JP2019535427A - エステティック処理用システムおよび方法 - Google Patents
エステティック処理用システムおよび方法 Download PDFInfo
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- JP2019535427A JP2019535427A JP2019527357A JP2019527357A JP2019535427A JP 2019535427 A JP2019535427 A JP 2019535427A JP 2019527357 A JP2019527357 A JP 2019527357A JP 2019527357 A JP2019527357 A JP 2019527357A JP 2019535427 A JP2019535427 A JP 2019535427A
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Abstract
Description
本出願は、2017年3月28日に出願された米国仮特許出願第62/601,674号の利益および優先権を主張し、該仮出願は、その全体において引用により本明細書に組み込まれる。本出願もまた、2016年11月22日に出願された米国仮特許出願第62/497,535号の利益をおよび優先権主張し、該仮出願は、その全体において引用により本明細書に組み込まれる。本出願もまた、2016年9月22日に出願された米国仮特許出願第62/497,534号の利益をおよび優先権主張し、該仮出願は、その全体において引用により本明細書に組み込まれる。本出願もまた、2016年9月22日に出願された米国仮特許出願第62/497,520号の利益をおよび優先権主張し、該仮出願は、その全体において引用により本明細書に組み込まれる。本出願もまた、2016年9月22日に出願された米国仮特許出願第 62/497,503号の利益をおよび優先権主張し、該仮出願は、その全体において引用により本明細書に組み込まれる。本出願もまた、2017年9月22日に出願された米国実用新案出願第 15/820,737号の利益および優先権を主張し、該仮出願は、その全体において引用により本明細書に組み込まれる。
これらの電圧降下およびジュール熱(I2*R)に関連する問題は、信頼性懸念に追加される。しかしながら、部分的なダイオードバー(すなわち規格2.0VDCのダイオードバーより短い長さを有するダイオードバー)は典型的に、バーの断片に比例したより低い電流を必要とする。したがって、一列に接続される部分的なダイオードバーを使用すること、部分的なダイオードの各々を作動するために、低電流だが高電圧で電流が送達されることによって、出力が保たれる間に、必要な電流を減らすことができる。
2つの測定が熱伝達アルゴリズムに含まれている場合、皮膚熱流束の計算が可能である。
あるいは、表面熱流束センサは熱流束データを提供することができる。
一実施形態では、皮下脂肪減少およびスキンタイトニングを同時に行なうことが望ましい場合もある。しかし、図11のヒト組織プロファイルで示されるように、異なるEMR波長は、異なる予測される透過の深さを有する。特に、図11は、各波長について、様々な深さにまで浸透するEMRエネルギーの割合をパーセントで例証する。より一般には、脂肪は、皮膚の表面から典型的に5mm以上である。したがって、例えば、約1064nm(例えば、400nm〜3000nm、または900nm〜1100nm)の波長は、皮膚、表皮、および真皮を介する良好な透過ならびに脂肪細胞内でのエネルギーの蓄積を示すため、脂肪組織の温熱療法に選択されることができる。他方では、一般にスキンタイトニングは、コラーゲンは存在する表皮および真皮においてより高い吸収を示す他の波長を必要とする。したがって、例えば、約400nm〜約3000nm、または約1300nm〜約1400nmの波長である。これらのEMRビーム波長は、コラーゲンに多くのエネルギーを蓄積し、壊死を引き起こし、および最終的には新しいコラーゲン再生からスキンタイトニングをもたらす。
Claims (42)
- 多機能エステティックシステムであって、多機能エステティックシステムは:
ハウジング;
電磁気アレイシステムであって、ハウジングの中に位置され複数の電磁波(EMR)源を有し、各々のEMR源は別のEMR源よって生成されたEMRビームと異なる波長を有するEMRビームを生成するように構成される、電磁気アレイ;
制御装置であって、EMRビームを処理範囲に方向づけるため、2つ以上のEMR源を操作するためのアレイと電子通信する、制御装置;および、
センサであって、フィードバックに応じて、制御装置が多機能のシステムの少なくとも1つの操作条件を調節することを可能にするために、定義されたパラメータに基づいて制御装置へのフィードバックを提供するための制御装置と電子通信する、センサ、を含む。多機能エステティックシステム。 - ハウジングは持ち運び可能に設計される、請求項1に記載の多機能エステティックシステム。
- EMR源によって生成された波長の組み合わせのカスタマイズを提供するために、アレイ内でEMR源はモジュール式に交換可能である、請求項1に記載の多機能エステティックシステム。
- 各々のEMR源は、赤外線波長、可視光波長または紫外線の波長のうちの1つを有するEMRビームを生成するように構成される、請求項1に記載の多機能エステティックシステム。
- 制御装置は、2つ以上のEMR源からEMRビームを放出するために、2つ以上のEMR源を同時に、連続的に、または交互パターンで操作するように構成される、請求項1に記載の多機能エステティックシステム。
- 制御装置は、治療上許容できる温度で処理範囲を維持するために、少なくとも1つの操作条件を調節するように構成される、請求項1に記載の多機能エステティックシステム。
- 制御装置は、処理範囲に当たる冷却気流の流量、処理範囲に当たる冷却気流の温度、処理範囲と冷却気流を処理範囲へ方向づける冷却機器との間の間隔、EMRビームの出力、処理範囲に対するEMRビームの走査速度、またはその組み合わせの少なくとも1つを調節するように構成される、請求項6に記載の多機能エステティックシステム。
- センサは、温度センサを含み、フィードバックは処理範囲の温度を示す温度データを含み、少なくとも1つの調節された操作条件は放射EMRビーム出力である、請求項1に記載の多機能エステティックシステム。
- センサは、温度センサを含み、フィードバックは処理範囲の温度を示す温度データを含み、少なくとも1つの調節された操作条件は、処理範囲へ方向づけられた冷却気流の流量である、請求項1に記載の多機能エステティックシステム。
- センサは、温度センサを含み、フィードバックは処理範囲の温度を示す温度データを含み、少なくとも1つの調節された操作条件は、処理範囲と、冷却気流を処理範囲へ方向づける冷却機器との間の間隔である、請求項1に記載の多機能エステティックシステム。
- センサは、処理範囲との接触なしに、フィードバックを提供するように構成される、請求項1に記載の多機能エステティックシステム。
- EMRを処理範囲に方向づけるEMR経路をさらに含む、請求項1に記載の多機能エステティックシステム。
- 経路は、2つ以上の異なる波長によって標的範囲の同時照射を可能にするために、2つ以上の光学的に分離された出力ファイバも含む、請求項12に記載の多機能エステティックシステム。
- EMRビームを処理範囲に方向づけるために、経路から受け取ったEMRビームを修正するための経路に光学的に係合された装置、も含む、請求項12に記載の多機能エステティックシステム。
- 装置は:
EMRビームを拡大した処理範囲に方向づけるために、EMRビームを拡大するための光学素子;および、
処理範囲より下の処理領域の表面下でEMRビームの拡大を予防するために、拡大されたビームの焦点を合わせるための、フレネルレンズ、を含む、請求項14に記載の多機能エステティックシステム。 - 装置は、経路と複数の出力ビームを生成するための装置との間で光学的に係合されたビームスプリッタも含み;複数の出力ビームは装置によって放出され、処理範囲に分かれて衝突し、処理範囲より下の所定の距離で重なり、処理領域の表面下を処理する、請求項14に記載の多機能エステティックシステム。
- 装置は、複数の出力ビームを生成するためのEMR経路の複数の光学的に分離する部分に光学的に係合され、複数の出力ビームは装置によって放出され、処理範囲に分かれて衝突し、処理範囲より下の所定の距離で重なり、処理領域の表面下を処理する、請求項14に記載の多機能エステティックシステム。
- アレイは、経路の光学的に分離する部分を経由して装置に方向づけられる同じ波長を有するEMRビームを生成するように構成される、少なくとも2つのEMR源、を含む、請求項17に記載の多機能エステティックシステム。
- 装置は処理範囲に関連したフィードバックを提供するためのセンサに係合される、請求項14に記載の多機能エステティックシステム。
- 装置は、EMRビームを分割せずに処理範囲に冷却気流を方向づけるように構成される、請求項19に記載の多機能エステティックシステム。
- 装置は、処理範囲にEMRビームを方向づけ、処理範囲に冷却気流を方向づけ、及び処理範囲との接触なしに、処理範囲に関連したセンサフィードバックを提供するように構成される、請求項20に記載の多機能エステティックシステム。
- 処理範囲にEMRビームを方向づけるように装置を配置するために、ハウジングに第1端部で係合され、装置に第2端部で係合される、機器、も含む、請求項14に記載の多機能エステティックシステム。
- 機器は、装置を配置するための関節式のアームも含む、請求項22に記載の多機能エステティックシステム。
- 機器は、処理範囲に対して装置を配置するために、機器の動作を命令すべく、制御装置から信号を受け取るように構成される、請求項22に記載の多機能エステティックシステム。
- 機器は、センサからの制御装置で受け取ったフィードバックに反応して、制御装置から信号を受け取るように構成され、センサは位置センサを含み、フィードバックは処理範囲に対する装置の位置を示す位置データを含み、少なくとも1つの調整された操作条件は装置の位置である、請求項24に記載の多機能エステティックシステム。
- 操作中に、EMR源、または冷却気流の少なくとも1つを冷やすための、チラー、も含む、請求項1に記載の多機能エステティックシステム。
- 操作中に、EMR源の、または冷却気流の別の少なくとも1つを冷やすための、第2チラー、も含む、請求項1に記載の多機能エステティックシステム。
- 多機能システムを使用するエステティック処理の方法であって、方法は:
操作する工程であって、各EMR源によって生成されたEMRビームを処理範囲に方向づけるために、ハウジングに位置される電磁気アレイと電子通信する制御装置によって、アレイの2つ以上の電磁放射(EMR)源を操作し、各々のEMR源は別のEMR源よって生成されたEMRビームと異なる波長を有するEMRビームを生成するように構成される工程;
制御装置と電子通信するセンサによって、定義されたパラメータに基づいて、制御装置へフィードバックを提供する工程;
制御装置によって、フィードバックに応じ多機能システムの少なくとも1つの操作条件を調節する工程、を含む、方法。 - 各々のEMR源は、赤外線波長、可視光波長または紫外線の波長のうちの1つを有するEMRビームを生成するように構成される、請求項28に記載の方法。
- 操作する工程は、処理範囲で治療上許容できる温度を維持するために、2つ以上のEMR源からEMRビームを放出すべく、2つ以上のEMR源を同時に、連続的に、または交互パターンで操作する工程、も含む、請求項28に記載の方法。
- 調節する工程は、処理範囲を治療上許容できる温度で維持する工程、も含む、請求項28に記載の方法。
- 処理範囲を治療上許容できる温度で維持する工程は、処理範囲に当たる冷却気流の流量、処理範囲に当たる冷却気流の温度、処理範囲と処理範囲に冷却気流を方向づける冷却機器との間の間隔、EMRビームの出力、処理範囲に対するEMRビームの走査速度、またはその組み合わせの、少なくとも1つを調節する工程、を含む、請求項30に記載の方法。
- EMRビームをEMR経路に沿って処理範囲に方向づける工程、も含む、請求項28に記載の方法。
- 処理範囲にEMRビームを方向づけるために、経路に光学的に係合された装置のEMRビームを修正する工程、も含む、請求項33に記載の方法。
- 修正する工程は:
拡大した処理範囲にEMRビームを方向づけるために、装置の光学素子によってEMRビームを拡大する工程;
処理範囲より下の処理領域の表面下でEMRビームの拡大を予防するために、フレネルレンズによる拡大されたビームの焦点合わせる工程、も含む、請求項34に記載の方法。 - 修正する工程は:
複数の出力ビームを生成するために、経路と装置との間に光学的に係合されたビームスプリッタによるEMRビームを分割する工程;
処理範囲に分かれて衝突し、処理範囲より下の所定の距離で重なり、処理領域の表面下を処理する、装置によって複数の出力ビームを放出する工程、も含む、請求項34に記載の方法。 - 修正する工程は:
複数の出力ビームを生成するために、EMR経路の複数の光学的に分離する部分と装置を光学的に係合する工程;
処理範囲に分かれて衝突し、処理範囲より下の所定の距離で重なるように、処理領域の表面下を処理する、装置によって複数の出力ビームを放出する工程、も含む、請求項34に記載の方法。 - 経路の光学的に分離する部分により装置に対し、同じ波長を有する少なくとも2つのEMRビームを方向づける工程、も含み、アレイは、各々が同じ波長を有する少なくとも2つのEMRビームを生成するように構成された、少なくとも2つのEMR源を含む、請求項37に記載の方法。
- 装置を介して、EMRビームを分割せずに、冷却気流を処理範囲に方向づける工程、も含む、請求項34に記載の方法。
- 装置によってEMRビームを処理範囲に方向づける工程、装置を介して冷却気流を処理範囲に方向づける工程、およびセンサによって制御装置へフィードバックを提供する工程は装置またはセンサが処理領域と接触せずに行われる、請求項39に記載の方法。
- 調節する工程は、制御装置によって、処理範囲に対してEMRビームを位置づけるために、ハウジングに係合された機器の動作を制御する工程、も含む、請求項28に記載の方法。
- 調節する工程は、フィードバックに応じてEMRビームの位置を変えるために、機器を移動する工程、も含む、請求項41に記載の方法。
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US20200406055A1 (en) | 2020-12-31 |
EP3981349A2 (en) | 2022-04-13 |
BR112019010363A2 (pt) | 2019-08-27 |
US20230093778A9 (en) | 2023-03-23 |
KR20190089176A (ko) | 2019-07-30 |
US20220273964A1 (en) | 2022-09-01 |
US20180140866A1 (en) | 2018-05-24 |
EP3981349A3 (en) | 2022-08-10 |
KR20230154105A (ko) | 2023-11-07 |
US11638835B2 (en) | 2023-05-02 |
KR102597022B1 (ko) | 2023-11-01 |
JP2023060852A (ja) | 2023-04-28 |
EP3544679A1 (en) | 2019-10-02 |
EP3544679A4 (en) | 2021-06-23 |
US10994151B2 (en) | 2021-05-04 |
WO2018098274A1 (en) | 2018-05-31 |
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