JP2020181817A5 - - Google Patents
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- Publication number
- JP2020181817A5 JP2020181817A5 JP2020078159A JP2020078159A JP2020181817A5 JP 2020181817 A5 JP2020181817 A5 JP 2020181817A5 JP 2020078159 A JP2020078159 A JP 2020078159A JP 2020078159 A JP2020078159 A JP 2020078159A JP 2020181817 A5 JP2020181817 A5 JP 2020181817A5
- Authority
- JP
- Japan
- Prior art keywords
- resistive heater
- substrate
- heater
- resistive
- electrical lead
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 34
- 238000010438 heat treatment Methods 0.000 claims description 24
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical class C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 6
- 239000011888 foil Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 239000007769 metal material Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962838535P | 2019-04-25 | 2019-04-25 | |
| US62/838,535 | 2019-04-25 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020181817A JP2020181817A (ja) | 2020-11-05 |
| JP2020181817A5 true JP2020181817A5 (enExample) | 2023-06-14 |
| JP7438840B2 JP7438840B2 (ja) | 2024-02-27 |
Family
ID=72917234
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020078159A Active JP7438840B2 (ja) | 2019-04-25 | 2020-04-27 | マルチゾーンアジマスヒータ |
Country Status (4)
| Country | Link |
|---|---|
| US (3) | US11562913B2 (enExample) |
| JP (1) | JP7438840B2 (enExample) |
| KR (1) | KR102601204B1 (enExample) |
| TW (1) | TWI836065B (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN212542359U (zh) * | 2017-11-21 | 2021-02-12 | 沃特洛电气制造公司 | 一种支撑基座 |
| JP7407752B2 (ja) * | 2021-02-05 | 2024-01-04 | 日本碍子株式会社 | ウエハ支持台 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4022846C2 (de) * | 1990-07-18 | 1994-08-11 | Schott Glaswerke | Vorrichtung zur Leistungssteuerung und -begrenzung bei einer Heizfläche aus Glaskeramik oder einem vergleichbaren Material |
| JP3512650B2 (ja) * | 1998-09-30 | 2004-03-31 | 京セラ株式会社 | 加熱装置 |
| EP1132956A4 (en) * | 1998-10-29 | 2005-04-27 | Tokyo Electron Ltd | VACUUM GENERATOR UNIT |
| JP2001035907A (ja) * | 1999-07-26 | 2001-02-09 | Ulvac Japan Ltd | 吸着装置 |
| US6740853B1 (en) * | 1999-09-29 | 2004-05-25 | Tokyo Electron Limited | Multi-zone resistance heater |
| US6225608B1 (en) * | 1999-11-30 | 2001-05-01 | White Consolidated Industries, Inc. | Circular film heater |
| CA2409373A1 (en) * | 2001-04-13 | 2002-11-19 | Akira Kuibira | Ceramic joined body substrate holding structure and substrate processing apparatus |
| US20050016986A1 (en) * | 2001-11-30 | 2005-01-27 | Yasutaka Ito | Ceramic heater |
| JP3904986B2 (ja) * | 2002-06-26 | 2007-04-11 | 京セラ株式会社 | ウェハ支持部材 |
| JP4761723B2 (ja) * | 2004-04-12 | 2011-08-31 | 日本碍子株式会社 | 基板加熱装置 |
| TWI281833B (en) * | 2004-10-28 | 2007-05-21 | Kyocera Corp | Heater, wafer heating apparatus and method for manufacturing heater |
| JP2007088411A (ja) * | 2005-06-28 | 2007-04-05 | Hitachi High-Technologies Corp | 静電吸着装置およびウエハ処理装置ならびにプラズマ処理方法 |
| US20070125762A1 (en) | 2005-12-01 | 2007-06-07 | Applied Materials, Inc. | Multi-zone resistive heater |
| JP5009064B2 (ja) | 2007-06-27 | 2012-08-22 | 太平洋セメント株式会社 | セラミックスヒーター |
| US8637794B2 (en) * | 2009-10-21 | 2014-01-28 | Lam Research Corporation | Heating plate with planar heating zones for semiconductor processing |
| US8733280B2 (en) | 2010-12-20 | 2014-05-27 | Intermolecular, Inc. | Showerhead for processing chamber |
| WO2013033381A2 (en) * | 2011-08-30 | 2013-03-07 | Watlow Electric Manufacturing Company | High definition heater and method of operation |
| KR20130098707A (ko) * | 2012-02-28 | 2013-09-05 | 삼성전자주식회사 | 정전 척 장치 및 그 제어방법 |
| US9089007B2 (en) * | 2012-04-27 | 2015-07-21 | Applied Materials, Inc. | Method and apparatus for substrate support with multi-zone heating |
| US10049948B2 (en) * | 2012-11-30 | 2018-08-14 | Lam Research Corporation | Power switching system for ESC with array of thermal control elements |
| JP5980147B2 (ja) * | 2013-03-08 | 2016-08-31 | 日本発條株式会社 | 基板支持装置 |
| US11158526B2 (en) * | 2014-02-07 | 2021-10-26 | Applied Materials, Inc. | Temperature controlled substrate support assembly |
| CN106971964A (zh) * | 2014-07-23 | 2017-07-21 | 应用材料公司 | 可调谐温度受控的基板支撑组件 |
| US9666467B2 (en) * | 2014-11-21 | 2017-05-30 | Varian Semiconductor Equipment Associates, Inc. | Detachable high-temperature electrostatic chuck assembly |
| US9888528B2 (en) * | 2014-12-31 | 2018-02-06 | Applied Materials, Inc. | Substrate support with multiple heating zones |
| WO2016190905A1 (en) * | 2015-05-22 | 2016-12-01 | Applied Materials, Inc. | Azimuthally tunable multi-zone electrostatic chuck |
| WO2017029876A1 (ja) * | 2015-08-20 | 2017-02-23 | 日本碍子株式会社 | 静電チャックヒータ |
| CN110089197B (zh) | 2016-10-21 | 2021-06-25 | 沃特洛电气制造公司 | 具有低漂移电阻反馈的电加热器 |
| KR102435888B1 (ko) * | 2017-07-04 | 2022-08-25 | 삼성전자주식회사 | 정전 척, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법 |
| US11533783B2 (en) * | 2019-07-18 | 2022-12-20 | Applied Materials, Inc. | Multi-zone heater model-based control in semiconductor manufacturing |
-
2020
- 2020-04-23 US US16/856,634 patent/US11562913B2/en active Active
- 2020-04-24 TW TW109113890A patent/TWI836065B/zh active
- 2020-04-27 KR KR1020200050622A patent/KR102601204B1/ko active Active
- 2020-04-27 JP JP2020078159A patent/JP7438840B2/ja active Active
-
2023
- 2023-01-13 US US18/096,711 patent/US12100603B2/en active Active
-
2024
- 2024-08-23 US US18/813,316 patent/US20240412988A1/en active Pending
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