JP2020524364A - コーティングおよび層系ならびにバイポーラプレート、燃料電池および電気分解装置 - Google Patents
コーティングおよび層系ならびにバイポーラプレート、燃料電池および電気分解装置 Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 67
- 239000000446 fuel Substances 0.000 title claims abstract description 42
- 239000011248 coating agent Substances 0.000 claims abstract description 62
- 229910052729 chemical element Inorganic materials 0.000 claims abstract description 53
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 29
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims abstract description 29
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 27
- 229910052751 metal Inorganic materials 0.000 claims abstract description 27
- 239000002184 metal Substances 0.000 claims abstract description 25
- 239000001257 hydrogen Substances 0.000 claims abstract description 23
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 23
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 22
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 19
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910000510 noble metal Inorganic materials 0.000 claims abstract description 14
- 239000001301 oxygen Substances 0.000 claims abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 14
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims abstract description 13
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 13
- 239000011737 fluorine Substances 0.000 claims abstract description 13
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 11
- 239000006104 solid solution Substances 0.000 claims abstract description 9
- 239000010970 precious metal Substances 0.000 claims abstract description 6
- 239000000758 substrate Substances 0.000 claims description 25
- 239000010936 titanium Substances 0.000 claims description 21
- 239000010955 niobium Substances 0.000 claims description 17
- 229910052719 titanium Inorganic materials 0.000 claims description 16
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 15
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 14
- 229910052737 gold Inorganic materials 0.000 claims description 14
- 239000010931 gold Substances 0.000 claims description 14
- 229910052758 niobium Inorganic materials 0.000 claims description 12
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 12
- 239000003870 refractory metal Substances 0.000 claims description 11
- 239000005518 polymer electrolyte Substances 0.000 claims description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 7
- 239000010953 base metal Substances 0.000 claims description 7
- 229910052735 hafnium Inorganic materials 0.000 claims description 7
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052715 tantalum Inorganic materials 0.000 claims description 7
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 7
- 229910052726 zirconium Inorganic materials 0.000 claims description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 238000005868 electrolysis reaction Methods 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
- 229910052684 Cerium Inorganic materials 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- 239000010948 rhodium Substances 0.000 claims description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 89
- 238000005260 corrosion Methods 0.000 description 18
- 230000007797 corrosion Effects 0.000 description 18
- 238000000034 method Methods 0.000 description 12
- 239000010935 stainless steel Substances 0.000 description 12
- 229910001220 stainless steel Inorganic materials 0.000 description 12
- 239000000463 material Substances 0.000 description 11
- 230000008901 benefit Effects 0.000 description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- DZQBLSOLVRLASG-UHFFFAOYSA-N iridium;methane Chemical class C.[Ir] DZQBLSOLVRLASG-UHFFFAOYSA-N 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
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- 230000006978 adaptation Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
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- 238000011068 loading method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical class [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 229910003468 tantalcarbide Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011530 conductive current collector Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
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- 150000001247 metal acetylides Chemical class 0.000 description 1
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- 229910052752 metalloid Inorganic materials 0.000 description 1
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- 238000002156 mixing Methods 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
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- 239000002344 surface layer Substances 0.000 description 1
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- 150000003608 titanium Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H01M8/02—Details
- H01M8/0202—Collectors; Separators, e.g. bipolar separators; Interconnectors
- H01M8/0204—Non-porous and characterised by the material
- H01M8/0223—Composites
- H01M8/0228—Composites in the form of layered or coated products
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/0641—Nitrides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
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- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
- C25B9/60—Constructional parts of cells
- C25B9/65—Means for supplying current; Electrode connections; Electric inter-cell connections
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/00—Stock material or miscellaneous articles
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Abstract
Description
・それらを取り囲む媒体に対する高い耐食性、および/または
・アノードまたはカソードの分極負荷に対する高い耐性、
・電解質の方を向いた支持体表面またはそのコーティングの低い表面抵抗、および
・支持体の低い製造コスト、特に、例えば、モバイルおよび定置用途用に燃料電池を用いるためのバイポーラプレートの形態の導電性導体の低い製造コスト
a)少なくとも99at%のイリジウムと、さらに炭素とを含む、または
b)少なくとも99at%のイリジウムと、さらに炭素と、痕跡量の酸素および/または水素とを含む、または
c)少なくとも99at%のイリジウムと、さらに炭素およびフッ素と、選択的にはさらに痕跡量の酸素および/または水素とを含む、または
d)合わせて、少なくとも15at%〜98.9at%のイリジウムと、0.1at%〜84at%のルテニウムと、さらに炭素とを含む、または
e)合わせて、少なくとも15at%〜98.9at%のイリジウムと、0.1at%〜84at%のルテニウムと、さらに炭素と、痕跡量の酸素および/または水素とを含む、または
f)合わせて、少なくとも15at%〜98.9at%のイリジウムと、0.1at%〜84at%のルテニウムと、さらに炭素およびフッ素と、選択的にはさらに痕跡量の酸素および/または水素とを含む
ことである。
a)チタン、ニオブ、さらに炭素およびフッ素、または
b)チタン、ニオブ、さらに窒素
を含む第2下地層を有し、特に(Ti0.67Nb0.33)1−xNx、ただしx=0.40〜0.55から形成されている。
2 基板
3 層系
3a カバー層
4 下地層系
4a 第1下地層
4b 第2下地層
30 開放表面
Claims (24)
- 特に、燃料電池または電気分解装置のバイポーラプレート(1)用のコーティング(3a)であって、
前記コーティング(3a)は、均質または不均質の金属固溶体から成り、前記金属固溶体は、貴金属の群からのイリジウムの形態の第1化学元素を、少なくとも99at%の濃度で含有するか、または貴金属の群からのイリジウムの形態の第1化学元素と、貴金属の群からのルテニウムの形態の第2化学元素とを含有し、
前記第1化学元素および前記第2化学元素は、全体として少なくとも99at%の濃度で存在しており、さらに、窒素、炭素、フッ素を含む群からの少なくとも1種の非金属化学元素を含有し、
さらに、選択的に酸素および/または水素が痕跡量だけ存在する、コーティング(3a)。 - 前記少なくとも1種の非金属化学元素は、層内に0.1at%〜1at%の濃度範囲で存在することを特徴とする、請求項1記載のコーティング。
- 前記コーティングは
a)少なくとも99at%のイリジウムと、さらに炭素とを含む、または
b)少なくとも99at%のイリジウムと、さらに炭素と、痕跡量の酸素および/または水素とを含む、または
c)少なくとも99at%のイリジウムと、さらに炭素およびフッ素と、選択的にはさらに痕跡量の酸素および/または水素とを含む、または
d)合わせて、少なくとも15at%〜98.9at%のイリジウムと、0.1at%〜84at%のルテニウムと、さらに炭素とを含む、または
e)合わせて、少なくとも15at%〜98.9at%のイリジウムと、0.1at%〜84at%のルテニウムと、さらに炭素と、痕跡量の酸素および/または水素とを含む、または
f)合わせて、少なくとも15at%〜98.9at%のイリジウムと、0.1at%〜84at%のルテニウムと、さらに炭素およびフッ素と、選択的にはさらに痕跡量の酸素および/または水素とを含む
ことを特徴とする、請求項1または2記載のコーティング。 - 前記コーティングは、少なくとも99at%の濃度のイリジウムと、0.1at%〜1at%未満の範囲の濃度の炭素とを含む、または、
前記コーティングは、少なくとも99at%の濃度のイリジウムと、0.1at%〜1at%未満の範囲の濃度の窒素とを含む、または
前記コーティングは、15at%〜98.9at%の範囲の濃度のイリジウムと、0.1at%〜84at%の範囲の濃度のルテニウムと、0.1at%〜1at%未満の範囲の濃度の炭素とを含む、または
前記コーティングは、15at%〜98.9at%の範囲の濃度のイリジウムと、0.1at%〜84at%の範囲の濃度のルテニウムと、0.1at%〜1at%未満の範囲の濃度の窒素とを含む
ことを特徴とする、請求項3記載のコーティング。 - 前記コーティングは、最大0.5at%までの濃度のフッ素を含むことを特徴とする、請求項1から4までのいずれか1項記載のコーティング。
- 前記コーティング(3a)は、さらに、卑金属の群からの少なくとも1種の化学元素を含有することを特徴とする、請求項1から5までのいずれか1項記載のコーティング。
- 前記卑金属の群からの少なくとも1種の前記化学元素は、アルミニウム、鉄、ニッケル、コバルト、亜鉛、セリウムまたはスズであることを特徴とする、請求項6記載のコーティング。
- 前記卑金属の群からの別の少なくとも1種の前記化学元素が、前記層内に0.005at%〜0.01at%の濃度範囲で含有されていることを特徴とする、請求項6または7記載のコーティング。
- 前記コーティング(3a)は、さらに、高融点金属、特にチタンおよび/またはジルコニウムおよび/またはハフニウムおよび/またはニオブおよび/またはタンタルの群からの少なくとも1種の化学元素を有することを特徴とする、請求項1から8までのいずれか1項記載のコーティング。
- 前記高融点金属の群からの少なくとも1種の前記化学元素は、前記コーティング(3a)内に、0.005at%〜0.01at%の濃度範囲で含有されていることを特徴とする、請求項9記載のコーティング。
- スズの形態の前記卑金属の群からの少なくとも1種の前記化学元素と、前記高融点金属の群からの少なくとも1種の前記化学元素とは、前記コーティング(3a)内に、合わせて、0.01at%〜0.02at%の濃度範囲で含有されていることを特徴とする、請求項6から10までのいずれか1項記載のコーティング。
- 前記コーティング(3a)は、さらに、貴金属の群からの少なくとも1種の付加的な化学元素を0.005at%〜0.9at%の濃度範囲で有することを特徴とする、請求項1から11までのいずれか1項記載のコーティング。
- 前記貴金属の群からの前記化学元素は、白金、金、銀、ロジウム、パラジウムであることを特徴とする、請求項12記載のコーティング。
- 前記貴金属の群からのすべての化学元素は、イリジウムおよびルテニウムを含め、前記コーティング内に、99at%〜99.9at%の濃度範囲で含有されていることを特徴とする、請求項1から13までのいずれか1項記載のコーティング。
- 前記コーティング(3a)は、少なくとも1nm〜最大50nmの層厚を有することを特徴とする、請求項1から14までのいずれか1項記載のコーティング。
- カバー層(3a)および下地層系(4)を含む、特に、燃料電池または電気分解装置のバイポーラプレート(1)用の層系(3)において、前記カバー層(3a)が、請求項1から15までのいずれか1項記載のコーティング(3a)の形態で構成されていることを特徴とする層系(3)。
- 前記下地層系(4)が、チタン、ニオブ、ハフニウム、ジルコニウム、タンタルの群からの少なくとも1種の化学元素を含む少なくとも1つの下地層(4a、4b)を有することを特徴とする、請求項16記載の層系。
- 前記下地層系(4)が、化学元素のチタンおよびニオブを含む金属合金層の形態の少なくとも1つの第1下地層(4a)を有することを特徴とする、請求項17記載の層系。
- 前記下地層系(4)は、チタン、ニオブ、ハフニウム、ジルコニウム、タンタルの群からの少なくとも1種の化学元素と、さらに、窒素、炭素、ホウ素、フッ素の群からの少なくとも1種の非金属元素とを含む第2下地層(4b)を有することを特徴とする、請求項17または18記載の層系。
- 前記第2下地層(4b)が、前記第1下地層(4a)と、前記カバー層(3a)との間に配置されていることを特徴とする、請求項19記載の層系。
- 前記第2下地層(4b)は、5at%までの酸素を含有することを特徴とする、請求項19または20記載の層系。
- 金属基板(2)と、前記基板(2)の表面の少なくとも部分領域に被着された、請求項16から21までのいずれか1項記載の層系(3)とを有する、バイポーラプレート(1)。
- 請求項22記載の少なくとも1つのバイポーラプレート(1)を有する、燃料電池、特に固体高分子形燃料電池。
- 請求項22記載の少なくとも1つのバイポーラプレート(1)を有する電気分解装置。
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