JP2020187332A - 微小光学構造体の製造方法 - Google Patents
微小光学構造体の製造方法 Download PDFInfo
- Publication number
- JP2020187332A JP2020187332A JP2019093886A JP2019093886A JP2020187332A JP 2020187332 A JP2020187332 A JP 2020187332A JP 2019093886 A JP2019093886 A JP 2019093886A JP 2019093886 A JP2019093886 A JP 2019093886A JP 2020187332 A JP2020187332 A JP 2020187332A
- Authority
- JP
- Japan
- Prior art keywords
- optical material
- optical
- substrate
- manufacturing
- mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 80
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 63
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 230000000694 effects Effects 0.000 claims abstract description 9
- 238000000576 coating method Methods 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims abstract description 7
- 239000011347 resin Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 5
- 239000011159 matrix material Substances 0.000 claims description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 14
- 239000004926 polymethyl methacrylate Substances 0.000 description 14
- 239000004205 dimethyl polysiloxane Substances 0.000 description 10
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 10
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 10
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 10
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 10
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- -1 polyethylene Polymers 0.000 description 3
- TUARVSWVPPVUGS-UHFFFAOYSA-N 5-nitrouracil Chemical compound [O-][N+](=O)C1=CNC(=O)NC1=O TUARVSWVPPVUGS-UHFFFAOYSA-N 0.000 description 2
- CFRFHWQYWJMEJN-UHFFFAOYSA-N 9h-fluoren-2-amine Chemical compound C1=CC=C2C3=CC=C(N)C=C3CC2=C1 CFRFHWQYWJMEJN-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000012099 Alexa Fluor family Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 1
- 229910021542 Vanadium(IV) oxide Inorganic materials 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011370 conductive nanoparticle Substances 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- VYNDHICBIRRPFP-UHFFFAOYSA-N pacific blue Chemical compound FC1=C(O)C(F)=C2OC(=O)C(C(=O)O)=CC2=C1 VYNDHICBIRRPFP-UHFFFAOYSA-N 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
Abstract
Description
図面において、同一又は同様の構成要素には同一の符号を付している。図面は模式的なものであり、平面寸法と厚さとの関係、及び各部材の厚さの比率は現実のものとは異なる。また、図面相互間においても互いの寸法の関係や比率が異なる部分が含まれていることは勿論である。
1A、1B、1C、1D パターン
3 フレキシブル基板
5 薄層
11 凸部
12 第1平坦部
31 凹部
32 第2平坦部
51 凸部
52 第3平坦部
55、60 レンズ
56 残渣
70 エアブロー
100、200 マイクロレンズ構造体
Claims (7)
- 第1光学材料からなる基板と、前記第1光学材料とは異なる第2光学材料からなる光学素子と、を有する微小光学構造体の製造方法であって、
一面に凸部を有するモールドを用いて前記第1光学材料に転写することで、表面に凹部を有する前記基板を作製するステップと、
前記基板の前記表面に前記第2光学材料をコーティングするステップと、
前記第2光学材料の表面張力の効果によって、前記基板の前記凹部に、最表面が凸曲面又は平坦面の前記光学素子を形成するステップと、
を有する、微小光学構造体の製造方法。 - 前記モールドは、各々が前記凸部と同一構造を有する複数の凸部が、前記一面にマトリクス状に配列された構造を有し、
前記基板を作製するステップは、前記モールドを用いて、各々が前記凹部と同一構造を有する複数の凹部が、前記表面にマトリクス状に配列された前記基板を作製する、請求項1に記載の微小光学構造体の製造方法。 - 前記モールドは、前記複数の凸部のうち隣接する凸部の間に第1平坦部を有し、
前記基板を作製するステップは、前記モールドを用いて、前記複数の凹部のうち隣接する凹部の間に第2平坦部を有する前記基板を作製する、請求項2に記載の微小光学構造体の製造方法。 - 前記第1光学材料と前記第2光学材料は屈折率が異なる、請求項1〜3の何れか1項に記載の微小光学構造体の製造方法。
- 前記基板を作製するステップは、前記基板としてフレキシブル基板を作製する、請求項1〜4の何れか1項に記載の微小光学構造体の製造方法。
- 前記第2光学材料をコーティングするステップは、前記第2光学材料として液状の樹脂をコーティングし、
前記光学素子を形成するステップは、前記液状の樹脂を硬化させ、表面張力の効果によって前記光学素子を形成する、請求項1〜5の何れか1項に記載の微小光学構造体の製造方法。 - 前記光学素子を形成した後、前記基板に残留した前記第2光学材料の残渣を除去するステップを更に有する、請求項1〜6の何れか1項に記載の微小光学構造体の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019093886A JP7340840B2 (ja) | 2019-05-17 | 2019-05-17 | 微小光学構造体の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019093886A JP7340840B2 (ja) | 2019-05-17 | 2019-05-17 | 微小光学構造体の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020187332A true JP2020187332A (ja) | 2020-11-19 |
JP7340840B2 JP7340840B2 (ja) | 2023-09-08 |
Family
ID=73223200
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019093886A Active JP7340840B2 (ja) | 2019-05-17 | 2019-05-17 | 微小光学構造体の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP7340840B2 (ja) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002283362A (ja) * | 2001-03-23 | 2002-10-03 | Seiko Epson Corp | マイクロレンズアレイ及びその製造方法並びに光学装置 |
JP2014089228A (ja) * | 2012-10-29 | 2014-05-15 | Seiko Epson Corp | マイクロレンズアレイの製造方法およびマイクロレンズアレイ |
-
2019
- 2019-05-17 JP JP2019093886A patent/JP7340840B2/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002283362A (ja) * | 2001-03-23 | 2002-10-03 | Seiko Epson Corp | マイクロレンズアレイ及びその製造方法並びに光学装置 |
JP2014089228A (ja) * | 2012-10-29 | 2014-05-15 | Seiko Epson Corp | マイクロレンズアレイの製造方法およびマイクロレンズアレイ |
Also Published As
Publication number | Publication date |
---|---|
JP7340840B2 (ja) | 2023-09-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5539894B2 (ja) | 凹部を有する物品の製造方法 | |
Yi et al. | Roll-to-roll UV imprinting lithography for micro/nanostructures | |
JP6603218B2 (ja) | 微細構造体の製造方法 | |
KR20060096198A (ko) | 자외선 경화방법을 이용한 도광판 제조방법 | |
US9625819B2 (en) | Photolithography on shrink film | |
US20080304287A1 (en) | Microstructure transfer medium and application thereof | |
Lee et al. | Facile fabrication of close-packed microlens arrays using photoinduced surface relief structures as templates | |
US8846159B2 (en) | Mold for fabricating barrier rib and method of fabricating two-layered barrier rib using same | |
JP7340840B2 (ja) | 微小光学構造体の製造方法 | |
TWI576658B (zh) | Copying die and its manufacturing method | |
Chang et al. | A novel method for rapid fabrication of microlens arrays using micro-transfer molding with soft mold | |
TWI280943B (en) | Method of micro-structural wedged array | |
TWI269885B (en) | Manufacturing method of micro lens mold and micro concave lens | |
Kuo et al. | The fabrication of non-spherical microlens arrays utilizing a novel SU-8 stamping method | |
KR101769749B1 (ko) | 수평방향으로 굴절률이 제어된 양면 패턴의 제조 방법 및 그에 의해 제조된 양면 패턴 | |
Chivate et al. | Additive manufacturing of micropatterned functional surfaces: a review | |
US20050151285A1 (en) | Method for manufacturing micromechanical structures | |
TWI287504B (en) | Manufacturing method of a 3-D micro lens array with predetermined surface curvature controlled by centrifugal force surface | |
Lu et al. | Self-positioning microlens arrays prepared using ink-jet printing | |
TWI262893B (en) | Manufacturing method and product of micro-cones array | |
TWI408041B (zh) | 用於製造增亮膜之模具的製造方法 | |
KR101846236B1 (ko) | 양면 패턴의 제조 방법 및 그에 의해 제조된 양면 패턴을 이용한 전사테이프 | |
CN218956931U (zh) | 微光学成像系统 | |
JP2005055485A (ja) | マイクロレンズアレイを用いた表示板 | |
TWI294403B (en) | Truncated pyramid array fabrication method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220406 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20230228 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230314 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230511 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20230530 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230626 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20230627 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20230714 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230808 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230822 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7340840 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |