JP2020047591A5 - - Google Patents

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Publication number
JP2020047591A5
JP2020047591A5 JP2019212122A JP2019212122A JP2020047591A5 JP 2020047591 A5 JP2020047591 A5 JP 2020047591A5 JP 2019212122 A JP2019212122 A JP 2019212122A JP 2019212122 A JP2019212122 A JP 2019212122A JP 2020047591 A5 JP2020047591 A5 JP 2020047591A5
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JP
Japan
Prior art keywords
hollow cathode
plasma source
cathode plasma
plasma
substrate
Prior art date
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Pending
Application number
JP2019212122A
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English (en)
Japanese (ja)
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JP2020047591A (ja
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Publication date
Application filed filed Critical
Priority to JP2019212122A priority Critical patent/JP2020047591A/ja
Priority claimed from JP2019212122A external-priority patent/JP2020047591A/ja
Publication of JP2020047591A publication Critical patent/JP2020047591A/ja
Publication of JP2020047591A5 publication Critical patent/JP2020047591A5/ja
Pending legal-status Critical Current

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JP2019212122A 2019-11-25 2019-11-25 中空陰極プラズマ源 Pending JP2020047591A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2019212122A JP2020047591A (ja) 2019-11-25 2019-11-25 中空陰極プラズマ源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019212122A JP2020047591A (ja) 2019-11-25 2019-11-25 中空陰極プラズマ源

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2017529720A Division JP6710686B2 (ja) 2014-12-05 2014-12-05 中空陰極プラズマ源、基材処理方法

Publications (2)

Publication Number Publication Date
JP2020047591A JP2020047591A (ja) 2020-03-26
JP2020047591A5 true JP2020047591A5 (enExample) 2020-06-25

Family

ID=69899895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019212122A Pending JP2020047591A (ja) 2019-11-25 2019-11-25 中空陰極プラズマ源

Country Status (1)

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JP (1) JP2020047591A (enExample)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE1019991A3 (fr) * 2011-05-25 2013-03-05 Agc Glass Europe Procede de depot de couches sur un substrat verrier par pecvd a faible pression.
ES2883288T3 (es) * 2014-12-05 2021-12-07 Agc Glass Europe Sa Fuente de plasma de cátodo hueco

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