JP2021097039A5 - - Google Patents

Download PDF

Info

Publication number
JP2021097039A5
JP2021097039A5 JP2020199270A JP2020199270A JP2021097039A5 JP 2021097039 A5 JP2021097039 A5 JP 2021097039A5 JP 2020199270 A JP2020199270 A JP 2020199270A JP 2020199270 A JP2020199270 A JP 2020199270A JP 2021097039 A5 JP2021097039 A5 JP 2021097039A5
Authority
JP
Japan
Prior art keywords
tkd
pattern
determining
sample
diffraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020199270A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021097039A (ja
JP7228558B2 (ja
Filing date
Publication date
Priority claimed from EP19216196.6A external-priority patent/EP3835768B1/en
Application filed filed Critical
Publication of JP2021097039A publication Critical patent/JP2021097039A/ja
Publication of JP2021097039A5 publication Critical patent/JP2021097039A5/ja
Application granted granted Critical
Publication of JP7228558B2 publication Critical patent/JP7228558B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2020199270A 2019-12-13 2020-12-01 透過菊池回折パターンの改良方法 Active JP7228558B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19216196.6A EP3835768B1 (en) 2019-12-13 2019-12-13 Method for improving kikuchi diffraction patterns
EP19216196 2019-12-13

Publications (3)

Publication Number Publication Date
JP2021097039A JP2021097039A (ja) 2021-06-24
JP2021097039A5 true JP2021097039A5 (enExample) 2023-01-19
JP7228558B2 JP7228558B2 (ja) 2023-02-24

Family

ID=68917374

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020199270A Active JP7228558B2 (ja) 2019-12-13 2020-12-01 透過菊池回折パターンの改良方法

Country Status (3)

Country Link
US (1) US11270867B2 (enExample)
EP (1) EP3835768B1 (enExample)
JP (1) JP7228558B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3736561B1 (en) * 2019-05-08 2021-05-05 Bruker Nano GmbH Method for improving an ebsd/tkd map
EP3770945B1 (en) * 2019-07-26 2024-06-19 Bruker Nano GmbH Kikuchi diffraction detector
EP3835768B1 (en) * 2019-12-13 2021-10-27 Bruker Nano GmbH Method for improving kikuchi diffraction patterns
CN113720865B (zh) 2021-08-06 2022-09-02 清华大学 自动矫正样品带轴偏离的电子层叠成像方法及装置
GB202208289D0 (en) * 2022-06-06 2022-07-20 Oxford Instruments Nanotechnology Tools Ltd Ebsd data enhancement using simulated pattern matching
US11996264B1 (en) * 2023-09-06 2024-05-28 Honeywell Federal Manufacturing & Technologies, Llc Sample mount for electron backscatter diffraction

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6555817B1 (en) * 2000-05-17 2003-04-29 Thermo Noran Inc. Method and apparatus for correcting magnetic field distortions in electron backscatter diffraction patterns obtained in an electron microscope
GB0506907D0 (en) * 2005-04-05 2005-05-11 Oxford Instr Analytical Ltd Method for correcting distortions in electron backscatter diffraction patterns
GB201302694D0 (en) * 2013-02-15 2013-04-03 Oxford Instr Nanotechnology Tools Ltd Method of electron beam diffraction analysis
GB201402318D0 (en) * 2014-02-11 2014-03-26 Oxford Instr Nanotechnology Tools Ltd Method for materials analysis
DE102014208295A1 (de) * 2014-05-02 2015-11-05 Bruker Nano Gmbh Verfahren und Anordnung zur Identifikation kristalliner Phasen sowie ein entsprechendes Computerprogramm und ein entsprechendes computerlesbares Speichermedium
DE102014226985B4 (de) * 2014-12-23 2024-02-08 Carl Zeiss Microscopy Gmbh Verfahren zum Analysieren eines Objekts, Computerprogrammprodukt sowie Teilchenstrahlgerät zur Durchführung des Verfahrens
EP3121593B1 (en) * 2015-07-23 2023-11-08 Carl Zeiss Microscopy GmbH Method of determining crystallographic properties of a sample and electron beam microscope for performing the method
FR3074949B1 (fr) * 2017-12-11 2019-12-20 Electricite De France Procede, dispositif et programme de traitement d'images de diffraction d'un materiau cristallin
US11756764B2 (en) * 2019-04-23 2023-09-12 Hitachi High-Tech Corporation Charged particle beam apparatus and method of controlling charged particle beam apparatus
EP3770945B1 (en) * 2019-07-26 2024-06-19 Bruker Nano GmbH Kikuchi diffraction detector
EP3835768B1 (en) * 2019-12-13 2021-10-27 Bruker Nano GmbH Method for improving kikuchi diffraction patterns

Similar Documents

Publication Publication Date Title
JP2021097039A5 (enExample)
JP7228558B2 (ja) 透過菊池回折パターンの改良方法
Saulick et al. A semi‐automated technique for repeatable and reproducible contact angle measurements in granular materials using the sessile drop method
CN113624358B (zh) 用于光热反射显微热成像的三维位移补偿方法及控制装置
CN116551215B (zh) 激光器的激光扫描控制方法、装置、设备及存储介质
CN109614459B (zh) 应用于二维激光的地图构建回环检测方法及设备
CN106767493B (zh) 一种变基准面凹坑深度测量方法
JP3379637B2 (ja) 電子プローブマイクロアナライザー
CN117095065B (zh) 线光谱共聚焦位移传感器标定方法、系统及设备
CN118650313A (zh) 激光振镜的标定方法、装置、计算机设备和存储介质
TWI726105B (zh) 用於自動產生一晶圓影像以設計座標映射之系統、方法及電腦程式產品
CN119027350A (zh) 一种基于高频聚焦探头声场校准的超声显微图像恢复方法
Gulyaev Measurement of the length of objects on scanning probe microscope images using curvature detectors
CN120065340A (zh) 基于独立干扰源的规则干扰波消除方法及其设备和介质
CN205539857U (zh) 一种激光声光扫描装置
CN116992188A (zh) 基于改进的优化算法提高长距离下直线度测量精度的方法
JP5087165B1 (ja) 表面検査装置を調整するためのデータを出力する調整装置、調整データ出力方法及びプログラム
JP4156177B2 (ja) ピエゾスキャナの歪み補正方法
JP6805945B2 (ja) 分析方法及び分析装置
CN113870359B (zh) 基于随机梯度下降的激光雷达外参标定方法及装置
CN120063586B (zh) 一种芯片动平衡测试用校正方法及其系统
CN117213367B (zh) 线光谱共聚焦高精度标定方法、系统、设备及存储介质
JP6160266B2 (ja) 走査型プローブ顕微鏡の制御プログラム、制御方法及び制御装置
JPWO2013084565A1 (ja) データ補正装置及びデータ補正プログラム
JP5860785B2 (ja) 荷電粒子顕微鏡システムおよびそれを用いた計測方法