JP2020004478A - Lift device and method for using same - Google Patents

Abstract

To achieve an increase in size and densification of a receptor substrate and shorten a tact time in a lift device while maintaining a high accuracy of a lift position.SOLUTION: A lift device is constructed with stage groups each of which moves while holding a donor substrate with a lift object mounted thereon and/or a beam shaping optical system and a reduction projection optical system, and a stage group for supporting a receptor substrate that is a lift destination, the donor groups and the stage group being formed on separate surface plates. Thereby, the lift device minimizes the vibration accompanying relative scanning of each substrate with respect to laser light and anomalies in the accuracy of a synchronization position for the stages used for the scanning.SELECTED DRAWING: Figure 1A

Description

    The present invention relates to an apparatus for accurately lifting (LIFT: Laser Induced Forward Transfer) an object located on a donor substrate onto a receptor substrate by using laser irradiation.

  There is a technique of irradiating a laser to an organic EL layer on a donor substrate and lifting the organic EL layer on an opposing circuit substrate. Patent Literature 1 discloses a technique in which one laser beam is converted into a plurality of rectangular laser beams having a rectangular uniform intensity distribution, these are arranged in series and at equal intervals, and fixed in a predetermined region of a donor substrate. Irradiation is performed for a predetermined number of times at a time interval or more, and is absorbed by a metal foil located between the donor substrate and the organic EL layer to generate an elastic wave, whereby the separated organic EL layer is lifted onto the opposing circuit substrate. The technology is disclosed.

  In this technique, a spacer having a preferable value of 80 to 100 [μm] is interposed between a donor substrate and a circuit substrate, and a spacer integrated with a constant distance therebetween is placed on one stage. A structure for mounting and scanning relatively to the laser beam is used. However, in this case, a step of integrating the opposing donor substrate and the circuit board is separately required, and a donor substrate of the same size as the circuit board is required. Larger size is also required.

  Similarly, as a technique for lifting the organic EL layer on the donor substrate to the opposing circuit substrate, a light absorbing layer is provided between the donor substrate and the organic EL layer, and the laser light applied to the light absorbing layer is absorbed to generate a shock wave. Patent Literature 2 discloses a technique of lifting an opposing circuit board at an interval of 10 to 100 [μm]. However, there is no disclosure of a laser beam scanning method, a stage configuration for realizing the method, and a lift device. Therefore, it cannot be referred to as a technique for maintaining and improving the lift position accuracy that can cope with an increase in the size of a circuit board.

  In addition, in an exposure apparatus used for manufacturing a semiconductor device, a technique related to a step-and-scan method is disclosed in Japanese Patent Application Laid-Open No. H11-163,837. The basic idea is that one row of shot areas along the scanning exposure direction of the wafer stage is intermittently exposed while skipping some shot areas on the way, and the wafer stage is not stopped halfway. is there. That is, a reticle stage that holds a reticle, a wafer stage that holds a wafer, and a projection optical system that projects a reticle pattern onto the wafer are provided, and exposure is performed while scanning the reticle stage and the wafer stage together with the projection optical system. An exposure apparatus for sequentially projecting a pattern of a reticle onto a plurality of shot areas of a wafer, and performing scanning movement without stopping the wafer stage for a plurality of shot areas on a wafer arranged in a scanning direction. This is an apparatus that performs intermittent exposure while performing exposure. This makes it possible to reduce the influence on the exposure accuracy of the vibration and swing caused by the scanning of the stage, in comparison with the step-and-repeat method in which the acceleration and deceleration of the wafer stage is repeated in the demand for a larger wafer and a higher processing speed. it can.

  However, the technique disclosed in Patent Document 3 is a technique of a semiconductor exposure apparatus based on reduction projection exposure, and has a different technical field from the lift technique of the present invention. That is, the configuration and scanning technique of the reticle stage and the wafer stage in the exposure apparatus, and the mask pattern according to the present invention is reduced and projected onto an object on a donor substrate with high positional accuracy. It is completely different from the stage configuration and the scanning technique for lifting to the substrate. Accordingly, this cannot be referred to as the specific stage configuration and the scanning technique in the present invention.

JP 2014-67671 A JP 2010-40380 A JP 2000-21702A

  A configuration in which the donor stage holding the donor substrate and the optical stage holding the optical system mounted on the donor stage and the receptor stage holding the receptor substrate are independent mechanisms, and further, the optical stage is provided on the donor stage Rather than mounting directly, the mechanism is configured to be installed independently on a rigid surface plate, so that vibrations and various errors due to scanning of each stage affect the synchronization position accuracy between stages Is minimized. As a result, it is an object of the present invention to provide a lift device that contributes to enlargement and miniaturization of a receptor substrate and shorten tact time while maintaining the lift position accuracy.

  The first invention selectively exfoliates the target by irradiating a pulse laser beam from the back surface of the donor substrate toward the target positioned on the front surface of the moving donor substrate, and removes the target substrate from the donor substrate. A laser device that lifts onto a receptor substrate that moves while opposing, a laser device that performs pulse oscillation, a telescope that converts pulse laser light emitted from the laser device into parallel light, and a pulse laser that passes through the telescope. A shaping optical system for uniformly shaping the spatial intensity distribution of light, a mask for passing the pulsed laser light shaped by the shaping optical system in a predetermined pattern, and a mask positioned between the shaping optical system and the mask A field lens, a projection lens for reducing and projecting the laser light passing through the pattern of the mask onto the surface of the donor substrate, and the field lens; A mask stage for holding a mask, an optical stage for holding the shaping optical system, the mask stage, and the projection lens, a donor stage for holding a donor substrate in a direction in which a back surface thereof is a laser beam incident side, and a receptor. A receptor stage for holding a substrate, and a programmable multi-axis controller having a trigger output function and a stage control function for the pulsed laser light oscillation, and the receptor stage includes a Y-axis when a horizontal plane is an XY plane, The donor stage has a vertical Z axis and a θ axis in an XY plane, the donor stage has an X axis, a Y axis, and a θ axis, and the projection lens is held on the optical stage together with a Z axis stage for the projection lens. The telescope, the shaping optical system, the field lens, the mask, and the projection lens are An X-axis of the donor stage is set on the surface plate 1, and a Y-axis of the receptor stage is different from the surface plate 1. The lift device is provided on the surface plate 2, and the Y axis of the donor stage is suspended from the X axis of the donor stage.

  Here, the “moving” substrate is a pulse laser beam (shown as “LS” in FIG. 1A. However, although FIG. 1A shows the main components of the second invention, it is common to the configuration of the first invention. (The same applies to the following.) The same applies to the case where the laser beam moves without stopping during the irradiation, and the case where the laser beam stops during the irradiation of the pulse laser beam and repeats the movement and the stop. These are selected according to the lift process by the lift device according to the present invention and the required tact time. In addition, a configuration in which the donor substrate (D) repeatedly moves and stops, and the receptor substrate (R) does not stop, and vice versa are also included. When only one shot is used to separate an object from a donor substrate and a high tact time is required, it is preferable that the donor substrate and the receptor substrate move at the same or different speeds without stopping. Selected. On the other hand, a configuration in which the donor substrate moves without stopping and the receptor substrate stops for a certain number of shots may be selected, for example, when it is desired to stack the objects with a certain thickness.

  The “target” is not particularly limited, and may be a lift target provided on the donor substrate or on the donor substrate via a light absorbing layer (not shown in FIG. 1A). The present invention includes, but is not limited to, a thin film typified by the organic EL layer described in the above-mentioned patent document, and a thin film formed in a fine element shape and regularly arranged. Note that the lift mechanism includes a light absorbing layer irradiated with laser light, which generates a shock wave, whereby an object is separated from the donor substrate and lifted toward the receptor substrate, or has a light absorbing layer. However, the present invention includes, but is not limited to, those separated by a laser beam directly applied to an object.

  The material of the donor substrate only needs to have a transmission characteristic with respect to the wavelength of the laser beam, and is desirably a material having a small amount of deflection due to the enlargement of the substrate. If the amount of deflection is so large that the uniformity of the gap between the donor substrate and the receptor substrate cannot be satisfied, the method of holding the donor substrate in the donor stage (Yd, θd), for example, by forming an adsorption area near the center of the donor substrate. In addition to mechanical correction by providing, etc., there is a method of correcting by using a gap sensor based on a combination of a height sensor described later.

  In the present invention, the movable range of the donor stage includes an XY plane region where the donor substrate is to be moved in order to lift an object located near the edge of the donor substrate to the receptor substrate, and a range depending on the size of the receptor substrate. Say. As an example, when the size of the donor substrate in the XY plane is 200 × 200 [mm] and the size of the receptor substrate is 400 × 400 [mm], the predetermined range in which the donor stage (Xd, Yd) is to move is approximately 800 mm. × 800 [mm]. This is shown in FIG. If it is necessary to move the substrate further for removing the donor substrate, that region is also included.

  Further, the term "plate" is not particularly limited in its material, but must be a material having extremely high rigidity. The surface plate 1 (G1) is desirably formed in a “U” shape or a “□” shape in a top view in order to impart rigidity. Also, in FIG. 1A, the surface plate 2 is shown as a single sheet. Specifically, the surface plate 2 is a surface plate provided in two in the Y-axis direction, and a linear scale and a linear motor May be placed. In addition, the surface plate 1 and the surface plate 2 can be structured to be fixed on the same basic surface plate (G). Furthermore, G1 may be configured to be a combination of a surface plate 11 (G11) and a surface plate 12 (G12).

  In addition, it is necessary to use a highly rigid member such as steel, stone, or ceramic for the material of any surface plate. For example, as the stone, a stone represented by granite (granite / granite) can be used, and the stone is not limited to this. Further, it is not necessary that all the surface plates are made of the same material.

  The movement of each stage will be described in detail in an embodiment to be described later, but generally performs the following operation. First, the X-axis (Xd) of the donor stage is set on G1 with the Y-axis (Yd) of the donor stage suspended, and moves in the X-axis direction. This movement changes the relative position along the X axis between the donor substrate and the receptor substrate. The movement is shown in FIG. 1B. In each of the drawings, details of the movable table of the stage, the linear guide, and the like are not shown.

  The method of installing the optical stage (Xo) on a surface plate or the like is not limited. For example, a state where the optical stage (Xo) is mounted on Xd, a state where the optical stage (Xo) is installed on the same surface plate as the surface plate on which Xd is installed, or Xd Various mechanisms can be selected, such as a state of being placed on a surface plate different from the above. Xo moves in the X-axis direction in parallel with Xd, and the relative positions of the shaping optical system (H), the field lens (F), the mask (M), and the projection lens (Pl) are not changed. These are moved together. On the other hand, the movement of Xo along the X axis changes the relative positional relationship between the donor substrate and the projection lens. The state of the movement is shown in FIG. 1C.

  When it is not necessary to change the relative positions of the donor substrate and the projection lens in the X-axis direction, the structure always moves together with the X-axis of the donor stage, that is, the optical stage is omitted, and the homogenizer, the field lens, the mask and the projection lens are omitted. May be fixed on the X-axis of the donor stage or separately on the surface plate.

  The mask is held on a mask stage, and the mask stage has at least a W axis that moves in the X axis direction together with at least the field lens, and preferably also has a U axis in the Y axis direction and a V axis that moves in the Z axis direction. , A TV axis for adjusting the inclination with respect to the R axis and the V axis, which are rotation axes in the YZ plane, and a TU axis for adjusting the inclination with respect to the U axis. In addition, in order to suppress the input of heat due to laser irradiation to the mask, an aperture mask having a pattern one size larger than the mask pattern may be provided in front of the mask, and a double mask structure may be provided together with the mask.

  The Y-axis of the donor stage (Yd) and the Y-axis of the receptor stage (Yr) may be the same or different speeds while maintaining a constant gap between the donor substrate and the receptor substrate during the lifting process, and maintaining a very high degree of parallelism. Move with. And, by the above-mentioned structure such as the moving method of each stage group and the platen which supports them, the moving mechanism of the receptor substrate is limited to the Y axis, and the moving mechanism of the donor substrate is separated from the moving mechanism of the donor substrate. It is possible to suppress the mutual influence due to the interference and vibration of the area, and to cope with the enlargement and miniaturization of the size of the receptor substrate.

  According to a second aspect, in the first aspect, the X-axis of the donor stage is mounted on the surface plate 1, and the optical stage is mounted on the X-axis of the donor stage. It is a lift device characterized by the following.

  FIG. 1A shows main components (in a side view) of the lift device according to the second invention. FIG. 1B shows a state (side view) in which Xd moves with Xo placed thereon from the state of FIG. 1A. FIG. 1C shows a state (side view) in which Xo moves on Xd from the state of FIG. 1B. FIG. 1D shows a top view of FIG. 1C.

  According to a third aspect, in the first aspect, the optical stage is mounted on the surface plate 1, and the X axis of the donor stage is suspended from the surface plate 1. It is a lift device.

  FIG. 2A shows main components (in side view) of the lift device according to the third invention. FIG. 2B shows a state (side view) in which Xd and Xo have moved the same distance on G1 (Xd is hung on G1) from the state of FIG. 2A. FIG. 2C shows a state (side view) in which only Xo has moved on G1 from the state of FIG. 2B.

  In a fourth aspect based on the first aspect, the X-axis of the donor stage is installed on the surface plate 1 and the optical stage is mounted on a surface plate 3 different from both the surface plate 1 and the surface plate 2. It is a lift device characterized by being performed.

  Here, “installed on the surface plate 1” includes a state of being placed on the surface plate 1 and a state of being suspended from the surface plate 1, and is not limited thereto.

  In a fifth aspect based on the first aspect, both the distance between the X axis of the donor stage and the surface plate 1 and the distance between the X axis of the donor stage and the Y axis of the donor stage are respectively set. A lift device having a rotation adjustment mechanism for finely adjusting an installation angle in an XY plane between the two.

  Here, an example of a rotation adjustment mechanism (RP) installed between the X axis (Xd) of the donor stage and the platen 1 (G1) is shown in FIG. 3A. In FIG. 3A, the left diagram shows a top view, and the right diagram shows a side view from the X-axis direction. A row of holes located on the outside in the top view is used for fixing to the G1 and has "play" (room) for having a rotation adjusting function. Further, two rows of holes located inside in the top view are holes through which screws for fixing the linear guides of RP and Xd pass. Although it is possible to use the Xd-side linear guide holes on the side where the "play" is provided, if the two linear guides are fixed independently and in parallel, the difficulty of the installation process may increase. There is.

  On the other hand, FIG. 3B shows an example of the RP installed between Xd and the Y axis (Yd) of the donor stage suspended therefrom. Two rows of holes located on the outside in the top view are used for fixing to Xd, and have “play” to have a rotation adjusting function. Further, two rows of holes arranged in the Y-axis direction are used for fixing with Yd.

  In addition, an RP different from the above may be used as the RP installed between G1 and Xd. For example, a fulcrum (a rotation axis in the Z-axis direction) for rotating and adjusting the RP on which Xd is placed (not shown) with respect to G1 in the XY plane with respect to G1 is provided on the contact surface between the RP and G1. A power point for the fulcrum is provided on the side surface (vertical surface) of the RP sufficiently distant from the fulcrum. On G1 near this point of force, a large screw that is pushed horizontally toward the point of force is installed. Similarly, a large screw is installed on the side of the RP opposite to this. Thus, the RP on which Xd is placed can be rotated on the XY plane with respect to G1 in the [μrad] order around the fulcrum.

  In a sixth aspect based on the second aspect, the X-axis of the donor stage and the optical table, the X-axis of the donor stage and the optical stage, and the X-axis of the donor stage A lift device having a rotation adjustment mechanism between the donor stage and the Y axis for fine adjustment of an installation angle in an XY plane between the two.

  As these RPs, for example, the RP used between G1 and Xd shown in FIG. 3A, the RP used between Xd and Xo shown in FIG. 3C, and the RP used between Xd and Yd shown in FIG. 3B are used. be able to.

  In a seventh aspect based on the third aspect, the X-axis of the donor stage and the surface plate 1, the optical stage and the surface plate 1, and the X-axis of the donor stage and the donor A lift device having a rotation adjusting mechanism for finely adjusting an installation angle between the stage and a Y axis in an XY plane between the two.

  Here, for example, the RP shown in FIG. 3A is used as a rotation adjustment mechanism between Xo and G1 and between Xd and G1, respectively, while the RP shown in FIG. 3B is used as a rotation adjustment mechanism between Xd and Yd. The former RP has holes through which Xo and Xd linear guide fixing screws are passed, and the "play" provided in the holes allows the respective linear guides for the stage to be fixed in the XY plane between the RP and G1. Adjust the installation angle.

  In an eighth aspect based on the fourth aspect, the X-axis of the donor stage and the surface plate 1, the optical stage and the surface plate 3, and the X-axis of the donor stage and the donor A lift device having a rotation adjusting mechanism for finely adjusting an installation angle between the stage and a Y axis in an XY plane between the two.

  A ninth invention is the lift device according to any one of the first to eighth inventions, wherein the pulse laser device is an excimer laser.

  Here, the oscillation wavelength of the excimer laser is mainly 193, 248, 308 or 351 [nm], and is suitably selected from these depending on the material of the light absorbing layer and the light absorption characteristics of the object.

  A tenth invention is the lift device according to the ninth invention, further comprising a pulse shutter for interrupting an arbitrary pulse train of a laser pulse emitted from the pulse laser device.

  The laser device that performs pulse oscillation receives a trigger signal from the programmable multi-axis control device and starts oscillating.However, the energy of a pulse within a certain number of times or a fixed time immediately after the oscillation is so high that it cannot be used depending on its application. Is known to be unstable. Therefore, in order to eliminate the unstable pulse group, it is necessary to eliminate it by a mechanical shutter operation. Specifically, for example, in the case of an excimer laser that oscillates at 1 [kHz], the time window between adjacent laser pulses is about 1 [ms], and a certain distance is moved (crossed) within this time. A high-speed shutter function that can be used is required. This constant distance depends on the spatial size of the laser beam at the place where the shutter is operated. If the distance is 5 [mm], the required shutter operation speed is 5 [m / s], An ultra-high-speed shutter that moves an optical element in and out of an optical path using a coil or the like is required. Even if the spatial size is reduced by a molding optical system or the like and the distance traversed by the shutter member can be shortened, it is easily damaged depending on the energy density of the laser beam.

  In an eleventh aspect based on any one of the first to tenth aspects, the programmable multi-axis control device has a function of simultaneously controlling at least the Y axis of the receptor stage and the Y axis of the donor stage, and A lift device comprising means for correcting the moving position error using two-dimensional distribution correction value data created in advance to correct the moving position error of the stage.

  For example, the position correction of the receptor substrate and the donor substrate at the time of laser beam irradiation is performed using the pseudo two-dimensional distribution correction value data information on the XY plane by any combination of Xd or Xo and Yr or Yd. Is what you do. Factors of the position error to be corrected include, but are not limited to, pitching, yawing, and rolling accompanying the movement of each stage. In addition, the parameters for determining the correction value include the moving speeds of Yr and Yd and the ratio thereof in addition to the position information of each stage.

  In a twelfth aspect based on any one of the first to eleventh aspects, a high-magnification camera for monitoring the position of the donor substrate is provided on the Z axis of the receptor stage, or a high-level camera for monitoring the position of the receptor substrate. A lift device, wherein a magnification camera is installed on the X-axis of the donor stage or a portion that moves with the X-axis, or the optical stage or a portion that moves with the X-axis.

  Here, the “portion of the donor stage that moves together with the X axis” includes Yd suspended from Xd. In the present invention, the parallelism between the Y axes and the X axes of each stage, and the perpendicularity between the Y and X axes of each stage are important parameters that affect the lift position accuracy. When verifying the parallelism and the perpendicularity when assembling each stage, the amount of displacement in the direction orthogonal to the movement distance of each stage holding the alignment substrate is measured with a high-magnification and high-resolution camera. Monitor and adjust the squareness using the rotation adjustment mechanism. In the adjustment of the parallelism between Yr and Yd, both stages are moved (parallel running) by the same distance in synchronization with each other, and the high-magnification camera attached to one of the stages is used to adjust the pattern attached to the opposite stage. It is observed whether or not the position of the matched alignment mark image (such as a cross mark) is stationary without moving. In this case, movement in the Y-axis direction indicates an abnormality in synchronization between Yd and Yr, and movement in the X-axis direction indicates an adjustment error in the parallelism between Yd and Yr.

  Note that a CCD camera is generally used as the high magnification camera. Although the magnification and the like depend on the lift position accuracy, as an example, when detecting the above-mentioned [μrad] order shift amount, that is, when detecting the 1 [m] shift amount with respect to the stage moving distance of 1 [m]. And a resolution of 1 [μm] and a magnification of about 20 to 50 times.

  In a thirteenth aspect based on any one of the first to twelfth aspects, the donor stage and the receptor stage each include a gap sensor for measuring a gap between the surface (lower surface) of the donor substrate and the surface of the receptor substrate. It is a lift device characterized by having.

  Here, the gap sensor is a combination of height sensors installed on each of the donor and receptor stages. The height sensor installed on the donor stage measures the distance to the receptor substrate and the height installed on the receptor stage. The sensor measures the distance to the donor substrate, and calculates the gap between the donor substrate and the receptor substrate from both the measured values and the height information of the height sensor.

  According to a fourteenth aspect, in any one of the eleventh to thirteenth aspects, position measuring means using a laser interferometer is provided for each of the Y axis of the receptor stage and the Y axis of the donor stage. A lift device characterized by the following.

  The configuration of the laser interferometer for the Y axis (Yr) of the receptor stage includes a mirror (Ic) held at a portion that moves together with Yr, and a surface plate that is not easily affected by vibration or the like due to the movement, for example, a surface plate 2 ( G2) and a configuration including an interferometer laser (IL) fixed to G2) and a 波長 wavelength plate or the like (not shown). Preferably, a three-axis corner cube (retro reflector) is used as the mirror, and it is desirable that the mirror be as close as possible to the position (height) of the receptor substrate. An outline is shown in FIG. 5A. (Z axis and θ axes of the donor stage group and the receptor stage are not shown.)

  Yr is controlled by the programmable multi-axis control device based on the position information from the linear encoder, but is used for calibration of the linear encoder. This laser interferometer is used for calibration at the time of fine adjustment.

  The configuration of the laser interferometer for the Y axis (Yd) of the donor stage includes Ic held on a surface that moves together with Yd suspended from Xd, IL similarly fixed to Xd, a 波長 wavelength plate, and the like. (Not shown). Again, it is desirable to use a three-axis corner cube (retro reflector) as the mirror and to be as close as possible to the position (height) of the donor substrate. An outline is shown in FIG. 5B. (The receptor stage group is not shown.) Regarding the selection of any of the detection methods of the laser for the interferometer, the optimum one may be selected according to the required lift position accuracy.

  A fifteenth invention according to any one of the first to fourteenth inventions, further comprises a confocal beam profiler having an imaging surface at a position conjugate with a position where the mask pattern is reduced and projected by the projection lens to form an image. A lift device characterized in that:

  By this confocal beam profiler, the position and spatial intensity distribution state of the laser light reduced and projected on the donor substrate surface, and the state of the image formation can be adjusted in real time with the same accuracy as the image resolution of the reduced image forming optical system. Can be monitored.

  In a sixteenth aspect based on any of the thirteenth to fifteenth aspects, the deflection amount of the donor substrate is measured in advance together with the XY position information of the donor substrate using the gap sensor, and the deflection amount obtained by the measurement is measured. The thirteenth to thirteenth to thirteenth to thirteenth to thirteenth to thirteenth to thirteenth to thirteenth aspects, wherein the lift is performed while correcting the gap between the donor substrate and the receptor substrate using the Z axis (Zr) of the receptor stage or the Z axis stage of the projection lens based on the two-dimensional distribution data. A usage method of the lift device according to any one of the fifteenth inventions.

  A seventeenth invention is a method for adjusting the parallelism between the Y axis of the receptor stage and the Y axis of the donor stage in the assembling step of the lift device according to any of the eleventh to sixteenth inventions, With the Z-axis and θ-axis of the receptor stage as well as the Y-axis for which the straightness is adjusted as a reference, the perpendicularity between the Y-axis of the receptor stage and the X-axis of the donor stage is determined by the X-axis of the surface plate 1 and the X-axis of the donor stage. Adjusting by a rotation adjustment mechanism located between the donor stage and the Y-axis of the donor stage suspended from the X-axis of the donor stage whose perpendicularity has been adjusted and the Y-axis of the receptor stage in synchronization. Run, and align the alignment mark on the Y axis of the donor stage with the high magnification camera attached to the site that moves with the Y axis of the receptor stage. And adjusting the parallelism between the Y axis of the receptor stage and the Y axis of the donor stage by a rotation adjusting mechanism between the X axis of the donor stage and the Y axis of the donor stage based on the result of the observation. And a step of adjusting the lift device according to any one of the eleventh to sixteenth aspects of the invention.

  The high-magnification camera is located at the highest position of each stage or plate placed on Yr and has high rigidity in order to accurately confirm and adjust the parallelism between Yd and Yr. It is desirable to attach.

  The present invention realizes an increase in the size of a receptor substrate in a lift device and a reduction in tact time while maintaining high lift position accuracy, based on high synchronous position accuracy between a donor substrate and a receptor substrate.

1 shows a main component (in a side view) of a lift device according to the present invention. (Second invention) 1A shows a state (side view) in which the X-axis of the donor stage has moved with the optical stage mounted thereon from the state of FIG. 1A. FIG. 1B shows a state (side view) in which the optical stage has moved on the X axis of the donor stage from the state shown in FIG. 1B. The top view of FIG. 1C. 1 shows a main component (in a side view) of a lift device according to the present invention. (Third invention) 2A shows a state (side view) in which the X axis of the donor stage and the optical stage have moved the same distance on the surface plate 1 from the state of FIG. 2A. 2B shows a state (side view) in which only the X-axis of the donor stage is moved on the surface plate 1 from the state of FIG. 2B. An example of a rotation adjustment mechanism used between G1 and Xd is shown. An example of a rotation adjustment mechanism used between Xd and Yd is shown. An example of a rotation adjustment mechanism used between Xd and Xo is shown. The range in which the donor stage should move according to the size of the receptor substrate is shown. 7 shows a state where a Y-axis laser interferometer of a receptor stage is installed. 4 shows how a laser interferometer for a Y-axis of a donor stage is installed. An example of a pattern applied to a mask is shown. The state of the lift process using a plurality of rows of mask patterns is shown. The state of the monitor of the confocal beam profiler is shown. 7 shows the first shot of the lift process. 7 shows a second shot of the lift process. 7 shows a third shot of the lift process. The state of the receptor substrate after one scan with a gear ratio of 1: 2 is shown. 6 shows a state of step scanning on the X axis of the donor stage. 5 shows a synchronization position error when the Y axis of the receptor stage and the Y axis of the donor stage are translated. 7 shows a first shot of a lift step using a matrix-shaped donor substrate. 7 shows a second shot of a lift step using a matrix-shaped donor substrate. 7 shows a third shot of a lift step using a matrix donor substrate.

    Hereinafter, a specific configuration of the lift device according to the present invention will be described in detail with reference to the drawings.

  In the first embodiment, a layer-shaped (solid film) object formed in one leaf via a light absorption layer on a donor substrate having a size of 200 × 200 [mm] is placed in a 400 × 400 [mm] size. An example is shown in which a total of 144 million pieces of 12,000 × 12,000 elements are lifted in a matrix form as element-shaped lift objects having a shape of 10 × 10 [μm] per receptor substrate. These 144 million lift positions have a positional accuracy of ± 1 [μm], and the vertical and horizontal pitches are 30 [μm].

  First, FIG. 1A shows main components of a lift device according to an embodiment of the present invention. In FIG. 1A, illustrations of a laser device, a control device, and other monitors are omitted, and the X-axis, Y-axis, and Z-axis directions are shown in the figure. The surface plate 1 (G1), the surface plate 11 (G11), the surface plate 12 (G12) and the surface plate 2 (G2) were all stone surface plates using granite. And iron of high synthesis was used for the base platen (G). This embodiment is an embodiment based on the configuration of the sixth invention.

  The configuration of the lift device according to the first embodiment of the present invention will be described in order from the pulsed laser beam emitted from the laser device to the irradiation of an object on the donor substrate along the propagation of the laser beam. First, the laser device used in the first embodiment is an excimer laser having an oscillation wavelength of 248 [nm]. The spatial distribution of the emitted laser light is approximately 8 × 24 [mm], and the beam divergence angle is 1 × 3 [mrad]. Each of them is represented by (length x width), and the numerical value is FWHM.

  The specifications of the excimer laser are various, and the emitted laser light is vertically long (the vertical and horizontal are reversed) in addition to the difference in output, the difference in repetition frequency, the difference in beam size, the difference in beam divergence, and the like. ), But there are many excimer lasers that can be used in the first embodiment due to addition, omission, or design change of the optical system. The laser device also depends on its size, but is generally installed on a base (laser platen) different from the base on which the stage group of the lift device is installed.

  The light emitted from the excimer laser enters the telescope optical system and propagates to the shaping optical system ahead. Here, as shown in FIG. 1A, the shaping optical system has its optical axis held on an optical stage (Xo) along the X axis, and the optical stage is connected to the X axis of the donor stage for moving the donor substrate. (Xd). The laser light immediately before being incident on the shaping optical system is adjusted by the telescope optical system so as to be substantially parallel light at any position within the X-axis movement range of the donor stage. Therefore, regardless of the movement of Xd and / or Xo in the X-axis direction, the light always enters the shaping optical system at substantially the same size and the same angle (perpendicular). In the first embodiment, the size is approximately 25 × 25 [mm] (length × width).

  The shaping optical system (H) in the first embodiment is obtained by combining two sets of uniaxial cylindrical lens arrays in a plane perpendicular to the optical axis direction at right angles. The first-stage lens array in each set is arranged so that an image is formed on the mask (M) by the second-stage lens array and a condenser lens (not shown) located after the first-stage lens array.

  The laser light that has passed through the shaping optical system is incident on the mask via a field lens (F) constituting an image-side telecentric reduction projection optical system in combination with the projection lens (Pl). The size of the laser beam on the mask is 1 × 50 [mm] (FWHM), and the size of the area whose spatial intensity distribution uniformity is within ± 5% is 0.5 × 45 [mm] or more. Have maintained.

  The mask is fixed to a mask stage. As described above, this mask stage moves with the field lens in the X axis direction, the W axis, the Y axis direction, the V axis moving in the Z axis direction, and the YZ plane. It has a total of six axis adjustment mechanisms of a TV axis for adjusting the inclination with respect to the R axis and the V axis which are the rotation axes, and a TU axis for adjusting the inclination with respect to the U axis.

  As the mask in the first embodiment, a mask in which a pattern is drawn (applied) by chrome plating on a synthetic quartz plate is used. FIG. 6 shows the outline. In this mask, the window portion (a) shown in white without chrome plating transmits laser light, and the colored portion (b) with chrome plating blocks laser light. The shape (a) of one window is 50 × 50 [μm], and a total of 300 windows are arranged in the X-axis direction (one line) at an interval of 150 [μm] over 43.85 [mm]. The surface on which chromium plating is performed is on the emission side of the laser light, and the antireflection film for 248 [nm] is applied on the incident side. Further, instead of chromium plating, aluminum evaporation or a dielectric multilayer film can be used.

  In the case of a lift process in which a plurality of patterns are switched and used on one mask, the lift process may be performed within the range of the size of the laser beam irradiated onto the mask from the shaping optical system and within the movable range of the mask stage. For example, a mask on which a different pattern is drawn can be used.

  In addition, in FIG. 7, a case where a lift step of scanning the donor substrate (D) a plurality of times or reciprocatingly at the same speed during the one-time scanning of the receptor substrate (R) (including an intermediate stop) is used. The mask pattern shown in FIG. 6 is not a single line but a plurality of lines (however, the laser irradiation is intermittently and selectively irradiated out of the mask patterns. In FIG. 7, it is displayed as a 3 × 2 matrix). It is also possible to adopt. This makes it possible to use a donor substrate smaller in size than the receptor substrate.

  The laser beam that has passed through the mask pattern changes its propagation direction vertically downward (−Z direction) by an incident mirror, and enters the projection lens. This projection lens is provided with an antireflection film for 248 nm and has a reduction magnification of 1/5. Details are shown in Table 1 below.

  The laser light emitted from the projection lens enters from the back surface of the donor substrate, and is positioned at a predetermined position of the light absorption layer formed on the front surface (lower surface) at a reduced size of 1/5 of the mask pattern. Projected accurately. Here, the predetermined position in the XY plane is adjusted with the X axis (Xd), the Y axis (Yd), and the θ axis (θd) of the donor stage with reference to an alignment mark or the like previously attached to the donor substrate. It is determined.

  In order to adjust the image plane of the mask pattern by the projection lens to be focused on the boundary surface between the surface of the donor substrate and the light absorbing layer, a mask on which a Z-axis stage (Zl) of the projection lens and a field lens (F) are placed Adjust the position of the W axis of the stage. Although a function of adjusting the donor substrate in the Z-axis direction (Z-axis stage) can be added, it is necessary to consider a decrease in lift position accuracy due to an increase in the load applied to the X-axis (Xd) of the donor stage. There is.

  When adjusting the imaging position at the boundary surface between the donor substrate surface and the light absorbing layer, a real-time monitor using a confocal beam profiler (BP) having an imaging plane with a plane conjugated with the imaging plane is effective. It is. FIG. 8 shows the state of the adjustment screen. In the first embodiment, the spatial intensity distribution of the laser light reduced and imaged on the interface between the donor substrate surface and the light absorbing layer is monitored in real time and with high resolution.

  The above is the function performed by the device configuration in the first embodiment regarding the propagation of the pulsed laser light emitted from the laser device.

  Next, in the apparatus according to the present invention, it is easy to determine whether the parallelism between the Y axis (Yr) of the receptor stage and the Y axis (Yd) of the donor stage is mechanically realized by using the configuration of the first embodiment. Will be described.

  In each stage, as shown in FIG. 1A, an X axis (Xd) of a donor stage is mounted on a stone surface plate 1 (G1), and an optical stage (Xo) is mounted thereon. The receptor stage group (Yr, θr, Zr) is mounted on a stone platen 2 (G2). And the whole is built on the basic surface plate (G). The rotation adjusting mechanism (RP) is provided between G1 and Xd, between Xo and Xd, and between Xd and Yd (not shown).

  In order to adjust the perpendicularity and parallelism of the axis of each stage, an adjustment substrate AD held on the donor stage is used instead of the donor substrate, and an adjustment substrate AR mounted on the receptor stage is used instead of the receptor substrate. Lines indicating the X-axis (alignment line X) and the Y-axis (alignment line Y) which form a right angle as an alignment line are drawn on each adjustment substrate, and a mark is also given at a predetermined position (interval). I have.

1) Parallelism between Yr and AR (Y) (squareness between Yr and AR (X))
In order to adjust the parallelism between the Y axis (Yr) of the receptor stage and the alignment line Y on the adjustment substrate AR, the adjustment substrate AR placed on the Z axis (Zr) of the receptor stage is moved to the optical stage (Xo) or Observation is made with a high-magnification CCD camera fixed to a Z-axis stage for a projection lens installed on the camera. The Yr axis is moved by 400 [mm], and adjustment is performed using the θ axis (θr) of the receptor stage so that the displacement amount of the alignment line Y in the X axis direction is within 1 [μm]. Note that the moving distance of the stage at this time is within the range of the effective stroke of the stage, and the allowable deviation amount varies according to the required lift accuracy. (same as below.)

2) Parallelism between AR (X) and Xd (squareness between Yr and Xd)
Next, by using the alignment line X of the adjustment substrate AR adjusted as described above, the perpendicularity between the X axis (Xd) of the donor stage and the Y axis (Yr) of the receptor stage is similarly set on the optical stage (Xo) or the optical stage (Xo). The adjustment is made while observing with a high-magnification CCD camera fixed to a Z-axis stage for a projection lens installed in the camera. The Xd axis is moved by 400 [mm], and the mounting angle of the two is adjusted using the above-described rotation adjusting mechanism between G1 and Xd so that the displacement amount of the alignment line X in the Y-axis direction falls within 1 [μm]. At the same time, the mounting angle of Xd with respect to G1 and Xd, ie, Yr, is adjusted.

3) Parallel of AR (X) and Xo (squareness of Yr and Xo, parallelism of Xd and Xo)
Using the alignment line X of the adjustment substrate AR adjusted as described above, the parallelism between the optical stage (Xo) and the X axis (Xd) of the donor stage is adjusted for the optical stage (Xo) or the projection lens installed on the optical stage (Xo). Is adjusted while observing with a high-magnification CCD camera fixed to the Z-axis stage. The Xo axis is moved by 200 [mm], and the parallelism of the optical stage (Xo) with respect to the X axis (Xd) of the donor stage is adjusted so that the amount of displacement of the alignment line X in the Y axis direction is within 0.5 [μm]. Is adjusted by a rotation adjusting mechanism between them.

4) Parallelism between Yd and AD (Y) The adjustment substrate held on the θ axis (θd) of the donor stage in order to adjust the parallelism between the Y axis (Yd) of the donor stage and the alignment line Y on the adjustment substrate AD. AD is observed by a high magnification CCD camera fixed to an optical stage (Xo) or a Z-axis stage for a projection lens installed on the optical stage (Xo). The Yd axis is moved by 200 [mm], and adjustment is performed using the θ axis (θd) of the donor stage so that the displacement amount of the alignment line Y in the X axis direction is within 0.5 [μm].

5) Parallelism between AD (X) and Xo (parallelism between AD (X) and Xd, squareness between Xd and Yd)
In order to adjust the perpendicularity between the X axis (Xd) of the donor stage and the Y axis (Yd) of the donor stage, the alignment of the alignment line X on the adjustment substrate AD is already adjusted to the parallelism with the X axis (Xd) of the donor stage. Observation is performed by a high-magnification CCD camera fixed to the optical stage (Xo) mounted or a Z-axis stage for a projection lens installed on the optical stage (Xo). The optical stage (Xo) is moved by 200 [mm], and the donor suspended on the X-axis (Xd) of the donor stage is adjusted so that the displacement of the alignment line X in the Y-axis direction is within 0.5 [μm]. The perpendicularity of the stage to the Y axis (Yd) is adjusted by a rotation adjusting mechanism between them.

6) Parallelism between AD (Y) and Yr (parallelism between Yd and Yr)
Finally, in order to check the parallelism between the Y axis (Yd) of the donor stage and the Y axis (Yr) of the receptor stage, a high-magnification CCD camera is attached to the Y axis (Yd) of the donor stage, and the CCD camera is mounted on the opposing receptor stage. The alignment line Y of the mounted adjustment substrate AR is observed.
At this time, the adjustment board AD is removed. The X axis (Xd) of the donor stage is moved so that the high magnification CCD camera can observe any one end of the receptor stage. Next, the Y-axis (Yd) of the donor stage is moved by 400 [mm], and it is confirmed whether or not the displacement of the alignment line Y in the X-axis direction is within 1 [μm]. Further, in order to confirm the same at the other end of the receptor stage, Xd was moved to the other end, then Yd was moved again by 400 [mm], and the displacement of the alignment line Y in the X-axis direction was 1 [μm]. Make sure it is within It is also possible to make Yd and Yr move in parallel and observe a change in the position of the alignment mark.

  When a high-magnification CCD camera is mounted on the Y-axis (Yd) of the donor stage, there is a possibility that the CCD camera may come into contact with these depending on the position of the X-axis of the donor stage and the shape (opening) of the stone platen 1. In this case, the high-magnification CCD camera is mounted not on Yd but on the Z-axis (Zr) of the receptor stage, and the Y-axis (Yr) of the receptor stage is moved by 200 [mm] to adjust the alignment line Y of the adjustment substrate AD. It is also possible to observe and confirm the shift amount in the X-axis direction.

  Stone platen 1 (G1) and stone platen 2 support each stage independently, and Yd is suspended from Xd installed on G1. Therefore, directly adjust the parallelism between Yr and Yd. Although it is not possible, the parallelism between Yr and Yd is adjusted step by step in the [μrad] order as described above. It should be noted that since the errors in the parallelism (squareness) accumulate as the adjustment steps are performed in the order of 1) to 6), it is desirable to adjust the allowable deviation amount in the initial stage to be as small as possible. In the adjustment steps 1) to 6), the adjustment of the parallelism and the squareness of each stage on the XY plane is described, but adjustment about other axes (X axis and Y axis) is also necessary.

  Next, scanning of the donor substrate and the receptor substrate during the lift in the first embodiment will be described with reference to FIGS. 9A to 9C. Here, Top Views in FIGS. 9A to 9C are images in which an operator is arranged on the left side of these figures, and the donor substrate (D) and the receptor substrate (R) scan back and forth with respect to the operator.

  First, the amount of deflection of the donor substrate that is set by being attracted to the θ axis (θd) of the donor stage is measured over the entire surface of the donor substrate, and is mapped as two-dimensional data together with positional information. This information is used as a correction amount of the Z axis (Zr) of the receptor stage corresponding to the X axis (Xd) and the Y axis (Yd) of the donor stage moving during the lift process.

  In the following description, for convenience, a predetermined position on the left front of the receptor substrate (R) and the donor substrate (D) as viewed from the operator is defined as the origin of each substrate. Then, the positions of the optical stage (Xo) and the receptor stage (Yr, θr) when the laser light is irradiated to the origin of the receptor substrate are defined as origins. Further, also on the donor substrate, the position of the donor stage (Xd, Yd, θd) at the time of irradiation with the laser beam (LS) is defined as the origin of each. However, the origin of each stage is not limited to one end of the stroke range, but is a position where a stroke corresponding to the subsequent lift process or the removal of the substrate is left.

  FIG. 9A shows a state where the first pulse of the laser beam (LS) is irradiated on the donor substrate (D) and the receptor substrate (R) at the origin positions. Here, both the Side View (side view) and the Top View (top view) are illustrated. The dashed line indicates how the laser light is irradiated onto the object (S) by the reduction projection optical system, and the light absorbing layer (not shown) in the irradiated area of 10 × 10 [μm] receives the laser light. Is absorbed and ablated, generating a shock wave, which lifts the object in the same area to the opposing receptor substrate. Although three objects are illustrated, in the case of the first embodiment, a total of 300 objects are lifted at one time toward the receptor substrate.

  In the first embodiment, the laser device oscillates at 200 [Hz], and the lift is performed in one shot. Therefore, the receptor stage (Yr) moves the receptor substrate to the next irradiation position at a speed of 6 [mm / mm]. s] to scan without stopping in the −Y direction.

  On the other hand, the donor substrate is stopped in the same -Y direction at a speed of 3 [mm / s] while synchronizing the position of the Y axis (Yd) of the donor stage with the Y axis (Yr) of the receptor stage. Without scanning. That is, the moving speed ratio (gear ratio) between Yd and Yr is 1: 2. FIG. 9B shows the state of the second shot in which each substrate has moved.

  Synchronization of the positions of Yr and Yd is performed by using Yr as a reference (master) and Yd as a slave (slave), using a gear command of the stage system, and synchronizing both stages in gear mode. A programmable multi-axis control device is used for the control system.

  In addition, a measured value of the stage position by the laser interferometer is used for determining the gear ratio in the gear command. A corner cube (Ic) that moves together with the Yr moving table and forms a laser interferometer near the receptor substrate is attached, and a He-Ne laser (IL) having a wavelength of 632.8 [nm] and a light receiving unit (shown in FIG. 5A) (Omitted) is set on the stone surface plate 2 (or an equivalent immovable position). Similarly, a corner cube is attached to the side of the Yd moving table, and the interferometer laser and the light receiving unit (not shown in FIG. 5B) are installed in Xd. Thus, accurate position synchronization of each stage is realized.

  As described above, each stage starts accelerating from a position before the origin so as to have already performed a stable constant velocity motion at the position of the origin. During the acceleration time and the time until the stage reaches the origin, the laser pulse needs to be cut off so that the donor substrate is not irradiated with laser light. Therefore, the programmable multi-axis control device transmits an external oscillation trigger or a high-speed shutter operation start trigger to the laser device and a stage drive signal with high accuracy.

  FIG. 9C shows the state of the third shot. As can be seen from the figure, it can be seen that the moving distance of the receptor substrate (R) is twice as long as the moving distance of the donor substrate (D). After this, the movement of the receptor substrate and the donor substrate proceeds similarly.

  When the donor substrate has finished scanning 180 [mm] in the -Y direction, and similarly, when the receptor substrate has finished scanning 360 [mm] in the -Y direction, the oscillation of the laser device is temporarily stopped, or the laser is operated by a high-speed shutter. Block light irradiation. By scanning at this distance, 300 objects arranged in the X-axis direction have been lifted by 12,000 steps in the Y-axis direction of the receptor substrate, that is, 3.6 million in total. FIG. 10 shows this state.

  During the stop time, the Y axis (Yr) of the receptor stage and the Y axis (Yd) of the donor stage both return to the origin. (However, the acceleration distance in the next scan is taken into account. The same applies to the following.) On the other hand, the X-axis (Xd) of the donor stage returns to the position of -9 [mm] from the origin. Then, the lift process is started again from a new area. Hereinafter, this is repeated.

  In FIG. 11, after the step movement of −9 [mm] × 20 times for Xd is completed, this time, the position of 15 [μm] in the −X direction from the origin (shown by a dotted line) (the solid line Returning to the drawing), the state immediately before the same operation is started with this point as a new origin is shown. Thereafter, the Y-axis scanning (180 [mm] (Yd) and 360 [mm] (Yr)) of both stages and the step operation of −9 [mm] of Xd × 20 are repeated. Thus, a region not irradiated with laser light during the first 180 [mm] scan of Xd (step movement of -9 [mm] 20 times) (irradiation of the next laser light (LS) in the figure) The target area on the donor substrate can be lifted to the receptor substrate without waste by irradiating the predetermined area with a laser beam to the target area.

  The approximate processing time is 360 [mm] / 6 [mm / s] × 40 [times] = 2400 [s]. Note that this time does not include the time required for the Y-axis (Yr) of the receptor stage to move the distance required for acceleration / deceleration and the time required to return to the origin every time the Y-axis is scanned. By increasing the repetition frequency of the excimer laser to 1 [kHz], the processing time can be reduced to 1/5.

  In FIG. 12, the distance of 400 [mm] at a moving speed of 150 [mm / s] with the Y axis (Yr) of the receptor stage as a reference (master) is set to the Y axis of the donor stage by the apparatus configuration of the first embodiment. The figure shows a synchronous position error between the two stages when a distance of 200 [mm] is synchronized and translated at a moving speed of 75 [mm / s] with (Yd) as a slave (slave). Specifically, in Yr as a reference (master), the error amount (δYr) between the position information obtained from the linear encoder and the position information measured by the laser interferometer is synchronized with half the speed. In Yd as a moving slave (slave), the difference (ΔYdr = δYd-δYr) between the error (δYd) between the position information obtained from the linear encoder and the position information measured by the laser interferometer is represented by the horizontal axis. The time was plotted as the elapsed time according to the moving speed of the receptor stage. As can be seen from this result, a position synchronization accuracy within ± 1 [μm] has been achieved over a movement distance of 400 mm.

  The lift pattern of the target object onto the receptor substrate in the first embodiment is, as described above, 10 × 10 [μm] lifted in a matrix at an interval of 30 [μm]. [μm], one donor substrate can lift four receptor substrates.

  In the second embodiment, the object on the donor substrate surface is formed in a matrix shape on the donor substrate having the same size of 200 × 200 [mm] unlike the one in the first embodiment in which the object is in a single-leaf layer state. A total of 144 million objects, each having a shape of 10 × 10 [μm] and an interval of 15 μm, were placed on a receptor substrate having a size of 400 × 400 [mm] by 1/100 of a donor substrate. This is an embodiment in which lift is performed in a matrix at a density of 2, that is, at an interval of 30 [μm].

  The arrangement of the object finally lifted to the receptor substrate is the same as that of the first embodiment, but in the second embodiment, the object is also previously arranged at twice the density on the donor substrate in advance. The difference is that this is lifted onto the receptor substrate with a positional accuracy of ± 1 [μm]. Then, in this case, the position synchronization accuracy between the Y axis (Yd) of the donor stage and the Y axis (Yr) of the receptor stage is more strictly required as compared with the first embodiment.

13A to 13C, from the state where the first pulse of the laser beam (LS) is applied to the donor substrate (D) and the receptor substrate (R) at the origin positions, as in the first embodiment, from the third shot. The state of is shown.

  In the third embodiment, the method of lifting an object on the donor substrate surface to the receptor substrate is the same as that in the first or second embodiment. On the other hand, the method of adjusting the degree of parallelism between the Y axes and the degree of parallelism between the X axes of each stage, and the method of adjusting the perpendicularity between the respective Y axis and the X axis are different from those in the above embodiment. That is, the adjustment method described in the first embodiment performs the adjustment steps 1) to 6) in order to adjust the parallelism between the Y axis (Yr) of the receptor stage and the Y axis (Yd) of the donor stage. On the other hand, in the third embodiment, the parallelism between Yr and Yd is performed at an early stage of the adjustment step.

1) Straightness of Yr, θr, and Zr This adjustment step is an adjustment step as a premise common to the first and second embodiments. The Y-axis (Yr) of the receptor stage installed on the stone surface plate 2 (G2) and the θ-axis (θr) installed thereon, and also the Z-axis (Zr) and the straightness of the holder of the receptor substrate (horizontal plane) Is adjusted by using a laser interferometer or the like with respect to the Z axis which is a vertical direction when is defined as an XY plane. Basically, after this adjustment, adjustments that may affect the squareness of the receptor stage group are not performed, and all adjustments of the other stages are made with reference to the top surface of this receptor stage group, for example. Do.

2) Parallelism between Yr and AR (Y) (squareness between Yr and AR (X))
As in the adjustment step 1) of the first embodiment, the parallelism between the Y axis (Yr) of the receptor stage and the alignment line Y on the adjustment substrate AR is adjusted. Thus, the squareness between Yr and the alignment line X is also adjusted. When an alignment line or an alignment mark directly drawn on Yr or the like is used without using the adjustment substrate AR, this adjustment step 1) can be omitted.

3) Parallelism between AR (X) and Xd (squareness between Yr and Xd)
Next, the alignment line X of the adjustment substrate AR is observed by a high magnification CCD camera mounted on an optical stage (Xo) mounted on the X axis (Xd) of the donor stage. Although the position of the high-magnification CCD camera in the Z-axis direction depends on the design of the projection optical system, in the third embodiment, a Z-axis stage (Zl) for holding the projection lens near the position of the projection lens (Pl) is used. It is fixed using. Xd is moved by 400 [mm], and the mounting angle of Xd with respect to the stone platen 1, that is, the perpendicularity of Xd with respect to Yr, is set so that the amount of displacement of the alignment line X in the Y-axis direction falls within 0.3 [μm]. , Using a rotation adjustment mechanism.

4) Parallelism of Yr and Yd in the YZ plane In the description of the first embodiment, the description of the adjustment steps around other axes (X axis and Y axis) is omitted, but here, around the X axis, that is, YZ The step of adjusting the parallelism in the plane will be briefly described. The lower surface of the donor stage Y-axis (Yd) is observed using a height sensor mounted on the Z-axis (Zr) of the receptor stage or another site. Yr and Yd are simultaneously moved at the same distance (parallel running) by 200 mm or more, and the fluctuation of the measured value (distance between Zr and Yd) by the gap sensor is observed. A shim plate is provided between Yd or Xd and a rotation adjustment mechanism provided between Xd and Yd so that the variation falls within 5 [μm] or a range sufficiently smaller than the depth of focus of the image formed by the projection lens. Then, the degree of parallelism in the YZ plane between Yr and Yd is adjusted.

5) Parallelism between Yr and Yd The alignment mark for pattern matching provided on the lower surface of Yd is observed with a high-magnification CCD camera installed on Zr or other parts. If Yr and Yd are moved in parallel by the same distance (parallel running) and the position of the pattern-matched alignment mark image (such as a cross mark) moves in the X-axis direction, the position between Xd and Yd is corrected so as to correct this. Adjust using the installed rotation adjustment mechanism. Note that an alignment line Y of the adjustment substrate AD attached to the Y axis of the donor stage can be used instead of the alignment mark.

6) Squareness between Yr and Xo The alignment line X of the adjustment substrate AR, the squareness of which is adjusted with the Y axis (Yr) of the receptor stage in the adjustment step 1), is moved to the height set on the optical stage (Xo). Observe with a magnification CCD camera. Xo is moved by 400 [mm], and the angle of attachment of Xo with respect to Xd is adjusted by a rotation adjustment mechanism installed between the two so that the displacement amount of the alignment line X in the Y-axis direction falls within 0.3 [μm]. Adjust using

  FIG. 2A shows main components of the lift device according to the fourth embodiment. In the present invention, the seventh invention has a basic configuration. 2A to 2C, illustrations of a laser device, a control device, and other monitors (all of which are the same as those in the first embodiment) are omitted, and the X-axis, Y-axis, and Z-axis directions are shown in the drawings. Further, the arrangement of the donor substrate, the receptor substrate, and the object to be lifted on the donor substrate and the arrangement after the lift to the receptor substrate used in the fourth embodiment are the same as those of the second embodiment.

  The state of the optical system from when the pulsed laser light is emitted from the excimer laser device to the irradiation of the lift target on the donor substrate is described below with reference to FIGS. 1A and 2A. The second embodiment is the same as the first embodiment except for the part caused by the difference. That is, in the case of the lift device according to the sixth invention shown in FIGS. 1A to 1C, the X-axis (Xd) of the donor stage is placed on the stone platen 1 (G1), and the optical stage (Xo) is placed thereon in this order. On the other hand, in the case of the lift device according to the seventh invention shown in FIGS. 2A to 2C, the point that Xo is mounted on G1 and Xd is hung below G1 is the stage group. Is the difference in construction.

  The light emitted from the excimer laser enters the telescope optical system and propagates to the shaping optical system ahead. As shown in FIG. 2A, this shaping optical system is installed on an optical stage (Xo) that moves in the X-axis direction so that its optical axes are parallel. Xo is mounted on a stone surface plate 1 (G1) made of glinite, and has a rotation adjustment mechanism (RP) between the two. Here, Xo is perpendicular to the Y axis (Yr) of the receptor stage mounted on the stone surface plate 2 (G2) different from G1, and parallel to the X axis (Xd) of the donor stage. It should be noted that the laser light immediately before entering the shaping optical system is adjusted by the telescope optical system so as to have substantially the same shape (approximately 25 × 25 [mm] (length × width, FWHM)) regardless of the movement of Xo. .

  The X axis (Xd) of the donor stage is suspended below G1, and further the Y axis (Yd) of the donor stage is suspended. In addition, a rotation adjusting mechanism is provided between the two. In FIG. 2B, a state in which Xo and Xd have moved the same distance from G1 is shown in a side view. Thereby, the position in the X-axis direction with respect to Yd can be changed without changing the relative position of Xo and Xd on the X-axis. FIG. 2C shows a state in which only Xo has moved with respect to G1 in a side view. Thereby, the relative positions of Xd and Xo on the X axis can be changed.

  The details of the field lens (F), the mask (M), and the projection lens (Pl), which are other reduction projection optical systems, are the same as those in the first embodiment, and the laser light emitted from the projection lens is , And is accurately projected to a lift target formed on the surface (lower surface) at a reduced size of 1/5 of the pattern drawn on the mask. The state of image formation on the donor substrate surface is performed by a confocal beam profiler as in the first embodiment.

  Based on the mask pattern reduced and projected on the lift target placed on the surface of the donor substrate as described above, when the lift target is lifted to the opposing receptor substrate, how the donor substrate and the receptor substrate are The scanning and how the lift object is lifted onto the receptor substrate are illustrated in FIGS. 6, 10, 11 and 13A-13C, as well as the Y axis of the receptor stage (Yr) and the Y axis of the donor stage. The position synchronization accuracy in the movement of (Yd) is the same as in FIG. 12 shown in the first embodiment.

Further, the method of adjusting the parallelism between the Y axes and between the X axes of each stage, and the method of adjusting the perpendicularity between the Y axis and the X axis are the same as in the third embodiment. That is, using the Y axis (Yr) of the receptor stage whose straightness has been adjusted as a reference, the squareness between Yr and the X axis (Xd) of the donor stage suspended from the stone surface plate 1 (G1) is defined as Observation is performed by a high-magnification CCD camera fixed to the Z axis (Zr) of the receptor stage, and adjustment is performed by a rotation adjustment mechanism (RP) between G1 and Xd. Then, the parallelism between the Y axis (Yd) and Yr of the donor stage suspended from the adjusted Xd is observed by the same high magnification CCD camera, and adjusted by the RP between Xd and Yd. Finally, the perpendicularity between the optical stage (Xo) and Yr is observed with a high-magnification CCD moving together with Xo, and adjusted by the RP between G1 and Xo.

It can be used as a display manufacturing device.

AD Adjustment substrate for donor stage AR Adjustment substrate for receptor stage BP Confocal beam profiler CCD High magnification camera D Donor substrate F Field lens G Basic surface plate G1 Surface plate 1
G11 Surface plate 11
G12 Surface plate 12
G2 surface plate 2
G3 Surface plate 3
H Shaping optical system Ic Corner cube for laser interferometer IL Laser for laser interferometer LS Laser beam M Mask Pl Projection lens R Receptor substrate RP Rotation adjustment mechanism S Target TE Telescope Xd Donor stage X axis Xo Optical stage (X axis )
Yd Y-axis of donor stage Yl Projection lens and camera switching stage Yr Y-axis of receptor stage Zl Z-axis stage of projection lens Zr Z-axis of receptor stage θd θ-axis of donor stage θr θ-axis of receptor stage

Claims (17)

By irradiating a pulse laser beam from the back surface of the donor substrate toward an object located on the surface of the moving donor substrate, the object is selectively separated, and the object is moved while facing the donor substrate. A device for lifting on a receptor substrate,
A laser device that performs pulse oscillation,
A telescope that converts the pulsed laser light emitted from the laser device into parallel light,
A shaping optical system that uniformly shapes the spatial intensity distribution of the pulsed laser light that has passed through the telescope,
A mask that passes the pulsed laser light shaped by the shaping optical system in a predetermined pattern,
A field lens located between the shaping optical system and the mask,
A projection lens for reducing and projecting the laser light passing through the pattern of the mask onto the surface of the donor substrate,
A mask stage for holding the field lens and a mask,
An optical stage that holds the shaping optical system, the mask stage, and the projection lens,
A donor stage that holds the donor substrate in a direction in which the back surface is on the laser light incident side,
A receptor stage for holding a receptor substrate,
A programmable multi-axis controller having a trigger output function and a stage control function for the pulsed laser light oscillation,
The receptor stage has a Y axis when a horizontal plane is an XY plane, a vertical Z axis, and a θ axis in an XY plane,
The donor stage has an X axis, a Y axis, and a θ axis,
The projection lens is held on the optical stage together with a Z-axis stage for the projection lens,
The telescope, the shaping optical system, the field lens, the mask and the projection lens constitute a reduction projection optical system for reducing and projecting the pattern of the mask on the donor substrate surface.
The X axis of the donor stage is set on the surface plate 1,
The Y axis of the receptor stage is set on a surface plate 2 different from the surface plate 1,
A lift device wherein the Y axis of the donor stage is suspended from the X axis of the donor stage. The X axis of the donor stage is placed on the surface plate 1,
The lift device according to claim 1, wherein the optical stage is mounted on the X axis of the donor stage. 2. The lift device according to claim 1, wherein the optical stage is mounted on the surface plate 1, and the X axis of the donor stage is suspended from the surface plate 1. 3. The X axis of the donor stage is set on the surface plate 1,
The lift device according to claim 1, wherein the optical stage is mounted on a surface plate 3 different from any of the surface plate 1 and the surface plate 2.   Fine adjustment of the installation angle between the X axis of the donor stage and the surface plate 1 and between the X axis of the donor stage and the Y axis of the donor stage in the XY plane between the two. The lift device according to claim 1, further comprising a rotation adjustment mechanism.   Between the X axis of the donor stage and the surface plate 1, between the X axis of the donor stage and the optical stage, and between the X axis of the donor stage and the Y axis of the donor stage. 3. The lift device according to claim 2, further comprising a rotation adjustment mechanism for finely adjusting an installation angle between the two in the XY plane.   Between the X axis of the donor stage and the surface plate 1, between the optical stage and the surface plate 1, and between the X axis of the donor stage and the Y axis of the donor stage. The lift device according to claim 3, further comprising a rotation adjustment mechanism for finely adjusting an installation angle in an XY plane between the two.   Between the X axis of the donor stage and the surface plate 1, between the optical stage and the surface plate 3, and between the X axis of the donor stage and the Y axis of the donor stage. The lift device according to claim 4, further comprising a rotation adjustment mechanism for finely adjusting an installation angle in an XY plane between the two.   The lift device according to any one of claims 1 to 8, wherein the pulse laser device is an excimer laser.   The lift device according to claim 9, further comprising a pulse shutter that blocks an arbitrary pulse train of a laser pulse emitted from the excimer laser device.   The programmable multi-axis control device has a function of controlling at least the Y axis of the receptor stage and the Y axis of the donor stage at the same time. The lift device according to any one of claims 1 to 10, further comprising means for correcting the movement position error using the dimension distribution correction value data.   A high magnification camera for monitoring the position of the donor substrate is installed on the Z axis of the receptor stage, or a high magnification camera for monitoring the position of the receptor substrate is moved along with the X axis of the donor stage, or The lift device according to any one of claims 1 to 11, wherein the lift device is provided on the optical stage or a portion that moves with the optical stage.   13. The lift device according to claim 1, wherein the donor stage and the receptor stage include a gap sensor that measures a gap between a surface of the donor substrate and a surface of the receptor substrate.   The lift according to any one of claims 1 to 13, further comprising a position measuring unit using a laser interferometer for each of the Y axis of the receptor stage and the Y axis of the donor stage. apparatus.   The method according to claim 1, further comprising a confocal beam profiler having an imaging surface at a position conjugate with a position where the pattern of the mask is reduced and projected by the projection lens and forms an image. Lifting device.   The deflection amount of the donor substrate is measured in advance together with the XY position information of the donor substrate using the gap sensor, and based on the two-dimensional distribution data of the deflection amount obtained by the measurement, the Z axis of the receptor stage or the Z 16. The method of using the lift device according to claim 13, wherein the lift is performed while adjusting the gap between the donor substrate and the receptor substrate using adjustment by an axis stage. In the step of assembling the lift device, a method for adjusting the parallelism between the Y axis of the receptor stage and the Y axis of the donor stage,
Based on the Y axis of the receptor stage, the straightness of which has been adjusted together with the Z axis and θ axis of the receptor stage,
Adjusting the perpendicularity between the Y axis of the receptor stage and the X axis of the donor stage by a rotation adjustment mechanism located between the surface plate 1 and the X axis of the donor stage;
The Y-axis of the donor stage suspended from the X-axis of the donor stage whose perpendicularity has been adjusted and the Y-axis of the receptor stage run in synchronization with each other, and are attached to a portion that moves together with the Y-axis of the receptor stage. Observing the alignment mark on the Y-axis of the opposing donor stage using the high-power camera.
Adjusting the parallelism between the Y axis of the receptor stage and the Y axis of the donor stage by a rotation adjusting mechanism between the X axis of the donor stage and the Y axis of the donor stage based on the result of the observation. ,
17. The method for adjusting a lift device according to claim 1, wherein the lift device is included in this order.