JP2020076081A5 - - Google Patents
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- Publication number
- JP2020076081A5 JP2020076081A5 JP2019195660A JP2019195660A JP2020076081A5 JP 2020076081 A5 JP2020076081 A5 JP 2020076081A5 JP 2019195660 A JP2019195660 A JP 2019195660A JP 2019195660 A JP2019195660 A JP 2019195660A JP 2020076081 A5 JP2020076081 A5 JP 2020076081A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alkoxycarbonyl
- branched
- linear
- optionally substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 3
- 125000004423 acyloxy group Chemical group 0.000 claims 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 2
- 125000006729 (C2-C5) alkenyl group Chemical group 0.000 claims 1
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 claims 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 1
- -1 C2-C5 alkenoxy Chemical group 0.000 claims 1
- 125000000041 C6-C10 aryl group Chemical group 0.000 claims 1
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000002877 alkyl aryl group Chemical group 0.000 claims 1
- 125000005248 alkyl aryloxy group Chemical group 0.000 claims 1
- 125000004104 aryloxy group Chemical group 0.000 claims 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 1
- 229910052794 bromium Inorganic materials 0.000 claims 1
- 125000002843 carboxylic acid group Chemical group 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 0 *N(C(N(C(N1I)=O)N)=O)C1=O Chemical compound *N(C(N(C(N1I)=O)N)=O)C1=O 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021074123A JP7184957B2 (ja) | 2018-10-31 | 2021-04-26 | Ｅｕｖリソグラフィプロセスのためのレジスト下層膜を形成するためのコーティング組成物 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/176,245 US12228858B2 (en) | 2018-10-31 | 2018-10-31 | Coating composition for forming resist underlayer film for EUV lithography process |
| US16/176245 | 2018-10-31 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021074123A Division JP7184957B2 (ja) | 2018-10-31 | 2021-04-26 | Ｅｕｖリソグラフィプロセスのためのレジスト下層膜を形成するためのコーティング組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2020076081A JP2020076081A (ja) | 2020-05-21 |
| JP2020076081A5 true JP2020076081A5 (enExample) | 2021-06-10 |
Family
ID=70325280
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019195660A Pending JP2020076081A (ja) | 2018-10-31 | 2019-10-28 | Ｅｕｖリソグラフィプロセスのためのレジスト下層膜を形成するためのコーティング組成物 |
| JP2021074123A Active JP7184957B2 (ja) | 2018-10-31 | 2021-04-26 | Ｅｕｖリソグラフィプロセスのためのレジスト下層膜を形成するためのコーティング組成物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021074123A Active JP7184957B2 (ja) | 2018-10-31 | 2021-04-26 | Ｅｕｖリソグラフィプロセスのためのレジスト下層膜を形成するためのコーティング組成物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12228858B2 (enExample) |
| JP (2) | JP2020076081A (enExample) |
| KR (2) | KR20200049660A (enExample) |
| CN (1) | CN111116357A (enExample) |
| TW (1) | TWI821442B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12393118B2 (en) * | 2021-05-28 | 2025-08-19 | Dupont Electronic Materials International, Llc | Composition for photoresist underlayer |
| WO2024181330A1 (ja) | 2023-02-27 | 2024-09-06 | 日産化学株式会社 | レジスト下層膜形成用組成物 |
| CN119200332A (zh) * | 2024-09-29 | 2024-12-27 | 国科天骥(山东)新材料有限责任公司 | 一种用于电子束光刻工艺的层状结构及其光刻工艺 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5939236A (en) * | 1997-02-07 | 1999-08-17 | Shipley Company, L.L.C. | Antireflective coating compositions comprising photoacid generators |
| TW591341B (en) | 2001-09-26 | 2004-06-11 | Shipley Co Llc | Coating compositions for use with an overcoated photoresist |
| JP4206851B2 (ja) * | 2003-07-23 | 2009-01-14 | Ｊｓｒ株式会社 | 反射防止膜形成組成物及び反射防止膜の形成方法 |
| JP4179116B2 (ja) * | 2003-09-11 | 2008-11-12 | Ｊｓｒ株式会社 | 反射防止膜形成組成物及び反射防止膜の製造方法 |
| EP1598702A1 (en) * | 2004-05-18 | 2005-11-23 | Rohm and Haas Electronic Materials, L.L.C. | Coating compositions for use with an overcoated photoresist |
| EP1691238A3 (en) * | 2005-02-05 | 2009-01-21 | Rohm and Haas Electronic Materials, L.L.C. | Coating compositions for use with an overcoated photoresist |
| TWI340296B (en) * | 2005-03-20 | 2011-04-11 | Rohm & Haas Elect Mat | Coating compositions for use with an overcoated photoresist |
| US20070298349A1 (en) * | 2006-06-22 | 2007-12-27 | Ruzhi Zhang | Antireflective Coating Compositions Comprising Siloxane Polymer |
| WO2009047151A1 (en) * | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
| WO2010061774A1 (ja) | 2008-11-27 | 2010-06-03 | 日産化学工業株式会社 | アウトガス発生が低減されたレジスト下層膜形成組成物 |
| KR20100103378A (ko) * | 2009-03-12 | 2010-09-27 | 스미또모 가가꾸 가부시끼가이샤 | 레지스트 패턴의 제조 방법 |
| WO2010122948A1 (ja) | 2009-04-21 | 2010-10-28 | 日産化学工業株式会社 | Ｅｕｖリソグラフィー用レジスト下層膜形成組成物 |
| US9244352B2 (en) | 2009-05-20 | 2016-01-26 | Rohm And Haas Electronic Materials, Llc | Coating compositions for use with an overcoated photoresist |
| WO2011018928A1 (ja) | 2009-08-10 | 2011-02-17 | 日産化学工業株式会社 | ポリマー型の光酸発生剤を含有するレジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| JP5610168B2 (ja) | 2010-11-17 | 2014-10-22 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| KR20180082617A (ko) * | 2012-02-09 | 2018-07-18 | 닛산 가가쿠 고교 가부시키 가이샤 | 막형성 조성물 및 이온주입방법 |
| JP2013203825A (ja) | 2012-03-28 | 2013-10-07 | Toyo Ink Sc Holdings Co Ltd | カラーフィルタ用着色組成物 |
| US9212255B2 (en) | 2012-05-07 | 2015-12-15 | Nissan Chemical Industries, Ltd. | Resist underlayer film-forming composition |
| CN105393172B (zh) | 2013-07-23 | 2019-08-02 | 日产化学工业株式会社 | 抗蚀剂下层膜形成用组合物用添加剂及包含其的抗蚀剂下层膜形成用组合物 |
| KR102255221B1 (ko) | 2013-12-27 | 2021-05-24 | 롬엔드하스전자재료코리아유한회사 | 나노리소그래피용 유기 바닥 반사방지 코팅 조성물 |
| DE102015220537A1 (de) | 2015-10-21 | 2016-10-27 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit mindestens einem Manipulator |
| CN107501858A (zh) | 2017-10-10 | 2017-12-22 | 周荣 | 一种强韧性三聚氰胺泡沫材料的制备方法 |
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2018
- 2018-10-31 US US16/176,245 patent/US12228858B2/en active Active
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2019
- 2019-10-28 TW TW108138803A patent/TWI821442B/zh active
- 2019-10-28 JP JP2019195660A patent/JP2020076081A/ja active Pending
- 2019-10-29 CN CN201911034549.1A patent/CN111116357A/zh active Pending
- 2019-10-30 KR KR1020190136357A patent/KR20200049660A/ko not_active Abandoned
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2021
- 2021-04-26 JP JP2021074123A patent/JP7184957B2/ja active Active
- 2021-12-27 KR KR1020210188794A patent/KR102516980B1/ko active Active