JP2020047591A - 中空陰極プラズマ源 - Google Patents

中空陰極プラズマ源 Download PDF

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Publication number
JP2020047591A
JP2020047591A JP2019212122A JP2019212122A JP2020047591A JP 2020047591 A JP2020047591 A JP 2020047591A JP 2019212122 A JP2019212122 A JP 2019212122A JP 2019212122 A JP2019212122 A JP 2019212122A JP 2020047591 A JP2020047591 A JP 2020047591A
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Japan
Prior art keywords
plasma source
plasma
hollow cathode
hole
cross
Prior art date
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Pending
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JP2019212122A
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English (en)
Japanese (ja)
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JP2020047591A5 (enExample
Inventor
ビケット，トーマス
Biquet Thomas
マスクィッツ，ピーター
Maschwitz Peter
チェンバーズ，ジョン
Chambers John
ワイアム，ヒューズ
Wiame Hughes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Glass Europe SA
AGC Inc
AGC Flat Glass North America Inc
Original Assignee
AGC Glass Europe SA
Asahi Glass Co Ltd
AGC Flat Glass North America Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AGC Glass Europe SA, Asahi Glass Co Ltd, AGC Flat Glass North America Inc filed Critical AGC Glass Europe SA
Priority to JP2019212122A priority Critical patent/JP2020047591A/ja
Publication of JP2020047591A publication Critical patent/JP2020047591A/ja
Publication of JP2020047591A5 publication Critical patent/JP2020047591A5/ja
Pending legal-status Critical Current

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  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
JP2019212122A 2019-11-25 2019-11-25 中空陰極プラズマ源 Pending JP2020047591A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2019212122A JP2020047591A (ja) 2019-11-25 2019-11-25 中空陰極プラズマ源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019212122A JP2020047591A (ja) 2019-11-25 2019-11-25 中空陰極プラズマ源

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2017529720A Division JP6710686B2 (ja) 2014-12-05 2014-12-05 中空陰極プラズマ源、基材処理方法

Publications (2)

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JP2020047591A true JP2020047591A (ja) 2020-03-26
JP2020047591A5 JP2020047591A5 (enExample) 2020-06-25

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ID=69899895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019212122A Pending JP2020047591A (ja) 2019-11-25 2019-11-25 中空陰極プラズマ源

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JP (1) JP2020047591A (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014518947A (ja) * 2011-05-25 2014-08-07 エージーシー グラス ユーロップ 低圧ｐｅｃｖｄによってガラス基板上に層を蒸着するための方法
JP6710686B2 (ja) * 2014-12-05 2020-06-17 エージーシー ガラス ヨーロッパ 中空陰極プラズマ源、基材処理方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014518947A (ja) * 2011-05-25 2014-08-07 エージーシー グラス ユーロップ 低圧ｐｅｃｖｄによってガラス基板上に層を蒸着するための方法
JP6710686B2 (ja) * 2014-12-05 2020-06-17 エージーシー ガラス ヨーロッパ 中空陰極プラズマ源、基材処理方法

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