作るために使用されるIGUを作るために使用される。用語「統合成膜システム」は、光学的に透明な基板及び半透明な基板上にエレクトロクロミックデバイスを製造するための装置を意味する。装置は、それぞれが、係るデバイスまたはその部分の洗浄、エッチング、及び温度制御だけではなく、エレクトロクロミックデバイスの特定の構成要素(または構成要素の一部分)を成膜する等の特定のユニット操作を専門に行う複数のステーションを有する。複数のステーションは、エレクトロクロミックデバイスが外部環境に曝露されることなく、製造されている基板があるステーションから次のステーションに移動できるように完全に統合されている。統合成膜システムは、プロセスステーションが位置するシステム内部の制御された周囲環境で動作する。完全に統合されたシステムは、成膜される層の間の界面特性のより優れた制御を可能にする。界面特性は、他の要因の中でも、層間の接着性、界面領域での汚染物質がないことを指す。用語「制御された周囲環境」は、開放大気環境またはクリーンルーム等の外部環境から分離された密閉環境を意味する。制御された周囲環境では、圧力及びガス組成の少なくとも1つは外部環境の状況とは独立して制御される。概して、必ずしもそうではないが、制御された周囲環境は、大気圧以下の圧力、例えば少なくとも不完全真空を有する。制御された周囲環境での状況は処理操作中一定のままとなることもあれば、経時的に変わることもある。例えば、エレクトロクロミックデバイスの層は制御された周囲環境の真空下で成膜されてよく、成膜処理の終わりには、環境は、パージガスまたは試薬ガスで際充填されてよく、別のステーションでの処理のために圧力を例えば大気圧まで高め、次いで次の処理のために真空が確立し直されてよい等である。
実験結果は、開示されているNiWTaO材料が非常に高品質の着色特性を示すことを示している。特に、NiWTaO材料は、その消色状態において非常に澄んで(透明で)おり、その消色状態でもいくぶん色が付いている他の材料と比較すると、より少ない色(特に黄色)を有している。さらに、NiWTaO材料は経時的に良好な切替え特性を示す。言い換えると、切替え速度は、切替え速度がますます遅くなる特定の他の材料と比較すると、対電極の寿命に亘って著しく減少することはない。
混合された酸化ニッケルタングステンタンタルである、NiWTaOは、基板が成膜チャンバ内で前後にラスタ化されるのにつれ、スパッタされた材料の非常に薄い層の反復される成膜を使用し、成膜されてよい。チャンバ圧力が約10mTorrでのアルゴン及び酸素分子の混合物でのNiW合金及びタンタル金属ターゲットの反応性スパッタリングが使用されてよい。NiW合金ターゲットは、Ni及びWの粉末を使用する熱間静水圧プレス(HIP)方法を使用し、作り出されてよい。各ターゲットに対する出力は、2つの同期パルスDC電源を使用し、独立して制御される。Ta対Ni+Wの比率は、2つのターゲット間の出力の比を変えることによって調整される。所与の出力状態のNiWTaOの厚さは、基板が成膜チャンバを通って移動するにつれ、基板を加速させるまたは減速させることによって変更できる。対電極全体の所望される厚さを達成するために、ターゲットの前を通過する回数は、必要に応じて増加できる、または減少できる。膜の酸化の程度は、全圧だけではなくスパッタリングガスのAr及びO2の分圧も調整することによって制御できる。これらのプロセスパラメータの操作を通じて、NiW:Ta:Oの比率を制御できる。加熱器は温度変動のために使用されてよいが、最高性能の膜及びデバイスは通常追加の加熱なしに成膜される。基板温度は通常100℃未満である。
上記実施形態は理解を容易にするためにある程度詳細に説明されてきたが、説明されている実施形態は例示的と見なされるべきであり、制限的と見なされるべきではない。特定の変更及び変更形態が添付の特許請求の範囲の範囲内で実施できることは当業者に明らかである。
Claims (1)
- エレクトロクロミック積層体を製造する方法であって、
陰極着色エレクトロクロミック材料を備える陰極着色層を形成することと、
酸化ニッケルタングステンタンタルを備える陽極着色層を形成することと、
を含み、
前記酸化ニッケルタングステンタンタルはNi:(W+Ta)の原子比率が1.8:1と3:1の間であり、W:Taの原子比率が1:1と2:1の間であり、
前記陽極着色層が、異なる組成及び/又は異なる相対濃度を有する2つ以上の副層を備え、
前記2つ以上の副層のうちの第1副層は二元金属酸化物を含み、第2副層は三元金属酸化物を含む、
方法。
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Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11187954B2 (en) * | 2009-03-31 | 2021-11-30 | View, Inc. | Electrochromic cathode materials |
US10261381B2 (en) | 2009-03-31 | 2019-04-16 | View, Inc. | Fabrication of low defectivity electrochromic devices |
US10156762B2 (en) | 2009-03-31 | 2018-12-18 | View, Inc. | Counter electrode for electrochromic devices |
US9664974B2 (en) | 2009-03-31 | 2017-05-30 | View, Inc. | Fabrication of low defectivity electrochromic devices |
US8582193B2 (en) | 2010-04-30 | 2013-11-12 | View, Inc. | Electrochromic devices |
US10591795B2 (en) | 2009-03-31 | 2020-03-17 | View, Inc. | Counter electrode for electrochromic devices |
US9261751B2 (en) | 2010-04-30 | 2016-02-16 | View, Inc. | Electrochromic devices |
US10852613B2 (en) | 2009-03-31 | 2020-12-01 | View, Inc. | Counter electrode material for electrochromic devices |
US9759975B2 (en) | 2010-04-30 | 2017-09-12 | View, Inc. | Electrochromic devices |
US11891327B2 (en) | 2014-05-02 | 2024-02-06 | View, Inc. | Fabrication of low defectivity electrochromic devices |
EP3189373B1 (en) | 2014-09-05 | 2019-11-06 | View, Inc. | Electrochromic stack with particular counter electrode and method for fabricating such stack |
EP4220291A3 (en) | 2014-11-26 | 2023-10-04 | View, Inc. | Counter electrode for electrochromic devices |
KR102202928B1 (ko) * | 2017-04-24 | 2021-01-14 | 주식회사 엘지화학 | 투광성 필름 및 이를 포함하는 전기변색소자 |
KR20180119120A (ko) * | 2017-04-24 | 2018-11-01 | 주식회사 엘지화학 | 도전성 적층체 및 이를 포함하는 전기변색소자 |
KR102141631B1 (ko) * | 2017-05-31 | 2020-08-05 | 주식회사 엘지화학 | 투과도 가변 필름 및 투과도 가변 필름의 제조방법 |
KR102035907B1 (ko) * | 2017-12-15 | 2019-10-23 | 주식회사 엘지화학 | 장식 부재 및 이의 제조방법 |
KR101986348B1 (ko) * | 2017-12-15 | 2019-06-05 | 성문전자주식회사 | 이색이상의 다변색이 가능한 스마트 윈도우용 변색필름 |
KR101999352B1 (ko) * | 2017-12-15 | 2019-07-11 | 성문전자주식회사 | 투과율이 가변되는 스마트 윈도우용 변색필름 |
WO2020018002A1 (en) * | 2018-07-18 | 2020-01-23 | Comberry, Llc | Electrochromic material and method of manufacturing thereof |
CN112654907A (zh) * | 2018-09-26 | 2021-04-13 | Sage电致变色显示有限公司 | 电活性器件及方法 |
CN110208997A (zh) * | 2019-05-31 | 2019-09-06 | 广东旗滨节能玻璃有限公司 | 一种智能变色玻璃及其制备方法和应用 |
RU2758201C2 (ru) * | 2019-11-28 | 2021-10-26 | Общество с ограниченной ответственностью "СмартЭлектроГласс" | Противоэлектрод электрохромного устройства и способ его изготовления |
FR3105459B1 (fr) * | 2019-12-20 | 2023-06-23 | Saint Gobain | Trempe thermique d’une electrode travail |
US11703737B2 (en) * | 2020-02-12 | 2023-07-18 | Sage Electrochromics, Inc. | Forming electrochromic stacks using at most one metallic lithium deposition station |
US20210271145A1 (en) * | 2020-02-25 | 2021-09-02 | Sage Electrochromics, Inc. | Approaches to modifying a color of an electrochromic stack in a tinted state |
CN111747660A (zh) * | 2020-07-09 | 2020-10-09 | 西安邮电大学 | 纳米孔阵列结构的电致变色复合薄膜及其制备方法、应用 |
CN114280111B (zh) * | 2021-12-24 | 2023-11-24 | 复旦大学 | 铈掺杂氧化钨复合材料和硫化氢传感器、以及制备方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20110100457A (ko) * | 2010-03-04 | 2011-09-14 | 서울대학교산학협력단 | 전기 변색 소자 제조방법 |
JP2012523019A (ja) * | 2009-03-31 | 2012-09-27 | ソラダイム, インコーポレイテッド | エレクトロクロミック素子 |
JP2013525860A (ja) * | 2010-04-30 | 2013-06-20 | ビュー, インコーポレイテッド | エレクトロクロミックデバイス |
US20140205748A1 (en) * | 2013-01-21 | 2014-07-24 | Kinestral Technologies, Inc. | Process for preparing a multi-layer electrochromic structure |
US20140329006A1 (en) * | 2011-09-30 | 2014-11-06 | View, Inc. | Optical device fabrication |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030031928A1 (en) * | 1999-05-20 | 2003-02-13 | Saint-Gobain Vitrage | Electrochemical device |
US6859297B2 (en) * | 2001-08-07 | 2005-02-22 | Midwest Research Institute | Electrochromic counter electrode |
CN100344002C (zh) * | 2001-08-20 | 2007-10-17 | 昭和电工株式会社 | 多色发光灯和光源 |
US7372610B2 (en) * | 2005-02-23 | 2008-05-13 | Sage Electrochromics, Inc. | Electrochromic devices and methods |
US7593154B2 (en) * | 2005-10-11 | 2009-09-22 | Sage Electrochromics, Inc. | Electrochromic devices having improved ion conducting layers |
WO2009115424A1 (en) * | 2008-03-17 | 2009-09-24 | Nv Bekaert Sa | A light weight electrochromic mirror stack |
US8842357B2 (en) * | 2008-12-31 | 2014-09-23 | View, Inc. | Electrochromic device and method for making electrochromic device |
US8764950B2 (en) * | 2010-04-30 | 2014-07-01 | View, Inc. | Electrochromic devices |
US8300298B2 (en) | 2010-04-30 | 2012-10-30 | Soladigm, Inc. | Electrochromic devices |
US9007674B2 (en) * | 2011-09-30 | 2015-04-14 | View, Inc. | Defect-mitigation layers in electrochromic devices |
US8582193B2 (en) * | 2010-04-30 | 2013-11-12 | View, Inc. | Electrochromic devices |
US8289610B2 (en) * | 2009-08-27 | 2012-10-16 | Guardian Industries Corp. | Electrochromic devices, assemblies incorporating electrochromic devices, and/or methods of making the same |
WO2011137104A1 (en) * | 2010-04-30 | 2011-11-03 | Soladigm, Inc. | Electrochromic devices |
CN102540612B (zh) * | 2010-12-31 | 2014-06-11 | 京东方科技集团股份有限公司 | 一种电致变色器件的制作方法和电致变色器件 |
WO2012109494A2 (en) * | 2011-02-09 | 2012-08-16 | Kinestral Technologies, Inc. | Electrochromic multi-layer devices with spatially coordinated switching |
EP2734601B1 (en) * | 2011-07-21 | 2019-09-04 | Sage Electrochromics, Inc. | Electrochromic nickel oxide simultaneously doped with lithium and a metal dopant |
ITRM20110536A1 (it) * | 2011-10-10 | 2013-04-11 | Univ Calabria | Dispositivo elettrocromico. |
ES2637799T3 (es) * | 2011-11-15 | 2017-10-17 | Ashwin-Ushas Corporation, Inc. | Dispositivo electrocrómico con polímeros complementarios |
WO2014025900A1 (en) * | 2012-08-08 | 2014-02-13 | Kinestral Technologies, Inc. | Electrochromic multi-layer devices with composite electrically conductive layers |
-
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012523019A (ja) * | 2009-03-31 | 2012-09-27 | ソラダイム, インコーポレイテッド | エレクトロクロミック素子 |
KR20110100457A (ko) * | 2010-03-04 | 2011-09-14 | 서울대학교산학협력단 | 전기 변색 소자 제조방법 |
JP2013525860A (ja) * | 2010-04-30 | 2013-06-20 | ビュー, インコーポレイテッド | エレクトロクロミックデバイス |
US20140329006A1 (en) * | 2011-09-30 | 2014-11-06 | View, Inc. | Optical device fabrication |
US20140205748A1 (en) * | 2013-01-21 | 2014-07-24 | Kinestral Technologies, Inc. | Process for preparing a multi-layer electrochromic structure |
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TW201621438A (zh) | 2016-06-16 |
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WO2016085823A1 (en) | 2016-06-02 |
TWI736526B (zh) | 2021-08-21 |
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RU2017120233A (ru) | 2018-12-26 |
AU2021202495A1 (en) | 2021-05-20 |
HK1244544A1 (zh) | 2018-08-10 |
EP3224671A4 (en) | 2018-06-20 |
JP2017538965A (ja) | 2017-12-28 |
CA2968832A1 (en) | 2016-06-02 |
TW202206924A (zh) | 2022-02-16 |
AU2015353823A1 (en) | 2017-06-08 |
EP3224671B1 (en) | 2024-02-28 |
CN114488641A (zh) | 2022-05-13 |
KR20170086631A (ko) | 2017-07-26 |
KR102479688B1 (ko) | 2022-12-20 |
KR20230003636A (ko) | 2023-01-06 |
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