JP2020136293A - Semiconductor device and manufacturing method thereof - Google Patents

Semiconductor device and manufacturing method thereof Download PDF

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JP2020136293A
JP2020136293A JP2019023147A JP2019023147A JP2020136293A JP 2020136293 A JP2020136293 A JP 2020136293A JP 2019023147 A JP2019023147 A JP 2019023147A JP 2019023147 A JP2019023147 A JP 2019023147A JP 2020136293 A JP2020136293 A JP 2020136293A
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central
peripheral
conductive layer
groove
surface conductive
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JP7310161B2 (en
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裕一朗 日向
Yuichiro Hyuga
裕一朗 日向
龍男 西澤
Tatsuo Nishizawa
龍男 西澤
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Fuji Electric Co Ltd
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Fuji Electric Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Abstract

To provide a semiconductor device in which poor joint of an external terminal fixed to a mounting board and a conductive layer on an insulation board can be prevented, even when the mounting board is bent.SOLUTION: A semiconductor device includes a chip mounting board (1a, 1b) placed on the top face of insulation boards 11a, 11b, and having conductive layers 12a, 12b provided with center side grooves 5b, 5c and peripheral side grooves 5a, 5d at an upper part, a mounting board 3 placed oppositely to the top face of the insulation boards 11a, 11b, and having a peripheral region 102 bending for a central region 101, external terminals 7b, 7c fixed to the central region 101, and having an end joined to joint materials 6b, 6c in the grooves 5b, 5c, and external terminals 7a, 7d fixed to the peripheral region 102, and having an end joined to joint materials 6a, 6d in the grooves 5a, 5d. The end of the external terminals 7b, 7c has a gap height G1 for the end of the external terminals 7a, 7d due to bending of the mounting board 3, and the grooves 5b, 5c and 5a, 5d have a depth D1 deeper than the gap height G1.SELECTED DRAWING: Figure 1

Description

本発明は、半導体チップが搭載された絶縁基板と、プリント基板等の実装基板とを有する半導体装置及びその製造方法に関する。 The present invention relates to a semiconductor device having an insulating substrate on which a semiconductor chip is mounted and a mounting substrate such as a printed circuit board, and a method for manufacturing the same.

従来の半導体モジュールとして、半導体チップが搭載された絶縁基板と、プリント基板等の実装基板とを用意し、実装基板に固定された外部端子の端部を、絶縁基板上の導電層にはんだを用いて接合した実装構造が知られている。 As a conventional semiconductor module, an insulating substrate on which a semiconductor chip is mounted and a mounting substrate such as a printed circuit board are prepared, and the ends of external terminals fixed to the mounting substrate are soldered to the conductive layer on the insulating substrate. The mounting structure joined together is known.

このような半導体モジュールでは、実装基板を構成する基材と配線材料の熱膨張係数が互いに異なるため、実装基板を構成する各層の配線パターン形状や厚みの違いに起因して、外部端子を導電層にはんだを用いて接合する際の加熱により、実装基板に熱反りが発生する可能性がある。この反りが大きいと、実装基板に固定された外部端子の一部と絶縁基板上の導電層との間にギャップが発生し、接合不良となる場合がある。 In such a semiconductor module, the coefficient of thermal expansion of the base material and the wiring material that make up the mounting board are different from each other. There is a possibility that thermal warpage may occur on the mounting board due to heating when joining with solder. If this warp is large, a gap may occur between a part of the external terminals fixed to the mounting board and the conductive layer on the insulating board, resulting in poor bonding.

特許文献1には、配線基板にLSIチップの突起電極が嵌入する凹部を形成してその凹部内に凹型LSI接続用パッドを形成し、LSIチップの突起電極を凹部LSI接続用パッドにはんだ付けすることが開示されている。しかし、特許文献1には、LSIチップが曲がることについては何ら開示されていない。 In Patent Document 1, a recess in which a protrusion electrode of an LSI chip is fitted is formed in a wiring board, a concave LSI connection pad is formed in the recess, and the protrusion electrode of the LSI chip is soldered to the recess LSI connection pad. Is disclosed. However, Patent Document 1 does not disclose anything about bending the LSI chip.

特許文献2には、配線基板の上面に凹状のパッド部を設け、半導体装置のリードピンをこの凹状パッド部の中に入れてはんだで接合することが開示されている。しかし、特許文献2には、半導体装置が曲がることについては何ら開示されていない。 Patent Document 2 discloses that a concave pad portion is provided on the upper surface of a wiring board, and a lead pin of a semiconductor device is inserted into the concave pad portion and joined by soldering. However, Patent Document 2 does not disclose anything about bending of a semiconductor device.

特許文献3には、配線パターンを有する配線基板上に半導体チップが搭載されると共に、配線基板の半導体チップ側の面は、封止樹脂にてモールドされており、半導体装置には外部接続端子側を凸とした反りがあることが開示されている。また、特許文献3には、配線基板に形成されたスルーホールを介して配線パターンと接続されたはんだバンプからなる外部接続端子は、半導体装置の中央から外周に向かうにつれ、徐々に背丈が高くなるように形成されることで、各外部接続端子の頂点が同一平面上に配され、且つ、各外部接続端子は柱形状をなすことが開示されている。 In Patent Document 3, a semiconductor chip is mounted on a wiring board having a wiring pattern, and the surface of the wiring board on the semiconductor chip side is molded with a sealing resin, and the semiconductor device has an external connection terminal side. It is disclosed that there is a warp with a convex shape. Further, in Patent Document 3, the external connection terminal composed of solder bumps connected to the wiring pattern through the through hole formed in the wiring board gradually becomes taller from the center to the outer periphery of the semiconductor device. It is disclosed that the vertices of the external connection terminals are arranged on the same plane and each external connection terminal has a pillar shape.

特許文献4には、半導体素子の電極端子と、回路基板の電極端子とを接合する接合部が、半導体素子の電極端子上に形成された突起状電極と、回路基板の電極上に形成された突起状電極と、はんだとを含み、半導体素子の突起状電極の先端の面積が、回路基板の突起状電極の先端の面積よりも大きく、且つ、電極端子の回路基板から露出する部分の面積が、回路基板の面内で複数種類存在していることが開示されている。 In Patent Document 4, a joint portion for joining an electrode terminal of a semiconductor element and an electrode terminal of a circuit board is formed on a protruding electrode formed on the electrode terminal of the semiconductor element and an electrode of the circuit board. The area of the tip of the protruding electrode of the semiconductor element including the protruding electrode and the solder is larger than the area of the tip of the protruding electrode of the circuit board, and the area of the portion of the electrode terminal exposed from the circuit board is large. , It is disclosed that there are a plurality of types in the plane of the circuit board.

特許文献5には、プリント配線板の複数のランドの配置は、コーナ部が第1のランド、中心部又は最内周部が第3のランド、第1ランドと第3ランドの間が、第2のランドで有ることが開示されている。しかし、上記特許文献3〜5には、湾曲した実装基板に固定された外部端子のギャップ高さを、実装基板に対向して配置された絶縁基板に設けた溝の深さで補償することは何ら開示されていない。 In Patent Document 5, the arrangement of the plurality of lands of the printed wiring board is such that the corner portion is the first land, the central portion or the innermost peripheral portion is the third land, and the first land and the third land are the first. It is disclosed that it is in 2 lands. However, in Patent Documents 3 to 5, the gap height of the external terminal fixed to the curved mounting board cannot be compensated by the depth of the groove provided in the insulating board arranged to face the mounting board. Nothing is disclosed.

特開平5−175275号公報Japanese Unexamined Patent Publication No. 5-175275 特開昭63−52497号公報JP-A-63-52497 特開2002−164473号公報JP-A-2002-164473 特開2013−239543号公報Japanese Unexamined Patent Publication No. 2013-239543 特開2011−103398号公報Japanese Unexamined Patent Publication No. 2011-103398

上記課題に鑑み、本発明は、実装基板が湾曲した場合でも、実装基板に固定された外部端子と、実装基板に対向して配置された絶縁基板上の導電層との接合不良を防止することができる半導体装置及びその製造方法を提供することを目的とする。 In view of the above problems, the present invention prevents poor bonding between the external terminals fixed to the mounting board and the conductive layer on the insulating board arranged to face the mounting board even when the mounting board is curved. It is an object of the present invention to provide a semiconductor device capable of producing a semiconductor device and a method for manufacturing the same.

本発明の一態様は、(a)絶縁基板と、絶縁基板の上面に配置され、中央部に配置された中央側溝及び周辺部に配置された周辺側溝を上部に設けた上面導電層とを有するチップ搭載基板と、(b)絶縁基板の上面に対向して配置され、中央部に対応する中央領域に対して周辺領域が湾曲した実装基板と、(c)実装基板の中央領域を貫通するように固定され、且つ中央側溝内の接合材に端部が接合された中央側外部端子と、(d)実装基板の周辺領域を貫通するように固定され、且つ周辺側溝内の接合材に端部が接合され、中央側外部端子と同じ長さの周辺側外部端子とを備え、(e)実装基板の湾曲により、周辺側外部端子のチップ搭載基板側に位置する端部が、中央側外部端子のチップ搭載基板側に位置する端部とギャップ高さを有し、中央側溝及び周辺側溝が、ギャップ高さ以上の深さを有する半導体装置であることを要旨とする。 One aspect of the present invention has (a) an insulating substrate and an upper surface conductive layer having a central groove arranged in a central portion and a peripheral groove arranged in a peripheral portion on the upper surface of the insulating substrate. The chip mounting board, (b) the mounting board which is arranged so as to face the upper surface of the insulating board and whose peripheral region is curved with respect to the central region corresponding to the central portion, and (c) the mounting board so as to penetrate the central region of the mounting board. The outer terminal on the central side, which is fixed to and the end is joined to the joint material in the groove on the central side, and (d) the end is fixed to the joint material in the groove on the peripheral side so as to penetrate the peripheral region of the mounting board. (E) Due to the curvature of the mounting board, the end of the peripheral side external terminal located on the chip mounting board side is the center side external terminal because it is provided with a peripheral side external terminal having the same length as the central side external terminal. It is a gist that the semiconductor device has a gap height with an end portion located on the chip mounting substrate side, and the central groove and the peripheral groove have a depth equal to or higher than the gap height.

本発明の他の態様は、(a)絶縁基板と、絶縁基板の上面に配置された上面導電層とを有するチップ搭載基板を用意する工程と、(b)上面導電層の上部に中央側溝及び周辺側溝を形成する工程と、(c)中央側溝及び周辺側溝内に接合材を搭載する工程と、(d)中央側外部端子が中央領域を貫通するように固定され、中央側外部端子と同じ長さの周辺側外部端子が周辺領域を貫通するように固定された実装基板を用意する工程と、(e)実装基板を、チップ搭載基板の絶縁層の上面側に対向させて、加熱により接合材を溶融させて、中央側外部端子及び周辺側外部端子の端部を、中央側溝及び周辺側溝内の接合材にそれぞれ接合する工程とを含み、加熱により実装基板の中央領域に対して周辺領域が湾曲した場合の、中央側外部端子のチップ搭載基板側に位置する端部と周辺側外部端子のチップ搭載基板側に位置する端部とのギャップ高さ以上となるように、中央側溝及び周辺側溝の深さを設定する半導体装置の製造方法であることを要旨とする。 Other aspects of the present invention include (a) a step of preparing a chip-mounted substrate having an insulating substrate and an upper surface conductive layer arranged on the upper surface of the insulating substrate, and (b) a central groove and a central groove on the upper surface of the upper surface conductive layer. The process of forming the peripheral groove, (c) the process of mounting the bonding material in the central groove and the peripheral groove, and (d) the central external terminal is fixed so as to penetrate the central region and is the same as the central external terminal. The process of preparing a mounting board in which the peripheral external terminals of the length are fixed so as to penetrate the peripheral area, and (e) the mounting board is opposed to the upper surface side of the insulating layer of the chip mounting board and joined by heating. This includes a step of melting the material and joining the ends of the central external terminal and the peripheral external terminal to the bonding material in the central groove and the peripheral groove, respectively, and the peripheral region with respect to the central region of the mounting substrate by heating. The center side groove and the periphery so as to be equal to or greater than the gap height between the end portion of the central external terminal located on the chip mounting board side and the end portion of the peripheral side external terminal located on the chip mounting substrate side when The gist is that it is a method for manufacturing a semiconductor device that sets the depth of a side groove.

本発明によれば、実装基板が湾曲した場合でも、実装基板に固定された外部端子と、実装基板に対向して配置された絶縁基板上の導電層との接合不良を防止することができる半導体装置及びその製造方法を提供することができる。 According to the present invention, even when the mounting substrate is curved, a semiconductor capable of preventing poor bonding between an external terminal fixed to the mounting substrate and a conductive layer on an insulating substrate arranged facing the mounting substrate can be prevented. An apparatus and a method for manufacturing the apparatus can be provided.

実施形態に係る半導体装置の一例を示す断面図である。It is sectional drawing which shows an example of the semiconductor device which concerns on embodiment. 比較例に係る半導体装置の一例を示す断面図である。It is sectional drawing which shows an example of the semiconductor device which concerns on a comparative example. 実施形態に係る半導体装置の製造方法の一例を示す工程断面図である。It is a process sectional view which shows an example of the manufacturing method of the semiconductor device which concerns on embodiment. 実施形態に係る半導体装置の製造方法の一例を示す図3に引き続く工程断面図である。It is a process cross-sectional view following FIG. 3 which shows an example of the manufacturing method of the semiconductor device which concerns on embodiment. 実施形態に係る半導体装置の製造方法の一例を示す図4に引き続く工程断面図である。It is a process cross-sectional view following FIG. 4 which shows an example of the manufacturing method of the semiconductor device which concerns on embodiment. 実施形態に係る半導体装置の製造方法の一例を示す図5に引き続く工程断面図である。It is a process cross-sectional view following FIG. 5 which shows an example of the manufacturing method of the semiconductor device which concerns on embodiment. 実施形態の第1変形例に係る半導体装置の一例を示す断面図である。It is sectional drawing which shows an example of the semiconductor device which concerns on 1st modification of embodiment. 実施形態の第2変形例に係る半導体装置の一例を示す断面図である。It is sectional drawing which shows an example of the semiconductor device which concerns on the 2nd modification of embodiment. 実施形態の第3変形例に係る半導体装置の一例を示す断面図である。It is sectional drawing which shows an example of the semiconductor device which concerns on 3rd modification of embodiment. 実施形態の第4変形例に係る半導体装置の一例を示す断面図である。It is sectional drawing which shows an example of the semiconductor device which concerns on 4th modification of embodiment. その他の実施形態に係る半導体装置の一例を示す断面図である。It is sectional drawing which shows an example of the semiconductor device which concerns on other embodiment.

以下において、図面を参照して実施形態を説明する。以下の説明で参照する図面の記載において、同一又は類似の部分には同一又は類似の符号を付している。ただし、図面は模式的なものであり、厚みと平面寸法との関係、各層の厚みの比率等は現実のものとは異なることに留意すべきである。したがって、具体的な厚みや寸法は以下の説明を参酌して判断すべきものである。また、図面相互間においても互いの寸法の関係や比率が異なる部分が含まれていることは勿論である。 Hereinafter, embodiments will be described with reference to the drawings. In the description of the drawings referred to in the following description, the same or similar parts are designated by the same or similar reference numerals. However, it should be noted that the drawings are schematic, and the relationship between the thickness and the plane dimension, the ratio of the thickness of each layer, etc. are different from the actual ones. Therefore, the specific thickness and dimensions should be determined in consideration of the following explanation. In addition, it goes without saying that the drawings include parts having different dimensional relationships and ratios from each other.

また、以下の説明における上下等の方向の定義は、単に説明の便宜上の定義であって、本発明の技術的思想を限定するものではない。例えば、以下の説明における「上面導電層」や「下面導電層」における「上」「下」は単なる便宜上の選択に過ぎず、地球の重力の方向に対して定義されるものではない。よって、対象を90°回転して観察すれば上下は左右に変換して読まれ、180°回転して観察すれば上下は反転して読まれることは勿論である。 Further, the definition of the vertical direction and the like in the following description is merely a definition for convenience of explanation, and does not limit the technical idea of the present invention. For example, "upper" and "lower" in the "upper surface conductive layer" and "lower surface conductive layer" in the following description are merely selections for convenience, and are not defined with respect to the direction of the earth's gravity. Therefore, it goes without saying that if the object is rotated 90 ° and observed, the top and bottom are converted to left and right and read, and if the object is rotated 180 ° and observed, the top and bottom are reversed and read.

<半導体装置>
実施形態に係る半導体装置は、図1に示すように、チップ搭載基板(1a,1b)と、チップ搭載基板(1a,1b)の上面に対向して配置され、中央領域101に対して周辺領域(周縁領域)102が湾曲する可能性を有する実装基板3とを備える半導体モジュールである。なお、図1では図示を省略するが、チップ搭載基板(1a,1b)及び実装基板3の周囲を封止する封止材が設けられていてもよい。
<Semiconductor device>
As shown in FIG. 1, the semiconductor device according to the embodiment is arranged so as to face the upper surface of the chip mounting substrate (1a, 1b) and the chip mounting substrate (1a, 1b), and is a peripheral region with respect to the central region 101. It is a semiconductor module including a mounting substrate 3 in which (peripheral region) 102 has a possibility of being curved. Although not shown in FIG. 1, a sealing material for sealing the periphery of the chip mounting substrate (1a, 1b) and the mounting substrate 3 may be provided.

チップ搭載基板(1a,1b)は、絶縁基板(11a,11b)と、この絶縁基板(11a,11b)の上面に配置された上面導電層(12a,12b,12c,12d)を有する。図1に示すように、絶縁基板(11a,11b)は、第1絶縁基板11aと第2絶縁基板11aの2枚から構成されていてもよい。この場合、チップ搭載基板(1a,1b)は、第1回路基板1aと第2回路基板1bの2枚から構成されることになる。 The chip mounting substrate (1a, 1b) has an insulating substrate (11a, 11b) and an upper surface conductive layer (12a, 12b, 12c, 12d) arranged on the upper surface of the insulating substrate (11a, 11b). As shown in FIG. 1, the insulating substrate (11a, 11b) may be composed of two sheets, a first insulating substrate 11a and a second insulating substrate 11a. In this case, the chip mounting board (1a, 1b) is composed of two boards, a first circuit board 1a and a second circuit board 1b.

チップ搭載基板(1a,1b)は、中央部に配置された中央側溝(凹部)5b,5c及び周辺部に配置された周辺側溝(凹部)5a,5dを上部に設けた上面導電層(12a,12b,12c,12d)を有する。上面導電層(12a,12b,12c,12d)の中央部は、実装基板3の中央領域101に対応し、上面導電層(12a,12b,12c,12d)の周辺部は、実装基板3の周辺領域102に対応する。図1では、この上面導電層(12a,12b,12c,12d)は、第1上面導電層12a,12b及び第2上面導電層12c,12dの4層で構成されている場合を例示している。なお、上面導電層(12a,12b,12c,12d)の数や配置位置は特に限定されない。 The chip mounting substrate (1a, 1b) has an upper surface conductive layer (12a, 12a, which is provided with central groove (recess) 5b, 5c arranged in the central portion and peripheral groove (recess) 5a, 5d arranged in the peripheral portion at the upper portion. It has 12b, 12c, 12d). The central portion of the upper surface conductive layer (12a, 12b, 12c, 12d) corresponds to the central region 101 of the mounting substrate 3, and the peripheral portion of the upper surface conductive layer (12a, 12b, 12c, 12d) is the periphery of the mounting substrate 3. Corresponds to region 102. In FIG. 1, the case where the upper surface conductive layer (12a, 12b, 12c, 12d) is composed of four layers of the first upper surface conductive layer 12a, 12b and the second upper surface conductive layer 12c, 12d is illustrated. .. The number and arrangement positions of the upper surface conductive layers (12a, 12b, 12c, 12d) are not particularly limited.

第1回路基板1a及び第2回路基板1bのそれぞれは、例えば直接銅接合(DCB)基板や活性ろう付け(AMB)基板等であってもよい。図1において左側に図示した第1回路基板1aは、第1絶縁基板11aと、第1絶縁基板11aの上面に配置された第1上面導電層12a,12bと、第1絶縁基板11aの下面に配置された第1下面導電層13aとを有する。図1において右側に示した第2回路基板1bは、第2絶縁基板11bと、第2絶縁基板11bの上面に配置された第2上面導電層12c,12dと、第2絶縁基板11bの下面に配置された第2下面導電層13bとを有する。 Each of the first circuit board 1a and the second circuit board 1b may be, for example, a direct copper bonded (DCB) substrate, an active brazing (AMB) substrate, or the like. The first circuit board 1a shown on the left side in FIG. 1 is formed on the first insulating substrate 11a, the first upper surface conductive layers 12a and 12b arranged on the upper surface of the first insulating substrate 11a, and the lower surface of the first insulating substrate 11a. It has a first lower surface conductive layer 13a arranged. The second circuit board 1b shown on the right side in FIG. 1 is formed on the second insulating substrate 11b, the second upper surface conductive layers 12c and 12d arranged on the upper surface of the second insulating substrate 11b, and the lower surface of the second insulating substrate 11b. It has a second lower surface conductive layer 13b arranged.

第1絶縁基板11a及び第2絶縁基板11bは、例えば酸化アルミニウム(Al)、窒化アルミニウム(AlN)、窒化ケイ素(Si)等の絶縁性セラミクスから構成される板状部材である。第1上面導電層12a,12b及び第2上面導電層12c,12d並びに第1下面導電層13a及び第2下面導電層13bとしては、銅(Cu)やアルミニウム(Al)等の導体箔等が使用可能である。第1下面導電層13a及び第2下面導電層13bの下面は、放熱用金属ベースを介して冷却フィンに取り付けられてもよい。或いは、第1下面導電層13a及び第2下面導電層13bの下面は、冷却フィンに直接取り付けられてもよい。 The first insulating substrate 11a and the second insulating substrate 11b are plate-shaped members composed of insulating ceramics such as aluminum oxide (Al 2 O 3 ), aluminum nitride (AlN), and silicon nitride (Si 3 N 4 ). is there. As the first upper surface conductive layers 12a and 12b and the second upper surface conductive layers 12c and 12d, and the first lower surface conductive layer 13a and the second lower surface conductive layer 13b, conductor foils such as copper (Cu) and aluminum (Al) are used. It is possible. The lower surfaces of the first lower surface conductive layer 13a and the second lower surface conductive layer 13b may be attached to the cooling fins via the heat radiating metal base. Alternatively, the lower surfaces of the first lower surface conductive layer 13a and the second lower surface conductive layer 13b may be directly attached to the cooling fins.

第1上面導電層12a上には、はんだ等の接合材4a,4bを介して、第1半導体素子(半導体チップ)2a及び第2半導体素子(半導体チップ)2bが配置されている。第2上面導電層12c上には、はんだ等の接合材4c,4dを介して、第3半導体素子(半導体チップ)2c及び第4半導体素子(半導体チップ)2dが配置されている。第1半導体素子2a〜第4半導体素子2dのそれぞれは、例えばMOSFET又はIGBT等のトランジスタや、サイリスタ等のパワー半導体素子で構成することができる。第1半導体素子2a〜第4半導体素子2dのそれぞれは、例えばシリコン(Si)基板で構成してもよく、炭化ケイ素(SiC)、窒化ガリウム(GaN)等のワイドバンドギャップ半導体基板で構成してもよい。なお、第1半導体素子2a〜第4半導体素子2dの種類や個数、配置位置は特に限定されない。また、接合材4a〜4dは、はんだに限定されず、銀(Ag)や銅(Cu)系の焼結材であってもよい。 A first semiconductor element (semiconductor chip) 2a and a second semiconductor element (semiconductor chip) 2b are arranged on the first upper surface conductive layer 12a via bonding materials 4a and 4b such as solder. A third semiconductor element (semiconductor chip) 2c and a fourth semiconductor element (semiconductor chip) 2d are arranged on the second upper surface conductive layer 12c via bonding materials 4c and 4d such as solder. Each of the first semiconductor element 2a to the fourth semiconductor element 2d can be composed of, for example, a transistor such as a MOSFET or an IGBT, or a power semiconductor element such as a thyristor. Each of the first semiconductor element 2a to the fourth semiconductor element 2d may be composed of, for example, a silicon (Si) substrate, or may be composed of a wide bandgap semiconductor substrate such as silicon carbide (SiC) or gallium nitride (GaN). May be good. The type, number, and arrangement position of the first semiconductor element 2a to the fourth semiconductor element 2d are not particularly limited. Further, the bonding materials 4a to 4d are not limited to solder, and may be silver (Ag) or copper (Cu) -based sintered materials.

第1半導体素子2aの上面の電極は、ボンディングワイヤ21により第2半導体素子2bの上面の電極に接続されている。第2半導体素子2bの上面の電極は、ボンディングワイヤ22により第1上面導電層12bに接続されている。第3半導体素子2cの上面の電極は、ボンディングワイヤ23により第4半導体素子2dの上面の電極に接続されている。第4半導体素子2dの上面の電極は、ボンディングワイヤ24により第2上面導電層12dに接続されている。なお、ボンディングワイヤ21〜24を用いた接続の代わりに、銅(Cu)等からなるリードフレームを用いた接続であってもよい。 The electrode on the upper surface of the first semiconductor element 2a is connected to the electrode on the upper surface of the second semiconductor element 2b by a bonding wire 21. The electrodes on the upper surface of the second semiconductor element 2b are connected to the first upper surface conductive layer 12b by the bonding wire 22. The electrode on the upper surface of the third semiconductor element 2c is connected to the electrode on the upper surface of the fourth semiconductor element 2d by the bonding wire 23. The electrodes on the upper surface of the fourth semiconductor element 2d are connected to the second upper surface conductive layer 12d by the bonding wire 24. Instead of the connection using the bonding wires 21 to 24, the connection using a lead frame made of copper (Cu) or the like may be used.

図1から分かるように、第1上面導電層12a,12bの一方の端部側の上部には周辺側溝5aが設けられ、第1上面導電層12a,12bの他方の端部側には中央側溝5bが設けられている。周辺側溝5a内には、周辺側外部端子7aの端部が挿入され、はんだ6aを介して第1上面導電層12aに接合されている。中央側溝5b内には、中央側外部端子7bの端部が挿入され、はんだ6bを介して第1上面導電層12bに接合されている。 As can be seen from FIG. 1, a peripheral groove 5a is provided on the upper portion of the first upper surface conductive layers 12a and 12b on the one end side, and a central groove is provided on the other end side of the first upper surface conductive layers 12a and 12b. 5b is provided. The end portion of the peripheral side external terminal 7a is inserted into the peripheral side groove 5a and is joined to the first upper surface conductive layer 12a via the solder 6a. The end of the central external terminal 7b is inserted into the central groove 5b and is joined to the first upper surface conductive layer 12b via the solder 6b.

一方、第2上面導電層12c,12dの第1回路基板1aに隣接する側の端部の上部には中央側溝5cが設けられ、第1回路基板1aから離れた側の端部側の上部には周辺側溝5dが設けられている。中央側溝5c内には、中央側外部端子7cの端部が挿入され、はんだ6cを介して第2上面導電層12cに接合されている。周辺側溝5d内には、周辺側外部端子7dの端部が挿入され、はんだ6dを介して第2上面導電層12dに接合されている。 On the other hand, a central groove 5c is provided in the upper portion of the end portion of the second upper surface conductive layers 12c and 12d on the side adjacent to the first circuit board 1a, and is provided in the upper portion on the end side away from the first circuit board 1a. Is provided with a peripheral groove 5d. The end of the central external terminal 7c is inserted into the central groove 5c and is joined to the second upper surface conductive layer 12c via the solder 6c. The end of the peripheral external terminal 7d is inserted into the peripheral groove 5d and is joined to the second upper surface conductive layer 12d via the solder 6d.

図1では、中央側溝5b,5c及び周辺側溝5a,5dの底面が曲率を有する場合を例示するが、中央側溝5b,5c及び周辺側溝5a,5dの底面は平坦であってもよい。中央側溝5b,5c及び周辺側溝5a,5dの平面形状は、周辺側外部端子7a,7d及び中央側外部端子7b,7cの端部を挿入可能であれば特に限定されない。中央側溝5b,5c及び周辺側溝5a,5dの平面形状は、例えば円形であってもよく、矩形であってもよい。 In FIG. 1, the case where the bottom surfaces of the central side grooves 5b and 5c and the peripheral side grooves 5a and 5d have a curvature is illustrated, but the bottom surfaces of the central side grooves 5b and 5c and the peripheral side grooves 5a and 5d may be flat. The planar shapes of the central side grooves 5b and 5c and the peripheral side grooves 5a and 5d are not particularly limited as long as the ends of the peripheral side external terminals 7a and 7d and the central side external terminals 7b and 7c can be inserted. The planar shapes of the central side grooves 5b and 5c and the peripheral side grooves 5a and 5d may be, for example, circular or rectangular.

周辺側外部端子7a,7d及び中央側外部端子7b,7cは、実装基板3を貫通し、且つ実装基板3に固定されている。周辺側外部端子7a,7d及び中央側外部端子7b,7cの材料としては、例えばCuやAl等の導電材料が使用可能である。周辺側外部端子7a,7d及び中央側外部端子7b,7cは、例えば円柱状であるが、角柱状、板状、ブロック状等の他の形状を有していてもよい。周辺側外部端子7a,7d及び中央側外部端子7b,7cは、第1半導体素子2a〜第4半導体素子2dの電位を第1上面導電層12a,12b及び第2上面導電層12c,12dを介して外部へ取り出す。 The peripheral external terminals 7a and 7d and the central external terminals 7b and 7c penetrate the mounting board 3 and are fixed to the mounting board 3. As the material of the peripheral side external terminals 7a and 7d and the central side external terminals 7b and 7c, for example, a conductive material such as Cu or Al can be used. The peripheral external terminals 7a and 7d and the central external terminals 7b and 7c are, for example, cylindrical, but may have other shapes such as prismatic, plate-shaped, and block-shaped. The peripheral external terminals 7a and 7d and the central external terminals 7b and 7c transfer the potentials of the first semiconductor elements 2a to 4th semiconductor elements 2d via the first upper surface conductive layers 12a and 12b and the second upper surface conductive layers 12c and 12d. And take it out.

実装基板3は、絶縁層31と、絶縁層31の上面側に配置された第1配線層32と、絶縁層31の下面側に配置された第2配線層33とを有するプリント基板で構成できる。実装基板3は、2層以上の絶縁層を有し、絶縁層と配線層とを交互に積層した多層基板であってもよい。 The mounting board 3 can be composed of a printed circuit board having an insulating layer 31, a first wiring layer 32 arranged on the upper surface side of the insulating layer 31, and a second wiring layer 33 arranged on the lower surface side of the insulating layer 31. .. The mounting substrate 3 may be a multilayer substrate having two or more insulating layers, in which insulating layers and wiring layers are alternately laminated.

絶縁層31としては、ガラス繊維とエポキシ樹脂との組み合わせ等からなる樹脂基板であってよい。また、絶縁層31は、Al、AlN、Si等を主成分としたセラミクス基板であってもよい。 The insulating layer 31 may be a resin substrate made of a combination of glass fiber and epoxy resin or the like. Further, the insulating layer 31 may be a ceramic substrate containing Al 2 O 3 , Al N, Si 3 N 4 or the like as a main component.

第1配線層32及び第2配線層33の材料としては、例えば銀(Ag)や銅(Cu)、アルミニウム(Al)等の金属等の導電材料が使用可能である。第1配線層32及び第2配線層33は、Cu板やAl板の張り合わせでもよく、Cuやニッケル(Ni)、錫(Sn)等のめっきが施されていてもよい。第1配線層32及び第2配線層33の厚さは10μm以上、且つ50μm以下程度の比較的薄い配線層でもよく、1mm以上、且つ3mm以下程度の比較的厚い配線層であってもよい。 As the material of the first wiring layer 32 and the second wiring layer 33, for example, a conductive material such as a metal such as silver (Ag), copper (Cu), or aluminum (Al) can be used. The first wiring layer 32 and the second wiring layer 33 may be laminated with a Cu plate or an Al plate, or may be plated with Cu, nickel (Ni), tin (Sn), or the like. The thickness of the first wiring layer 32 and the second wiring layer 33 may be a relatively thin wiring layer of about 10 μm or more and 50 μm or less, or a relatively thick wiring layer of about 1 mm or more and about 3 mm or less.

実施形態に係る半導体装置の製造プロセスにおいて、熱変形や組立工程中で発生した外力により、実装基板3に反りが発生する場合がある。例えば、実装基板3の絶縁層31と、第1配線層32及び第2配線層33とで熱膨張係数が異なるために、各層のパターン形状や厚さの違いが影響し、製造プロセス中に実装基板3に熱反りが発生する。ここで、図1の実装基板3の中央領域101に対し、中央領域101の両側に周辺領域102を定義して説明する。図1では、熱反りに起因して、実装基板3の中央領域101に対して、周辺領域102が湾曲した場合を例示している。即ち、図1では、実装基板3が、第1回路基板1a及び第2回路基板1b側に凸状に湾曲する場合を仮定している。 In the manufacturing process of the semiconductor device according to the embodiment, the mounting substrate 3 may be warped due to thermal deformation or an external force generated in the assembly process. For example, since the insulating layer 31 of the mounting substrate 3 and the first wiring layer 32 and the second wiring layer 33 have different coefficients of thermal expansion, the difference in the pattern shape and thickness of each layer affects the mounting during the manufacturing process. Thermal warpage occurs on the substrate 3. Here, with respect to the central region 101 of the mounting substrate 3 of FIG. 1, peripheral regions 102 are defined and described on both sides of the central region 101. FIG. 1 illustrates a case where the peripheral region 102 is curved with respect to the central region 101 of the mounting substrate 3 due to thermal warpage. That is, in FIG. 1, it is assumed that the mounting board 3 is curved convexly toward the first circuit board 1a and the second circuit board 1b.

図1に示した状況では、実装基板3の中央領域101に位置する外部端子7b,7cの端部が、実装基板3の周辺領域102に位置する周辺側外部端子7a,7dの端部よりも、下方の第1回路基板1a及び第2回路基板1b側にギャップ高さG1だけ突出する。即ち、実装基板3の中央領域101に位置する外部端子7b,7cの端部と、実装基板3の周辺領域102に位置する周辺側外部端子7a,7dの端部とはギャップ高さG1分の差異を有する。 In the situation shown in FIG. 1, the ends of the external terminals 7b and 7c located in the central region 101 of the mounting board 3 are larger than the ends of the peripheral external terminals 7a and 7d located in the peripheral region 102 of the mounting board 3. , The gap height G1 protrudes toward the lower first circuit board 1a and the second circuit board 1b. That is, the gap height between the ends of the external terminals 7b and 7c located in the central region 101 of the mounting board 3 and the ends of the peripheral external terminals 7a and 7d located in the peripheral region 102 of the mounting board 3 is 1 minute. Have a difference.

第1上面導電層12a,12b及び第2上面導電層12c,12dに設けられた中央側溝5b,5c及び周辺側溝5a,5dは、このギャップ高さG1以上の深さD1を有するように設けられている。このため、実装基板3の中央領域101に位置する外部端子7b,7cの端部を、溝5b,5cの深い位置まで挿入させ、接合材6b,6cに接合させる。一方、実装基板3の周辺領域102に位置する周辺側外部端子7a,7dの端部を、溝5a,5dの開口部付近の浅い位置まで挿入させ、接合材6a,6dに接合させる。なお、実装基板3の周辺領域102に位置する周辺側外部端子7a,7dの端部は、溝5a,5dに挿入されずに、第1上面導電層12a及び第2上面導電層12dの上面よりも上方の位置で接合材6a,6dに接合していてもよい。 The central side grooves 5b, 5c and the peripheral side grooves 5a, 5d provided in the first upper surface conductive layers 12a, 12b and the second upper surface conductive layers 12c, 12d are provided so as to have a depth D1 having a gap height G1 or more. ing. Therefore, the ends of the external terminals 7b and 7c located in the central region 101 of the mounting substrate 3 are inserted deep into the grooves 5b and 5c to be joined to the joining materials 6b and 6c. On the other hand, the ends of the peripheral external terminals 7a and 7d located in the peripheral region 102 of the mounting substrate 3 are inserted to shallow positions near the openings of the grooves 5a and 5d to be joined to the joining materials 6a and 6d. The ends of the peripheral external terminals 7a and 7d located in the peripheral region 102 of the mounting substrate 3 are not inserted into the grooves 5a and 5d, but are formed from the upper surfaces of the first upper surface conductive layer 12a and the second upper surface conductive layer 12d. May be joined to the joining materials 6a and 6d at an upper position.

即ち、第1上面導電層12a,12b及び第2上面導電層12c,12dに設けられた中央側溝5b,5c及び周辺側溝5a,5dの深さD1により、周辺側外部端子7a,7d及び中央側外部端子7b,7cの端部のギャップ高さG1を補償することができ、周辺側外部端子7a,7d及び中央側外部端子7b,7cと第1上面導電層12a,12b及び第2上面導電層12c,12dとの接合不良を防止することができる。 That is, the peripheral side external terminals 7a, 7d and the central side are provided by the depth D1 of the central side grooves 5b, 5c and the peripheral side grooves 5a, 5d provided in the first upper surface conductive layers 12a, 12b and the second upper surface conductive layers 12c, 12d. The gap height G1 at the ends of the external terminals 7b and 7c can be compensated, and the peripheral external terminals 7a and 7d, the central external terminals 7b and 7c, the first upper surface conductive layers 12a and 12b, and the second upper surface conductive layer can be compensated. It is possible to prevent poor bonding with 12c and 12d.

<比較例>
ここで、比較例に係る半導体装置を説明する。比較例に係る半導体装置は、図2に示すように、実施形態に係る半導体装置の構成と基本的には同様であるが、第1上面導電層12a,12b及び第2上面導電層12c,12dの上部に中央側溝5b,5c及び周辺側溝5a,5dが設けられていない点が、実施形態に係る半導体装置の構成と異なる。比較例に係る半導体装置では、第1上面導電層12a,12b及び第2上面導電層12c,12d上に接合材6a〜6dが配置されている。
<Comparison example>
Here, the semiconductor device according to the comparative example will be described. As shown in FIG. 2, the semiconductor device according to the comparative example is basically the same as the configuration of the semiconductor device according to the embodiment, but the first upper surface conductive layers 12a and 12b and the second upper surface conductive layers 12c and 12d. The configuration of the semiconductor device according to the embodiment is different from that of the semiconductor device in that the central grooves 5b and 5c and the peripheral grooves 5a and 5d are not provided in the upper part of the above. In the semiconductor device according to the comparative example, the bonding materials 6a to 6d are arranged on the first upper surface conductive layers 12a and 12b and the second upper surface conductive layers 12c and 12d.

実装基板3の中央領域101に位置する外部端子7b,7cの端部は、実装基板3の周辺領域102に位置する周辺側外部端子7a,7dの端部よりもギャップ高さG1だけチップ搭載基板(1a,1b)側に突出する。このため、実装基板3の中央領域101に位置する外部端子7b,7cの端部は、第1上面導電層12b及び第2上面導電層12c上の接合材6b,6cと接合しているが、実装基板3の周辺領域102に位置する周辺側外部端子7a,7dの端部は、第1上面導電層12a及び第2上面導電層12d上の接合材6a,6dとの間にギャップが発生し、接合不良となっている。 The ends of the external terminals 7b and 7c located in the central region 101 of the mounting board 3 are chip mounting boards having a gap height G1 more than the ends of the peripheral external terminals 7a and 7d located in the peripheral region 102 of the mounting board 3. It protrudes to the (1a, 1b) side. Therefore, the ends of the external terminals 7b and 7c located in the central region 101 of the mounting substrate 3 are joined to the bonding materials 6b and 6c on the first upper surface conductive layer 12b and the second upper surface conductive layer 12c. At the ends of the peripheral external terminals 7a and 7d located in the peripheral region 102 of the mounting substrate 3, a gap is generated between the first upper surface conductive layer 12a and the bonding materials 6a and 6d on the second upper surface conductive layer 12d. , The joint is poor.

これに対して、実施形態に係る半導体装置によれば、図1に示すように、実装基板3に反りが発生しても、中央側外部端子7b,7cの端部が、中央側溝5b,5cの位置において第1上面導電層12b及び第2上面導電層12cの最表面よりも深く入り込み、周辺側外部端子7a,7dの端部と第1上面導電層12a及び第2上面導電層12dとのギャップを解消することができる。このため、実装基板3に固定された外部端子7a〜7dと、チップ搭載基板(1a,1b)の上面導電層(12a,12b,12c,12d)との接合不良を防止することができ、電気的な導通を確保することができる。 On the other hand, according to the semiconductor device according to the embodiment, as shown in FIG. 1, even if the mounting substrate 3 is warped, the ends of the central external terminals 7b and 7c are the central grooves 5b and 5c. At the position of, it penetrates deeper than the outermost surfaces of the first upper surface conductive layer 12b and the second upper surface conductive layer 12c, and the ends of the peripheral side external terminals 7a and 7d and the first upper surface conductive layer 12a and the second upper surface conductive layer 12d The gap can be closed. Therefore, it is possible to prevent poor bonding between the external terminals 7a to 7d fixed to the mounting board 3 and the upper conductive layers (12a, 12b, 12c, 12d) of the chip mounting board (1a, 1b), and the electricity can be prevented. Conduction can be ensured.

<半導体モジュールの製造方法>
次に、図3〜図6等を参照して、実施形態に係る半導体装置の製造方法の一例を説明する。
<Manufacturing method of semiconductor module>
Next, an example of the method for manufacturing the semiconductor device according to the embodiment will be described with reference to FIGS. 3 to 6 and the like.

まず、図3に示すように、絶縁層31、第1配線層32及び第2配線層33からなる実装基板3を用意する。そして、実装基板3に形成されたスルーホールに周辺側外部端子7a,7d及び中央側外部端子7b,7cを挿入して固定する。なお、周辺側外部端子7a,7d及び中央側外部端子7b,7cは、圧入により固定されてもよく、はんだ等の接合材により固定されてもよい。図3の段階では実装基板3は湾曲しておらず平坦であってよい。 First, as shown in FIG. 3, a mounting board 3 including an insulating layer 31, a first wiring layer 32, and a second wiring layer 33 is prepared. Then, the peripheral side external terminals 7a and 7d and the central side external terminals 7b and 7c are inserted into the through holes formed in the mounting board 3 and fixed. The peripheral external terminals 7a and 7d and the central external terminals 7b and 7c may be fixed by press fitting or may be fixed by a joining material such as solder. At the stage of FIG. 3, the mounting substrate 3 may not be curved and may be flat.

一方、図4に示すように、第1絶縁基板11a、第1上面導電層12a,12b及び第1下面導電層13aからなる第1回路基板1aと、第2絶縁基板11b、第2上面導電層12c,12d及び第2下面導電層13bからなる第2回路基板1bとにより構成されるチップ搭載基板(1a,1b)を用意する。そして、第1上面導電層12aの周辺側外部端子7aとの接続予定位置の上部に周辺側溝5aを、第1上面導電層12bの中央側外部端子7bとの接続予定位置の上部に中央側溝5bを形成する。同様に、第2上面導電層12cの中央側外部端子7cとの接続予定位置の上部に中央側溝5cを、第2上面導電層12dの周辺側外部端子7dとの接続予定位置の上部に周辺側溝5dを形成する。中央側溝5b,5c及び周辺側溝5a,5dの形成方法としては、化学的なエッチングや物理的なドリル加工でもよく、レーザ照射により加工してもよい。中央側溝5b,5c及び周辺側溝5a,5dの深さD1は、図1に示すように実装基板3に反りが発生した場合のギャップ高さG1を実験等により予め求めておき、ギャップ高さG1以上となるように設定される。 On the other hand, as shown in FIG. 4, a first circuit board 1a composed of a first insulating substrate 11a, a first upper surface conductive layer 12a, 12b and a first lower surface conductive layer 13a, a second insulating substrate 11b, and a second upper surface conductive layer A chip-mounted substrate (1a, 1b) composed of a second circuit board 1b composed of 12c, 12d and a second lower surface conductive layer 13b is prepared. Then, a peripheral groove 5a is provided above the planned connection position of the first upper surface conductive layer 12a with the peripheral external terminal 7a, and a central groove 5b is provided above the planned connection position of the first upper surface conductive layer 12b with the central external terminal 7b. To form. Similarly, a central groove 5c is provided above the planned connection position of the second upper surface conductive layer 12c with the central external terminal 7c, and a peripheral groove is provided above the planned connection position of the second upper surface conductive layer 12d with the peripheral external terminal 7d. Form 5d. The central side grooves 5b, 5c and the peripheral side grooves 5a, 5d may be formed by chemical etching, physical drilling, or laser irradiation. As for the depth D1 of the central side grooves 5b, 5c and the peripheral side grooves 5a, 5d, the gap height G1 when the mounting substrate 3 is warped is obtained in advance by an experiment or the like as shown in FIG. 1, and the gap height G1 It is set to be as above.

次に、第1上面導電層12a及び第2上面導電層12c上の第1半導体素子2a〜第4半導体素子2dの搭載予定位置に、印刷又はディスペンサー等によりペースト状又は板状のAgやCu系の焼結材等からなる接合材4a〜4dを塗布する。そして、図5に示すように第1半導体素子2a〜第4半導体素子2dを第1上面導電層12a及び第2上面導電層12c上に搭載し、第1半導体素子2a〜第4半導体素子2dと第1上面導電層12a及び第2上面導電層12cとを接合材4a〜4dを介して接合する。更に、ボンディングワイヤ21〜24により、第1半導体素子2aの上面の電極と第2半導体素子2bの上面の電極との間、第2半導体素子2bの上面の電極と第1上面導電層12bとの間、第3半導体素子2cの上面の電極と第4半導体素子2dの上面の電極との間、第4半導体素子2dの上面の電極と第2上面導電層12dとの間をそれぞれ接続する。 Next, a paste-like or plate-like Ag or Cu system is printed or dispensed at the planned mounting positions of the first semiconductor element 2a to the fourth semiconductor element 2d on the first upper surface conductive layer 12a and the second upper surface conductive layer 12c. 4a to 4d of the bonding materials made of the sintered material of the above are applied. Then, as shown in FIG. 5, the first semiconductor element 2a to the fourth semiconductor element 2d are mounted on the first upper surface conductive layer 12a and the second upper surface conductive layer 12c, and the first semiconductor element 2a to the fourth semiconductor element 2d The first upper surface conductive layer 12a and the second upper surface conductive layer 12c are joined via the bonding materials 4a to 4d. Further, the bonding wires 21 to 24 provide between the electrodes on the upper surface of the first semiconductor element 2a and the electrodes on the upper surface of the second semiconductor element 2b, and the electrodes on the upper surface of the second semiconductor element 2b and the first upper surface conductive layer 12b. Between the electrodes on the upper surface of the third semiconductor element 2c and the electrodes on the upper surface of the fourth semiconductor element 2d, and between the electrodes on the upper surface of the fourth semiconductor element 2d and the conductive layer 12d on the second upper surface, respectively.

次に、図6に示すように、第1上面導電層12a,12b及び第2上面導電層12c,12dに設けた中央側溝5b,5c及び周辺側溝5a,5d内に、ディスペンサーを用いて板状又はペースト状のはんだ等の接合材6a〜6dを搭載する。 Next, as shown in FIG. 6, a plate shape is used in the central side grooves 5b, 5c and the peripheral side grooves 5a, 5d provided in the first upper surface conductive layers 12a, 12b and the second upper surface conductive layers 12c, 12d. Alternatively, the bonding materials 6a to 6d such as paste-like solder are mounted.

次に、第1回路基板1a及び第2回路基板1bと、図3に示した周辺側外部端子7a,7d及び中央側外部端子7b,7cを固定した実装基板3とを、カーボン等の治具を用いて重ね合わせて対向させる。そして、200℃以上、且つ350℃以下程度の温度で加熱することにより接合材6a〜6dを溶融させて、実装基板3に固定された周辺側外部端子7a,7d及び中央側外部端子7b,7cを、上面導電層(12a,12b,12c,12d)の中央側溝5b,5c及び周辺側溝5a,5dに挿入して接合する。 Next, the first circuit board 1a and the second circuit board 1b, and the mounting board 3 to which the peripheral external terminals 7a and 7d and the central external terminals 7b and 7c shown in FIG. 3 are fixed are attached to a jig such as carbon. To overlap and face each other using. Then, the bonding materials 6a to 6d are melted by heating at a temperature of 200 ° C. or higher and 350 ° C. or lower to melt the peripheral side external terminals 7a and 7d and the central side external terminals 7b and 7c fixed to the mounting substrate 3. Is inserted into the central grooves 5b, 5c and the peripheral grooves 5a, 5d of the upper surface conductive layer (12a, 12b, 12c, 12d) to be joined.

この際の加熱により、図1に示すように実装基板3に熱反りが発生するが、中央側外部端子7b,7cの端部が、溝5b,5cの位置において第1上面導電層12b及び第2上面導電層12cの最表面よりも深く入り込み、周辺側外部端子7a,7dの端部と第1上面導電層12a及び第2上面導電層12dとの隙間を解消することができる。このため、周辺側外部端子7a,7d及び中央側外部端子7b,7cの端部と上面導電層(12a,12b,12c,12d)との接合不良の発生を抑制でき、電気的な導通を確保することができる。 Due to the heating at this time, thermal warpage occurs in the mounting substrate 3 as shown in FIG. 2. It penetrates deeper than the outermost surface of the upper surface conductive layer 12c, and can eliminate the gap between the end portions of the peripheral external terminals 7a and 7d and the first upper surface conductive layer 12a and the second upper surface conductive layer 12d. Therefore, it is possible to suppress the occurrence of poor bonding between the end portions of the peripheral side external terminals 7a and 7d and the central side external terminals 7b and 7c and the upper surface conductive layer (12a, 12b, 12c, 12d) and ensure electrical continuity. can do.

実施形態に係る半導体装置の製造方法によれば、実装基板3が湾曲した場合でも、実装基板3に固定された外部端子7a〜7dと、チップ搭載基板(1a,1b)の上面導電層(12a,12b,12c,12d)との接合不良を防止することができる。 According to the method for manufacturing a semiconductor device according to the embodiment, even when the mounting substrate 3 is curved, the external terminals 7a to 7d fixed to the mounting substrate 3 and the upper surface conductive layer (12a) of the chip mounting substrate (1a, 1b) , 12b, 12c, 12d) can be prevented from being poorly joined.

なお、上述した実施形態に係る半導体装置の製造方法は一例であって、これに限定されない。例えば、接合材4a〜4d及び接合材6a〜6dのいずれもがはんだの場合には、第1半導体素子2a〜第4半導体素子2dを第1上面導電層12a及び第2上面導電層12cに接合材4a〜4dを介して接合する工程と、実装基板3に固定された周辺側外部端子7a,7d及び中央側外部端子7b,7cの端部を上面導電層(12a,12b,12c,12d)に接合材6a〜6dを介して接合する工程とを同時に行ってもよい。その後、第1半導体素子2a〜第4半導体素子2dのボンディングワイヤ21〜24の接続を行ってもよい。 The method for manufacturing a semiconductor device according to the above-described embodiment is an example, and is not limited thereto. For example, when both the bonding materials 4a to 4d and the bonding materials 6a to 6d are solders, the first semiconductor element 2a to the fourth semiconductor element 2d are bonded to the first upper surface conductive layer 12a and the second upper surface conductive layer 12c. The steps of joining via the materials 4a to 4d and the end portions of the peripheral side external terminals 7a and 7d and the central side external terminals 7b and 7c fixed to the mounting substrate 3 are formed by the upper surface conductive layer (12a, 12b, 12c, 12d). The step of joining the solders via the bonding materials 6a to 6d may be performed at the same time. After that, the bonding wires 21 to 24 of the first semiconductor element 2a to the fourth semiconductor element 2d may be connected.

<第1変形例>
実施形態の第1変形例に係る半導体装置は、図7に示すように、実装基板3が、第1回路基板1a及び第2回路基板1b側とは反対側に凸状に湾曲する点が、図1に示した実施形態に係る半導体装置の構成と異なる。
<First modification>
In the semiconductor device according to the first modification of the embodiment, as shown in FIG. 7, the mounting board 3 is curved in a convex shape on the side opposite to the first circuit board 1a and the second circuit board 1b side. It differs from the configuration of the semiconductor device according to the embodiment shown in FIG.

実施形態の第1変形例に係る半導体装置では、周辺側外部端子7a,7dの端部が、中央側外部端子7b,7cの端部よりもギャップ高さG1だけチップ搭載基板(1a,1b)側に突出する。中央側溝5b,5c及び周辺側溝5a,5dは、ギャップ高さG1以上の深さD1を有する。周辺側外部端子7a,7dの端部は、周辺側溝5a,5dの深い位置まで挿入されて、接合材6a,6dを介して第1上面導電層12a及び第2上面導電層12dに接続できる。一方、中央側外部端子7b,7cの端部は、中央側溝5b,5cの開口部付近の浅い位置に挿入されて、接合材6b,6cを介して第1上面導電層12b及び第2上面導電層12cに接続できる。他の構成は、図1に示した実施形態に係る半導体装置の構成と実質的に同様であるので、重複した説明を省略する。 In the semiconductor device according to the first modification of the embodiment, the chip mounting substrate (1a, 1b) has a gap height G1 between the ends of the peripheral external terminals 7a and 7d and the ends of the central external terminals 7b and 7c. Protruding to the side. The central side grooves 5b and 5c and the peripheral side grooves 5a and 5d have a depth D1 having a gap height G1 or more. The ends of the peripheral external terminals 7a and 7d can be inserted deep into the peripheral grooves 5a and 5d and connected to the first upper surface conductive layer 12a and the second upper surface conductive layer 12d via the bonding materials 6a and 6d. On the other hand, the ends of the central external terminals 7b and 7c are inserted at shallow positions near the openings of the central grooves 5b and 5c, and the first upper surface conductive layer 12b and the second upper surface conductive layer 12b and the second upper surface conductive via the bonding materials 6b and 6c. Can be connected to layer 12c. Since the other configurations are substantially the same as the configurations of the semiconductor device according to the embodiment shown in FIG. 1, duplicate description will be omitted.

実施形態の第1変形例に係る半導体装置によれば、実装基板3が、第1回路基板1a及び第2回路基板1b側とは反対側に凸状に湾曲する場合であっても、実装基板3に固定された外部端子7a〜7dと、チップ搭載基板(1a,1b)の上面導電層(12a,12b,12c,12d)との接合不良を防止することができる。 According to the semiconductor device according to the first modification of the embodiment, even when the mounting board 3 is convexly curved to the side opposite to the first circuit board 1a and the second circuit board 1b side, the mounting board It is possible to prevent poor bonding between the external terminals 7a to 7d fixed to 3 and the upper surface conductive layers (12a, 12b, 12c, 12d) of the chip mounting substrate (1a, 1b).

<第2変形例>
実施形態の第2変形例に係る半導体装置は、図8に示すように、第1回路基板1a及び第2回路基板1bの第1絶縁基板11a及び第2絶縁基板11bが互いに接続されて1枚の絶縁基板(11a,11b)で構成されている点が、図1に示した実施形態に係る半導体装置の構成と異なる。また、第1回路基板1a及び第2回路基板1bの第1下面導電層13a及び第2下面導電層13bが互いに接続されて1層の第2導電層(13a,13b)で構成されている点が、図1に示した実施形態に係る半導体装置の構成と異なる。他の構成は、図1に示した実施形態に係る半導体装置の構成と実質的に同様であるので、重複した説明を省略する。
<Second modification>
As shown in FIG. 8, the semiconductor device according to the second modification of the embodiment is a single piece in which the first insulating substrate 11a and the second insulating substrate 11b of the first circuit board 1a and the second circuit board 1b are connected to each other. It is different from the configuration of the semiconductor device according to the embodiment shown in FIG. 1 in that it is composed of the insulating substrates (11a, 11b) of. Further, the first lower surface conductive layer 13a and the second lower surface conductive layer 13b of the first circuit board 1a and the second circuit board 1b are connected to each other and are composed of one second conductive layer (13a, 13b). However, the configuration of the semiconductor device according to the embodiment shown in FIG. 1 is different. Since the other configurations are substantially the same as the configurations of the semiconductor device according to the embodiment shown in FIG. 1, duplicate description will be omitted.

<第3変形例>
実施形態の第3変形例に係る半導体装置は、図9に示すように、実装基板3の中央領域101の下方の第1上面導電層12b及び第2上面導電層12cに中央側溝5b,5cのみを有し、実装基板3の周辺領域102の下方の第1上面導電層12a及び第2上面導電層12dに周辺側溝5a,5dが設けられていない点が、図1に示した実施形態に係る半導体装置の構成と異なる。
<Third modification example>
As shown in FIG. 9, the semiconductor device according to the third modification of the embodiment has only the central grooves 5b and 5c in the first upper surface conductive layer 12b and the second upper surface conductive layer 12c below the central region 101 of the mounting substrate 3. The point that the peripheral side grooves 5a and 5d are not provided in the first upper surface conductive layer 12a and the second upper surface conductive layer 12d below the peripheral region 102 of the mounting substrate 3 is related to the embodiment shown in FIG. It is different from the configuration of the semiconductor device.

実施形態の第3変形例に係る半導体装置では、周辺側外部端子7a,7dは、第1上面導電層12a及び第2上面導電層12d上の接合材6a,6dを介して第1上面導電層12a及び第2上面導電層12dに接続している。一方、中央側外部端子7b,7cは、中央側溝5b,5cに挿入されて、接合材6b,6cを介して第1上面導電層12b及び第2上面導電層12cに接続している。他の構成は、図1に示した実施形態に係る半導体装置の構成と実質的に同様であるので、重複した説明を省略する。 In the semiconductor device according to the third modification of the embodiment, the peripheral side external terminals 7a and 7d are the first upper surface conductive layer via the bonding materials 6a and 6d on the first upper surface conductive layer 12a and the second upper surface conductive layer 12d. It is connected to 12a and the second upper surface conductive layer 12d. On the other hand, the central side external terminals 7b and 7c are inserted into the central side grooves 5b and 5c and are connected to the first upper surface conductive layer 12b and the second upper surface conductive layer 12c via the bonding materials 6b and 6c. Since the other configurations are substantially the same as the configurations of the semiconductor device according to the embodiment shown in FIG. 1, duplicate description will be omitted.

実施形態の第3変形例に係る半導体装置によれば、実装基板3の中央領域101の下方の第1上面導電層12b及び第2上面導電層12cに中央側溝5b,5cのみを有する場合でも、実装基板3に固定された外部端子7a〜7dと、チップ搭載基板(1a,1b)の上面導電層(12a,12b,12c,12d)との接合不良を防止することができる。 According to the semiconductor device according to the third modification of the embodiment, even when the first upper surface conductive layer 12b and the second upper surface conductive layer 12c below the central region 101 of the mounting substrate 3 have only the central side grooves 5b and 5c. It is possible to prevent poor bonding between the external terminals 7a to 7d fixed to the mounting board 3 and the upper conductive layers (12a, 12b, 12c, 12d) of the chip mounting board (1a, 1b).

<第4変形例>
実施形態の第4変形例に係る半導体装置は、図10に示すように、実装基板3の周辺領域102の下方の第1上面導電層12a及び第2上面導電層12dに周辺側溝5a,5dのみを有し、実装基板3の中央領域101の下方の第1上面導電層12b及び第2上面導電層12cに中央側溝5b,5cが設けられていない点が、図1に示した実施形態に係る半導体装置の構成と異なる。
<Fourth modification>
As shown in FIG. 10, the semiconductor device according to the fourth modification of the embodiment has only peripheral grooves 5a and 5d in the first upper surface conductive layer 12a and the second upper surface conductive layer 12d below the peripheral region 102 of the mounting substrate 3. The point that the central side grooves 5b and 5c are not provided in the first upper surface conductive layer 12b and the second upper surface conductive layer 12c below the central region 101 of the mounting substrate 3 is related to the embodiment shown in FIG. It is different from the configuration of the semiconductor device.

実施形態の第4変形例に係る半導体装置では、中央側外部端子7b,7cは、第1上面導電層12b及び第2上面導電層12c上の接合材6b,6cを介して第1上面導電層12b及び第2上面導電層12cに接続できる。一方、周辺側外部端子7a,7dは、溝5a,5dに挿入されて、接合材6a,6dを介して第1上面導電層12a及び第2上面導電層12dに接続できる。他の構成は、図1に示した実施形態に係る半導体装置の構成と実質的に同様であるので、重複した説明を省略する。 In the semiconductor device according to the fourth modification of the embodiment, the central side external terminals 7b and 7c are the first upper surface conductive layer via the bonding materials 6b and 6c on the first upper surface conductive layer 12b and the second upper surface conductive layer 12c. It can be connected to 12b and the second upper surface conductive layer 12c. On the other hand, the peripheral external terminals 7a and 7d can be inserted into the grooves 5a and 5d and connected to the first upper surface conductive layer 12a and the second upper surface conductive layer 12d via the bonding materials 6a and 6d. Since the other configurations are substantially the same as the configurations of the semiconductor device according to the embodiment shown in FIG. 1, duplicate description will be omitted.

実施形態の第4変形例に係る半導体装置によれば、実装基板3の周辺領域102の下方の第1上面導電層12a及び第2上面導電層12dに周辺側溝5a,5dのみを有する場合でも、実装基板3に固定された外部端子7a〜7dと、チップ搭載基板(1a,1b)の上面導電層(12a,12b,12c,12d)との接合不良を防止することができる。 According to the semiconductor device according to the fourth modification of the embodiment, even when the first upper surface conductive layer 12a and the second upper surface conductive layer 12d below the peripheral region 102 of the mounting substrate 3 have only peripheral side grooves 5a and 5d. It is possible to prevent poor bonding between the external terminals 7a to 7d fixed to the mounting board 3 and the upper conductive layers (12a, 12b, 12c, 12d) of the chip mounting board (1a, 1b).

(その他の実施形態)
上記のように、本発明は実施形態によって記載したが、この開示の一部をなす論述及び図面は本発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施の形態、実施例及び運用技術が明らかとなろう。
(Other embodiments)
As mentioned above, although the present invention has been described by embodiment, the discourses and drawings that form part of this disclosure should not be understood to limit the invention. Various alternative embodiments, examples and operational techniques will be apparent to those skilled in the art from this disclosure.

例えば、実施形態に係る半導体装置では、実装基板3が湾曲した場合を説明したが、図11に示すように、実装基板3が湾曲しておらず、中央領域101及び周辺領域102が平坦であってもよい。この場合、周辺側外部端子7a,7d及び中央側外部端子7b,7cの端部はギャップ高さを有さない。周辺側外部端子7a,7d及び中央側外部端子7b,7cは、中央側溝5b,5c及び周辺側溝5a,5dに互いに同じ深さだけ挿入されて、接合材6a〜6dを介して第1上面導電層12a,12b及び第2上面導電層12c,12dに接合される。 For example, in the semiconductor device according to the embodiment, the case where the mounting substrate 3 is curved has been described, but as shown in FIG. 11, the mounting substrate 3 is not curved, and the central region 101 and the peripheral region 102 are flat. You may. In this case, the peripheral side external terminals 7a and 7d and the central side external terminals 7b and 7c do not have a gap height. The peripheral external terminals 7a and 7d and the central external terminals 7b and 7c are inserted into the central grooves 5b and 5c and the peripheral grooves 5a and 5d by the same depth, and are electrically conductive on the first upper surface via the bonding materials 6a to 6d. It is joined to the layers 12a and 12b and the second upper surface conductive layers 12c and 12d.

このように、本発明はここでは記載していない様々な実施の形態等を含むことは勿論である。したがって、本発明の技術的範囲は上記の説明から妥当な特許請求の範囲に係る発明特定事項によってのみ定められるものである。 As described above, it goes without saying that the present invention includes various embodiments not described here. Therefore, the technical scope of the present invention is defined only by the matters specifying the invention relating to the reasonable claims from the above description.

1a…第1回路基板
1b…第2回路基板
2a…第1半導体素子
2b…第2半導体素子
2c…第3半導体素子
2d…第4半導体素子
3…実装基板
4a,4b,4c,4d…接合材
5a,5d…周辺側溝
5b,5c…中央側溝
6a,6b,6c,6d…接合材
7a,7d…周辺側外部端子
7b,7c…中央側外部端子
11a…第1絶縁基板
11b…第2絶縁基板
12a,12b…第1上面導電層
12c,12d…第2上面導電層
13a…第1下面導電層
13b…第2下面導電層
21,22,23,24…ボンディングワイヤ
31…絶縁層
32…第1配線層
33…第2配線層
101…中央領域
102…周辺領域
1a ... 1st circuit board 1b ... 2nd circuit board 2a ... 1st semiconductor element 2b ... 2nd semiconductor element 2c ... 3rd semiconductor element 2d ... 4th semiconductor element 3 ... Mounting board 4a, 4b, 4c, 4d ... Bonding material 5a, 5d ... Peripheral side grooves 5b, 5c ... Central side grooves 6a, 6b, 6c, 6d ... Bonding material 7a, 7d ... Peripheral side external terminals 7b, 7c ... Central side external terminals 11a ... First insulating substrate 11b ... Second insulating substrate 12a, 12b ... 1st upper surface conductive layer 12c, 12d ... 2nd upper surface conductive layer 13a ... 1st lower surface conductive layer 13b ... 2nd lower surface conductive layer 21, 22, 23, 24 ... Bonding wire 31 ... Insulation layer 32 ... 1st Wiring layer 33 ... Second wiring layer 101 ... Central area 102 ... Peripheral area

Claims (5)

絶縁基板と、前記絶縁基板の上面に配置され、中央部に配置された中央側溝及び周辺部に配置された周辺側溝を上部に設けた上面導電層とを有するチップ搭載基板と、
前記絶縁基板の上面に対向して配置され、前記中央部に対応する中央領域に対して周辺領域が湾曲した実装基板と、
前記実装基板の前記中央領域を貫通するように固定され、且つ前記中央側溝内の接合材に端部が接合された中央側外部端子と、
前記実装基板の前記周辺領域を貫通するように固定され、且つ前記周辺側溝内の接合材に端部が接合され、前記中央側外部端子と同じ長さの周辺側外部端子と、
を備え、
前記実装基板の湾曲により、前記周辺側外部端子の前記チップ搭載基板側に位置する端部が、前記中央側外部端子の前記チップ搭載基板側に位置する端部とギャップ高さを有し、
前記中央側溝及び周辺側溝が、前記ギャップ高さ以上の深さを有することを特徴とする半導体装置。
A chip-mounted substrate having an insulating substrate, an upper surface conductive layer having a central groove arranged in a central portion and a peripheral groove arranged in a peripheral portion on the upper surface of the insulating substrate, and a top conductive layer.
A mounting board which is arranged so as to face the upper surface of the insulating substrate and whose peripheral region is curved with respect to the central region corresponding to the central portion.
A central external terminal fixed so as to penetrate the central region of the mounting substrate and having an end bonded to a bonding material in the central groove.
A peripheral external terminal having the same length as the central external terminal, which is fixed so as to penetrate the peripheral region of the mounting substrate and whose end is bonded to the bonding material in the peripheral groove,
With
Due to the curvature of the mounting board, the end portion of the peripheral side external terminal located on the chip mounting board side has a gap height with the end portion of the central side external terminal located on the chip mounting board side.
A semiconductor device characterized in that the central groove and the peripheral groove have a depth equal to or greater than the gap height.
前記チップ搭載基板が、
一方の端部側に前記中央側溝を、他方の端部側に前記周辺側溝をそれぞれ上部に設けた第1上面導電層を有する第1回路基板と、
前記第1回路基板に隣接する側の端部側に前記中央側溝を、前記第1回路基板から離れた側の端部側に前記周辺側溝をそれぞれ上部に設けた第2上面導電層を有する第2回路基板と、
を含むことを特徴とする請求項1に記載の半導体装置。
The chip mounting board
A first circuit board having a first upper surface conductive layer having the central groove on one end side and the peripheral groove on the other end side.
A second upper surface conductive layer having the central groove on the end side adjacent to the first circuit board and the peripheral groove on the end side on the side away from the first circuit board. 2 circuit boards and
The semiconductor device according to claim 1, wherein the semiconductor device comprises.
前記実装基板が、前記チップ搭載基板側に凸状に湾曲することを特徴とする請求項1又は2に記載の半導体装置。 The semiconductor device according to claim 1 or 2, wherein the mounting substrate is curved in a convex shape toward the chip mounting substrate side. 前記実装基板が、前記チップ搭載基板側とは反対側に凸状に湾曲することを特徴とする請求項1又は2に記載の半導体装置。 The semiconductor device according to claim 1 or 2, wherein the mounting substrate is curved in a convex shape on a side opposite to the chip mounting substrate side. 絶縁基板と、前記絶縁基板の上面に配置された上面導電層とを有するチップ搭載基板を用意する工程と、
前記上面導電層の上部に中央側溝及び周辺側溝を形成する工程と、
前記中央側溝及び周辺側溝内に接合材を搭載する工程と、
中央側外部端子が中央領域を貫通するように固定され、前記中央側外部端子と同じ長さの周辺側外部端子が周辺領域を貫通するように固定された実装基板を用意する工程と、
前記実装基板を、前記チップ搭載基板の前記絶縁層の上面側に対向させて、加熱により前記接合材を溶融させて、前記中央側外部端子及び前記周辺側外部端子の端部を、前記中央側溝及び前記周辺側溝内の前記接合材にそれぞれ接合する工程と、
を含み、
前記加熱により前記実装基板の中央領域に対して周辺領域が湾曲した場合の、前記中央側外部端子の前記チップ搭載基板側に位置する端部と前記周辺側外部端子の前記チップ搭載基板側に位置する端部とのギャップ高さ以上となるように、前記中央側溝及び周辺側溝の深さを設定することを特徴とする半導体装置の製造方法。
A step of preparing a chip-mounted substrate having an insulating substrate and a top conductive layer arranged on the upper surface of the insulating substrate, and
A step of forming a central groove and a peripheral groove on the upper part of the upper surface conductive layer, and
The process of mounting the bonding material in the central groove and the peripheral groove, and
A process of preparing a mounting board in which the central external terminal is fixed so as to penetrate the central region and the peripheral external terminal having the same length as the central external terminal is fixed so as to penetrate the peripheral region.
The mounting substrate is opposed to the upper surface side of the insulating layer of the chip mounting substrate, the bonding material is melted by heating, and the ends of the central side external terminal and the peripheral side external terminal are formed into the central side groove. And the process of joining to the joining material in the peripheral groove, respectively.
Including
When the peripheral region is curved with respect to the central region of the mounting substrate due to the heating, the end portion of the central external terminal located on the chip mounting substrate side and the peripheral region external terminal located on the chip mounting substrate side. A method for manufacturing a semiconductor device, characterized in that the depths of the central groove and the peripheral groove are set so as to be equal to or larger than the gap height with the end portion.
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