JP2020084251A - 基板処理装置、基板処理システム及び基板処理方法 - Google Patents
基板処理装置、基板処理システム及び基板処理方法 Download PDFInfo
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Abstract
Description
例えば特許文献1には、減圧雰囲気中にて、チャンバ(処理容器)内に載置した基板に原料ガスを供給して処理を行う減圧処理装置において、チャンバリッド(処理容器蓋部)の上方に、チャンバに供給される原料を収容する原料容器(原料ガス供給源)が配置されることが好ましいと記載されている。これにより原料容器とチャンバとの距離を短く構成できると共に専有面積を増加させることなく配管径を大きく構成できると記載されている。
内部に基板が載置される処理容器と、
前記原料を収容し、前記処理容器に向けて原料ガスを供給するための原料ガス供給源と、
前記原料ガス供給源から受け入れた原料ガスを一時的に貯留するバッファタンクと、
前記バッファタンクに貯留された原料ガスの処理容器への給断を行う給断バルブが配置されるバルブ配置部と、を備え、
前記処理容器の上方に、前記バルブ配置部、バッファタンク及び原料ガス供給源が、下方側からこの順に設けられた。
以後、搬入出ポート91側を前方、常圧搬送室92側を後方として説明する。なお図2中の符号91Aは、キャリアCの蓋部と共に開放されるドアである。
またSiH4ガス供給源32には、SiH4ガス供給路301の一端が接続され、SiH4ガス供給路301の他端側は、MFC301Cを介して反応ガス供給路300に合流している。NH3ガス供給源31と、SiH4ガス供給源32と、は、後述のプロセスガスボックス3に配置されている。
さらにバルブ装置6の上方には、バッファタンク5A、5Bを備えたバッファタンク部5が配置されている。
図4、図5において、処理容器10から見て真空搬送室90が設けられている方向を内側、その反対の方向を外側と呼ぶと、1段目の内側に原料ボックス4、外側に不活性ガスボックス2、2段目の内側に電気設備8、外側にプロセスガスボックス3が各々配置されている。上記構成において、不活性ガスボックス2とプロセスガスボックス3とは、本例のガスボックスを構成している。
また真空搬送室90から見て原料ボックス4の向こう側(外側)に設けられた不活性ガスボックス2には、置換ガス供給源21、22、カウンターガス供給源23、24、MFC201〜204などが収納されている。なお、置換ガス供給源21、22、カウンターガス供給源23、24を不活性ガスボックス2内に設けず、設備側の不活性ガス供給源からMFC201〜204に配管を接続し、不活性ガスを供給する構成としてもよい。さらに図5中に破線で示してあるように、真空搬送室90側から見て不活性ガスボックス2の側方には、図3に示した置換ガスを一時的に貯留するためのバッファタンク51が設けられている。
さらには、原料ガス供給路400内を通流する間に、原料ガスの温度が低下して再液化してしまわないように、長い原料ガス供給路400を保温・加熱する機構が必要になると、機器コストの上昇要因ともなる。
一方で、図2を用いて説明したように、真空搬送室9の互いに対向する側面に、各々、隙間を詰めて複数の処理モジュール1を配置する場合には、上述のガス供給系を設けるスペースの確保が問題となる。この点、真空搬送室90から見て処理モジュール1よりも外側に原料供給系などを設ける場合には、真空処理システムの小型化を実現することができない。一方、既述のように、処理容器10の下方側にガス供給系を設ける問題点は、既に説明した通りである。
4 原料ボックス
5 バッファタンク部
6 バルブ装置
10 処理容器
40 原料ガス供給源
V1〜V6 給断バルブ
W ウエハ
Claims (10)
- 基板に形成される膜の原料を含む原料ガスを前記基板に供給して基板処理を行う基板処理装置において、
内部に基板が載置される処理容器と、
前記原料を収容し、前記処理容器に向けて原料ガスを供給するための原料ガス供給源と、
前記原料ガス供給源から受け入れた原料ガスを一時的に貯留するバッファタンクと、
前記バッファタンクに貯留された原料ガスの処理容器への給断を行う給断バルブが配置されるバルブ配置部と、を備え、
前記処理容器の上方に、前記バルブ配置部、バッファタンク及び原料ガス供給源が、下方側からこの順に設けられた、基板処理装置。 - 前記原料ガス供給源には、固体原料または液体原料が収容され、前記固体原料または液体原料を気化させて得た原料ガスが前記処理容器に供給される、請求項1に記載の基板処理装置。
- 前記原料ガス供給源には気体状態の原料ガスが収容され、当該原料ガスは前記原料ガス供給源にて加熱された後、前記処理容器に供給される、請求項1に記載の基板処理装置。
- 前記処理容器に原料ガスが導入される高さ位置と、前記原料ガス供給源に収容された前記固体原料または液体原料の表面の高さ位置と、の高低差は、600mm〜1200mmの範囲内である、請求項1または2に記載の基板処理装置。
- 前記基板処理は、真空雰囲気にて基板に対し、前記原料ガスと、原料ガスと反応して反応生成物を生成する反応ガスと、を交互に繰り返し供給して反応生成物の膜を成膜する処理であって、
前記処理容器の上方に設けられ、当該処理容器に向けて前記反応ガスを供給するための反応ガス供給源と、
前記処理容器の上方に設けられ、当該処理容器に向けて、前記反応ガスまたは原料ガスと置換される置換ガスを供給するための置換ガス供給源と、を備え、
前記バルブ配置部には、前記反応ガス供給源から供給される反応ガスの給断を行う給断バルブ、及び前記置換ガス供給源から供給される置換ガスの給断を行う給断バルブが配置された、請求項1ないし4のいずれか一項に記載の基板処理装置。 - 前記基板の搬送容器が搬入出される搬入出ポートと、
前記搬入出ポート上の搬送容器に対して常圧雰囲気下で基板の受け渡しを行う常圧搬送機構が配置された常圧搬送室と、
側面側から、前記処理容器が複数接続されると共に、常圧雰囲気と真空雰囲気とを切り替えるロードロックモジュールを介して前記常圧搬送室に接続され、前記処理容器及びロードロックモジュールとの間で真空雰囲気下にて基板の受け渡しを行う真空搬送機構が配置された真空搬送室と、
前記複数の処理容器の上方に各々設けられ、前記反応ガス供給源を含む、前記処理容器に供給されるガスの供給源が配置されたガスボックスと、を備え、
前記ガスボックスには、真空搬送室側から前記原料ガス供給源にアクセスするためのアクセス面が設けられた、請求項1ないし5のいずれか一つに記載の基板処理装置を備えた基板処理システム。 - 前記ガスボックスには、前記原料ガス供給源に、原料ガスと共に処理容器に供給されるキャリアガスを供給するキャリアガス供給源が配置された請求項6に記載の基板処理システム。
- 前記基板処理は、真空雰囲気にて基板に対し、前記原料ガスと、原料ガスと反応して反応生成物を生成する反応ガスと、を交互に繰り返し供給して反応生成物の膜を成膜する処理であって、前記ガスボックスには、前記処理容器に向けて、前記反応ガスまたは原料ガスと置換される置換ガスを供給するための置換ガス供給源が配置された、請求項6または7に記載の基板処理システム。
- 前記真空搬送室は、上面側から見て互いに対向する側面を備え、前記複数の処理容器は、各側面に沿って複数台ずつ並べて設置された、請求項6ないし8のいずれか一つに記載の基板処理システム。
- 基板に膜の原料を含む原料ガスを供給して基板処理を行う基板処理方法において、
処理容器内に基板を載置する工程と、
前記原料ガス供給源からバッファタンクに原料ガスを受け入れて一時的に貯留する工程と、
給断バルブを用い、前記バッファタンクに貯留された原料ガスを前記処理容器に供給する工程と、を含み、
前記処理容器の上方に、前記給断バルブが配置されたバルブ配置部、バッファタンク及び原料ガス供給源が、下方側からこの順に設けられた、基板処理方法。
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