JP2019535427A5 - - Google Patents

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Publication number
JP2019535427A5
JP2019535427A5 JP2019527357A JP2019527357A JP2019535427A5 JP 2019535427 A5 JP2019535427 A5 JP 2019535427A5 JP 2019527357 A JP2019527357 A JP 2019527357A JP 2019527357 A JP2019527357 A JP 2019527357A JP 2019535427 A5 JP2019535427 A5 JP 2019535427A5
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JP
Japan
Prior art keywords
emr
processing range
emr beam
multifunctional
range
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JP2019527357A
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English (en)
Japanese (ja)
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JP2019535427A (ja
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Priority claimed from US15/820,737 external-priority patent/US10994151B2/en
Publication of JP2019535427A publication Critical patent/JP2019535427A/ja
Publication of JP2019535427A5 publication Critical patent/JP2019535427A5/ja
Priority to JP2022198167A priority Critical patent/JP2023060852A/ja
Pending legal-status Critical Current

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JP2019527357A 2016-11-22 2017-11-22 エステティック処理用システムおよび方法 Pending JP2019535427A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022198167A JP2023060852A (ja) 2016-11-22 2022-12-12 エステティック処理用システムおよび方法

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
US201662497520P 2016-11-22 2016-11-22
US201662497535P 2016-11-22 2016-11-22
US201662497503P 2016-11-22 2016-11-22
US201662497534P 2016-11-22 2016-11-22
US62/497,535 2016-11-22
US62/497,520 2016-11-22
US62/497,534 2016-11-22
US62/497,503 2016-11-22
US201762601674P 2017-03-28 2017-03-28
US62/601,674 2017-03-28
US15/820,737 US10994151B2 (en) 2016-11-22 2017-11-22 Systems and methods for aesthetic treatment
PCT/US2017/063010 WO2018098274A1 (en) 2016-11-22 2017-11-22 Systems and methods for aesthetic treatment
US15/820,737 2017-11-22

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022198167A Division JP2023060852A (ja) 2016-11-22 2022-12-12 エステティック処理用システムおよび方法

Publications (2)

Publication Number Publication Date
JP2019535427A JP2019535427A (ja) 2019-12-12
JP2019535427A5 true JP2019535427A5 (cg-RX-API-DMAC7.html) 2021-01-14

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JP2019527357A Pending JP2019535427A (ja) 2016-11-22 2017-11-22 エステティック処理用システムおよび方法
JP2022198167A Pending JP2023060852A (ja) 2016-11-22 2022-12-12 エステティック処理用システムおよび方法

Family Applications After (1)

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JP2022198167A Pending JP2023060852A (ja) 2016-11-22 2022-12-12 エステティック処理用システムおよび方法

Country Status (6)

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US (3) US10994151B2 (cg-RX-API-DMAC7.html)
EP (2) EP3544679A4 (cg-RX-API-DMAC7.html)
JP (2) JP2019535427A (cg-RX-API-DMAC7.html)
KR (2) KR20230154105A (cg-RX-API-DMAC7.html)
BR (1) BR112019010363A2 (cg-RX-API-DMAC7.html)
WO (1) WO2018098274A1 (cg-RX-API-DMAC7.html)

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