JP7094162B2 - Lift device and usage - Google Patents

Description

The present invention relates to an apparatus that accurately lifts an object located on a donor substrate onto a receptor substrate by using laser irradiation (LIFT: Laser Induced Forward Transfer).

There is a technique of irradiating an organic EL layer on a donor substrate with a laser and lifting it on an opposing circuit board. In Patent Document 1, one laser beam is converted into a plurality of rectangular laser beams having a uniform intensity distribution in a rectangular shape, and these are arranged in series and at equal intervals, and are constant in a predetermined region of a donor substrate. The light is superimposed and irradiated a predetermined number of times at intervals of time or more, absorbed by the metal foil located between the donor substrate and the organic EL layer, and an elastic wave is generated, whereby the peeled organic EL layer is lifted onto the opposite circuit board. The technology is disclosed.

In this technique, a spacer with a suitable value of 80 to 100 [μm] is sandwiched between the donor substrate and the circuit board, and the spacers integrated with the spacers kept constant are placed on one stage. It uses a structure in which it is placed and scanned relative to the laser beam. However, in this case, a separate step of integrating the opposed donor board and the circuit board is required, and a donor board of the same size as the circuit board is required. Larger size is also required.

Similarly, as a technique for lifting the organic EL layer on the donor substrate to the opposite circuit board, a light absorption layer is provided between the donor substrate and the organic EL layer, and the laser light irradiated to the light absorption layer is absorbed to generate a shock wave. Patent Document 2 discloses a technique of lifting to an opposing circuit board with an interval of 10 to 100 [μm]. However, there is no disclosure as a method for scanning laser light, a stage configuration for realizing this, and a lift device. Therefore, it cannot be referred to as a technique for maintaining and improving the lift position accuracy that can cope with the increase in size of the circuit board.

Further, Patent Document 3 discloses a technique related to a step-and-scan method in an exposure apparatus used for manufacturing a semiconductor device. The basic idea is to intermittently expose a row of shot areas along the scanning exposure direction of the wafer stage while skipping some shot areas on the way, and do not stop the wafer stage in the middle. be. That is, it is equipped with a reticle stage that holds the reticle, a wafer stage that holds the wafer, and a projection optical system that projects the reticle pattern onto the wafer, and exposes the projection optical system while scanning both the reticle stage and the wafer stage. An exposure device that sequentially projects a reticle pattern onto a plurality of shot regions of a wafer, and scans and moves the wafer stage to a plurality of shot regions arranged along the scanning direction without stopping the wafer stage. It is a device that intermittently exposes while allowing the wafer to be exposed. As a result, in the demand for larger wafers and higher processing speeds, it is possible to reduce the influence of vibration and shaking caused by scanning of the stage on the exposure accuracy, as compared with the step-and-repeat method that repeats acceleration and deceleration of the wafer stage. can.

However, the technique disclosed in Patent Document 3 is a technique of a semiconductor exposure apparatus based on reduced projection exposure, and its technical field is different from that of the lift technique of the present invention. That is, the configuration and scanning technique of the reticle stage and the wafer stage in the exposure apparatus, the mask pattern according to the present invention are reduced and projected onto the object on the donor substrate with high position accuracy, and the object is further received with the same high position accuracy. It is completely different from the stage configuration and scanning technique for lifting to the substrate. Therefore, this cannot be referred to as a specific stage configuration and a scanning technique thereof in the present invention.

Japanese Unexamined Patent Publication No. 2014-67671 Japanese Unexamined Patent Publication No. 2010-40380 Japanese Unexamined Patent Publication No. 2000-21702

Both the donor stage that holds the donor substrate and the optical stage that holds the optical system mounted on the donor stage, and the receptor stage that holds the receptor substrate are independent mechanisms, and the optical stage is added to the donor stage. Due to the configuration in which each is installed independently on a highly rigid platen instead of being placed directly, vibrations and various errors associated with scanning of each stage affect the synchronization position accuracy between stages. To minimize. As a result, it is an object of the present invention to provide a lift device that contributes to increasing the size and size of the receptor substrate and shortening the tact time while maintaining the lift position accuracy.

In the first invention, an object located on the surface of a moving donor substrate is irradiated with pulsed laser light from the back surface of the donor substrate to selectively peel off the object, and this is separated from the donor substrate. A device that lifts onto a receptor substrate that moves while facing the lens, a laser device that oscillates in a pulse, a telescope that converts pulsed laser light emitted from the laser device into parallel light, and a pulsed laser that has passed through the telescope. It is located between the shaping optical system and the mask, a shaping optical system that uniformly shapes the spatial intensity distribution of light, a mask that allows pulse laser light shaped by the shaping optical system to pass through in a predetermined pattern, and the shaping optical system. A field lens, a projection lens that reduces and projects laser light that has passed through the mask pattern onto the surface of the donor substrate, a mask stage that holds the field lens and mask, an orthopedic optical system, the mask stage, and the projection lens. An optical stage that holds the donor substrate, a donor stage that holds the donor substrate in a direction in which the back surface is the incident side of the laser beam, a receptor stage that holds the receptor substrate, and a trigger output function and stage for pulse laser light oscillation. The receptor stage includes a programmable multi-axis control device having a control function, the receptor stage has a Y-axis when the horizontal plane is an XY plane, a Z-axis in the vertical direction, and a θ-axis in the XY plane, and the donor stage is a donor stage. Having an X-axis, a Y-axis and a θ-axis, the projection lens is held on the optical stage together with a Z-axis stage for the projection lens, the telescope, the orthopedic optics, the field lens, the mask and the projection. The lens constitutes a reduced projection optical system that reduces and projects the pattern of the mask on the surface of the donor substrate, the X-axis of the donor stage is installed on the platen 1, and the Y-axis of the receptor stage is the platen. The lift device is installed on a platen 2 different from No. 1, and the Y-axis of the donor stage is suspended on the X-axis of the donor stage.

Here, the “moving” substrate is a pulsed laser beam (indicated as “LS” in FIG. 1A. However, although FIG. 1A shows a main component of the second invention, it is common to the structure of the first invention. Refer to this because it includes components. The same shall apply hereinafter.) Including the case of moving without stopping when irradiating, and the case of stopping when irradiating pulsed laser light and repeating movement and stop. These are selected according to the lift process by the lift device according to the present invention, the required tact time, and the like. It also includes a configuration in which the donor substrate (D) repeatedly moves and stops, and the receptor substrate (R) does not stop, and vice versa. When only one shot is used to peel off the object from the donor substrate and high takt time is required, a configuration in which the donor substrate and the receptor substrate move at the same or different speeds without stopping is preferably used. Be selected. On the other hand, in some cases, such as when an object is to be laminated to a certain thickness, a configuration is selected in which the donor substrate moves without stopping and the receptor substrate stops for a certain number of shots.

Further, the "object" is not particularly limited, and is a lift object provided on a single leaf on the donor substrate or on the donor substrate via a light absorption layer (not shown in FIG. 1A). It includes, and is not limited to, a thin film represented by the organic EL layer described in the above-mentioned patent document, and a thin film in which a large number are regularly arranged in the form of fine elements. The lift mechanism includes a light absorbing layer irradiated with a laser beam that generates a shock wave, which causes the object to be separated from the donor substrate and lifted toward the receptor substrate, and a light absorbing layer. However, the object is not limited to those that are peeled off by the laser beam directly applied to the object.

The material of the donor substrate may have transmission characteristics with respect to the wavelength of the laser beam, and it is desirable that the material has a small amount of deflection due to the increase in size of the substrate. If the amount of deflection is too large to satisfy the uniformity of the gap between the donor substrate and the receptor substrate, a method for holding the donor substrate in the donor stage (Yd, θd), for example, an adsorption area near the center of the donor substrate is provided. In addition to mechanically correcting by providing, there is a method of correcting by using a gap sensor by combining a height sensor described later.

In the present invention, the movable range of the donor stage includes the XY planar region to which the donor substrate should move in order to lift the object located near the edge of the donor substrate to the receptor substrate, and the range depends on the size of the receptor substrate. Say. As an example, when the size of the donor substrate in the XY plane is 200 × 200 [mm] and the size of the receptor substrate is 400 × 400 [mm], the predetermined range in which the donor stage (Xd, Yd) should move is approximately 800. It becomes × 800 [mm]. The situation is shown in FIG. If it is necessary to move further to remove the donor substrate, that area is also included.

Further, the term "surface plate" is not limited to the material thereof, but must be a material having extremely high rigidity. It is desirable that the surface plate 1 (G1) has a "U" shape or a "□" shape when viewed from above in order to have rigidity. Further, in FIG. 1A, the surface plate 2 is shown in a single shape, but specifically, two surface plates are installed in the Y-axis direction, and a linear scale and a linear motor are in between. It may be configured to place. The surface plate 1 and the surface plate 2 may have a structure fixed on the same basic surface plate (G). Further, G1 may have a configuration including a combination of a surface plate 11 (G11) and a surface plate 12 (G12).

As the material of any surface plate, it is necessary to use a highly rigid member such as steel, stone or ceramic. For example, a stone material typified by granite (granite / granite) can be used as this stone material, and the stone material is not limited to this. Also, not all surface plates need to be made of the same material.

The movement of each stage will be described in detail in Examples described later, but the following operations are generally performed. First, the X-axis (Xd) of the donor stage is installed in G1 with the Y-axis (Yd) of the donor stage suspended, and moves in the X-axis direction. This movement then changes the relative position along the X-axis between the donor and receptor substrates. The state of movement is shown in FIG. 1B. In either figure, the details of the movable table of the stage, the linear guide, etc. are not shown.

The method of installing the optical stage (Xo) on a surface plate or the like is not limited, but for example, it is placed on an Xd, installed on the same surface plate as the surface plate on which Xd is installed, or Xd. Various mechanisms can be selected, such as the state of being placed on a surface plate different from that of the above. Xo moves in the X-axis direction in parallel with Xd, and the relative positions of the orthopedic optical system (H), the field lens (F), the mask (M), and the projection lens (Pl) are not changed. These are moved together. On the other hand, this movement of Xo along the X axis changes the relative positional relationship between the donor substrate and the projection lens. The state of the movement is shown in FIG. 1C.

When it is not necessary to change the relative positions of the donor substrate and the projection lens in the X-axis direction, the configuration that always moves with the X-axis of the donor stage, that is, the optical stage is omitted, and the homogenizer, field lens, mask, and projection lens are omitted. May be a structure in which all of the donor stages are fixed on the X-axis of the donor stage or separately on a platen.

The mask is held on a mask stage, which has a W-axis that moves at least with a field lens in the X-axis direction, preferably a U-axis in the Y-axis direction and a V-axis that moves in the Z-axis direction. It is preferable to have a TV axis for adjusting the inclination with respect to the R axis and the V axis, which are rotation axes in the YZ plane, and a TU axis for adjusting the inclination with respect to the U axis. Further, in order to suppress the input of heat to the mask due to laser irradiation, an aperture mask in which a pattern slightly larger than the mask pattern is arranged is provided in front of the mask, and the mask may be combined with the mask to form a double mask structure.

The Y-axis (Yd) of the donor stage and the Y-axis (Yr) of the receptor stage have the same or different velocities while maintaining a constant gap between the donor substrate and the receptor substrate during the lift process and maintaining extremely high parallelism. Move with. Then, by limiting the movement mechanism of the receptor substrate to the Y axis and separating it from the movement mechanism of the donor substrate by the above-mentioned structure such as the movement method of each stage group and the surface plate that supports them, the movement of each substrate is performed. It is possible to suppress mutual influences due to region interference and vibration, and to cope with the increase in size and size of the receptor substrate.

In the second invention, in the first invention, the X-axis of the donor stage is mounted on the surface plate 1, and the optical stage is mounted on the X-axis of the donor stage. It is a characteristic lift device.

FIG. 1A shows a main component (side view) of the lift device according to the second invention. FIG. 1B shows a state (side view) in which Xd moves with Xo on it from the state of FIG. 1A. FIG. 1C shows a state (side view) in which Xo moves on Xd from the state of FIG. 1B. FIG. 1D shows a top view of FIG. 1C.

A third aspect of the invention is characterized in that, in the first invention, the optical stage is placed on the surface plate 1, and the X-axis of the donor stage is suspended on the surface plate 1. It is a lift device.

FIG. 2A shows a main component (side view) of the lift device according to the third invention. FIG. 2B shows a state (side view) in which Xd and Xo move the same distance on G1 (Xd is suspended on G1) from the state of FIG. 2A. FIG. 2C shows a state (side view) in which only Xo moves on G1 from the state of FIG. 2B.

In the fourth aspect of the invention, in the first invention, the X-axis of the donor stage is installed on the surface plate 1, and the optical stage is placed on a surface plate 3 different from both the surface plate 1 and the surface plate 2. It is a lift device characterized by being used.

Here, "installation on the surface plate 1" includes, and is not limited to, a state of placing on the surface plate 1 and a state of suspending from the surface plate 1.

A fifth aspect of the invention is the first aspect of the invention, both between the X-axis of the donor stage and the platen 1, and between the X-axis of the donor stage and the Y-axis of the donor stage. It is a lift device characterized by having a rotation adjustment mechanism for finely adjusting the installation angle in the XY plane between the two.

Here, FIG. 3A shows an example of a rotation adjusting mechanism (RP) installed between the X axis (Xd) of the donor stage and the surface plate 1 (G1). In FIG. 3A, the left view shows a top view and the right figure shows a side view from the X-axis direction. A row of holes located on the outside in the top view is used for fixing to G1 and has "play" (margin / clearance) in order to have a rotation adjusting function. Further, the two rows of holes located inside in the top view are holes through which a screw for fixing the linear guides of the RP and Xd is passed. It is also possible to use the hole for the linear guide of this Xd on the side that has "play", but if the two linear guides are fixed independently in parallel, the difficulty of the installation process may increase. There is.

On the other hand, FIG. 3B shows an example of an RP installed between Xd and the Y axis (Yd) of the donor stage suspended from the Xd. The two rows of holes located on the outside in the top view are used for fixing to Xd and have "play" in order to have a rotation adjusting function. Further, the two rows of holes arranged in the Y-axis direction are used for fixing to Yd.

In addition, an RP different from the above can be used as the RP installed between G1 and Xd. For example, a fulcrum (rotation axis in the Z-axis direction) for adjusting the rotation of the RP on which the Xd is placed with respect to the G1 in the XY plane is provided on the contact surface between the RP and the G1 (although not shown). A force point for the fulcrum is provided on the side surface (lead surface) of the RP sufficiently far from the fulcrum. On G1 near this point of effort, install a large screw that pushes horizontally toward the point of effort. Similarly, install a large screw on the side of the RP on the opposite side. Thereby, this RP on which Xd is placed can be rotated in the XY plane with respect to G1 in the order of [μrad] about the fulcrum.

In the second invention, the sixth invention relates to the X-axis of the donor stage and the platen 1, the X-axis of the donor stage and the optical stage, and the X-axis of the donor stage. The lift device is characterized by having a rotation adjusting mechanism for finely adjusting the installation angle in the XY plane between the donor stage and the Y axis, respectively.

As these RPs, for example, the RP used between G1 and Xd shown in FIG. 3A, the RP used between Xd and Xo shown in FIG. 3C, and the RP used between Xd and Yd shown in FIG. 3B are used. be able to.

A seventh aspect of the invention is, in the third invention, between the X-axis of the donor stage and the platen 1, the optical stage and the platen 1, and the X-axis of the donor stage and the donor. It is a lift device characterized by having a rotation adjusting mechanism for finely adjusting the installation angle in the XY plane between the two, respectively, between the stage and the Y axis.

Here, for example, the RP shown in FIG. 3A is used as the rotation adjusting mechanism between Xo and G1 and between Xd and G1, while the RP shown in FIG. 3B is used as the rotation adjusting mechanism between Xd and Yd. The former RP has holes for passing the Xo and Xd linear guide fixing screws, and the "play" provided in the holes allows the linear guides for each stage to be fixed in the XY plane of the RP and G1. Adjust the installation angle of.

The eighth invention in the fourth invention is between the X-axis of the donor stage and the platen 1, the optical stage and the platen 3, and the X-axis of the donor stage and the donor. It is a lift device characterized by having a rotation adjusting mechanism for finely adjusting the installation angle in the XY plane between the two, respectively, between the stage and the Y axis.

A ninth aspect of the present invention is the lift device according to any one of the first to eighth aspects, wherein the pulse laser device is an excimer laser.

Here, the oscillation wavelength of the excimer laser is mainly 193, 248, 308 or 351 [nm], but it is preferably selected from these depending on the material of the light absorption layer and the light absorption characteristics of the object.

A tenth aspect of the present invention is the lift device according to the ninth aspect, comprising a pulse shutter that blocks an arbitrary pulse train of laser pulses emitted from the pulse laser device.

A laser device that oscillates a pulse receives a trigger signal from the programmable multi-axis control device and starts oscillating, but the energy of the pulse immediately after the oscillation is constant or within a certain period of time cannot be used depending on its application. It is known to be unstable. Therefore, in order to eliminate this unstable pulse group, it is necessary to eliminate it by mechanical shutter operation. Specifically, for example, in the case of an excimer laser that oscillates at 1 [kHz], the time window between adjacent laser pulses is about 1 [ms], and it can move (cross) a certain distance within this time. A high-speed shutter function that can be used is required. This constant distance depends on the spatial magnitude of the laser beam at the place where the shutter is operated, and if the distance is 5 [mm], the required shutter operation speed is 5 [m / s], and the voice An ultra-high-speed shutter that moves an optical element in and out of the optical path using a coil or the like is required. Even if the spatial size can be reduced by a molding optical system or the like to shorten the crossing distance of the shutter member, it is easily damaged depending on the energy density of the laser beam.

According to the eleventh invention, in any one of the first to tenth inventions, the programmable multi-axis control device has a function of simultaneously controlling at least the Y-axis of the receptor stage and the Y-axis of the donor stage, and each of them. The lift device is characterized in that it is provided with a means for correcting the moving position error by using the two-dimensional distribution correction value data created in advance for correcting the moving position error of the stage.

For example, using the two-dimensional distribution correction value data information in the pseudo XY plane by any combination of Xd or Xo and Yr or Yd, the position correction of the receptor substrate and the donor substrate at the time of irradiation with the laser beam. Is to do. Factors for corrected position error include, but are not limited to, pitching, yawing and rolling associated with the movement of each stage. Further, the parameters for determining the correction value include the moving speeds of Yr and Yd and their ratios in addition to the position information of each stage.

In the twelfth invention, in any one of the first to eleventh inventions, a high-magnification camera for monitoring the position of the donor substrate is installed on the Z axis of the receptor stage, or the position of the receptor substrate is monitored. It is a lift device characterized in that the magnifying camera is installed on the X-axis of the donor stage or a portion moving with the X-axis, or on the optical stage or a portion moving with the optical stage.

Here, the "part that moves with the X axis of the donor stage" includes Yd suspended from Xd. In the present invention, the parallelism between the Y-axis and the X-axis of each stage, and the squareness between the Y-axis and the X-axis of each stage are important parameters that affect the lift position accuracy. Then, in the verification of parallelism and squareness when assembling each stage, the amount of deviation in the direction orthogonal to the moving distance of each stage holding the alignment substrate is measured with a high-magnification and high-resolution camera. Monitor and adjust the squareness using the rotation adjustment mechanism. In adjusting the parallelism between Yr and Yd, both stages are synchronized and moved (parallel running) by the same distance, and a pattern attached to the opposite stage by a high-magnification camera attached to one stage. Observe whether the position of the matched alignment mark image (cross mark, etc.) is stationary without moving. In this case, the movement in the Y-axis direction means an abnormality in synchronization between Yd and Yr, and the movement in the X-axis direction means an adjustment error in the parallelism of Yd and Yr.

A CCD camera is generally used as the high-magnification camera. Although the magnification and the like depend on the lift position accuracy, as an example, when detecting the deviation amount of the above-mentioned [μrad] order, that is, when detecting the deviation amount of 1 [μm] with respect to the stage movement distance of 1 [m]. It is preferable to use a resolution of 1 [μm] and a magnification of about 20 to 50 times.

A thirteenth invention comprises, in any one of the first to twelfth inventions, a gap sensor in which the donor stage and the receptor stage measure the gap between the surface (lower surface) of the donor substrate and the surface of the receptor substrate. It is a lift device characterized by being.

Here, the gap sensor is a combination of height sensors installed in each of the donor and the receptor stage, and the height sensor installed in the donor stage determines the distance to the receptor substrate and the height installed in the receptor stage. The sensor measures the distance to the donor substrate and calculates the gap between the donor substrate and the receptor substrate from both measured values and the height information of the height sensor.

According to the fourteenth invention, in any one of the eleventh to thirteenth inventions, a position measuring means using a laser interferometer is provided for the Y-axis of the receptor stage and the Y-axis of the donor stage, respectively. It is a lift device characterized by.

The configuration of the laser interferometer for the Y-axis (Yr) of the receptor stage includes a mirror (Ic) held in a portion that moves with Yr and a platen that is not easily affected by vibration or the like due to the movement, for example, plateau 2 ( It can be configured to include an interferometer laser (IL) fixed to G2) and a 1/4 wave plate or the like (not shown). Further, it is preferable to use a 3-axis corner cube (retroreflector) as the mirror and to be as close as possible to the position (height) of the receptor substrate. FIG. 5A shows an outline. (The Z-axis and θ-axis of the donor stage group and the receptor stage are not shown.)

Although Yr is controlled by a programmable multi-axis controller based on the position information from the linear encoder, its gear ratio is used for calibrating this linear encoder and in the gear mode operation of Yr and Yd described later. This laser interferometer is used for calibration when making fine adjustments.

The configuration of the laser interferometer for the Y-axis (Yd) of the donor stage includes Ic held on a surface suspended with Yd suspended from Xd, IL fixed to Xd, a 1/4 wave plate, and the like. (Not shown). Again, it is desirable to use a 3-axis corner cube (retroreflector) as the mirror and to be as close as possible to the position (height) of the donor substrate. FIG. 5B shows an outline. (The receptor stage group is not shown.) In addition, the optimum detection method for any interferometer laser may be selected according to the required lift position accuracy.

A fifteenth invention comprises a confocal beam profiler having an image pickup surface at a position conjugate with a position where the mask pattern is reduced and projected by the projection lens to form an image in any one of the first to fourteenth inventions. It is a lift device characterized by this.

With this confocal beam profiler, the position of the laser beam projected on the surface of the donor substrate, the state of the spatial intensity distribution, and the image formation state are measured in real time with the same accuracy as the image resolution of the reduced image formation optical system. Can be monitored with.

In the sixteenth invention, in any one of the thirteenth to fifteenth inventions, the amount of deflection of the donor substrate is measured in advance together with the XY position information of the donor substrate by using the gap sensor, and the amount of deflection obtained by the measurement is measured. Based on the two-dimensional distribution data, the thirteenth to the thirteenth to lift while correcting the gap between the donor substrate and the receptor substrate by using the adjustment by the Z-axis (Zr) of the receptor stage or the Z-axis stage of the projection lens. 15 is a method of using the lift device according to any one of the fifteenth inventions.

The seventeenth invention is a method for adjusting the parallelism between the Y-axis of the receptor stage and the Y-axis of the donor stage in the assembling step of the lift device according to any one of the eleventh to sixteenth inventions. With reference to the Y-axis whose straightness is adjusted together with the Z-axis and θ-axis of the receptor stage, the squareness of the Y-axis of the receptor stage and the X-axis of the donor stage is set to the X of the platen 1 and the donor stage. The step adjusted by the rotation adjustment mechanism located between the axes and the Y-axis of the donor stage suspended from the X-axis of the donor stage whose squareness is adjusted and the Y-axis of the receptor stage are synchronized and aligned. Based on the step of observing the alignment mark on the Y-axis of the opposite donor stage with a high-magnification camera attached to the site that runs and moves with the Y-axis of the receptor stage, and the result of the observation, the X of the donor stage. The eleventh feature is that the step of adjusting the parallelism between the Y-axis of the receptor stage and the Y-axis of the donor stage by the rotation adjusting mechanism between the axis and the Y-axis of the donor stage is included in this order. The method for adjusting the lift device according to any one of the sixteenth inventions.

The high-magnification camera is located at the highest position of each stage or plate placed on Yr and has high rigidity in order to accurately check and adjust the parallelism between Yd and Yr. It is desirable to install it.

Based on the high synchronization position accuracy of the donor substrate and the receptor substrate, the present invention realizes an increase in size of the receptor substrate and a reduction in tact time in the lift device while maintaining high lift position accuracy.

A main component (side view) of the lift device according to the present invention is shown. (Second invention) From the state of FIG. 1A, a state (side view) in which the X-axis of the donor stage moves on the optical stage is shown. From the state of FIG. 1B, a state (side view) in which the optical stage moves on the X-axis of the donor stage is shown. Top view of FIG. 1C. A main component (side view) of the lift device according to the present invention is shown. (Third invention) From the state of FIG. 2A, a state (side view) in which the X-axis of the donor stage and the optical stage move the same distance on the surface plate 1 is shown. From the state of FIG. 2B, only the X-axis of the donor stage is moved on the surface plate 1 (side view). An example of the rotation adjustment mechanism used between G1 and Xd is shown. An example of the rotation adjustment mechanism used between Xd and Yd is shown. An example of the rotation adjustment mechanism used between Xd and Xo is shown. The range in which the donor stage should move according to the size of the receptor substrate is shown. It shows how the laser interferometer for the Y axis of the receptor stage is installed. It shows how the Y-axis laser interferometer of the donor stage is installed. An example of the pattern applied to the mask is shown. The state of the lift process by the mask pattern of a plurality of rows is shown. The state of the monitor of the confocal beam profiler is shown. The first shot of the lift process is shown. The second shot of the lift process is shown. The third shot of the lift process is shown. The state of the receptor substrate after one scan with a gear ratio of 1: 2 is shown. The state of the X-axis step scan of the donor stage is shown. The synchronization position error when the Y-axis of the receptor stage and the Y-axis of the donor stage are translated is shown. The first shot of the lift process using a matrix-shaped donor substrate is shown. The second shot of the lift process using the matrix-shaped donor substrate is shown. The third shot of the lift process using the matrix-shaped donor substrate is shown.

Hereinafter, a specific configuration of the lift device according to the present invention will be described in detail with reference to the drawings.

In the first embodiment, a layered (solid film) object formed in a single leaf via a light absorbing layer on a donor substrate having a size of 200 × 200 [mm] is subjected to a size of 400 × 400 [mm]. An example is shown in which a total of 144 million pieces of the receptor substrate are lifted in a matrix shape of 12000 × 12000 in length as an element-like lift object having a shape of 10 × 10 [μm]. The 144 million lift positions have a position accuracy of ± 1 [μm], and each vertical and horizontal pitch is 30 [μm].

First, FIG. 1A shows the main components of the lift device according to the implementation of the present invention. In FIG. 1A, the laser device, control device, other monitors, etc. are not shown, and the X-axis, Y-axis, and Z-axis directions are shown in the figure. The surface plate 1 (G1), the surface plate 11 (G11), the surface plate 12 (G12), and the surface plate 2 (G2) were all stone surface plates using granite. And high synthetic iron was used for the basic surface plate (G). It should be noted that this embodiment is an example based on the configuration of the sixth invention described above.

The configuration of the lift device according to the first embodiment of the present invention will be described in order along the propagation of the laser light until the pulsed laser light is emitted from the laser device and irradiated to the object on the donor substrate. First, the laser device used in the first embodiment is an excimer laser having an oscillation wavelength of 248 [nm]. The spatial distribution of the emitted laser light is approximately 8 × 24 [mm], and the beam divergence angle is 1 × 3 [mrad]. Both are notations (vertical x horizontal), and the numerical value is FWHM.

There are various specifications of excimer lasers, and not only the difference in output, the difference in repetition frequency, the difference in beam size, the difference in beam spread angle, etc., but also the emitted laser light is vertically long (the above-mentioned vertical and horizontal are reversed). ), But there are many excimer lasers that can be used in the first embodiment by adding, omitting, or changing the design of the optical system. Further, although the laser device depends on its size, it is generally installed on a base (laser surface plate) different from the base on which the stage group of the lift device is installed.

The light emitted from the excimer laser enters the telescope optical system and propagates to the shaping optical system beyond it. Here, as shown in FIG. 1A, the orthopedic optical system holds its optical axis on the optical stage (Xo) along the X axis, and the optical stage is the X axis of the donor stage for moving the donor substrate. It is installed on (Xd). Then, the laser beam immediately before incident on the shaping optical system is adjusted by the telescope optical system so as to be substantially parallel light at any position within the movement range of the X axis of the donor stage. Therefore, regardless of the movement of Xd and / or Xo in the X-axis direction, it is always incident on the orthopedic optical system at substantially the same size and at the same angle (vertical). In the first embodiment, the size is approximately 25 × 25 [mm] (length × width).

The orthopedic optical system (H) in the first embodiment is a combination of two sets of uniaxial cylindrical lens arrays at right angles in a plane perpendicular to the optical axis direction. The first-stage lens array in each set is an arrangement in which an image is formed on a mask (M) by a rear-stage lens array and a condenser lens (not shown) located thereafter.

The laser beam that has passed through the orthopedic optical system is incident on the mask via the field lens (F) that constitutes the image-side telecentric reduction projection optical system in combination with the projection lens (Pl). The size of the laser beam on the mask is 1 × 50 [mm] (FWHM), and the size of the region where the spatial intensity distribution uniformity is within ± 5% is 0.5 × 45 [mm] or more. Maintaining.

The mask is fixed to the mask stage, and the mask stage is in the W axis moving in the X-axis direction, the U axis in the Y axis direction, the V axis moving in the Z axis direction, and the YZ plane as described above. It has a total of 6 axis adjustment mechanisms, a TV axis that adjusts the inclination with respect to the R axis and the V axis, which are rotation axes, and a TU axis that adjusts the inclination with respect to the U axis.

As the mask in Example 1, a synthetic quartz plate on which a pattern is drawn (applied) by chrome plating is used. The outline is shown in FIG. In this mask, the white window portion (a) that is not chrome-plated transmits the laser light, and the colored portion (b) that is chrome-plated blocks the laser light. The shape (a) of one window is 50 × 50 [μm], and a total of 300 windows are arranged in the X-axis direction (one row) at intervals of 150 [μm] over 43.85 [mm]. The surface to be chrome-plated is the emission side of the laser beam, while the incident side is provided with an antireflection film for 248 [nm]. Further, instead of chrome plating, aluminum vapor deposition or a dielectric multilayer film can be used.

In the case of a lift process in which a plurality of patterns are switched and used in one mask, the size of the laser beam emitted from the shaping optical system onto the mask should be within the range and within the movable range of the mask stage. For example, different patterns of drawn masks can be used.

Further, in FIG. 7, when a lift step is used in which the donor substrate (D) is scanned a plurality of times or reciprocally at the same speed while the receptor substrate (R) is scanned once (however, including a stop in the middle). , The mask pattern shown in FIG. 6 is not a single row, but a pattern of a plurality of rows (however, laser irradiation is intermittently and selectively irradiated among the mask patterns. In FIG. 7, it is displayed as a matrix of 3 × 2 rows). It is also possible to adopt it. This makes it possible to use a donor substrate that is smaller in size than the receptor substrate.

The laser beam that has passed through the mask pattern changes its propagation direction vertically downward (-Z direction) by the epi-illumination mirror, and is incident on the projection lens. This projection lens is provided with an antireflection film for 248 nm and has a reduction magnification of 1/5. Details are shown in Table 1 below.

The laser beam emitted from the projection lens is incident from the back surface of the donor substrate, and has a reduced size of 1/5 of the mask pattern with respect to a predetermined position of the light absorption layer formed on the front surface (lower surface) of the donor substrate. It is projected accurately. Here, the predetermined position in the XY plane is adjusted by the X-axis (Xd), Y-axis (Yd), and θ-axis (θd) of the donor stage with reference to the alignment mark or the like previously attached to the donor substrate. It is determined.

To adjust the image plane of the mask pattern by the projection lens to focus on the interface between the surface of the donor substrate and the light absorption layer, a mask on which the Z-axis stage (Zl) of the projection lens and the field lens (F) are placed. Adjust the position of the W axis of the stage. Although it is possible to add an adjustment function in the Z-axis direction of the donor substrate (Z-axis stage), it is necessary to consider a decrease in lift position accuracy due to an increase in the load applied to the X-axis (Xd) of the donor stage. There is.

When adjusting the image formation position at the interface between the donor substrate surface and the light absorption layer, a real-time monitor using a confocal beam profiler (BP) that has a plane coupled to the image plane as the image plane is effective. Is. The state of the adjustment screen is shown in FIG. In the first embodiment, the spatial intensity distribution of the laser beam reduced and imaged on the boundary surface between the donor substrate surface and the light absorption layer is monitored in real time and with high resolution.

The above is the function of the device configuration in the first embodiment regarding the propagation of the pulsed laser light emitted from the laser device.

Next, in the apparatus according to the present invention, it is simple to see how the parallelism of the Y-axis (Yr) of the receptor stage and the Y-axis (Yd) of the donor stage can be mechanically realized by using the configuration of the first embodiment. Explain to.

In each stage, as shown in FIG. 1A, the X-axis (Xd) of the donor stage is placed on the stone surface plate 1 (G1), and the optical stage (Xo) is placed on the X-axis (Xd) of the donor stage. The receptor stage group (Yr, θr, Zr) is placed on the stone surface plate 2 (G2). And the whole is built on the basic surface plate (G). The rotation adjustment mechanism (RP) is provided between G1 and Xd, between Xo and Xd, and between Xd and Yd (not shown).

In order to adjust the squareness and parallelism of the axes of each stage, an adjustment substrate AD to be held by the donor stage instead of the donor substrate and an adjustment substrate AR to be placed on the receptor stage instead of the receptor substrate are used. Lines indicating the X-axis (alignment line X) and the Y-axis (alignment line Y) that form a right angle exactly as alignment lines are drawn on each adjustment board, and marks are also attached to predetermined positions (intervals). There is.

1) Parallelism of Yr and AR (Y) (squareness of Yr and AR (X))
In order to adjust the parallelism of the Y-axis (Yr) of the receptor stage and the alignment line Y on the adjustment substrate AR, the adjustment substrate AR placed on the Z-axis (Zr) of the receptor stage is mounted on the optical stage (Xo) or Observation is performed by a high-magnification CCD camera fixed to a Z-axis stage for a projection lens installed therein. The Yr axis is moved by 400 [mm], and adjustment is made using the θ axis (θr) of the receptor stage so that the amount of deviation of the alignment line Y in the X axis direction is within 1 [μm]. The moving distance of the stage at this time is within the range of the effective stroke of the stage, and the allowable deviation amount varies depending on the required lift accuracy. (same as below.)

2) Parallelism between AR (X) and Xd (squareness of Yr and Xd)
Next, using the alignment line X of the adjustment substrate AR adjusted by the above, the squareness between the X axis (Xd) of the donor stage and the Y axis (Yr) of the receptor stage is set to the same optical stage (Xo) or this. Adjust while observing with a high-magnification CCD camera fixed to the Z-axis stage for the projection lens installed in. The Xd axis is moved by 400 [mm], and the mounting angles of the alignment line X are adjusted by using the rotation adjustment mechanism between G1 and Xd so that the amount of deviation in the Y-axis direction is within 1 [μm]. At the same time, the mounting angle of Xd with respect to G1 and Xd, that is, Yr is adjusted.

3) Parallel between AR (X) and Xo (squareness between Yr and Xo, parallelism between Xd and Xo)
Using the alignment line X of the adjustment substrate AR adjusted as described above, the parallelism between the optical stage (Xo) and the X axis (Xd) of the donor stage can be adjusted for the optical stage (Xo) or the projection lens installed on the optical stage (Xo). Adjust while observing with a high-magnification CCD camera fixed to the Z-axis stage of. The Xo axis is moved by 200 [mm], and the degree of parallelism of the optical stage (Xo) with respect to the X axis (Xd) of the donor stage is within 0.5 [μm] so that the amount of deviation of the alignment line X in the Y axis direction is within 0.5 [μm]. Is adjusted by the rotation adjustment mechanism between the two.

4) Parallelism of Yd and AD (Y) An adjustment board held on the θ-axis (θd) of the donor stage to adjust the parallelism of the Y-axis (Yd) of the donor stage and the alignment line Y on the adjustment board AD. AD is observed by a high-magnification CCD camera fixed to an optical stage (Xo) or a Z-axis stage for a projection lens installed therein. The Yd axis is moved by 200 [mm], and adjustment is made using the θ axis (θd) of the donor stage so that the amount of deviation of the alignment line Y in the X axis direction is within 0.5 [μm].

5) Parallelism between AD (X) and Xo (parallelism between AD (X) and Xd, squareness between Xd and Yd)
In order to adjust the squareness of the X-axis (Xd) of the donor stage and the Y-axis (Yd) of the donor stage, the parallelism of the alignment line X on the adjustment board AD with the X-axis (Xd) of the donor stage has already been adjusted. The observation is performed by a high-magnification CCD camera fixed to the optical stage (Xo) or the Z-axis stage for the projection lens installed therein. The optical stage (Xo) is moved by 200 [mm], and the donor suspended on the X-axis (Xd) of the donor stage so that the amount of deviation of the alignment line X in the Y-axis direction is within 0.5 [μm]. The squareness of the stage with the Y axis (Yd) is adjusted by the rotation adjustment mechanism between the two.

6) Parallelism between AD (Y) and Yr (parallelism between Yd and Yr)
Finally, in order to confirm the parallelism between the Y-axis (Yd) of the donor stage and the Y-axis (Yr) of the receptor stage, a high-magnification CCD camera is attached to the Y-axis (Yd) of the donor stage and placed on the opposite receptor stage. Observe the alignment line Y of the placed adjustment board AR.
At this time, the adjustment board AD is removed. The high magnification CCD camera moves the X-axis (Xd) of the donor stage so that it can observe any one end of the receptor stage. Next, the Y-axis (Yd) of the donor stage is moved by 400 [mm], and it is confirmed whether the amount of deviation of the alignment line Y in the X-axis direction is within 1 [μm]. Further, in order to confirm the same for the other end of the receptor stage, after moving Xd to the other end, Yd is moved again by 400 [mm], and the amount of deviation of the alignment line Y in the X-axis direction is 1 [μm]. Make sure it fits within. It is also good to translate Yd and Yr in parallel and observe the fluctuation of the position of the alignment mark.

When the high-magnification CCD camera is attached to the Y-axis (Yd) of the donor stage, there is a possibility of contact with them depending on the position of the X-axis of the donor stage and the shape (opening) of the stone surface plate 1. In that case, the high-magnification CCD camera is attached not to Yd but to the Z-axis (Zr) of the receptor stage, and the Y-axis (Yr) of the receptor stage is moved by 200 [mm] to move the alignment line Y of the adjustment board AD. It is also possible to observe and confirm the amount of deviation in the X-axis direction.

Since the stone surface plate 1 (G1) and the stone surface plate 2 independently support each stage, and Yd is suspended from Xd installed on G1, the parallelism of Yr and Yd should be adjusted directly. Although it cannot be done, the parallelism of Yr and Yd is adjusted in the [μrad] order in steps as described above. Since the error in parallelism (squareness) accumulates as the adjustment steps are taken in the order of 1) to 6), it is desirable to adjust the allowable deviation amount in the initial stage to be as small as possible. Further, although the adjustment steps 1) to 6) have described the adjustment of the parallelism and the squareness of each stage in the XY plane, it is also necessary to make adjustments around other axes (X-axis and Y-axis).

Next, scanning of the donor substrate and the receptor substrate during lifting in the first embodiment will be described with reference to FIGS. 9A to 9C. Here, Top Views of FIGS. 9A to 9C are images in which an operator is arranged on the left side of these figures, and the donor substrate (D) and the receptor substrate (R) scan back and forth with respect to the operator.

First, the amount of deflection of the donor substrate that is adsorbed and set on the θ axis (θd) of the donor stage is measured on the entire surface of the donor substrate, and this is mapped as two-dimensional data together with the position information. This information is used as a correction amount for the Z-axis (Zr) of the receptor stage corresponding to the X-axis (Xd) and Y-axis (Yd) of the donor stage moving during the lift process.

Further, in the following description, for convenience, a predetermined position on the left front side of the receptor substrate (R) and the donor substrate (D) from the viewpoint of the operator is defined as the origin of each substrate. Then, the positions of the optical stage (Xo) and the receptor stage (Yr, θr) when the origin of the receptor substrate is irradiated with the laser beam are defined as the origins, respectively. Further, also in the donor substrate, the position of the donor stage (Xd, Yd, θd) at the time of irradiation with the laser beam (LS) is defined as the origin of each. However, the origin of each stage is not limited to one end of the stroke range, and is a position where a stroke portion to be moved for the subsequent lift process or removal of the substrate is left.

FIG. 9A shows how the donor substrate (D) and the receptor substrate (R) at the origin position are irradiated with the first pulse of the laser beam (LS). Here, both Side View (side view) and Top View (top view) are illustrated. The alternate long and short dash line shows how the laser beam is irradiated to the object (S) by the reduced projection optical system, and the light absorption layer (not shown) in the region of 10 × 10 [μm] that has been irradiated is the laser beam. Is absorbed and ablated to generate a shock wave, which lifts an object in the same region to the opposite receptor substrate. Although the number of objects shown is three, in the case of the first embodiment, a total of 300 objects are lifted toward the receptor substrate at one time.

In the first embodiment, since the laser device oscillates at 200 [Hz] and the lift is performed in one shot, the receptor stage (Yr) moves the receptor substrate to the next irradiation position at a speed of 6 [mm / mm /. s] scans in the −Y direction without stopping.

On the other hand, the Y-axis (Yd) of the donor stage should be stopped in the −Y direction at a speed of 3 [mm / s] while synchronizing the position with the Y-axis (Yr) of the receptor stage. Scan without. That is, the moving speed ratio (gear ratio) of Yd and Yr is 1: 2. FIG. 9B shows the state of the second shot in which each substrate has moved.

The positions of Yr and Yd are synchronized by using Yr as a reference (master) and Yd as a subordinate (slave) and using the gear command of the stage system to synchronize both stages in gear mode. A programmable multi-axis control device is used for the control system.

In addition, the measured value of the stage position by the laser interferometer is used to determine the gear ratio in the gear command. A corner cube (Ic) that moves with the Yr moving table and constitutes a laser interferometer is attached near the receptor substrate, and a He-Ne laser (IL) with a wavelength of 632.8 [nm] and a light receiving unit (shown in FIG. 5A). (Omitted) is installed on the stone platen 2 (or an equivalent immovable position). Similarly, a corner cube is attached to the side surface of the moving table of Yd, and an interferometer laser and a light receiving unit (not shown in FIG. 5B) are installed in Xd. As a result, accurate position synchronization of each stage is realized.

As described above, each stage starts accelerating from the position before the origin so that the motion is already stable at the origin. During the acceleration time and the time until the stage reaches the origin, the laser pulse needs to be blocked so that the donor substrate is not irradiated with the laser beam. Therefore, the programmable multi-axis control device transmits an external oscillation trigger or a high-speed shutter operation start trigger to the laser device, and a stage drive signal with high accuracy.

Further, the state of the third shot is shown in FIG. 9C. As can be seen from the figure, it can be seen that the moving distance of the receptor substrate (R) is twice as large as the moving distance of the donor substrate (D). After this, the movement of the receptor substrate and the donor substrate also proceeds in the same manner.

When the donor substrate finishes scanning 180 [mm] in the −Y direction, and similarly, when the receptor substrate finishes scanning 360 [mm] in the −Y direction, the oscillation of the laser device is temporarily stopped, or the laser is used with a high-speed shutter. Block the irradiation of light. By scanning this distance, 300 objects lined up in the X-axis direction were lifted by 12,000 steps in the Y-axis direction of the receptor substrate, for a total of 3.6 million. FIG. 10 shows the situation.

Within the stop time, both the Y-axis (Yr) of the receptor stage and the Y-axis (Yd) of the donor stage return to the origin. (However, the acceleration distance in the next scan shall be taken into consideration. The same shall apply hereinafter.) On the other hand, the X-axis (Xd) of the donor stage returns to the position of -9 [mm] from the previous origin. Then, the lift process is started again from a new area. Hereafter, this is repeated.

In FIG. 11, after Xd has completed step movements of -9 [mm] × 20 times, this time, the position (solid line) is 15 [μm] in the −X direction from the previous origin (shown by the dotted line). (Illustrated), and the state just before starting the same operation with this point as a new origin is shown. After that, the Y-axis scanning (180 [mm] (Yd) and 360 [mm] (Yr)) of both stages and the step operation of -9 [mm] × 20 times of Xd are repeated. As a result, during the first 180 [mm] scan of Xd (20 step movements of -9 [mm]), the region not irradiated with the laser beam (in the figure, the irradiation of the next laser beam (LS)). The planned area is shown by the alternate long and short dash line.) Is irradiated with laser light, and the object on the donor substrate can be lifted to the receptor substrate more efficiently.

The approximate processing time is 360 [mm] / 6 [mm / s] × 40 [times] = 2400 [s]. It should be noted that this time does not include the time for the Y-axis (Yr) of the receptor stage to move the distance required for its acceleration / deceleration and the time for returning to the origin for each Y-axis scan. Further, by increasing the repetition frequency of the excimer laser to 1 [kHz], this processing time can be shortened to 1/5.

In FIG. 12, according to the apparatus configuration of the first embodiment, the distance of 400 [mm] at a moving speed of 150 [mm / s] with the Y axis (Yr) of the receptor stage as a reference (master) is set to the Y axis of the donor stage. The synchronization position error of both stages when (Yd) is made a subordinate (slave) and a distance of 200 [mm] is synchronized and translated at a moving speed of 75 [mm / s] is shown. Specifically, in Yr as a reference (master), the error amount (δYr) between the position information obtained from the linear encoder and the position information measured by the laser interferometer is synchronized with the speed of 1/2 of that. In Yd as a moving subordinate (slave), the difference (ΔYdr = δYd-δYr) between the position information obtained from the linear encoder and the position information measured by the laser interferometer (δYd) is shown on the horizontal axis. It was plotted as the elapsed time according to the movement rate of the receptor stage. As can be seen from this result, the position synchronization accuracy within ± 1 [μm] is achieved over the moving distance of 400 mm.

As described above, the lift pattern of the object to the receptor substrate in Example 1 is such that 10 × 10 [μm] is lifted in a matrix at an interval of 30 [μm]. For example, this interval is 60 [. When set to [μm], one donor substrate can lift four receptor substrates.

In the second embodiment, the object on the surface of the donor substrate in the first embodiment is formed in a matrix on the donor substrate having the same size of 200 × 200 [mm], unlike the one in the layered state of one leaf. A total of 144 million objects with a shape of 10 × 10 [μm] and an interval of 15 [μm] were placed at 1 / of the donor substrate with respect to the receptor substrate with a size of 400 × 400 [mm]. It is an example of lifting in the same matrix with a density of 2, that is, an interval of 30 [μm].

The arrangement of the object finally lifted on the receptor substrate is the same as in Example 1, but in Example 2, the object is similarly arranged on the donor substrate in advance at twice the density. It differs in that it is lifted onto the receptor substrate with a position accuracy of ± 1 [μm]. Then, in this case, the position synchronization accuracy of the Y-axis (Yd) of the donor stage and the Y-axis (Yr) of the receptor stage is more strictly determined as compared with Example 1.

In FIGS. 13A to 13C, as in the case of the first embodiment, the donor substrate (D) and the receptor substrate (R) at the origin position are irradiated with the first pulse of the laser beam (LS) to the third shot. Shows the state of.

In the third embodiment, the method of lifting the object on the surface of the donor substrate to the receptor substrate is the same as that of the first or second embodiment. On the other hand, the method of adjusting the parallelism between the Y-axis and the parallelism between the X-axis of each stage and the squareness of each Y-axis and the X-axis is different from the above embodiment. That is, the adjustment method described in Example 1 performs the adjustment steps 1) to 6) above in order to adjust the parallelism between the Y-axis (Yr) of the receptor stage and the Y-axis (Yd) of the donor stage. On the other hand, in the third embodiment, the parallelism of Yr and Yd is adjusted at an early stage of the adjustment step.

1) Straightness of Yr, θr, Zr This adjustment step is an adjustment step as a premise common to the first and second embodiments. The Y-axis (Yr) of the receptor stage installed on the stone platen 2 (G2), the θ-axis (θr) installed on it, the Z-axis (Zr), and the straightness of the holder of the receptor substrate (horizontal plane). The straightness with respect to the Z axis, which is the vertical direction when the XY plane is set to XY), is adjusted using a laser interferometer or the like. Basically, after this adjustment, no adjustment that may affect the squareness of the receptor stage group is performed, and all adjustments for other stages are based on the top surface of this receptor stage group, for example. conduct.

2) Parallelism of Yr and AR (Y) (squareness of Yr and AR (X))
Similar to the adjustment step 1) of the first embodiment, the parallelism of the Y-axis (Yr) of the receptor stage and the alignment line Y on the adjustment substrate AR is adjusted. As a result, the squareness between Yr and the alignment line X is also adjusted. When an alignment line or an alignment mark drawn directly on Yr is used without using the adjustment board AR, this adjustment step 1) can be omitted.

3) Parallelism between AR (X) and Xd (squareness of Yr and Xd)
Next, the alignment line X of the adjustment substrate AR is observed by a high-magnification CCD camera installed on the optical stage (Xo) mounted on the X-axis (Xd) of the donor stage. Although the position of this high-magnification CCD camera in the Z-axis direction is due to the design of the projection optical system, in the third embodiment, a Z-axis stage (Zl) that holds the shadow lens cast near the position of the projection lens (Pl) is provided. It is fixed using. Move Xd by 400 [mm], and set the mounting angle of Xd with respect to the stone surface plate 1, that is, the squareness of Xd with respect to Yr so that the amount of deviation of the alignment line X in the Y-axis direction is within 0.3 [μm]. , Adjust using the rotation adjustment mechanism.

4) Parallelism in the YZ plane of Yr and Yd In the description of Example 1, the description of the adjustment step around other axes (X-axis and Y-axis) was omitted, but here, around the X-axis, that is, YZ. The step of adjusting the parallelism in the plane will be briefly described. The lower surface of the Y-axis (Yd) of the donor stage is observed using a height sensor installed on the Z-axis (Zr) of the receptor stage or other sites. Simultaneously move Yr and Yd at the same distance (parallel running) by 200 [mm] or more, and observe the fluctuation of the measured value (distance between Zr and Yd) by the gap sensor. A shim plate is placed between Yd or Xd and the rotation adjustment mechanism installed between Xd and Yd so that the fluctuation is within 5 [μm] or within a range sufficiently smaller than the depth of focus of the image formed by the projection lens. Insert and adjust the parallelism in the YZ plane between Yr and Yd.

5) Parallelism of Yr and Yd Observe the pattern matching alignment mark provided on the lower surface of Yd with a high-magnification CCD camera installed in Zr or other parts. When Yr and Yd are moved by the same distance (parallel running) in synchronization and the position of the pattern-matched alignment mark image (cross mark, etc.) moves in the X-axis direction, it should be corrected between Xd and Yd. Adjust using the installed rotation adjustment mechanism. It is also possible to use the alignment line Y of the adjustment board AD attached to the Y axis of the donor stage instead of the alignment mark.

6) Squareness of Yr and Xo The alignment line X of the adjustment substrate AR whose squareness with the Y axis (Yr) of the receptor stage was adjusted in the adjustment step 1) is set on the optical stage (Xo). Observe with a magnification CCD camera. Move Xo by 400 [mm], and adjust the mounting angle of Xo with respect to Xd so that the amount of deviation of the alignment line X in the Y-axis direction is within 0.3 [μm]. Adjust using.

FIG. 2A shows the main components of the lift device of the fourth embodiment. Of the present invention, the seventh invention is the basic configuration. In FIGS. 2A to 2C, the illustration of the laser device, control device, other monitors, etc. (all of which are the same as in Example 1) is omitted, and the X-axis, Y-axis, and Z-axis directions are shown in the figure. Further, the arrangement of the donor substrate, the receptor substrate, the lift target object on the donor substrate, and the arrangement after the lift on the receptor substrate used in the fourth embodiment are the same as those of the second embodiment.

The state of the optical system from the emission of the pulsed laser light from the excimer laser device to the irradiation of the lift object on the donor substrate is as described below. This is the same as that of the first embodiment except for the portion caused by the difference between the above. That is, in the case of the lift device according to the sixth invention shown in FIGS. 1A to 1C, the X-axis (Xd) of the donor stage is placed on the stone surface plate 1 (G1), and the optical stage (Xo) is placed on the stone surface plate 1 (G1) in this order. On the other hand, in the case of the lift device according to the seventh invention shown in FIGS. 2A to 2C, Xo is placed on G1 and Xd is suspended under G1. Is the difference in construction.

The light emitted from the excimer laser enters the telescope optical system and propagates to the shaping optical system beyond it. As shown in FIG. 2A, this shaping optical system is installed on an optical stage (Xo) that moves in the X-axis direction so that its optical axes are parallel to each other. The Xo is placed on a stone surface plate 1 (G1) made of Grinite, and has a rotation adjusting mechanism (RP) between the two. Here, Xo is perpendicular to the Y-axis (Yr) of the receptor stage placed on the stone surface plate 2 (G2) different from G1, and is parallel to the X-axis (Xd) of the donor stage. The laser beam immediately before incident on the shaping optical system is adjusted by the telescope optical system so as to have substantially the same shape (approximately 25 × 25 [mm] (length × width, FWHM) regardless of the movement of Xo. ..

The X-axis (Xd) of the donor stage is suspended below G1, and the Y-axis (Yd) of the donor stage is further suspended. Further, a rotation adjusting mechanism is provided between the two. In FIG. 2B, a side view showing how Xo and Xd have moved the same distance with respect to G1. As a result, the positions of Xo and Xd in the X-axis direction with respect to Yd can be changed without changing the relative positions on the X-axis. Further, in FIG. 2C, the state in which only Xo is moved with respect to G1 is shown from the side view. This makes it possible to change the relative positions of Xd and Xo on the X axis.

The details of the field lens (F), the mask (M), and the projection lens (Pl), which are other reduced projection optical systems, are the same as those in the first embodiment, and the laser beam emitted from the projection lens is the back surface of the donor substrate. It is incident from and is accurately projected toward the lift object formed on the surface (lower surface) thereof at a reduced size of 1/5 of the pattern drawn on the mask. Further, the state of image formation on the surface of the donor substrate is performed by a confocal beam profiler as in Example 1.

Based on the mask pattern reduced and projected as described above on the lift object placed on the surface of the donor substrate, how the donor substrate and the receptor substrate are lifted when the lift object is lifted to the opposite receptor substrate. 6 and 10, FIGS. 11, 11 and 13A to 13C show how the object to be lifted is lifted onto the receptor substrate by scanning, and further, the Y-axis (Yr) of the receptor stage and the Y-axis of the donor stage. The position synchronization accuracy in the movement of (Yd) is the same as that shown in FIG. 12 shown in the first embodiment.

Further, the method of adjusting the parallelism between the Y-axis and the parallelism between the X-axis of each stage and the squareness between the Y-axis and the X-axis of each stage is the same as that in the third embodiment. That is, the squareness of Yr and the X-axis (Xd) of the donor stage suspended from the stone platen 1 (G1) is set based on the Y-axis (Yr) of the receptor stage whose straightness has been adjusted. Observe with a high magnification CCD camera fixed to the Z axis (Zr) of the receptor stage, and adjust by the rotation adjustment mechanism (RP) between G1 and Xd. Then, the parallelism between the Y axis (Yd) of the donor stage suspended from the adjusted Xd and Yr is observed with the same high-magnification CCD camera, and adjusted by the RP between Xd and Yd. Finally, the squareness of the optical stage (Xo) and Yr is observed by a high-magnification CCD moving with Xo and adjusted by the RP between G1 and Xo.

It can be used as a display manufacturing device.

AD Donor stage adjustment board AR Receptor stage adjustment board BP Confocal beam profiler CCD High magnification camera D Donor board F Field lens G Basic surface plate G1 Surface plate 1
G11 surface plate 11
G12 surface plate 12
G2 surface plate 2
G3 surface plate 3
H Orthopedic Optical System Ic Corner Cube for Laser Interferometer IL Laser Interferometer Laser LS Laser Light M Mask Pl Projection Lens R Receptor Substrate RP Rotation Adjustment Mechanism S Object TE Telescope Xd Donor Stage X Axis Xo Optical Stage (X Axis) )
Yd Donor stage Y-axis Yl Projection lens and camera switching stage Yr Receptor stage Y-axis Zl Projection lens Z-axis stage Zr Receptor stage Z-axis θd Donor stage θ-axis θr Receptor stage θ-axis

Claims (17)

By irradiating an object located on the surface of the moving donor substrate with a pulsed laser beam from the back surface of the donor substrate, the object is selectively peeled off and moved while facing the donor substrate. A device that lifts onto a receptor substrate
A laser device that oscillates a pulse and
A telescope that converts pulsed laser light emitted from the laser device into parallel light,
An orthopedic optical system that uniformly shapes the spatial intensity distribution of pulsed laser light that has passed through the telescope.
A mask that allows pulsed laser light shaped by the shaping optical system to pass through in a predetermined pattern,
A field lens located between the shaping optical system and the mask,
A projection lens that reduces and projects the laser beam that has passed through the mask pattern onto the surface of the donor substrate.
A mask stage that holds the field lens and mask,
The shaping optical system, the mask stage, the optical stage holding the projection lens, and the like.
A donor stage that holds the donor substrate in a direction in which the back surface is on the incident side of the laser beam,
The receptor stage that holds the receptor substrate and
A programmable multi-axis control device having a trigger output function and a stage control function for pulse laser light oscillation, and the like.
The receptor stage has a Y-axis when the horizontal plane is the XY plane, a Z-axis in the vertical direction, and a θ-axis in the XY plane.
The donor stage has an X-axis, a Y-axis and a θ-axis.
The projection lens is held on the optical stage together with the Z-axis stage for the projection lens.
The telescope, the shaping optical system, the field lens, the mask, and the projection lens constitute a reduced projection optical system that reduces and projects the pattern of the mask on the surface of the donor substrate.
The X-axis of the donor stage is installed on the surface plate 1 and
The Y-axis of the receptor stage is installed on a surface plate 2 different from the surface plate 1.
A lift device characterized in that the Y-axis of the donor stage is suspended on the X-axis of the donor stage. The X-axis of the donor stage is placed on the surface plate 1 and is placed on the surface plate 1.
The lift device according to claim 1, wherein the optical stage is mounted on the X-axis of the donor stage. The lift device according to claim 1, wherein the optical stage is placed on the surface plate 1, and the X-axis of the donor stage is suspended on the surface plate 1. The X-axis of the donor stage is installed on the surface plate 1 and
The lift device according to claim 1, wherein the optical stage is mounted on a surface plate 3 different from both the surface plate 1 and the surface plate 2. The installation angle in the XY plane between the X-axis of the donor stage and the surface plate 1 and between the X-axis of the donor stage and the Y-axis of the donor stage are finely adjusted. The lift device according to claim 1, further comprising a rotation adjusting mechanism for the purpose. Between the X-axis of the donor stage and the platen 1, between the X-axis of the donor stage and the optical stage, and between the X-axis of the donor stage and the Y-axis of the donor stage, respectively . The lift device according to claim 2, further comprising a rotation adjusting mechanism for finely adjusting the installation angle in the XY plane between the two. Between the X-axis of the donor stage and the platen 1, between the optical stage and the platen 1, and between the X-axis of the donor stage and the Y-axis of the donor stage, respectively . The lift device according to claim 3, further comprising a rotation adjusting mechanism for finely adjusting the installation angle in the XY plane between the two. Between the X-axis of the donor stage and the platen 1, between the optical stage and the platen 3, and between the X-axis of the donor stage and the Y-axis of the donor stage, respectively . The lift device according to claim 4, further comprising a rotation adjusting mechanism for finely adjusting the installation angle in the XY plane between the two. The lift device according to any one of claims 1 to 8, wherein the pulse laser device is an excimer laser. The lift device according to claim 9, further comprising a pulse shutter that blocks an arbitrary pulse train of laser pulses emitted from the excimer laser device. The programmable multi-axis controller has a function of simultaneously controlling at least the Y-axis of the receptor stage and the Y-axis of the donor stage, and is preliminarily created to correct a movement position error of these stages. The lift device according to any one of claims 1 to 10, further comprising means for correcting the movement position error using the dimension distribution correction value data. A high-magnification camera that monitors the position of the donor substrate is installed on the Z-axis of the receptor stage, or a high-magnification camera that monitors the position of the receptor stage moves along with the X-axis of the donor stage, or The lift device according to any one of claims 1 to 11, wherein the lift device is installed on the optical stage or a portion moving with the optical stage. The lift device according to any one of claims 1 to 12, wherein the donor stage and the receptor stage include a gap sensor that measures a gap between the surface of the donor substrate and the surface of the receptor substrate. The lift according to any one of claims 1 to 13, wherein a position measuring means using a laser interferometer is provided for the Y-axis of the receptor stage and the Y-axis of the donor stage, respectively. Device. The invention according to any one of claims 1 to 14, wherein the mask pattern includes a confocal beam profiler having an imaging surface at a position conjugate with a position where the mask pattern is reduced and projected by the projection lens to form an image. Lift device. The amount of deflection of the donor substrate is measured in advance together with the XY position information of the donor substrate using the gap sensor, and based on the two-dimensional distribution data of the amount of deflection obtained by the measurement, the Z axis of the receptor stage or the Z of the projection lens. 13. The method of using the lift device according to claim 13 , wherein the lift device is lifted while correcting the gap between the donor substrate and the receptor substrate by using the adjustment by the axial stage. A method for adjusting the parallelism between the Y-axis of the receptor stage and the Y-axis of the donor stage in the step of assembling the lift device.
With reference to the Y-axis of the receptor stage whose straightness has been adjusted along with the Z-axis and θ-axis of the receptor stage.
A step of adjusting the squareness of the Y-axis of the receptor stage and the X-axis of the donor stage by a rotation adjusting mechanism located between the surface plate 1 and the X-axis of the donor stage.
The Y-axis of the donor stage suspended on the X-axis of the donor stage whose squareness is adjusted and the Y-axis of the receptor stage are run in parallel in synchronization, and are attached to a site that moves together with the Y-axis of the receptor stage. The step of observing the alignment mark on the Y-axis of the opposite donor stage with a high-magnification camera,
Based on the result of the observation, the step of adjusting the parallelism between the Y-axis of the receptor stage and the Y-axis of the donor stage by the rotation adjusting mechanism between the X-axis of the donor stage and the Y-axis of the donor stage is performed. ,
The method for adjusting a lift device according to any one of claims 1 to 16, wherein the lift device is included in this order.

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